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    • 1. 发明专利
    • Manufacture of shadow mask
    • 阴影面膜的制造
    • JPS6110834A
    • 1986-01-18
    • JP13011784
    • 1984-06-26
    • Toshiba Corp
    • ICHIKAWA MASATOSHIKATOU ATSUSHI
    • H01J9/14
    • H01J9/142H01J2209/015
    • PURPOSE:To relieve a temperature rise in a shadow mask in an effective manner as well as to manufacture the shadow mask in a manner conformable to mass production, by forming a nonapplication part, not applying a glass group partially, on the shadow mask with a vacuum. CONSTITUTION:An injection device 12 is impressed with a negative high voltage, for example, -90kV from a DC power source 10, while an electrostatic field is formed in space between a shadow mask 25 and the injection device 12. Glass particles emitted out of a feed tank 11 through the device 12 are always electrified and put on the electrostatic field whereby these particles are continuously stickable to the shadow mask 25. Each of vacuum ducts 19 and 18 is disposed at a shadow mask central part 25a and the whole circumference of a frame 27 as well as in and around a holder 29, which suction takes place with a vacuum duct 30 surrounding these elements on the whole, and a glass pulverulent body stream 13 being in a state of being atomized is formed there. These vacuum ducts 18 and 19 set up on a nonapplication part quickly advance the nearby glass pulverulent body stream 13, thus this stream 13 is preventable from sticking thereto.
    • 目的:为了以有效的方式缓解荫罩中的温度上升,并且以适合于批量生产的方式制造荫罩,通过在阴罩上形成不应用玻璃组的不应用部分 真空。 构成:注入装置12被施加负电压,例如直流电源10的-90kV,同时在荫罩25和注射装置12之间的空间中形成静电场。 通过装置12的供给槽11总是通电并且被放置在静电场上,从而这些颗粒连续地粘贴在荫罩25上。每个真空管道19和18设置在荫罩中心部分25a和整个周边 框架27以及保持器29内和周围,在这里整体上围绕这些元件的真空管道30进行抽吸,并且在其中形成处于被雾化的状态的玻璃粉体体流13。 这些设置在不施加部分上的真空管18和19快速地推进附近的玻璃粉末体流13,从而可以防止该流13粘附到其上。
    • 2. 发明专利
    • Manufacture of face panel
    • 面板制造
    • JPS60195837A
    • 1985-10-04
    • JP4926184
    • 1984-03-16
    • Toshiba Corp
    • ANZAI KAZUOSHINOZAKI KAZUOKATOU ATSUSHI
    • H01J9/22H01J29/28
    • H01J29/28
    • PURPOSE:To heighten the productivity of face panels by a method, in which a phosphor layer and a film layer are formed on the inside of the face panel followed by maintaining the face panel inside in a gas atmosphere of a specific vacuum degree and performing sputtering for simultaneously fomring a luminous reflective metal film and a thermoabsorbing material film on the film layer. CONSTITUTION:Sputtering maintains the inside of a face panel 1 in a gas atmosphere of a vacuum degree 10 -10 Torr while being performed with a luminous reflective metal as a target. Generally, a mixture gas of rare gas such as helium, neon, argon, krypton and xenon and a nitric compound such as nitorgen, ammonia and dicyan or a compound separating and generating nitrogen under said sputtering atmosphere is used as the atmosphere gas. The kind of the atmospheric gas is properly selected according to a sputtering condition, however, desirably a mixture gas of nitrogen gas and rare gas, which are cheap and easy to handle, is used while more desirably mixture gas consisting of 3-10vol% of nitrogen and 90-97vol% of rare gas is used. Sputtering is desirably performed until the sputtering film thickness reaches 500-5,000Angstrom .
    • 目的:通过以下方法提高面板的生产率:其中在面板内侧形成荧光体层和膜层,然后将面板保持在特定真空度的气体气氛中并进行溅射 用于同时在膜层上产生发光反射金属膜和热吸收材料膜。 构成:溅射在以发光反射金属为目标的情况下,在真空度10 -4 -10 -2乇的气体气氛中维持面板1的内部。 通常,使用诸如氦,氖,氩,氪和氙的稀有气体和硝基化合物如硝基,氨和二氰的混合气体或在所述溅射气氛下分离和产生氮的化合物作为气氛气体。 根据溅射条件适当地选择气氛气体的种类,然而,优选使用便宜且易于处理的氮气和稀有气体的混合气体,更优选由3-10体积% 使用氮气和90-97vol%的稀有气体。 期望进行溅射,直到溅射膜厚度达到500-5,000埃。