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1. 发明专利

JP2010215968A Gas generation apparatus 审中-公开
标题翻译：气体发生装置
公开(公告)号：JP2010215968A
公开(公告)日：2010-09-30
申请号：JP2009064468
申请日：2009-03-17
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： YOSHIMOTO OSAMU , HIRAIWA JIRO , TANAKA TAKAHIRO , YANO YASUHIRO
IPC分类号： C25B9/00 , C25B1/24
摘要： PROBLEM TO BE SOLVED: To provide a gas generation apparatus capable of stably electrolyzing while suppressing the consumption of an inert gas.
SOLUTION: In a stop mode, control valves V1-V8 are closed and a voltage applying device 51, a vacuum generator 31 and a pump P1 are stopped, thereby an electrolysis in an electrolytic cell 10 is completely shut-down. In a stand-by mode, the control valves V1-V3, V8 are opened and the control valves V4-V6 are closed, The pump 1 is also stopped and the vacuum generator 31 is driven and in such the state, a second voltage is applied between the anode 13 and the cathode 14 by means of the voltage apply device 51. Then, the small quantity of fluorine gas is generated in the anode chamber 10a and the small quantity of gaseous hydrogen is generated in the cathode chamber 10b.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供能够在抑制惰性气体的消耗的同时稳定地进行电解的气体发生装置。解决方案：在停止模式中，控制阀V1-V8关闭，电压施加装置51，真空发生器31和泵P1停止，从而电解槽10中的电解完全关闭。在待机模式中，控制阀V1-V3，V8打开，控制阀V4-V6关闭，泵1也停止，真空发生器31被驱动，在这种状态下，第二电压为通过电压施加装置51施加在阳极13和阴极14之间。然后，在阳极室10a中产生少量的氟气，并且在阴极室10b中产生少量的气态氢。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2004231970A Surface modification method, water-repellent polymer material obtained by the method and clothing, paper and rubber using the material 有权
公开(公告)号：JP2004231970A
公开(公告)日：2004-08-19
申请号：JP2004095877
申请日：2004-03-29
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： TOJO TETSURO , HIRAIWA JIRO , TAKEBAYASHI HITOSHI
IPC分类号： C08J7/00 , D06M11/09 , D06M11/58 , D06M11/84 , D21H21/16 , D21H23/44
摘要： PROBLEM TO BE SOLVED: To provide a surface modification method surely imparting water repellency by treating the surface of a synthetic or natural polymer material, to provide a polymer material obtained by the method, and to provide clothing, paper and rubber using the material.
SOLUTION: The method comprises treating a synthetic or natural polymer with a gas containing fluorine gas and an inert gas to impart water repellency, wherein, as the synthetic or natural polymer material, a material having ≤1.6 specific gravity and containing neither ether bond, carbonate bond, amide bond nor urethane bond is selected so as to make the contact angle to water and of the treated by the method ≥10° larger than that of the untreated.
COPYRIGHT: (C)2004,JPO&NCIPI

3. 发明专利

JP2010215932A Gas generation apparatus 有权
标题翻译：气体发生装置
公开(公告)号：JP2010215932A
公开(公告)日：2010-09-30
申请号：JP2009060849
申请日：2009-03-13
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： MOTOMIYA MAKOTO , YOSHIMOTO OSAMU , HIRAIWA JIRO
IPC分类号： C25B15/08 , C25B9/00
摘要： PROBLEM TO BE SOLVED: To provide a gas generation apparatus capable of controlling the liquid level of an electrolyte bath in an electrolytic cell stably to a fixed range with simple constitution. SOLUTION: It is detected by pressure meters 25, 26 whether the pressure in a cathode chamber 3 and the pressure in an anode chamber 4 are equal to or above atmospheric pressure or one of them is lower than atmospheric pressure. It is detected by a first liquid level detecting device 50A whether the liquid level in the cathode chamber 4 shows H or L and it is detected by a second liquid level detecting device 50B whether the liquid level in the anode chamber 4 shows H or L. Opening and closing of an automatic valve 11 of a gaseous hydrogen discharge pipe 7, an automatic valve 15 of a fluorine gas discharge pipe 8 and an automatic valve 21 of a HF supply pipe 20 are controlled based on the detected results of the pressure meters 25, 26, the first liquid level detecting device 50A and the second liquid level detecting device 50B. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种气体发生装置，其能够以简单的结构将电解槽中的电解液浴的液面稳定地固定在一定范围内。解决方案：由压力计25,26检测阴极室3中的压力和阳极室4中的压力是否等于或高于大气压，或者其中一个低于大气压。由第一液面检测装置50A检测阴极室4中的液面是否显示H或L，并且由第二液位检测装置50B检测阳极室4中的液位是否显示H或L. 基于压力计25的检测结果，控制气体氢排出管7的自动阀11的打开和关闭，氟气排出管8的自动阀15和HF供给管20的自动阀21 ，26，第一液面检测装置50A和第二液位检测装置50B。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009221542A Fluorine gas generating apparatus 有权
标题翻译：氟燃气发生装置
公开(公告)号：JP2009221542A
公开(公告)日：2009-10-01
申请号：JP2008067621
申请日：2008-03-17
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： HIRAIWA JIRO , MANABE NOBUTAKA , TOJO TETSURO
IPC分类号： C25B9/00 , C25B1/24
摘要： PROBLEM TO BE SOLVED: To provide a fluorine gas generating apparatus in which the life of a seal member used in a pressurizer and comprising a synthetic resin is prolonged.
SOLUTION: The fluorine gas generating apparatus 1000 has an electrolytic cell 1 in which an electrolyte 2 comprising a mixed molten salt containing hydrogen fluoride is formed, adsorption means 14, 15 for adsorbing hydrogen fluoride in a fluorine-containing gas produced by the electrolysis of the electrolyte 2 and discharged from the electrolytic cell 1, the pressurizer 21 for pressurizing the fluorine gas in the fluorine-containing gas having the adsorbed hydrogen fluoride and a casing 100 housing the electrolytic cell 1, the adsorption means 14, 15 and the pressurizer 21. The pressurizer 21 uses the synthetic resin made seal member for insulating the inside of the pressurizer from the outside of the pressurizer to keep the purity of a gas passing through the pressurizer 21. The pressurizer 21, the electrolytic cell 1 and the adsorption means 14, 15 are each divide by partition wall in the casing 100.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种氟气生成装置，其中使用在加压器中并包括合成树脂的密封构件的寿命延长。解决方案：氟气发生装置1000具有：电解槽1，其中形成有包含含有氟化氢的混合熔融盐的电解质2，吸附装置14,15用于吸附由氟化氢产生的含氟气体中的氟化氢电解质2的电解并从电解池1排出的加压器21，用于对具有吸附氟化氢的含氟气体中的氟气进行加压的加压器21和容纳电解槽1的壳体100，吸附装置14,15和加压器21使用合成树脂制成的密封构件，用于将加压器的内部与加压器的外部绝缘，以保持通过加压器21的气体的纯度。加压器21，电解池1和吸附装置14,15各自被外壳100中的分隔壁分隔。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2009024222A Apparatus for generating fluorine-based gas and hydrogen gas 审中-公开
标题翻译：用于产生基于氟的气体和氢气的装置
公开(公告)号：JP2009024222A
公开(公告)日：2009-02-05
申请号：JP2007189038
申请日：2007-07-20
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： HIRAIWA JIRO , TANAKA TAKAHIRO , TOJO TETSURO
IPC分类号： C25B9/00 , C25B1/24
CPC分类号： C25B1/245 , C25B1/02 , C25B15/08
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for generating a fluorine-based gas and hydrogen gas, which can collect and utilize not only the fluorine-based gas but also the generated hydrogen gas with high purity.
SOLUTION: The apparatus is directed at generating the fluorine-based gas and hydrogen gas by electrolyzing an electrolytic bath 2 in an electrolytic tank 1 which has an anode chamber 3 and a cathode chamber 4, and includes: a pipe 61 for supplying hydrogen gas, which is connected so as to communicate with a gas phase part in the cathode chamber 4 and supplies the hydrogen gas generated in the cathode chamber 4; a first automatic valve 41 which is installed at some midpoint of the pipe 61 for supplying the hydrogen gas; a first pressurizer 47 which is installed downstream of the first automatic valve 41; a pipe 62 for supplying the fluorine-based gas, which is connected so as to communicate with a gas phase part in the anode chamber 3 and supplies the fluorine-based gas generated in the anode chamber 3; a second automatic valve 42 which is installed at some midpoint of the pipe 62 for supplying the fluorine-based gas; and a second pressurizer 48 which is installed downstream of the second automatic valve 42.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于产生氟基气体和氢气的装置，其不仅可以收集和利用氟基气体，而且可以高纯度地产生所产生的氢气。解决方案：该装置旨在通过在具有阳极室3和阴极室4的电解槽1中电解电解槽2来产生氟基气体和氢气，并且包括：用于供应的管道61 氢气，其连接成与阴极室4中的气相部分连通并供给在阴极室4中产生的氢气; 第一自动阀41，其安装在用于供给氢气的管61的某个中点处; 第一加压器47，安装在第一自动阀41的下游; 用于供给氟系气体的管62，该氟系气体与阳极室3内的气相部分连通并供给在阳极室3内产生的氟系气体; 第二自动阀42，其安装在用于供应氟基气体的管62的某个中点处; 以及安装在第二自动阀42的下游的第二加压器48.版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2005061636A Halogen gas or halogen containing gas supply method, cleaning method for semiconductor manufacturing device cleaning room, surface treatment method using halogen gas or halogen containing gas, semiconductor manufacturing device, and surface treatment device 审中-公开
标题翻译：含有气体供给方法的卤化物或卤化物，用于半导体制造装置清洁室的清洁方法，使用含有气体或含有气体的气体的表面处理方法，半导体制造装置和表面处理装置
公开(公告)号：JP2005061636A
公开(公告)日：2005-03-10
申请号：JP2004263688
申请日：2004-09-10
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： TOJO TETSURO , HIRAIWA JIRO , YOSHIMOTO OSAMU
IPC分类号： F17C7/00 , C01B7/01 , C01B7/20 , C01B9/08 , F17C13/02 , H01L21/3065 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a gas supply method for inexpensively and safely supplying fluorine gas to a supply destination, and to provide a semiconductor manufacturing device.
SOLUTION: The halogen gas or halogen containing gas supply method comprises a step of storing halogen gas or halogen containing gas in a storage tank and a step of pressurizing the gas in the storage tank. The semiconductor manufacturing device comprises the storage tank 2 for strong fluorine gas, a pressurizer 3 for pressurizing the fluorine gas in the storage tank 2, and a press-in storage tank 4 in which the fluorine gas from the pressurizer 3 is pressed. Thus, the fluorine gas can be supplied from a gas supply device 1 storing the fluorine gas to the supply destination without the need for replacing a gas supply source such as a gas cylinder, while saving labor and expense for such work. The gas supply device 1 can inexpensively and safely supply the fluorine gas to the supply destination.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于向供应目的地廉价和安全地供应氟气的气体供应方法，并提供一种半导体制造装置。解决方案：卤素气体或含卤素气体供给方法包括将卤素气体或含卤素气体储存在储罐中的步骤和对储罐中的气体加压的步骤。半导体制造装置包括强氟气用储罐2，对储存罐2中的氟气进行加压的加压器3以及来自加压器3的氟气被按压的压入槽4。因此，能够从存储氟气的供气装置1向供给目的地供给氟气，而不需要更换气瓶等气体供给源，同时节省了用于这种工作的劳动力和费用。气体供给装置1能够廉价，安全地将氟气供给到供给目的地。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004169123A Fluorine gas generator 有权
公开(公告)号：JP2004169123A
公开(公告)日：2004-06-17
申请号：JP2002336406
申请日：2002-11-20
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： TOJO TETSURO , YOSHIMOTO OSAMU , HIRAIWA JIRO
IPC分类号： C25B15/08 , C25B1/24 , C25B15/00
CPC分类号： C25B1/245
摘要： PROBLEM TO BE SOLVED: To prevent the corrosion of the upstream line by an electrolytic bath even upon interruption of HF (hydrogen fluoride) feeding or in case of emergency, and also to prevent the remaining of HF in the line.
SOLUTION: In the fluorine gas generator, an electrolytic bath comprising a hydrogen fluoride-containing mixed molten salt is electrolyzed to generate hydrogen fluoride gas. The generator has a hydrogen fluoride gas feed line for feeding hydrogen fluoride gas into the electrolytic bath, a first automatic valve disposed on the hydrogen fluoride gas feed line and capable of being closed on the occasion of interruption of hydrogen fluoride gas feeding, and an inert gas substitution means for eliminating the hydrogen fluoride gas remaining in the line on the downstream side from the first automatic valve in the hydrogen fluoride gas feed line and substituting an inert gas therefor when hydrogen fluoride gas feeding is interrupted.
COPYRIGHT: (C)2004,JPO

8. 发明专利

JP2013059709A Powder-processing device and powder-processing method 有权
标题翻译：粉末加工设备和粉末加工方法
公开(公告)号：JP2013059709A
公开(公告)日：2013-04-04
申请号：JP2011198187
申请日：2011-09-12
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： TANAKA NORIYUKI , HIRAIWA JIRO , MUKAI TAKAHIRO
IPC分类号： B01J8/24
CPC分类号： B01F3/068 , B01F2003/063 , B01J8/1818 , B01J8/1827 , B01J8/40 , B82Y30/00 , B82Y40/00 , C01B32/15 , Y10T137/87652
摘要： PROBLEM TO BE SOLVED: To provide a powder-processing device and powder-processing method which can increase an efficiency of processing a powder while securing safety.SOLUTION: A processing space SP is provided inside a reaction container 2. A first gas-introduction inlet 2a is provided on a lower end part of the reaction container 2. A dispersion plate 4 is attached to the gas-introduction inlet 2a. Another gas-introduction inlet 2b is provided on a lower side surface of the reaction container. In a state where a powder 10 is accommodated on the dispersion plate 4 inside the reaction container, nitrogen gas is introduced from the gas-introduction inlet 2a to the space SP for processing by passing through the dispersion plate 4, and a processing gas is introduced from the other gas-introduction inlet 2b to the space SP for processing without passing through the dispersion plate 4.
摘要翻译：要解决的问题：提供一种能够在确保安全性的同时提高粉末处理效率的粉末处理装置和粉末处理方法。解决方案：处理空间SP设置在反应容器2的内部。第一气体导入口2a设置在反应容器2的下端部。分散板4安装在气体导入口2a 。另外的气体导入口2b设置在反应容器的下侧面上。在粉末10容纳在反应容器内部的分散板4上的状态下，氮气通过分散板4从气体导入口2a导入到处理用空间SP，并且引入处理气体从另一个气体导入口2b到没有通过分散板4的处理空间SP。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2009242944A Fluorine gas generating apparatus 有权
标题翻译：氟燃气发生装置
公开(公告)号：JP2009242944A
公开(公告)日：2009-10-22
申请号：JP2009058567
申请日：2009-03-11
申请人： Toyo Tanso Kk , 東洋炭素株式会社
发明人： OKUBO HIROSHI , HIRAIWA JIRO , MOTOMIYA MAKOTO , TANAKA NORIYUKI , YOSHIMOTO OSAMU , KODAMA MASASHI
IPC分类号： C25B9/00
摘要： PROBLEM TO BE SOLVED: To provide a fluorine gas generating apparatus that prevents an electrolytic bath from clogging in pipes, valves or the like and can be continuously operated for a long time. SOLUTION: The fluorine gas generating apparatus 100 is equipped with an electrolytic cell 3 housing an electrolytic bath 4 comprising a melt salt containing hydrogen fluoride, and has discharge passages 11a, 11b where a fluorine-containing gas generated by electrolysis of the electrolytic bath 4 passes, and elimination towers 5a, 5b where impurities are eliminated from the fluorine-containing gas. The discharge passages 11a, 11b are disposed to connect a vapor phase part in the electrolytic cell 3 and the elimination towers 5a, 5b. The apparatus is further equipped with first line heaters 12a, 12b that heat the inner walls of the discharge passages 5a, 5b and/or the gas passing through the discharge passages 5a, 5b to a temperature equal to or higher than the melting point of the electrolytic bath 4. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种防止电解槽在管道，阀门等中堵塞并能够长时间连续运转的氟气发生装置。解决方案：氟气发生装置100装有电解池3，该电解池3容纳包含含有氟化氢的熔融盐的电解槽4，并且具有排出通道11a，11b，其中通过电解电解产生的含氟气体浴4通，以及从含氟气体中除去杂质的消除塔5a，5b。排出通道11a，11b设置成连接电解槽3中的气相部分和消除塔5a，5b。该装置还配备有将排出通道5a，5b的内壁和/或通过排出通道5a，5b的气体加热至等于或高于其的熔点的温度的第一行加热器12a，12b 电解槽4.版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009213947A Surface treatment apparatus 审中-公开
标题翻译：表面处理设备
公开(公告)号：JP2009213947A
公开(公告)日：2009-09-24
申请号：JP2008056952
申请日：2008-03-06
申请人： Takamatsu Teisan Kk , Toyo Tanso Kk , 東洋炭素株式会社 , 高松帝酸株式会社
发明人： HIRAIWA JIRO , TAKEBAYASHI HITOSHI , YOSHIMOTO OSAMU , TANAKA NORIYUKI , FUJITA ICHIRO , SASAKI HIROYOSHI , MORI KAZUTAKA
IPC分类号： B01J19/00 , B01D53/68 , C08J7/12
摘要： PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which can suppress an impair of the apparatus by a gas used for a surface treatment and reforming. SOLUTION: The surface treatment apparatus 100 includes: a diluent gas supply unit 1 supplying a diluent gas; a fluorine gas supply unit 2 supplying a fluorine gas; a mixer 5 mixing the diluent gas and the fluorine gas to produce a mixed gas; and a reactor vessel 6 contacting the mixed gas with the object to be treated, and is characterized by further comprising: an exhaust equipment 7 discharging an exhaust gas from the reactor vessel inside; a plurality of passages 19, 20, 21, and 22 provided between the reactor vessel 6 and the exhaust equipment 7 and circulating the exhaust gas; and a plurality of valves 23, 24, 25, and 26 provided on each of a plurality of passages. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以通过用于表面处理和重整的气体来抑制装置的损害的表面处理装置。解决方案：表面处理设备100包括：稀释气体供应单元1，供应稀释气体; 供给氟气的氟气供给单元2; 将稀释气体与氟气混合以产生混合气体的混合器5; 以及与混合气体与待处理物体接触的反应器容器6，其特征在于还包括：排气设备7，其将来自反应器容器内部的废气排出; 设置在反应容器6和排气设备7之间的多个通道19,20,21和22，并使废气循环; 以及设置在多个通路中的每一个上的多个阀23,24,25和26。版权所有（C）2009，JPO＆INPIT

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