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    • 39. 发明公开
    • 포지형 감광성 수지조성물 및 이로부터 얻어지는 경화막
    • 正极性感光树脂组合物和固化膜
    • KR1020080089485A
    • 2008-10-06
    • KR1020087020040
    • 2007-01-09
    • 닛산 가가쿠 고교 가부시키 가이샤
    • 하타나카타다시
    • G03F7/027
    • C08G18/8061C08G18/64G03F7/0007G03F7/0392
    • a positive photosensitive resin composition which has excellent storage stability and high sensitivity and is reduced in film thickness loss in unexposed areas and which, even when subjected after film formation to burning at a high temperature or a treatment with a resist stripper liquid, retains a high transmittance and suffers no decrease in film thickness; and a cured film which is obtained from the positive photosensitive resin composition and is suitable for use as a film material for various displays, e.g., an array planarization film for TFT liquid-crystal elements. [MEANS FOR SOLVING PROBLEMS] The positive photosensitive resin composition comprises: ingredient (A) which is a thermally crosslinked polymer formed from a base polymer having a functional group capable of undergoing heat curing reaction by bonding the base polymer to itself through a chemical structure comprising two or more heat-crosslinkable groups represented by the formula (1); [Chemical formula 1] formula (1) ingredient (B) which is a compound having two or more blocked isocyanate groups per molecule; ingredient (C) which is a photo-acid generator; and a solvent (D).
    • 具有优异的保存稳定性和高灵敏度的正型感光性树脂组合物,并且在未曝光区域中的膜厚度损失降低,并且即使在成膜后在高温下进行烧制或用抗蚀剂剥离液进行处理也保持高 透光率,膜厚度不降低; 以及由正性感光性树脂组合物得到的固化膜,适用于各种显示器的膜材料,例如TFT液晶元件的阵列平面化膜。 作为解决问题的方法正型感光性树脂组合物包含:成分(A),其是由具有能够进行热固化反应的官能团的基础聚合物形成的热交联聚合物,其通过以下化学结构将基础聚合物自身结合,所述化学结构包括: 由式(1)表示的两个或更多个热交联基团; [化学式1]式(1)成分(B),其为每分子具有两个以上封端异氰酸酯基团的化合物; 成分(C),它是光酸产生剂; 和溶剂(D)。