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    • 1. 发明专利
    • DISCHARGING CONTAINER
    • JPH09180627A
    • 1997-07-11
    • JP33511995
    • 1995-12-22
    • KYOCERA CORP
    • AIDA HIROSHI
    • H01J5/10
    • PROBLEM TO BE SOLVED: To increase the corrosion resistance of a discharging container and extend the life of the container by applying a single substance of group 2a element of the periodic table or its compound on the contact face with plasma in the discharging container generating plasma in it. SOLUTION: A film layer 4 made of a single substance of group 2a element of the periodic table or its compound is formed on the surface at least kept in contact with plasma on the inner face of the container wall 2 of a discharging container 1 generating plasma in it. The thickness of the film 4 is preferably set to about 0.001-1mm. At least one kind selected from a group of Ba, Mg, Ca, Sr, Ra is used for the 2a group element in the periodic table. A nitride, a carbide, a carbonitride, an oxide, an oxynitride, an oxycarbonitride, a halide, or a boride is used for the compound.
    • 2. 发明专利
    • SUBSTRATE PROVIDED WITH ANTI-REFLECTION FILM
    • JPH07130307A
    • 1995-05-19
    • JP27217293
    • 1993-10-29
    • FUTABA DENSHI KOGYO KK
    • MIHIRA AKIHIRO
    • H01J29/88H01J5/10H01J17/04H01J29/89H01J31/15
    • PURPOSE:To provide a substrate provided with an anti-reflection film, which has both alkaline shutting effect and a reflection preventing effect. CONSTITUTION:An SiO2 film 3 which is an alkaline shutting film, and a mixed film 4 having TiO2 and SiO2, are formed on a translucent substrate 2. A conductor pattern layer 5 made of Al is provided on the mixed film. The mixed film, a part corresponding to the conductor pattern layer, is colored by means of heat treatment and thus has anti-reflection effect. An SiO2 film is formed on the boundary surface of the mixed film connected to the SiO2 film, and the both films fit well with one another on the boundary surface. When SiO2 is mixed to the TiO2 film, the expansion coefficient of the whole becomes lower than that of TiO2. This mixed film of the expansion coefficient smaller than that of a conventional film is not easily peeled off due to its expansion coefficient which is different from that of the substrate. The strength of the mixed film is higher than that of a TiO2-only film. The mixed film thus does not peel off easily from a SiO2 film.