专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH0290522A WAFER HANDLING DEVICE FOR CLEANING WAFER 失效
公开(公告)号：JPH0290522A
公开(公告)日：1990-03-30
申请号：JP24075988
申请日：1988-09-28
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO , OTANI TAIICHI , MASHITA NORIYOSHI
IPC分类号： B65H1/28 , B25J15/00 , B65G1/00 , B65G1/07 , H01L21/304
摘要： PURPOSE:To obtain a high cleaning effect, to cut down the time of dipping, and to reduce the flow rate of a cleaning fluid by a method wherein a large number of wafers are held in a line maintaining space in forward and backward directions in an almost exposed condition by the four-point contact using a part of guide arms and a pair of chuck arms. CONSTITUTION:In order to grab up a wafer from an auxiliary means 13, a pair of chuck arms 12a and 12b are opened maximum by moving them in separating direction, the chuck arms and guide arms are lowered, and the pair of guide arms 11a and 11b are brought close to the upper surface of the left and right supporting walls A and B of the auxiliary means. Then, a pusher 14 is lifted up and erected in the auxiliary means 13, all the arranged wafers are pushed up, and when they are placed in the supporting grooves 11 and 11 opposing to the guide arms, the twin guide arms and the chuck arms begin to rise at the same speed as the rising speed of the pusher 14. Then, when the pusher pushed up almost whole of the wafers and its rising is stopped, the rising of the twin guide arms and the chuck arms is also stopped, the chucks 12a and 12b are shifted to approaching direction, And the right and left side edges of the wafer lower than the largest diameter part are inserted into and pinched by the supporting grooves 12 and 12. Then, the pusher is lowered and returned to its original condition, and the wafers are grabbed up above the auxiliary means by the guide arms and the chuck arms.

2. 发明专利

JPH01189127A CLEANING METHOD FOR WAFER 失效
公开(公告)号：JPH01189127A
公开(公告)日：1989-07-28
申请号：JP1379988
申请日：1988-01-25
申请人： TOSHIBA CORP , KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , OTANI TAIICHI , MASHITA NORIYOSHI
IPC分类号： H01L21/304 , B08B3/12
摘要： PURPOSE:To efficiently clean a wafer in high cleanliness by exposing the wafer with steam generated by heating superpure water, and then cleaning it with superpure water. CONSTITUTION:After a wafer is first exposed with steam generated by heating superpure water as water stock, it is washed with superpure water. The washing after cleaning with pure steam is effective to use ultrasonic wave. The frequency of the ultrasonic wave is preferably 200kHz-1MHz. The superpure water used to wash it is heated to 45-95 deg.C thereby to enhance rinsing effect, thereby obtaining higher cleaning effect. Further, the wafer cleaned by pure steam cleaning and washing is conducted by draining to sterilize it after washing, and preferably again cleaned with pure steam.

3. 发明专利

JPH01211926A WASHING DEVICE 失效
公开(公告)号：JPH01211926A
公开(公告)日：1989-08-25
申请号：JP3663788
申请日：1988-02-19
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI
IPC分类号： H01L21/304 , B01D19/00
摘要： PURPOSE:To contrive to reduce washing period and to save washing water by a method wherein the material to be cleaned is washed with the degassed pure water using a degas-treatment machine. CONSTITUTION:The washing water in the washing water reservoir vessel 1, which is maintained in a sealed state by pressurized pure nitrogen gas, is fed to a degas-treatment machine 3 by a pump 2, and a degassing treatment is conducted on the nitrogen gas contained in the washing water. In this case, as the washing water supplied to a washing water supplying tube 6 is degas- treated by the degas treatment machine 3 in advance, no bubbles are generated even when the pressure of the washing water is released in a washing vessel 5, and even when supersonic waves are added thereto, it becomes warm water by heating, bubbles are not generated.

4. 发明专利

JPH0142753B2 失效
公开(公告)号：JPH0142753B2
公开(公告)日：1989-09-14
申请号：JP9412185
申请日：1985-05-01
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , MOTOMURA TAKAHITO
IPC分类号： C02F1/42 , B01J47/00 , B01J47/04

5. 发明专利

JPS62110795A DEVICE FOR PRODUCING HIGH-PURITY WATER 失效
公开(公告)号：JPS62110795A
公开(公告)日：1987-05-21
申请号：JP24841385
申请日：1985-11-06
申请人： KURITA WATER IND LTD
发明人： INAGAKI KIYOHIKO , IMAIZUMI MASABUMI , YABE KOICHI
IPC分类号： C02F1/28 , B01D61/58 , B01D65/02 , C02F1/44 , C02F9/00
摘要： PURPOSE:To efficiently produce high-purity water by using a disinfectant, a means for adding a pH regulator, the first reverse osmosis membrane separator, an activated carbon adsorption tower, the second reverse osmosis membrane separator, etc., to treat raw water. CONSTITUTION:A disinfectant and/or a pH regulator are added while raw water pretreated with activated carbon, etc., is supplied to a degasification tower 1 through a pipeline 11. The raw water is treated by the first reverse osmosis membrane separator 2. The permeated water is then treated with activated carbon in the activated carbon adsorption tower 3. The treated water is subsequently treated by the second reverse osmosis membrane separator 4. The permeated water of the reverse osmosis membrane separator 4 is taken out, and the concentrated water of the reverse osmosis membrane separator 4 is returned to the raw water supply system of the reverse osmosis membrane separator 2. Consequently, the troubles in the conventional water purifying device provided with an ion-exchange device are eliminated and high-purity water can be efficiently produced.

6. 发明专利

JPH05115B2 失效
公开(公告)号：JPH05115B2
公开(公告)日：1993-01-05
申请号：JP22328084
申请日：1984-10-24
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , SATO SHIGEAKI , OBATA KASHU
IPC分类号： C02F1/32 , C02F1/42

7. 发明专利

JPS61254292A METHOD FOR MAKING PURE WATER 失效
公开(公告)号：JPS61254292A
公开(公告)日：1986-11-12
申请号：JP9412185
申请日：1985-05-01
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , MOTOMURA TAKAHITO
IPC分类号： C02F1/42 , B01J47/00 , B01J47/04
摘要： PURPOSE:To stably obtain high purity water while preventing the oxidative deterioration of an ion exchange resin, by adding a nitrogen compound to raw water. CONSTITUTION:In performing the ion exchange of raw water containing residual chlorine by an ion exchange resin, a nitrogen compound such as hydrazine is added to raw water as a reducing agent in an amount of 1.3-2.0 equivalent on the basis of residual chlorine in raw water. By this method, high purity water can be obtained and the stable preserving period thereof can be prolonged.

8. 发明专利

JP2500968B2 失效
公开(公告)号：JP2500968B2
公开(公告)日：1996-05-29
申请号：JP30462291
申请日：1991-11-20
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , SATO SHIGEAKI , OBATA KASHU
IPC分类号： C02F1/32 , C02F1/42 , C02F1/72 , C02F9/00

9. 发明专利

JPH05300A APPARATUS FOR MAKING PURE WATER 失效
公开(公告)号：JPH05300A
公开(公告)日：1993-01-08
申请号：JP30462291
申请日：1991-11-20
申请人： KURITA WATER IND LTD
发明人： IMAIZUMI MASABUMI , SATO SHIGEAKI , OBATA KASHU
IPC分类号： C02F1/32 , C02F1/42 , C02F1/72 , C02F9/00
摘要： PURPOSE:To easily and efficiently prepare high purity water at a low cost. CONSTITUTION:An ultraviolet irradiation device 1 irradiating water to be treated with ultraviolet rays to oxidize org. matter to an org. acid, an anion exchange device 2 treating the treated water containing the org. acid from the ultraviolet irradiation device 1 and a mixed bed type ion exchange device 3 removing the residual ionic substance from the anion exchange device 2 are mounted. High purity water extremely low in TOC concn. can be prepared within a short time. The excessive consumption of power due to the excessive oxidation of org. matter is avoided and the quantity of electricity required in ultraviolet oxidation can be reduced. The regeneration frequency of the mixed bed type ion exchange device can be also reduced to a large extent. Process control becomes easy and the running cost of the apparatus can be reduced to a large extent and the apparatus can also be miniaturized.

10. 发明专利

JPH03242932A WASHING AND DRYING APPARATUS FOR WAFER 失效
公开(公告)号：JPH03242932A
公开(公告)日：1991-10-29
申请号：JP3844490
申请日：1990-02-21
申请人： KURITA WATER IND LTD
发明人： KAMETANI SHIGEJI , IMAIZUMI MASABUMI , INAGAKI KIYOHIKO
IPC分类号： H01L21/304
摘要： PURPOSE:To prevent formation of an oxide film, abrasion by a spinner jig, etc. by a method wherein a nitrogen gas is supplied into and discharged from a tank body made of quartz which supports a carrier holding a plurality of wafers set up in juxtaposition vertically inside the tank body, and a space inside the tank body is filled up with the nitrogen gas. CONSTITUTION:A tank body 1 is made of silica glass and has an immersion part 8 of a carrier and a corridor-shaped inundation part 9 so provided around the immersion part 8 as to project from the upper part of the outside, and a cover body 2 closes up the upper side of the inundation part 9 and covers it up. Wafers 4 to be washed are set up vertically and juxtaposed in the carrier 3, which is set on a support rack 15 in the immersion part 8. Next, the upper side of the inundation part 9 is covered up with the cover body 2, the inside of the tank body 1 is shut off from the outside air and washing water is supplied into the immersion part 8 from an introduction port 10 provided in the bottom. At the same time, a nitrogen gas is introduced into the tank body and filled up in a space above the immersion part 8 in the tank body 1. According to this constitution, formation of an oxide film on the wafers, abrasion with the carrier, production of dust and impairment are eliminated.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式