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    • 4. 发明专利
    • Hot dipping method
    • 热浸法
    • JPS6160873A
    • 1986-03-28
    • JP18346884
    • 1984-08-31
    • Hitachi Cable Ltd
    • KONISHI KENJI
    • C23C2/10C23C2/14C23C2/26C23C2/38
    • C23C2/14C23C2/10
    • PURPOSE:To prevent easily thickness deviation of hot dipping by dipping a material to be plated into a molten metal bath then passing the material through a salt bath which is provided by forming a boundary with the molten metal bath, has the specific gravity smaller than the specific gravity of the molten metal bath and is kept at approximately the same temp. as the temp. of said bath and pulling up the material. CONSTITUTION:A cooper wire 1 as the material to be plated is run in an arrow direc tion and is dipped into a Pb-Sn solder bath 3 by guide rolls 2a, b, c, etc. and is passed through a drawing die 4, by which the thickness of the solder 5 sticking to the wire 1 is reduced adequately. The wire is immediately thereafter passed through the salt bath 6 consisting of KNO3, KNO3, etc. and is vertically pulled. The above-mentioned salt bath 6 having about 1.8 specific gravity is held afloat by forming the boundary face on the solder bath 3 having about 9.5 specific gravity and is kept at approximately the same temp. as the temp. of the bath 3. The solder 5 on the surface of the wire 1 is thus stuck in the molten state to said surface by the own surface tension and the uniform liquid pressure of the bath 6 from the periphery without forming the thickness deviation. The solder is cooled to solidify by cooling water 7, by which the solder hot dipping is executed without thickness deviation.
    • 目的:为了通过将要镀覆的材料浸入熔融金属浴中以防止容易的厚度偏差,然后使材料通过与熔融金属浴形成边界而提供的盐浴,其比重小于 熔融金属浴的比重保持在大致相同的温度。 作为温度 的浴,拉起材料。 构成:作为被镀材料的铜线1以箭头方向运行,并通过导辊2a,b,c等浸入Pb-Sn焊锡槽3中,并通过拉丝模4, 通过该焊料5,焊接剂5的粘附线1的厚度被充分降低。 然后,线材立即通过由KNO3,KNO3等组成的盐浴6,并被垂直拉动。 上述具有约1.8比重的盐浴6通过在具有约9.5比重的焊料槽3上形成边界面并保持在大致相同的温度下而保持浮动。 作为温度 因此,电线1的表面上的焊料5由于自身的表面张力和槽6的液体均匀的液体压力从周边而被粘合到所述表面,而不形成厚度偏差。 焊料通过冷却水7冷却固化,由此进行焊料热浸镀而没有厚度偏差。
    • 6. 发明专利
    • Display device for plating film thickness
    • 用于镀膜厚度的显示装置
    • JPS6111649A
    • 1986-01-20
    • JP13261284
    • 1984-06-27
    • Mitsubishi Electric Corp
    • SOMURA MASAO
    • G01N27/26C23C2/14G01B7/06
    • C23C2/14
    • PURPOSE:To judge the end point of time of plating operation securely by displaying the current film thickness sequentially during the plating operation on the basis of electric energy as the product of a current applied to a plated body and time and the area of the plated body. CONSTITUTION:The area of the plated body 3 from a plating film thickness calculating means 8 is inputted from a plated body area input device 7 during plating operation and the area value is inputted to a CPU10 through an input circuit 14 and stored in a memory 1. A reset signal is sent to an integrating watt meter 6 through an output circuit A13 from a CPU10 so as to reset the integrated electric power of the integrating watt meter 6, and the integrated electric power is reset. When the input operation of the area is completed, an operator sets the body 3 to be plated in a plating tank 1 and a current corresponding to the body 3 to be plated is flowed. Then, the film thickness obtained by a film thickness calculating means 8 is displayed on a display device 9 and the plating operation is completed with specific plating film thickness.
    • 目的:通过以电能为基础,在电镀操作期间依次显示当前膜厚度作为施加到镀层体的电流与时间的乘积与电镀体的面积之间的顺序来判断电镀操作的终点时间 。 构成:电镀操作期间,从镀膜厚度计算装置8的电镀体3的面积从电镀体区域输入装置7输入,并且通过输入电路14将区域值输入到CPU10并存储在存储器1中 通过CPU10的输出电路A13将复位信号发送到积分电表6,以便复位积分电表6的积分电力,并且集成电力被复位。 当区域的输入操作完成时,操作者将要镀覆的主体3设置在电镀槽1中,并且流过与要被镀的主体3相对应的电流。 然后,通过膜厚度计算装置8获得的膜厚度显示在显示装置9上,电镀操作以特定的镀膜厚度完成。