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    • 1. 发明专利
    • Opaque silica glass molding and method for producing the same
    • OPAQUE二氧化硅玻璃成型及其制造方法
    • JP2005139018A
    • 2005-06-02
    • JP2003375511
    • 2003-11-05
    • Tosoh CorpTosoh Quartz Corp東ソー・クォーツ株式会社東ソー株式会社
    • OSADA HIRONARIKUDO MASAYUKITSUYOSHI TORUKIMURA SHIGEO
    • C03B20/00C04B35/14
    • C03B19/06C03B19/066C03B20/00
    • PROBLEM TO BE SOLVED: To provide an opaque silica glass molding being an opaque silica glass molding with its surface entirely covered with transparent silica glass and being excellent in surface smoothness and light shielding properties.
      SOLUTION: The molding is an opaque silica glass molding with its surface entirely covered with a transparent silica glass layer, wherein the opaque part comprises silica glass and voids at least 90% of which have maximum diameters of below 20 μm and has an apparent density of 2.00 to 2.20 g/cm
      3 . The thickness of the transparent layer at the thinnest part of the molding is 1/1,000 to 400/1,000 of the thickness of the opaque part, and the surface roughness Ra on at least one surface is 0.05 to 0.5 μm. This molding is obtained by injection-molding a kneaded mixture of a binder and silica glass being spherical particles having the maximum diameter and the minimum diameter in the range of 0.01 to 20 μm and containing 5 to 70 wt.% 0.2 μm or smaller particles, degreasing the molding by heating, and vacuum-sintering the molding at 1,100 to 1,400°C.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种不透明的石英玻璃模制品,其是不透明的石英玻璃模制品,其表面完全被透明的石英玻璃覆盖并且具有优异的表面平滑性和遮光性。 解决方案:模制品是不透明的石英玻璃模制品,其表面完全被透明的石英玻璃层覆盖,其中不透明部分包括二氧化硅玻璃和至少90%的最大直径小于20μm的空隙,并且具有 表观密度为2.00〜2.20g / cm 3。 成型体最薄部分的透明层的厚度为不透明部分厚度的1 / 1,000〜400 / 1,000,至少一个表面的表面粗糙度Ra为0.05〜0.5μm。 该成型是将具有最大直径和最小直径的球状粒子的粘合剂和石英玻璃的捏合混合物注射成型为0.01〜20μm,含有5〜70重量%的0.2μm以下的粒子, 通过加热脱模成型,在1100〜1400℃下进行真空烧结。 版权所有(C)2005,JPO&NCIPI
    • 2. 发明专利
    • Method for producing silica glass molding
    • 生产二氧化硅玻璃成型的方法
    • JP2005145766A
    • 2005-06-09
    • JP2003386762
    • 2003-11-17
    • Tosoh CorpTosoh Quartz Corp東ソー・クォーツ株式会社東ソー株式会社
    • OSADA HIRONARIKUDO MASAYUKITSUYOSHI TORUKIMURA SHIGEO
    • C03B20/00
    • C03B19/06C03B19/066C03B20/00
    • PROBLEM TO BE SOLVED: To provide a method for producing a silica glass molding, which method does not necessitate complicated after-processings, such as machining and flaming, for attaining a desired shape or markedly reduces such after-processings, if necessary, and provides high productivity.
      SOLUTION: The silica glass molding is obtained by kneading a silica glass powder comprising spherical particles having the maximum and minimum diameters in the range of 0.01 to 20 μm and containing 5 to 70 wt.%, based on the entire particles, of 0.2 μm or smaller particles with an organic binder in such a mixing ratio that the rate of the powder in the kneaded mixture with the organic binder is 65 to 85 wt.%, hot-extrusion-molding the mixture, degreasing the molding by heating, and vacuum-sintering the degreased molding at 1,200-1,400°C. The obtained silica glass molding has a density of 2.0 to 2.2 g/cm
      3 .
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了提供石英玻璃成型体的制造方法,该方法不需要诸如机械加工和燃烧的复杂的后处理,以获得所需的形状,或者如果需要,显着地减少这种后处理 ,并提供高生产率。 解决方案:二氧化硅玻璃成型体是将具有最大和最小直径的球形颗粒的二氧化硅玻璃粉末在0.01至20μm的范围内混合,并且含有基于整个颗粒的5-70重量% 0.2μm以下的有机粘合剂的粒子,使混合物中的粉末与有机粘合剂的比例为65〜85重量%,将该混合物进行热挤压成型,加热脱模, 并在1200-1,400℃下对脱脂模塑进行真空烧结。 得到的石英玻璃成型体的密度为2.0〜2.2g / cm 3。 版权所有(C)2005,JPO&NCIPI
    • 3. 发明专利
    • Black silica glass molding and method for producing the same
    • 黑色二氧化硅玻璃成型及其制造方法
    • JP2005145767A
    • 2005-06-09
    • JP2003386763
    • 2003-11-17
    • Tosoh CorpTosoh Quartz Corp東ソー・クォーツ株式会社東ソー株式会社
    • OSADA HIRONARIKUDO MASAYUKITSUYOSHI TORUKIMURA SHIGEO
    • G02B6/36C03B19/06C03B20/00F21S2/00F21V7/00G03B21/14
    • C03B19/06C03B19/066C03B20/00C03B2201/03
    • PROBLEM TO BE SOLVED: To provide a black silica glass molding excellent in surface smoothness and light shielding properties and capable of markedly shortening a polishing time even when its polishing is necessary and to provide a method for producing the same.
      SOLUTION: The molding has a linear transmittance of at most 5% to 200 to 5,000 nm light at a thickness of 1 mm, an apparent density of 2.10 to 2.20 g/cm
      3 , a total content of Na, K, Mg, and Ca elements of at most 200 ppm, and having a surface roughness Ra of 0.05 to 1 μm on at least one surface. The black silica glass molding is obtained by kneading a silica glass powder comprising spherical particles of a particle diameter of 0.01 to 20 μm and contains 5 to 70 wt.% of 0.2 μm or smaller particles with an organic binder in a weight ratio of 70:30 to 90:10, injection-molding the mixture, degreasing the molding by heating in a non-oxidizing atmosphere at 0.1 to 5 atm, and vacuum-sintering the degreased molding at 1,200-1.400°C.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 解决的问题:提供表面平滑性和遮光性优异的黑色二氧化硅玻璃成型体,即使在需要研磨的情况下也能够显着缩短研磨时间并提供其制造方法。 解决方案:模制品具有至多5至200至5000nm光线的线性透射率,其厚度为1mm,表观密度为2.10至2.20g / cm 3 SP / 3,总共 Na,K,Mg和Ca元素的含量至多为200ppm,并且在至少一个表面上具有0.05至1μm的表面粗糙度Ra。 黑色二氧化硅玻璃成型体通过将粒径为0.01〜20μm的球状粒子的二氧化硅玻璃粉末与重量比为70:1的有机粘合剂相比,含有5〜70重量%的0.2μm以下的粒子, 30〜90:10,对混合物进行注射成型,在非氧化性气氛中以0.1〜5atm进行加热脱脂成型,在脱脂成型中以1,200-1.400℃进行真空烧结。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • Light-transmitting zirconia sintered compact and its production method
    • 发光ZIRCONIA烧结紧凑型及其生产方法
    • JP2008214168A
    • 2008-09-18
    • JP2007057689
    • 2007-03-07
    • Tosoh Corp東ソー株式会社
    • TSUYOSHI TORUTSUKUMA KOJI
    • C04B35/48A61C7/14A61C7/28A61C13/08A61C13/083
    • PROBLEM TO BE SOLVED: To provide a light-transmitting zirconia sintered compact having a relative density of 99% or higher, a crystal grain size of 0.15 μm or smaller, and an absorption scattering coefficient of 5.0 mm -1 or smaller to visible light of 600 nm in view that among conventional yttria-containing zirconia sintered compacts, there is no one that has a high transmittance to straight light and high aesthetic properties though ones that have a yttria content of 2-4 mol% have high strengths and an appreciable total light transmittance. SOLUTION: A zirconia sintered compact having high strengths, a high straight light transmittance, and high aesthetic properties can be obtained by sealing a raw material molding comprising a zirconia powder containing 2-4 mol% yttria in a vacuum container and subjecting the molding to hot hydrostatic pressing (HIP) under conditions including a temperature of not higher than 1,200°C and a pressure of 50 MPa or higher. COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题:为了提供相对密度为99%以上,晶粒尺寸为0.15μm以下的吸光散射系数为5.0mm×SP -1的透光性氧化锆烧结体 或更小到600nm的可见光,鉴于在常规的含氧化钇的氧化锆烧结体中,没有一种对直线透光率高和美观性好的氧化钇烧结体,尽管氧化钇含量为2- 4mol%具有高强度和明显的总透光率。 解决方案:通过将包含含有2-4摩尔%氧化钇的氧化锆粉末的原料模塑件密封在真空容器中,并且对所述氧化锆烧结体进行密封,可以获得具有高强度,高直链透光率和高美观性的氧化锆烧结体 在不高于1200℃的温度和50MPa或更高的压力的条件下成型为热静压(HIP)。 版权所有(C)2008,JPO&INPIT
    • 7. 发明专利
    • Translucent yttria-containing zirconia sintered compact, manufacturing method and utilization of the same
    • 透明YTTRIA包含ZIRCONIA烧结紧固件,制造方法及其应用
    • JP2008222450A
    • 2008-09-25
    • JP2007058592
    • 2007-03-08
    • Tosoh Corp東ソー株式会社
    • TSUYOSHI TORUTSUKUMA KOJI
    • C04B35/48A61C7/14A61C7/28
    • PROBLEM TO BE SOLVED: To solve a problem that a conventional yttria-containing zirconia sintered compact has not compatibility between translucency and strength, and therefore it is not sufficient to be used for artificial tooth or tooth alignment correcting bracket. SOLUTION: The translucent yttria-containing zirconia sintered compact comprises zirconia containing >4 to 7 mol% yttria, and the sintered compact having ≤2.0 μm particle diameter and ≥99.5% relative density has compatibility between strength and translucency wherein all light transmissivity to the visible ray of 600 nm wavelength in 1 mm thickness is ≥40% and three point bending strength is ≥500 MPa, and it is used as dental materials such as artificial tooth or tooth alignment correcting bracket. COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题为了解决传统的含氧化钇的氧化锆烧结体在半透明性和强度之间不相容的问题,因此不足以用于人造牙齿或牙齿矫正支架。 解决方案:半透明的含氧化钇的氧化锆烧结体包含含有4至7mol%氧化钇的氧化锆,并且具有≤2.0μm粒径和≥99.5%相对密度的烧结体具有强度和半透明度之间的相容性,其中所有光透射率 对于1mm厚度的600nm波长的可见光线≥40%,三点弯曲强度≥500MPa,用作人造牙或牙齿矫正支架等牙科材料。 版权所有(C)2008,JPO&INPIT
    • 8. 发明专利
    • Translucent alumina sintered compact and its manufacturing method
    • 透明氧化铝烧结及其制造方法
    • JP2008195581A
    • 2008-08-28
    • JP2007034067
    • 2007-02-14
    • Tosoh Corp東ソー株式会社
    • TSUYOSHI TORU
    • C04B35/115A61C1/07A61C7/14A61C7/28
    • PROBLEM TO BE SOLVED: To solve the problems wherein the conventional translucent alumina sintered compact is low in translucence and strength, and particularly, the translucence and the strength fall when is heat-treated in working process of ceramic parts, that is, is low in thermal durability. SOLUTION: The translucent alumina sintered compact, of which the content of ZrO 2 is 0.01-0.5 wt.%, the purity is 99.5% or higher, the carbon content is 5 ppm or lower, the relative density is 99.9% or higher, the total light transmission at thickness of 1 mm is 60% or higher, and the three-point flexural strength is 700 MPa or higher; keeps the total light transmission at thickness of 1 mm of 60% or higher and the three-point flexural strength of 700 MPa or higher, after reheat-treatment at 1,200°C for 5 hours. COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题为了解决传统的半透明氧化铝烧结体的半透明度和强度低的问题,特别是当在陶瓷部件的加工过程中进行热处理时,半透明度和强度下降, 热耐久性低。 解决方案:半透明氧化铝烧结体,其中ZrO 2 的含量为0.01-0.5重量%,纯度为99.5%以上,碳含量为5ppm以下, 相对密度为99.9%以上,厚度1mm的总透光度为60%以上,三点弯曲强度为700MPa以上。 在1,200℃再热处理5小时后,将厚度1mm的全光透射率保持在60%以上,三点弯曲强度为700MPa以上。 版权所有(C)2008,JPO&INPIT
    • 10. 发明专利
    • Zinc oxide cylindrical target and process for production thereof
    • 氧化锌圆柱体目标及其生产方法
    • JP2012031502A
    • 2012-02-16
    • JP2010291314
    • 2010-12-27
    • Tosoh Corp東ソー株式会社
    • TSUYOSHI TORUYATSUTSUHA TOSHISUKETAKAHASHI KOYATA
    • C23C14/34
    • PROBLEM TO BE SOLVED: To provide a zinc oxide cylindrical target reducing generation of arcing and nodules during sputtering film deposition, and having high productivity even during the high-output film deposition and having high density and enabling the wall thickness thereof to be increased, and to provide a process for production of the zinc oxide cylindrical target.SOLUTION: Zinc oxide powder is caused to stay in the high-temperature plasma jet 4 as long as possible in a range where the sublimation of zinc oxide powder can be suppressed, and the melting degree of the powder is thereby enhanced. The zinc oxide powder is thermal-sprayed by a thermal spraying gun 7 having a substrate cooling piping structure for cooling a thermal spraying target so that the surface temperature of the thermal spraying target is quickly reduced to or below the predetermined value after the deposition of the molten powder.
    • 要解决的问题:为了提供一种氧化锌圆柱形靶,在溅射膜沉积期间减少产生电弧和结节,并且即使在高输出膜沉积期间也具有高生产率并且具有高密度并且使其壁厚可以是 并且提供了生产氧化锌圆柱形靶的方法。 解决方案:可以在可以抑制氧化锌粉末的升华的范围内尽可能长时间地将氧化锌粉末留在高温等离子体射流4中,从而提高粉末的熔融度。 氧化锌粉末通过具有基板冷却管道结构的热喷枪7进行热喷涂,用于冷却热喷涂目标,使得在沉积热喷涂目标之后,将热喷涂目标的表面温度快速降低到或低于预定值 熔融粉末。 版权所有(C)2012,JPO&INPIT