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1. 发明专利

JPH1135315A PRODUCTION OF HIGH DENSITY MESOPOROUS BODY 失效
公开(公告)号：JPH1135315A
公开(公告)日：1999-02-09
申请号：JP20985097
申请日：1997-07-18
申请人： TOYOTA CENTRAL RES & DEV , CATALER IND CO
发明人： FUKUSHIMA YOSHIAKI , INAGAKI SHINJI , YAMADA ARIMICHI , SUGIMOTO KENSHO , KANEMITSU OSAMU , OSUGI YOSHIO
IPC分类号： B01J20/10 , B01J35/10 , C01B33/16
摘要： PROBLEM TO BE SOLVED: To obtain a high density mesoporous body having a uniform pore diameter which is useful as an adsorbent and the like with good reproducibility while suppressing the reaction by mixing an alkoxysilane having a specified acid value, water and a surfactant. SOLUTION: An alkoxy silane having =5 and to form a gel. The powdery or film state silica/surfactant composite body thus obtd. is subjected to calcination at 400 to 1000 deg.C or to solvent treatment with alcohol to remove the surfactant.

2. 发明专利

JP2007234771A Quantum infrared sensor 审中-公开
标题翻译：量子红外传感器
公开(公告)号：JP2007234771A
公开(公告)日：2007-09-13
申请号：JP2006052941
申请日：2006-02-28
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： SUGIMOTO KENSHO , FUNABASHI HIROBUMI , MITSUSHIMA KOICHI
IPC分类号： H01L31/02 , B82B1/00 , H01L27/14
摘要： PROBLEM TO BE SOLVED: To provide a quantum infrared sensor capable of detecting infrared rays with a high sensibility by a quantum effect in a high degree, and capable of being operated under temperature conditions close to a room temperature. SOLUTION: The quantum infrared sensor has a meso-porous body 11 having a central pore diameter of 1.5 to 5.0 nm, and metallic oxides 12 having a refractive index within a range of 1.7 to 2.1 to a light having a wavelength of 3 to 15 μm arrayed in the pores of the meso-porous body 11. The quantum infrared sensor further has electrodes 13 electrically connected to the metallic oxides 12. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够高度量子效应地检测具有高灵敏度的红外线并能够在接近室温的温度条件下操作的量子红外传感器。解决方案：量子红外传感器具有中心孔径为1.5至5.0nm的中孔多孔体11和具有波长为3的光的折射率在1.7至2.1范围内的金属氧化物12 至15μm排列在中孔多孔体11的孔中。量子红外传感器还具有与金属氧化物12电连接的电极13.版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2002087810A CLUSTER INCLUSION MATERIAL 失效
公开(公告)号：JP2002087810A
公开(公告)日：2002-03-27
申请号：JP2000282081
申请日：2000-09-18
申请人： TOYOTA CENTRAL RES & DEV
发明人： INAGAKI SHINJI , SUGIMOTO KENSHO , FUKUSHIMA YOSHIAKI , FUKUOKA ATSUSHI , ICHIKAWA MASARU
IPC分类号： C08J9/36 , C01B33/12 , C01B37/00 , C01B39/02 , H01F1/00
摘要： PROBLEM TO BE SOLVED: To provide a cluster inclusion material in which a luster is formed with sufficient uniformity and high density and which displays excellent characteristics when used for a magnetic material, an electron device, a catalyst or the like. SOLUTION: The cluster inclusion material is distinguished by providing with a porous body, which has a skeleton constituted of an organic group having one or more carbon atoms, two or more metallic atoms bound to the same carbon atom or to different carbon atoms and one or more oxygen atoms bound to the metallic atom and further has a fine pore of 1 to 50 nm central pore diameter, and the cluster formed in the fine pore.

4. 发明专利

JP2006063404A Method for manufacturing fine metal wire 有权
标题翻译：制造精细金属线的方法
公开(公告)号：JP2006063404A
公开(公告)日：2006-03-09
申请号：JP2004248292
申请日：2004-08-27
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： SUGIMOTO KENSHO , MITSUSHIMA KOICHI
IPC分类号： C22B3/44 , B22F9/24 , B82B3/00
CPC分类号： Y02P10/234
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine metal wire by which a fine metal wire having fineness of mesosize and sufficient length can be efficiently manufactured with certainty and a metallic crystal can be grown unidirectionally and anisotropically in the pores of a mesoporous thin film to improve the directionality of crystal growth and the metal crystal can be grown within a desired range. SOLUTION: The method for manufacturing the fine metal wire comprises the following steps: a step of forming a nonporous film on the surface of the mesoporous thin film having a structure of continuous pores; a step of forming, in a specific part of the nonporous film, a raw material solution feeding hole through which the pores in the mesoporous thin film are allowed to communicate with the outside; a step of feeding a raw material solution containing metal ions to the raw material solution feeding hole and introducing the raw material solution via the raw material solution feeding hole into the pores by capillarity; and a step of forming the fine metal wire in the pores by reducing the metal ions in the raw material solution introduced into the pores. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种细金属丝的制造方法，通过该方法可以确定地有效地制造具有中等尺寸和足够长度的细度的细金属丝，并且可以在孔中单向和各向异性地生长金属晶体的介孔薄膜，以改善晶体生长的方向性，并且可以在期望的范围内生长金属晶体。解决方案：用于制造细金属丝的方法包括以下步骤：在具有连续孔结构的介孔薄膜的表面上形成无孔膜的步骤; 在无孔膜的特定部分形成允许介孔薄膜中的孔与外部连通的原料溶液供给孔的步骤; 将含有金属离子的原料溶液供给到原料溶液供给孔的步骤，通过原料溶液供给孔将原料溶液通过毛细管作用引入孔中; 以及通过减少引入孔中的原料溶液中的金属离子，在孔中形成细金属丝的步骤。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004263246A Method of producing metal fine wire 审中-公开
标题翻译：生产金属丝的方法
公开(公告)号：JP2004263246A
公开(公告)日：2004-09-24
申请号：JP2003054655
申请日：2003-02-28
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： SUGIMOTO KENSHO , KUMAI YOKO , TSUKADA KOJI
IPC分类号： B82B3/00 , B22F9/24
摘要： PROBLEM TO BE SOLVED: To provide a method of producing a metal fine wire by which a metal fine wire having a fineness of a mesosize and a sufficient length can efficiently and securely be produced.
SOLUTION: At least one edge part of a mesoporous thin film 1 having a structure of communicated fine pores 2 is brought into contact with a metal ion solution 3 comprising metal ions, and, while introducing the metal ion solution into the fine pores of the mesoporous thin film by capillary, the mesoporous thin film is irradiated with light 5, and the metal ions in the metal ion solution introduced into the fine pores are reduced, so that metal fine wire 6 is formed inside the fine pores.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种金属细线的制造方法，通过该方法可以有效且可靠地制造具有中尺度细度和足够长度的金属细线。解决方案：具有连通的细孔2的结构的介孔薄膜1的至少一个边缘部分与包含金属离子的金属离子溶液3接触，并且在将金属离子溶液引入到细孔中通过毛细管对介孔薄膜进行照射，使介孔薄膜用光5照射，导入细孔内的金属离子溶液中的金属离子减少，从而在细孔内部形成金属细线6。版权所有（C）2004，JPO＆NCIPI

6. 发明专利

JP2004099386A Metal particle-including thin film and its forming process 有权
公开(公告)号：JP2004099386A
公开(公告)日：2004-04-02
申请号：JP2002264773
申请日：2002-09-10
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： KUMAI YOKO , SUGIMOTO KENSHO , TSUKADA KOJI , ICHIKAWA MASARU , FUKUOKA ATSUSHI
IPC分类号： C01B37/02
摘要： PROBLEM TO BE SOLVED: To provide a metal particle-including thin film which includes metal particles having a uniform size and arranged almost with fixed intervals and its forming process. SOLUTION: The metal particle-including thin film comprises a mesoporous silica thin film with a thickness of ≤1 μm and a central pore diameter of 1-50nm and metal particles having an average particle size of 0.5-50nm and arranged separately with predetermined intervals within 3d-hexagonal or cubic pores of the mesoporous silica thin film. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP2004099384A High crystalline mesoporous silica thin film, its manufacturing method, cluster clathrate thin film using the mesoporous silica thin film, and its manufacturing method 有权
公开(公告)号：JP2004099384A
公开(公告)日：2004-04-02
申请号：JP2002264694
申请日：2002-09-10
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： TSUKADA KOJI , SUGIMOTO KENSHO , KUMAI YOKO , ICHIKAWA MASARU , FUKUOKA ATSUSHI
IPC分类号： B01J20/10 , B01J19/00 , B01J20/30 , C01B37/02
摘要： PROBLEM TO BE SOLVED: To provide a mesoporous silica thin film having sufficient crystallinity, excellent smoothness of the pore surfaces and orientation of the pores, and to provide a method for manufacturing the mesoporous silica thin film, a cluster clathrate thin film by using the mesoporous silica thin film and its manufacturing method. SOLUTION: The high crystalline mesoporous silica thin film has ≤1 μm film thickness and 1 to 50 nm center pore diameter. In the X-ray diffraction measurement of the mesoporous silica thin film, the peak indicating the (100) plane shows ≥50,000 cps intensity and ≤0.21° of half bandwidth. The mesoporous silica thin film is used for the cluster clathrate thin film and its manufacturing method is provided. COPYRIGHT: (C)2004,JPO

8. 发明专利

JPH09297323A TUNGSTEN MESO-STRUCTURE AND ITS PRODUCTION 失效
公开(公告)号：JPH09297323A
公开(公告)日：1997-11-18
申请号：JP11395096
申请日：1996-05-08
申请人： TOYOTA CENTRAL RES & DEV
发明人： SUGIMOTO KENSHO , INAGAKI SHINJI , FUKUSHIMA YOSHIAKI , HIOKI TATSUMI
IPC分类号： G02F1/15 , C01G41/02 , C09K9/00
摘要： PROBLEM TO BE SOLVED: To obtain a meso-structure of tungsten oxide having superior electrochromism and cubic symmetry by enveloping micelle of a surfactant having cubic symmetry in its X-ray diffraction pattern in tungsten oxide and integrating them. SOLUTION: Micelle of a surfactant having cubic symmetry in its X-ray diffraction pattern is enveloped in tungsten oxide and they are integrated to obtain the objective tungsten meso-structure. Spherical micelle structures are dispersed and held in the tungsten oxide at intervals. One layer of the surfactant is circularly disposed with the hydrophilic groups outward between the outermost and middle ones of concentric circles in the drawing and another layer of the surfactant is circularly disposed with the hydrophilic groups inward between the middle and inner ones of the concentric circles. These two layers form two concentric circles so that the lipophilic groups contact with each other.

9. 发明专利

JP2008032458A Hydrogen gas sensor 审中-公开
标题翻译：氢气传感器
公开(公告)号：JP2008032458A
公开(公告)日：2008-02-14
申请号：JP2006204350
申请日：2006-07-27
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： SUGIMOTO KENSHO , FUNABASHI HIROBUMI , MITSUSHIMA KOICHI
IPC分类号： G01N27/12
摘要： PROBLEM TO BE SOLVED: To provide a hydrogen gas sensor excellent in sensitivity and response, capable of rapidly detecting even a very small amount of a hydrogen gas and developing sufficient durability.
SOLUTION: The hydrogen gas sensor is equipped with a meso-porous body 11 with a center pore diameter of 1.5-5.0 nm, the metal components 12 having a hydrogen occluding capacity arranged in the pores of the meso-porous body 11 and the electrode 13 electrically connected to the metal components 12.
COPYRIGHT: (C)2008,JPO&INPIT

10. 发明专利

JP2004099381A Highly acid-resistant mesoporous silica thin film, cluster-including thin film using the same, and their forming processes 审中-公开
公开(公告)号：JP2004099381A
公开(公告)日：2004-04-02
申请号：JP2002264647
申请日：2002-09-10
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： KUMAI YOKO , SUGIMOTO KENSHO , TSUKADA KOJI , ICHIKAWA MASARU , FUKUOKA ATSUSHI
IPC分类号： B01J20/10 , B01J19/00 , B01J20/30 , C01B37/02
摘要： PROBLEM TO BE SOLVED: To provide a mesoporous silica thin film showing a sufficient acid resistance and excellent in surface smoothness and orientation of pores, a cluster-including thin film using the same, and their forming processes. SOLUTION: The mesoporous silica thin film has a thickness of ≤1 μm and a central pore diameter of 1-50 nm. In the X-ray diffraction measurement of the film, the initial intensity (I 1 ) of a peak corresponding to plane (100) and the intensity (I 2 ) of the peak obtained after performing an acid-resistance test by soaking the film in an acidic solution for 24 hr, satisfy the relation (1): (1-(I 2 /I 1 ))×100≤90. COPYRIGHT: (C)2004,JPO

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