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    • 2. 发明专利
    • STORAGE METHOD OF RADIOACTIVE GAS
    • JPS63311199A
    • 1988-12-19
    • JP14671787
    • 1987-06-12
    • TOSHIBA CORP
    • TAKANO YOSOKOKOBAYASHI YOSHIHIRO
    • G21F9/02G21F9/00
    • PURPOSE:To stably store radioactive gas for a long time and secure the safety for the storage by forming a nonradioactive metal layer which does not contain gases by spattering by the use of nonradioactive gases. CONSTITUTION:A gas switch 16 is manipulated and nonradioactive gas 14 is introduced in an ionization chamber 5. Next, an inside cathodic power source 10a and an outside cathodic power source 10b are switched on and negative voltage exceeding 1kV is applied on the inside cathode. Thus, ions of most nonradioactive gases 14 produced therein are accelerated to an inside cathode 6, inside electrode surface is spattered by ion collision, a layer 20a which is nonradioactive, does not contain gases, has high density and good adhesion is formed and so pretreatment manipulation of a gas storage equipment is performed. Thereafter, gas injection voltage of an outside cathode 1 is heightened and storage operation of nonradioactive gases is performed. Post treatment by the same as said method is performed by the aid of nonradioactive gas again after storage treatment operation is completed. Therefore, radioactive gases are prevented from releasing and can be stored for a long time.
    • 3. 发明专利
    • GAS STORAGE DEVICE
    • JPS6488398A
    • 1989-04-03
    • JP24750987
    • 1987-09-30
    • TOSHIBA CORP
    • KOBAYASHI YOSHIHIROTAKANO YOSOKO
    • G21F9/02G21F9/00
    • PURPOSE:To efficiently store gas with a long life by providing protective covers to prevent the sputtered metals driven out of a sputtering electrode from sticking to the inside surfaces of insulators for electrical insulation between the electrodes. CONSTITUTION:The 1st protective cover 15 is fixed to an anode cap 2 and the 2nd protective cover 16 is fixed to the ion implantation electrode 1. The covers 15, 16 are combined in a labyrinth type to shield the sputtered metals flying from the sputtering electrode 6 and to prevent said metals from sticking to the insulating ring 4a. The 3rd protective cover 17 is mounted to the anode cap 2 to prevent the sticking of said metals to the insulating terminal 7. The 4th and 5th protective covers 18, 19 are the covers which protect the lower insulating ring 4b, like the ring 4a, against the sticking of the sputtered metals. The cover 18 fixed to the electrode 1 and the cover 19 fixed to an anode bottom 3 are disposed in the labyrinth type.
    • 4. 发明专利
    • CONCENTRATION MEASURING SYSTEM
    • JPS63173952A
    • 1988-07-18
    • JP657287
    • 1987-01-14
    • TOSHIBA CORP
    • KOBAYASHI YOSHIHIROTAKANO YOSOKO
    • G01N27/38G01N27/42
    • PURPOSE:To achieve a continuous measurement of fine concentration, by sharing a concentration measuring mode, a replacement/passage cleaning mode, a potential scanning cleaning/background measuring mode alternately with a plurality of electrolytic cells to perform cyclic system control. CONSTITUTION:A valve 5a for introducing a liquid to be inspected, solution replacing valves 8a and 8b and drain valves 6a-6c are opened while valves 5b, 5c and 8c are closed to drive a pump 3 and a liquid to be inspected is sampled from a line 1 while a pure carrier solution is supplied from a solution feeder 7. The liquid being inspected is supplied to an electrolytic cell 4a to measured the density of ions. The pure carrier solution is supplied to electrolytic cells 4b and 4c and a potential is applied to the electrolytic cell 4b to perform an electrolytic oxidation cleaning 4c and a background measurement. The electrolytic cell 4c is replaced with the pure carrier solution to clean. Then, the valve for introducing liquid being inspected and a solution replacing valve are changed over with a mode selector 9 and the electrolytic cells 4a-4c are subjected to sequential repeated operations of concentration measurement, replacement/passage cleaning and potential scanning cleaning/background measurement.
    • 5. 发明专利
    • SCREEN CHANGEOVER DEVICE
    • JPH04186196A
    • 1992-07-02
    • JP31435890
    • 1990-11-21
    • TOSHIBA CORP
    • TAKANO YOSOKOTAKADA YOSHINORI
    • G21C3/00G21C17/00
    • PURPOSE:To make changing-over of a screen with one changeover operation and allow changing-over back to the original screen after the operator has checked it. CONSTITUTION:When No.1 switch 9 of a screen changeover request input device 1 is adhered, a screen changeover control device 2 receives No. of request information screen from the input device 1, and a request signal is sent to a screen memory device 3 so that the screen before changing-over currently being emitted to an information output device 5 is stored in memory. After an answer signal about end of storing is received from this memory device 3, the information screen being requested by the operator is taken out of a screen database 4 and sent to the output device 5. When a release signal is received from the input device 1, which is in short-time changeover mode, the control device 2 instantly sends a request signal to the memory device 3 so that it shall give the stored screen to the output device 5. The memory device 3 will implement the request immediately.
    • 6. 发明专利
    • AUTOMATED CONTROL OPERATING DEVICE
    • JPH034301A
    • 1991-01-10
    • JP13737189
    • 1989-06-01
    • TOSHIBA CORP
    • TAKANO YOSOKO
    • G05B9/02
    • PURPOSE:To reduce a misoperation and a confirmation miss in a break confirmation and to properly execute an automated operation by confirming a voice through the use of a voice input device along with the break confirmation of an automation with a touch screen installed on the screen of a CRT display device. CONSTITUTION:Watching the list of a break point displayed on a CRT display device 1, an operator O tells the item of an automatic operation to be executed next by the voice. When the confirmation instruction of the operator O is received by a voice input device 3 and a voice collation confirming part 9, the item corresponding to the confirmation instruction among the display items of the device 1 is blinked by a controller 4, a confirmed input operation area 11 on a touch screen 2 is made into the queuing condition of an input operation, and at the time of touch the area 11, an effectiveness is confirmed by the touch confirming part 8, and thereafter, the device 4 instructs the execution of the automatic operation of a plant 6 to a control part 5. On the other hand, the queuing condition of the area 11 on the touch screen 2 is turned on after, for example, 2-10 sec from a voice reception, and it is released after 10-40 sec thereafter.
    • 7. 发明专利
    • STORAGE METHOD FOR RADIOACTIVE GAS
    • JPH01144000A
    • 1989-06-06
    • JP30251887
    • 1987-11-30
    • TOSHIBA CORP
    • TAKANO YOSOKOKOBAYASHI YOSHIHIRO
    • G21F9/02G21F9/00
    • PURPOSE:To assure the secure adhesiveness between an implanting and accumulating layer and electrode surface by previously generating sputtering to an outside cathode to clean the inside surface of the outside cathode as a pretreatment for implantation and storage of a radioactive gas. CONSTITUTION:The flow of gaseous Kr to extract and discharge the gas is executed simultaneously with the start of an ion implantation operation and a negative voltage is impressed to the inside cathode 6 and the outside cathode 1, respectively. This negative voltage is about 0--100V on the cathode 6 and about -1,000V on the cathode 1. The voltage on the cathode 6 is set measurably lower than the voltage on the cathode 1. Gaseous ions 12 ionized by electric discharge are strongly attracted to the cathode 1. The gaseous ions 12 are accelerated toward the cathode 1 until finally the ions induce the sputtering on the inside surface of the cathode 1. The impurities such as oxide films on the inside surface of the cathode 1 are removed and adequate roughness of the atom size is generated by this sputtering. The adhesiveness between the gas implanting and accumulating layer 1 and the inside surface of the cathode 1 is thereby improved and since the gas discharge is stably continued, the smooth gas implantation is assured.
    • 8. 发明专利
    • ELECTROLYTIC CELL FOR FLOW COULOMETRY
    • JPS63173951A
    • 1988-07-18
    • JP657187
    • 1987-01-14
    • TOSHIBA CORP
    • TAKANO YOSOKO
    • G01N27/42
    • PURPOSE:To achieve a higher detection sensitivity of an electrolytic cell, by providing current collecting bodies contacting an working electrode at two points separately on the upstream and downstream sides of a liquid to be inspected to upgrade the current efficiency. CONSTITUTION:A hollow cylindrical electrolytic diaphragm 1 is arranged in a housing container 7 having inlet and outlet nozzles 5 and 6 and two current collectors 12a and 12b of the same diameter are bonded at both ends thereof. A housing body is made up of the electrolytic diaphragm 1 and the current collecting bodies 12a and 12b and a working electrode 16 made of a carbon fiber bundle is housed therein with the tip parts 15a and 15b contacting the inside of the current collectors 15a and 15b. A cylindrical counter electrode 4 is arranged on the circumference of the electrolytic diaphragm 1 and piercing a part thereof, a reference electrode 3 is arranged with a liquid junction positioned on the external surface of the electrolytic diaphragm 1. A liquid to be inspected from the nozzle 5 is electrolyzed while passing through the working electrode 16 and an electrolytic current is collected to the current collectors 12a and 12b. The density of ions of the liquid being inspected is determined by detecting the current.
    • 9. 发明专利
    • METHOD FOR DIAGNOSING MEMBER
    • JPH03176660A
    • 1991-07-31
    • JP31517489
    • 1989-12-06
    • TOSHIBA CORP
    • TAKANO YOSOKOSANO YUJI
    • G01N33/20G21C17/003
    • PURPOSE:To judge the timing to start the precision inspection of a member to be diagnosed so that the deterioration thereof can be diagnosed early by measuring the size of the initial microdefects, such as atom holes and lattice defects, existing internally in the member and the change in the density thereof. CONSTITUTION:For example, test pieces consisting of the same material as the member to be diagnosed are used and the initial defects of the atomic and molecular levels in the test pieces or the sizes of the expanded defects and the concn. are measured by a positron life measuring method. On the other hand, the same test pieces are subjected to destructive inspections, such as fatigue tests and acceleration test, etc., to obtain the relations between the growing speeds of the defects and the time when the defects grow to about several 10 to several 100 mum defects which can be detected by ordinary nondestructive inspections as well as the sizes of the defects. Namely, the changes are measured in accordance with the life diagnosis chart indicting the relations between the size and density of the defects and the expanding progression of the defects by which the initial defects existing internally in the member to be diagnosed are expanded and the service time of the member until the ordinary nondestructive inspections become effective is derived. Thus, the deterioration of the member is diagnosed in an early period.
    • 10. 发明专利
    • STORAGE TREATMENT DEVICE FOR GAS
    • JPS63290997A
    • 1988-11-28
    • JP12558587
    • 1987-05-22
    • TOSHIBA CORP
    • KOBAYASHI YOSHIHIROTAKANO YOSOKO
    • G21F9/02G21F9/00
    • PURPOSE:To freely adjust the compsn. ratios of an accumulated layer of an amorphous metal by using respectively exclusive DC high-voltage power supplies provided on the outside to vary and adjust the ratio of the voltages to be impressed on a transition metal element and rare earth metal material. CONSTITUTION:The negative voltage is gradually and successively impressed on the rare earth metal material 15 as well by the DC high-voltage power supply 26d for sputtering the rare earth metal material. The negative voltage of an outer cathode container 1 is increased to a high voltage below 1kV simultaneously therewith. The accumulated layer 16 of the amorphous alloy by both of the transition metal material 14 and the rare earth metal material 15 is thereby formed and ions 12 of radioactive waste gases are continuously injected therein. The storage treatment of said gases is thus executed. A system control device 31 applies commands to a power supply controller 27 while monitoring the amt. of the gases to be injected and treated with a flow meter 30 and adjusts the ratio of the voltages to be impressed on the transition and rare earth metal materials 14, 15, thereby automatically controlling the operation so that the treatment device can be operated at the max. injection capacity.