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    • 3. 发明专利
    • Control method and control system for exposure apparatus
    • 曝光装置的控制方法和控制系统
    • JP2012033712A
    • 2012-02-16
    • JP2010172000
    • 2010-07-30
    • Toshiba Corp株式会社東芝
    • TSUJISAWA KENICHIOGAWA AKIRAMATSUSHITA HIROSHIWASHIYAMA KOJIOISHI HIDEYUKIOTAKE TAKAYOSHI
    • H01L21/027
    • G03F9/7007G03F7/70533
    • PROBLEM TO BE SOLVED: To provide a control method and control system for exposure apparatus capable of detecting apparatus abnormalities leading to quality trouble with high probability in real time.SOLUTION: The exposure apparatus control method according to the embodiment comprises the step of: retrieving from the database the correction amount of alignment correction at the time of exposure of a wafer and the inclination amount of the wafer stage with respect to the optical axis of the exposure optical system at that exposure time; the step of making a determination on the inclination amount based on a predetermined condition; the step of making a determination on the correction amount based on a predetermined condition; and the step of issuing an alarm when the inclination amount and the correction amount both satisfy the predetermined condition.
    • 要解决的问题:提供一种能够以实时高概率检测导致质量问题的装置异常的曝光装置的控制方法和控制系统。 解决方案:根据实施例的曝光装置控制方法包括以下步骤:从数据库中取出在晶片曝光时的校准量和晶圆台相对于光学元件的倾斜量 在曝光时间下曝光光学系统的轴线; 基于预定条件来确定倾斜量的步骤; 基于预定条件确定校正量的步骤; 以及当倾斜量和校正量都满足预定条件时发出报警的步骤。 版权所有(C)2012,JPO&INPIT
    • 4. 发明专利
    • Abnormality detecting device, method, and program making computer execute method
    • 异常检测装置,方法和程序制作计算机执行方法
    • JP2012138388A
    • 2012-07-19
    • JP2010287689
    • 2010-12-24
    • Toshiba Corp株式会社東芝
    • MATSUSHITA HIROSHIOGAWA AKIRATSUJISAWA KENICHIWASHIYAMA KOJIOISHI HIDEYUKIOTAKE TAKAYOSHI
    • H01L21/02H01L21/027H01L21/3065H01L21/31
    • PROBLEM TO BE SOLVED: To provide an abnormality detecting device capable of detecting a specific abnormal behavior of a device at a high sensitivity as compared with conventional ones.SOLUTION: A device parameter acquisition part 11 acquires device parameters representing an operating state of a device. A data processing part 13 performs fitting processing for time-series data of the device parameters. A trend acquisition part 14 acquires a second-order differential value when the device parameters were acquired as trend change information using the data for which the fitting processing was performed. A fitting error acquisition part 15 acquires fitting errors in the acquired device parameters and the data for which the fitting processing was performed as change degree information on the device parameters. An abnormality determination part 17 determines whether the operating state of the device is abnormal by comparing a combination of the trend change information acquired by data behavior acquisition means and the change degree information on the device parameters with abnormality determination criteria information defining a range within which the operating state of the device is determined to be abnormal.
    • 要解决的问题:提供一种异常检测装置,其能够与常规检测装置以高灵敏度检测装置的特定异常行为。 解决方案:设备参数获取部分11获取表示设备的操作状态的设备参数。 数据处理部13对设备参数的时间序列数据进行适配处理。 当使用执行了装配处理的数据作为趋势变化信息获取装置参数时,趋势获取部分14获取二阶微分值。 拟合误差获取部15获取所获取的装置参数和进行装配处理的数据的装配误差,作为关于装置参数的变化度信息。 异常判定部17通过将由数据行为获取单元获取的趋势变化信息与设备参数的变化度信息的组合与定义范围的异常判定基准信息进行比较,来判断设备的运行状态是否异常 设备的运行状态被确定为异常。 版权所有(C)2012,JPO&INPIT
    • 6. 发明专利
    • FLUORESCENT SCREEN FORMING METHOD FOR COLOR CATHODE-RAY TUBE
    • JPS63131431A
    • 1988-06-03
    • JP27512786
    • 1986-11-20
    • TOSHIBA CORP
    • HARIKAE MAKOTOUBUKATA TOKUOWASHIYAMA KOJI
    • H01J9/227
    • PURPOSE:To suppress the etching irregularity of a graphite film by pouring a liquid on the inner surface of a panel, removing a photo-resist film and a graphite film on the film from the inner surface of the panel, and forming a stripe-shaped light absorbing film. CONSTITUTION:A graphite liquid 2 diluted with water is poured on a photo- resist film formed in a pattern shape on the surface of a panel 1, the panel 1 mounted on a rotating device 3 is inclined and rotated, thereby the whole panel 1 is coated with the graphite liquid 2. After the graphite film is dried, a pre-coating liquid is poured on the inner surface of the panel 1 while the panel 1 is rotated, then the pre-coating liquid infiltrates into the graphite film. In addition, while this pre-coating liquid is still wet, an etching liquid is poured on the inner surface of the panel 1, then the photo-resist film is expanded in about a minute. Next, water is sprayed on the inner surface of the panel 1 with a spray, then the photo-resist film and the graphite film on it are removed, and a stripe-shaped graphite film (light absorbing film) 4 is formed on the inner surface of the panel 1. Accordingly, no etching irregularity of this film is observed, and no pinhole 6 is generated.