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1. 发明专利

JP2014112690A Substrate processing apparatus and chemical solution supply method 有权
标题翻译：基板加工设备和化学溶液供应方法
公开(公告)号：JP2014112690A
公开(公告)日：2014-06-19
申请号：JP2013267523
申请日：2013-12-25
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： KOSHO TOMONOBU , OKUBO TAKAHIRO , YOSHIHARA KOSUKE , YAMAMOTO YUSUKE , STEPHEN HORNICK
IPC分类号： H01L21/027 , B05C11/10 , B05D3/00
摘要： PROBLEM TO BE SOLVED: To improve the filtration effect without deteriorating the throughput.SOLUTION: A substrate processing apparatus includes: a chemical solution supply part which supplies a chemical solution onto a substrate; and a chemical solution supply system which supplies the chemical solution from a chemical solution supply source to the chemical solution supply part. The chemical solution supply system includes: a first container which is connected with the chemical solution supply source through an inlet pipeline; a second container which is connected with the chemical solution supply part through an outlet pipeline; a first pump provided at a first pipeline which connects the first container with the second container, the first pump which flows the chemical solution stored in the first container toward the second container; a first filter which is provided at the first pipeline and filters the chemical solution flowing in the first pipeline from the first container to the second container; and a second pipeline which connects the first container with the second container.
摘要翻译：要解决的问题：提高过滤效果而不降低生产量。解决方案：一种基板处理装置，包括：将化学溶液供给到基板上的化学溶液供给部; 以及从化学溶液供给源向化学溶液供给部供给化学溶液的化学溶液供给系统。化学溶液供应系统包括：通过入口管道与化学溶液供应源连接的第一容器; 通过出口管道与化学溶液供应部分连接的第二容器; 第一泵，设置在将第一容器与第二容器连接的第一管道处，第一泵将存储在第一容器中的化学溶液流向第二容器; 第一过滤器，其设置在第一管道处，并将在第一管道中流动的化学溶液从第一容器过滤到第二容器; 以及将第一容器与第二容器连接的第二管路。

2. 发明专利

JP2011238666A Chemical supply system, substrate processing apparatus having chemical supply system, and application development system 有权
标题翻译：化学供应系统，具有化学供应系统的基板加工设备和应用开发系统
公开(公告)号：JP2011238666A
公开(公告)日：2011-11-24
申请号：JP2010106656
申请日：2010-05-06
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： KOSHO TOMONOBU , OKUBO TAKAHIRO , YOSHIHARA KOSUKE , YAMAMOTO YUSUKE , STEPHEN HORNICK
IPC分类号： H01L21/027 , B05C11/10 , H01L21/304
CPC分类号： H01L21/6715 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： PROBLEM TO BE SOLVED: To provide a chemical supply system capable of enhancing a filtration effect without degrading through-put.SOLUTION: The chemical supply system includes: a first container and a second container for storing chemical; a first pump that is installed on a first pipe for connecting the first container with the second container and flows the chemical stored in the first container into the second container; a first filter that is installed on the first pipe and filters the chemical flowing in the first pipe from the first container toward the second container; a second pipe for connecting the first container with the second container; and a second pump that is installed on the second pipe and flows the chemical stored in the second container into the first container.
摘要翻译：要解决的问题：提供能够提高过滤效果而不降低通过量的化学品供应系统。解决方案：化学品供应系统包括：第一容器和用于储存化学品的第二容器; 第一泵，其安装在用于将第一容器与第二容器连接的第一管上，并将存储在第一容器中的化学品流入第二容器; 第一过滤器，其安装在第一管上，并将从第一容器流向第一管的化学品从第一容器过滤到第二容器; 用于将第一容器与第二容器连接的第二管道; 以及第二泵，其安装在第二管上并将存储在第二容器中的化学品流入第一容器。版权所有（C）2012，JPO＆INPIT

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