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1. 发明专利

JP2005274920A Negative radiation-sensitive resin composition 有权
标题翻译：负辐射敏感性树脂组合物
公开(公告)号：JP2005274920A
公开(公告)日：2005-10-06
申请号：JP2004087521
申请日：2004-03-24
申请人： Jsr Corp , Jsr株式会社
发明人： NISHIKAWA KOJI , KIMURA TORU , IWANAGA SHINICHIRO
IPC分类号： C08F20/18 , C08F20/58 , G03F7/004 , G03F7/033 , G03F7/40 , H01L21/027
CPC分类号： G03F7/40 , G03F7/033 , Y10S430/107 , Y10S430/111 , Y10S430/117 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a thick plated product such as a bump and a wiring line with high accuracy, to provide a negative radiation-sensitive resin composition having excellent sensitivity, resolution or the like suitable for the above method, and also to provide a transfer film using the above composition.
SOLUTION: The negative radiation-sensitive resin composition contains: (A) a polymer having a structural unit expressed by the general formula (1) and/or (2); (B) a compound having at least one ethylenically unsaturated double bond; and (C) a radiation-sensitive radical polymerization initiator. A negative radiation-sensitive resin film is obtained by using the above composition.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种高精度制造诸如凸块和布线的厚电镀产品的方法，以提供一种适合于具有优异的灵敏度，分辨率等的负型辐射敏感性树脂组合物并且还提供使用上述组成的转印膜。解决方案：负辐射敏感性树脂组合物含有：（A）具有由通式（1）和/或（2）表示的结构单元的聚合物; （B）具有至少一个烯属不饱和双键的化合物; 和（C）辐射敏感性自由基聚合引发剂。通过使用上述组合物获得负型辐射敏感树脂膜。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP4318453B2 Photoresist pattern forming method of using the anti-film composition and this diffused reflection 有权
公开(公告)号：JP4318453B2
公开(公告)日：2009-08-26
申请号：JP2002366252
申请日：2002-12-18
申请人：株式会社ハイニックスセミコンダクターHynix Semiconductor Inc.
发明人：晟求李 , 根守李 , 起秀申 , 載昌鄭
IPC分类号： G03F7/11 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/09 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/091 , Y10S430/114 , Y10S430/119 , Y10S430/12 , Y10S430/151
摘要： A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light used as light sources during lithography process using light sources such as KrF, ArF, VUV, EUV, E-beam and ion beam, even when photoresist resins having high absorbance to light source are used.

4. 发明专利

JP2010515780A Electromagnetic radiation or heat-sensitive composition 审中-公开
公开(公告)号：JP2010515780A
公开(公告)日：2010-05-13
申请号：JP2009544389
申请日：2007-12-21
申请人：チバホールディングインコーポレーテッドCiba Holding Inc.
发明人：キャンベル，ジョナサン , ケーザー，アードルフ
IPC分类号： C09D201/00 , C09D7/12
CPC分类号： B41M5/323 , B41M3/142 , C08K5/07 , C08K5/17 , C09D7/63 , Y10S430/106 , Y10S430/114 , Y10S430/119 , Y10S430/145 , Y10S430/146 , Y10S430/165 , Y10T428/24802
摘要： The present invention provides coating compositions comprising (i) a) a compound containing a free carbonyl group and b) a nucleophile or (ii) a compound containing a free carbonyl group, which compound is substituted with one or more nucleophilic groups. The present invention also provides a process for the preparation of these compositions, substrates coated with these compositions and a process for their preparation, a process for preparing marked substrates using these compositions, and marked substrates obtainable by the latter process.

5. 发明专利

JP3954066B2 Barrier film-forming material and a pattern forming method using the same 有权
标题翻译：空值
公开(公告)号：JP3954066B2
公开(公告)日：2007-08-08
申请号：JP2004361058
申请日：2004-12-14
申请人：松下電器産業株式会社
发明人：勝笹子 , 政孝遠藤
IPC分类号： G03F7/11 , G03C5/00 , G03F7/00 , G03F7/09 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/84
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/119 , Y10S430/123

6. 发明专利

JP2003012713A Thermopolymerization initiator system using leuco dye and polyhalogen compound 有权
标题翻译：使用低聚氯乙烯和多羟基化合物的热塑化发动机系统
公开(公告)号：JP2003012713A
公开(公告)日：2003-01-15
申请号：JP2002107119
申请日：2002-04-09
申请人： Kodak Polychrome Graphics Co Ltd , コダックポリクロムグラフィックスカンパニーリミテッド
发明人： MUELLER URSULA , WITTIG TOBIAS , TIMPE HANS-JOACHIM
IPC分类号： G03F7/004 , B41C1/10 , B41M5/40 , B41M5/46 , B41N1/14 , C08F2/48 , C08F4/00 , G03F7/00 , G03F7/029 , G03F7/038 , G03F7/11
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/22 , B41C2210/24 , B41M5/465 , Y10S430/116 , Y10S430/117 , Y10S430/118 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： PROBLEM TO BE SOLVED: To obtain an infrared ray-sensitive initiator composition improved in infrared ray sensitivity and capable of being used in producing a negative printing plate precursor, and to provide an initiator system composed of at least one component and free radical-polymerizable. SOLUTION: The initiator system contains at least one kind of a compound capable of absorbing infrared ray radiation, at least one kind of a compound capable of generating radicals, at least one kind of a carboxylic acid, and at least one kind of a leuco dye. The infrared ray-sensitive initiator composition contains the system.
摘要翻译：要解决的问题：获得提高红外线灵敏度的红外线敏感性引发剂组合物，并且能够用于制备负性印版前体，并提供由至少一种组分和游离基可自由基聚合的引发剂体系。解决方案：引发剂体系包含至少一种能够吸收红外线辐射的化合物，至少一种能够产生自由基的化合物，至少一种羧酸和至少一种无色染料。红外线敏感引发剂组合物含有该系统。

7. 发明专利

JPS5753508A Acrylate composition two-step hardenable with ultraviolet ray and heat 失效
标题翻译：丙烯酸酯组合物具有超紫外线和热的两步可变性
公开(公告)号：JPS5753508A
公开(公告)日：1982-03-30
申请号：JP12607681
申请日：1981-08-13
申请人： Grace W R & Co
发明人： CHIYAARUZU ROBAATO MOOGAN
IPC分类号： C08F2/00 , C08F2/48 , C08F20/00 , C08F20/10 , C08F22/10 , C09D4/00 , G03F7/031
CPC分类号： G03F7/031 , C08F22/105 , C09D4/00 , Y10S430/114 , Y10S430/117 , Y10S430/119 , C08F222/1006

8. 发明专利

JP4360242B2 Negative radiation-sensitive resin composition 有权
标题翻译：空值
公开(公告)号：JP4360242B2
公开(公告)日：2009-11-11
申请号：JP2004087521
申请日：2004-03-24
申请人： Jsr株式会社
发明人：伸一郎岩永 , 徹木村 , 耕二西川
IPC分类号： G03F7/033 , C08F20/18 , C08F20/58 , G03F7/004 , G03F7/029 , G03F7/031 , G03F7/40 , H01L21/027
CPC分类号： G03F7/40 , G03F7/033 , Y10S430/107 , Y10S430/111 , Y10S430/117 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126

10. 发明专利

JP2005275365A Material for forming barrier film and method for forming pattern using the same 有权
标题翻译：用于形成障碍膜的材料和使用其形成图案的方法
公开(公告)号：JP2005275365A
公开(公告)日：2005-10-06
申请号：JP2004361058
申请日：2004-12-14
申请人： Matsushita Electric Ind Co Ltd , 松下電器産業株式会社
发明人： ENDO MASATAKA , SASAKO MASARU
IPC分类号： G03F7/11 , G03C5/00 , G03F7/00 , G03F7/09 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/84
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/119 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To obtain a fine pattern having a preferable profile by preventing the influence of an immersion liquid to be used for immersion lithography on a resist film. SOLUTION: A resist film 102 comprising a chemically amplified resist is formed on a substrate 101. Subsequently, a barrier film 103 is formed on the resist film 102, the barrier film preventing the elution of the component in the resist film into the immersion liquid or preventing the permeation of the immersion liquid into the resist film 102. Thereafter, with the immersion liquid 104 provided on the barrier film 103, the resist film 102 is selectively irradiated with exposure light 105 for pattern exposure through the barrier film 103. After the barrier film 103 is removed, the resist film 102 subjected to pattern exposure is developed to form a resist pattern 102a from the resist film 102. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过防止用于浸渍光刻的浸渍液体对抗蚀剂膜的影响而获得具有优选轮廓的精细图案。解决方案：在基板101上形成包括化学放大型抗蚀剂的抗蚀剂膜102.随后，在抗蚀剂膜102上形成阻挡膜103，阻挡膜阻止抗蚀剂膜中的成分溶解到浸没液体或防止浸入液体渗透到抗蚀剂膜102中。此后，通过设置在阻挡膜103上的浸渍液体104，通过阻挡膜103选择性地照射用于图案曝光的曝光光105的抗蚀剂膜102。在去除阻挡膜103之后，进行图案曝光的抗蚀剂膜102被显影以形成抗蚀剂图案102a。版权所有（C）2006，JPO＆NCIPI

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