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1. 发明专利

JP2005072040A Sample stage for electron beam exposure system 有权
标题翻译：电子束曝光系统的样品阶段
公开(公告)号：JP2005072040A
公开(公告)日：2005-03-17
申请号：JP2003208658
申请日：2003-08-25
申请人： Toshiba Corp , Toshiba Mach Co Ltd , 東芝機械株式会社 , 株式会社東芝
发明人： SUZUKI KIMIO , OTAKI SATOSHI , SHIMIZU AKIRA , YASUDA SATOSHI
IPC分类号： G03F7/20 , G03F1/76 , H01J37/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To change the size of a retaining mechanism according to the size of a substrate to be treated without using any exclusive holders in the sample stage of an electron beam exposure system. SOLUTION: A mask blank 1 is retained by a retaining mechanism 10 arranged on a stage substrate 3. A first feed screw 21 and a connection shaft 23 are arranged in parallel with the X axis on the stage substrate 3, and a second feed screw 22 is arranged in parallel with the Y axis. The tip of the connection shaft 23 is connected at right angle to the rear end of the second feed screw 22 via toothed wheels. When changing the interval in the X-axis direction of the retaining mechanism 10, a drive shaft 24 is connected to the first feed screw 21 via coupling members 28 and 26, and the first feed screw 21 is driven. When changing the interval in the Y-axis direction of the retaining mechanism 10, the drive shaft 24 is connected to the second feed screw 22 via the coupling members 28, 27, and the second feed screw 22 is driven. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：根据待处理的基板的尺寸来改变保持机构的尺寸，而不使用电子束曝光系统的样品台中的任何专用的保持器。解决方案：掩模坯料1由布置在载物台基材3上的保持机构10保持。第一进料螺杆21和连接轴23与载片基材3上的X轴平行设置，第二进料螺杆进给螺杆22与Y轴平行设置。连接轴23的前端通过齿轮与第二进给螺杆22的后端成直角连接。当改变保持机构10的X轴方向的间隔时，驱动轴24经由联接构件28和26连接到第一进给螺杆21，并且第一进给螺杆21被驱动。当改变保持机构10的Y轴方向的间隔时，驱动轴24通过联接构件28,27连接到第二进给螺杆22，并且第二进给螺杆22被驱动。版权所有（C）2005，JPO＆NCIPI

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