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    • 7. 发明专利
    • Lead wire for semiconductor device
    • 用于半导体器件的引线
    • JPS58191455A
    • 1983-11-08
    • JP7413982
    • 1982-04-30
    • Sumitomo Electric Ind Ltd
    • KUDOU KAZUNAO
    • H01L23/48H01L21/48H01L23/49
    • H01L24/745H01L2224/43H01L2224/435H01L2224/43822H01L2224/45H01L2224/4516H01L2224/45565H01L2224/45647H01L2224/45686H01L2224/45687H01L2224/745H01L2924/00014H01L2924/01028H01L2924/01029H01L2924/01074H01L2924/01082H01L2224/48H01L2924/013H01L2924/00012
    • PURPOSE:To obtain a probe lead wire for the miniature type glass diode having high reliability about glass sealing without generating trouble at welding by a method wherein a copper suboxide (Cu2O) film is formed on a core wire consisting of an iron-nickel alloy coated with copper. CONSTITUTION:The core wire consisting of the iron-nickel alloy coated with copper is drawn to form the wire 11 and is sent out from a supplyer 12, and is heated by a heating burner 13 to form the copper suboxide (Cu2O) film being stable in the room temperature. The wire is cooled rapidly in a cooling water tank 14, and is wound round a winder 16 as the wire 15 coated with the copper suboxide film being uniform in the room temperature. Rapid cooling of the wire 11 is performed within 0.04sec after the wire passed through the final burner nozzle of the heating burner 13. When rapid cooling is performed in the range of 0.04-0.15sec, thickness of the copper suboxide film is formed to 0.8-8mu, and although no hindrance is generated on the point of reliability about glass sealing, but welding of the probe of tungsten, etc., can not be performed favorably.
    • 目的:为了获得玻璃密封高度可靠性的微型玻璃二极管的探针引线,而不会在焊接时产生麻烦,因为其中在由铁 - 镍合金涂覆的铁 - 镍合金构成的芯线上形成低氧化铜(Cu2O) 与铜。 构成:由涂覆有铜的铁 - 镍合金构成的芯线被拉拔以形成电线11,并从供电器12送出,并由加热燃烧器13加热,形成稳定的低氧化铜(Cu2O)膜 在室温下。 电线在冷却水箱14中快速冷却,并且在室温下均匀涂覆有低氧化铝薄膜的金属丝15上缠绕在卷绕机16上。 在焊丝通过加热燃烧器13的最终燃烧器喷嘴之后的0.04秒内进行电线11的快速冷却。当快速冷却在0.04-0.15秒的范围内进行时,低氧化铜膜的厚度形成为0.8 -8mu,虽然在玻璃密封的可靠性方面没有产生障碍,但是钨等的探针的焊接不能有利地进行。