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1. 发明专利

JPS62144703A PROCESS OF SEPARATING LIQUID MIXTURE 失效
公开(公告)号：JPS62144703A
公开(公告)日：1987-06-27
申请号：JP28428885
申请日：1985-12-19
申请人： TOKUYAMA SODA KK
发明人： NONAKA TORU , ONAKA KAZUMASA , KOBAYASHI TARO
IPC分类号： B01D61/36
摘要： PURPOSE:To provide a penetrating vaporization process to prepare a liquid component carrying a very high purity and a very small specific gravity by using a vertical cell partitioned into the liquid treatment chamber and the penetrating vapor chamber by the separating membrane provided vertically and flowing the liquid mixture from the lower part of liquid treatment chamber upward to the upper part. CONSTITUTION:The liquid component with larger specific gravity is separated out of the liquid component mixture carrying difference of gravities more than 0.2 by means of pervaporation to prepare a refined liquid component carrying a small gravity. The cell 1 has a vertical separating membrane 2 to form up the liquid treatment chamber 3 and the penetrating vapor chamber 4. The height (h) between the level of liquid discharging outlet 6 and the level of liquid charging inlet 5 in the treatment chamber 3 is provided at a rate of 10-3,000 against the thickness W of the treatment chamber. The liquid mixture carrying different gravities of components is flowed from the lower side upward to the upper side of the liquid treatment chamber. As the liquid moves upward, the component with large specific gravity is removed, while the component with smaller specific gravity is taken out of the liquid outlet 6.

2. 发明专利

JPS62133091A CLEANING SYSTEM DEVICE FOR ARTICLE 失效
公开(公告)号：JPS62133091A
公开(公告)日：1987-06-16
申请号：JP27136585
申请日：1985-12-04
申请人： TOKUYAMA SODA KK
发明人： KAGIYAMA YASUHIRO , NONAKA TORU , ISHIYAMA YUJI
IPC分类号： B08B3/08 , B01D61/36 , C23G5/04 , H01L21/304
摘要： PURPOSE:To obtain a good cleaning effect without moisture and particles, etc., on the surface of articles to be cleaned by combining a pervaporation device and steam cleaning device having specific structure so that steam cleaning is executed by directly using the org. solvent refined by the pervaporation device. CONSTITUTION:This system device is constituted of the pervaporation device 8 which has a treating liquid chamber 4 and permeated steam chamber 5 segmented by a diaphragm 3 and is provided with a liquid supply port 6 and liquid take-out port 7 in the chamber 4 as well as a permeated steam take-out port 8 in the chamber 5, respectively, and the steam cleaning device which has a steam generating chamber 9 in the lower part and a steam cleaning chamber 10 in the upper part via a packed bed 11 and is provided with a condensate receiver 12 in the chamber 10. The condensate receiver 12 of the steam cleaning is connected to the liquid supply port 6 of the pervaporation device 8, and the liquid take-out port 7 of the pervaporation 8 is connected to a steam generating tank 9 of the steam cleaning device, respectively.

3. 发明专利

JPS61239628A CLEANING OF SEMICONDUCTOR SUBSTRATE 失效
公开(公告)号：JPS61239628A
公开(公告)日：1986-10-24
申请号：JP8033585
申请日：1985-04-17
申请人： TOKUYAMA SODA KK
发明人： KOMATSUBARA SHIGEO , NONAKA TORU , TOI KOICHI , KAGIYAMA YASUHIRO
IPC分类号： B08B3/08 , B01D3/36 , B01D12/00 , B01D61/36 , H01L21/00 , H01L21/304
摘要： PURPOSE:To make cleaning operation efficient while preventing any external impurities from entering into a cleaning vessel by a method wherein a semiconductor substrate is cleaned up with isopropylalcohol while any waste solution containing water, acid content, ionic substance and particles etc. is regenerated by a distillation still to be circulated for reuse within a closed system. CONSTITUTION:Semiconductor substrate to be cleaned in a cleaning vessel 1 is cleaned up with isopropylalcohol and then any waste solution containing water, acid content, ionic substance and particles etc., after cleaning is accumulated in a waste solution tank 3. Next the waste solution is fed to a pervaporization chamber 4 composed of a separating film 5 and a transmitting steam chamber 6 by a pump for dehydration as well as to distillation still 8, making use of back pressure through the intermediary of a line 7 to remove any impurity by the still 8 comprising a filler 9 and a condenser 10 for accumulating refined alcohol in an intermediate tank 11. Later the refined alcohol supplied with any supplementary new alcohol as necessary is fed back to the cleaning vessel 1 through the intermediary of another line 12.

4. 发明专利

JPH0669175A METHOD OF CLEANING SEMICONDUCTOR BASE MATERIAL 失效
公开(公告)号：JPH0669175A
公开(公告)日：1994-03-11
申请号：JP1180893
申请日：1993-01-27
申请人： TOKUYAMA SODA KK
发明人： KOMATSUBARA SHIGEO , NONAKA TORU , TOI KOICHI , KAGIYAMA YASUHIRO
IPC分类号： B08B3/14 , H01L21/304
摘要： PURPOSE:To provide a refining system which can efficiently regenerate organic solvent waste liquid inside a clean room by using anion exchange film as the separating film for selectively gasifying and separating one ingredient liquid from the liquid mixture. CONSTITUTION:Used cleaning waste liquid is extracted from a cleaner 1, and it is received in a waste liquid tank 3 from a line 2. The waste liquid is processed to remove water by the purvaparation method using anion exchange film as a separation film 5, and the processing liquid being gotten from dehydration method is distilled to obtain an organic solvent being refined as distilled liquid. That is, for a device which is divided into a processing liquid chamber 4 and a permeated steam chamber 6 by a separating film 5 is used. The organic solvent being refined this way is returned to a cleaner again by a circulation line 12, and is used again. This way, the mixing in of impurities from the outside can be reduced remarkably.

5. 发明专利

JPH04346352A DEVELOPING SOLUTION FOR PHOTORESIST 失效
公开(公告)号：JPH04346352A
公开(公告)日：1992-12-02
申请号：JP11891591
申请日：1991-05-23
申请人： TOKUYAMA SODA KK
发明人： BABA HIDEJI , OMI TADAHIRO , NONAKA TORU
IPC分类号： G03F7/32 , H01L21/027 , H01L21/30
摘要： PURPOSE:To increase resolution and form an excellent pattern by mixing a specified compound of a specified amount with alkaline water solution. CONSTITUTION:A compound indicated by the equation I is mixed by an amount of 50 to 5000ppm with alkaline solution. In the equation, R is an aliphatic hydrocarbon radical with the number of carbons of 4 to 18, X is a group indicated by -CH2-CH2-O-, Y is a group indicated by -CH(CH3)-CH2-O-, k and 1 are integers of 3 to 40 same with or different from each other, m and n are integers of 1 to 30 same with or different from each other, and (m+n):(k+1)=2:8 to 7:3. As the alkaline solution, water solutions of alkaline metal hydroxide such as sodium hydroxide, potassium hydroxide, etc., those of amines, etc., such as propyl amine, butyl amine, di-n-butyl amine, triethylamine, etc.

6. 发明专利

JPH05293340A 失效
公开(公告)号：JPH05293340A
公开(公告)日：1993-11-09
申请号：JP9983592
申请日：1992-04-20
申请人： TOKUYAMA SODA KK
发明人： HANADA FUMIO , NONAKA TORU
IPC分类号： B01D61/46
摘要： PURPOSE:To control salt concentration and simultaneously to find an abnormal phenomenon, such as a blister generated during electrodialysis by using water solution of salt from a salt chamber while circulating it and when cell voltage exceeds the set value, feeding new water solution of salt. CONSTITUTION:Three kinds of membranes, bipolar membranes B, anion exchange membranes A and cation exchange membranes C, are arranged in order between an anode 11 and a cathode 12 to form alkali chambers 13, acid chambers 14 and salt chambers 15. And for water solution of salt similar to water solution of acid and alkali, the salt chambers and a salt tank 24 are connected by a water solution of salt circulating line 25 and while the water solution of salt discharged from the salt chambers 15 is again returned to the salt chambers 15 through the salt tank 24 to circulate it, it is desalted. At that time, cell voltage is measured and when the voltage exceeds the set value new water solution of salt is fed to the water solution of salt circulating line 25 through a water solution of salt feed line 23. Therefore, the concentration of water solution of salt in the salt chamber is always suited for electrodialysis.

7. 发明专利

JPH05285346A 失效
公开(公告)号：JPH05285346A
公开(公告)日：1993-11-02
申请号：JP8235092
申请日：1992-04-03
申请人： TOKUYAMA SODA KK
发明人： NONAKA TORU , HANADA FUMIO
IPC分类号： B01D61/44 , B01D61/46 , B01D61/54 , C01D1/38
摘要： PURPOSE:To provide a method capable of enabling operation for a long period without raising cell voltage even in such a system that polyvalent cations are present in electrodialysis using a bipolar membrane. CONSTITUTION:In the case of operating an electrodialitic tank (figure) in which a cation exchange membrane and a bipolar membrane are incorporated between an anode and a cathode, the pH of a brine solution is regulated to 1 or below and the brine solution is electrodialyzed to produce alkali and acid.

8. 发明专利

JPS62161736A PURIFICATION OF ORGANIC SOLVENT 失效
公开(公告)号：JPS62161736A
公开(公告)日：1987-07-17
申请号：JP228986
申请日：1986-01-10
申请人： TOKUYAMA SODA KK
发明人： NONAKA TORU , KAGIYAMA YASUHIRO , ISHIYAMA YUJI
IPC分类号： C07B63/00 , B01D61/36 , C07B31/00 , C07C67/00
摘要： PURPOSE:To efficiently purify a crude organic solvent containing particles and water, by treating the organic solvent by a pervaporation method and specific distillation method in combination. CONSTITUTION:A crude organic solvent, containing water and particles and having an azeotropic point with water is fed from a line 1 into a rectifying column 2 and rectified under condition to give

9. 发明专利

JPH056002A DEVELOPER FOR PHOTORESIST 失效
公开(公告)号：JPH056002A
公开(公告)日：1993-01-14
申请号：JP15043591
申请日：1991-06-21
申请人： TOKUYAMA SODA KK
发明人： BABA HIDEJI , NONAKA TORU
IPC分类号： G03F7/32 , H01L21/027 , H01L21/30
摘要： PURPOSE:To form good patterns with high resolution and to lessen the dissolution of a photoresist in non-exposed parts by compounding a specific ratio of phenyl propyl alcohol with an aq. alkaline soln. CONSTITUTION:The phenyl propyl alcohol is compounded at 0.1 to 2wt.% with the aq. alkaline soln. Aq. solns. of alkaline metal hydroxides, such as sodium hydroxide and potassium hydroxide, and aq. solns. of amines, such as propyl amine, butyl amine and dibutyl amine, are preferably used as the aq. alkaline soln. The concn. of the alkaline compd. in the aq. alkaline soln. is preferably in a 0.1 to 10wt.%. Preferably, 1-phenyl-1 propanol, 1-phenyl-2 propanol, etc., are used as the phenyl propyl alcohol.

10. 发明专利

JPH04346351A DEVELOPING SOLUTION FOR PHOTORESIST 失效
公开(公告)号：JPH04346351A
公开(公告)日：1992-12-02
申请号：JP11891491
申请日：1991-05-23
申请人： TOKUYAMA SODA KK
发明人： NONAKA TORU , OMI TADAHIRO , BABA HIDEJI
IPC分类号： G03F7/32 , H01L21/027 , H01L21/30
摘要： PURPOSE:To obtain better resolution and eliminate foaming by mixing a specified surface active agent with alkaline water solution. CONSTITUTION:A compound indicated by the equation I is mixed by an amount of 50 to 5000ppm with alkaline solution. In the equation, R is an alkyl group with the number of carbons of 4 to 18 or a phenyl group which may be substituted with an alkyl group with the number of carbons of 1 to 13, X is a group indicated by -CH2-CH2-O-, Y is a group indicated by -CH(CH3)-CH2-O-, m is an integer of 5 to 40, n is an integer of 2 to 30, and m:n is 40:60 to 75:25. As the alkaline solution, water solutions of alkaline metal hydroxide such as sodium hydroxide, potassium hydroxide, etc., those of amines, etc., such as propyl amine, butyl amine, di-n-butyl amine, triethylamine, etc.

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