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    • 8. 发明专利
    • Resist stripper
    • 耐力剥离器
    • JP2004219486A
    • 2004-08-05
    • JP2003003700
    • 2003-01-09
    • Mitsubishi Gas Chem Co Inc三菱瓦斯化学株式会社
    • IKEMOTO KAZUTO
    • G03F7/42C07C45/00C07H1/00C07H5/00C11D3/00G03F7/00G03F7/32H01L21/027H01L21/304
    • G03F7/425G03F7/426
    • PROBLEM TO BE SOLVED: To provide a resist stripper which can rapidly and easily strip a photoresist membrane applied on a substrate, a photoresist layer remaining after etching of the photoresist membrane applied on the substrate or the photoresist residues etc., remaining by performing ashing after etching of the photoresist film at a low temperature, permits microfabrication of various kinds of the materials and permits manufacturing of circuit wiring of high accuracy.
      SOLUTION: The resist stripper contains the product obtained by reacting alkanol amine and formaldehyde with formaldehyde/alkanol amine (molar ratio) at a ration of ≤0.8.
      COPYRIGHT: (C)2004,JPO&NCIPI
    • 要解决的问题:提供一种抗蚀剂剥离器,其可以快速且容易地剥离施加在基板上的光致抗蚀剂膜,在蚀刻施加在基板上的光致抗蚀剂膜或光致抗蚀剂残留物等之后残留的光致抗蚀剂层,由 在低温下蚀刻光致抗蚀剂膜之后进行灰化,允许对各种材料进行微细加工,并允许高精度地制造电路布线。 解决方案:抗蚀剂汽提器含有通过使烷醇胺和甲醛与甲醛/烷醇胺(摩尔比)反应得到的产物,摩尔比为≤0.8。 版权所有(C)2004,JPO&NCIPI