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1. 发明专利

JP2011195548A Photoacid generator and photoreactive composition 审中-公开
标题翻译：光电发生器和光电组合物
公开(公告)号：JP2011195548A
公开(公告)日：2011-10-06
申请号：JP2010066957
申请日：2010-03-23
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： YAMAGUCHI HIROSHI , YAMAMOTO KATSUMASA
IPC分类号： C07D333/62 , C09K3/00
摘要： PROBLEM TO BE SOLVED: To provide a photoacid generator showing extremely high sensitivity to light of near-ultraviolet range of around 300-400 nm, thereby achieving highly increased reaction rate, and a photoreactive composition requiring extremely short reaction time under exposure to near-ultraviolet irradiation.SOLUTION: A benzo[b]thiophene sulfonium salt compound represented by formula (1) (wherein R-Reach independently represents hydrogen atom, halogen atom, 1C-4C alkyl halide group, 1C-10C alkyl group, 1C-4C alkoxy group, 1C-8C acyl group or hydroxy group; and X represents anion) is provided.
摘要翻译：要解决的问题：为了提供对近300-400nm的近紫外范围的光具有极高灵敏度的光致酸发生剂，从而实现高度提高的反应速率，以及在暴露于近紫外线条件下需要极短的反应时间的光反应性组合物辐射。溶液：由式（1）表示的苯并[b]噻吩锍盐化合物（其中R-Reach独立地表示氢原子，卤素原子，1C-4C烷基卤基，1C-10C烷基，1C-4C烷氧基，1C-8C酰基或羟基; X表示阴离子）。

2. 发明专利

JP2011038014A Photoacid generator and photoreactive composition 有权
标题翻译：光电发生器和光电组合物
公开(公告)号：JP2011038014A
公开(公告)日：2011-02-24
申请号：JP2009187610
申请日：2009-08-13
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： YAMAGUCHI HIROSHI , YAMAMOTO KATSUMASA , AKEMI HIDEHIKO , NISHIGUCHI HIDEAKI
IPC分类号： C09K3/00 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a photoacid generator and a photoreactive composition; wherein the photoacid generator is useful for a printing platemaking material, various resists and ultraviolet curable paint, etc., very highly sensitive in near-ultraviolet region of around 300-400 nm and capable of fully enhancing reaction rate, and the photoreactive composition takes a very short reaction time under near-ultraviolet irradiation.
SOLUTION: The photoacid generator contains a specific dithienyl sulfide sulfonium salt compound and a specific acyl phosphine oxide compound while the photoreactive composition contains the photoacid generator and an acid reactive compound.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供光致酸产生剂和光反应性组合物; 其中光致酸发生器可用于印刷制版材料，各种抗蚀剂和紫外线固化涂料等，其在约300-400nm的近紫外区域非常高度敏感并能够完全提高反应速率，并且光反应组合物需要在近紫外线照射下反应时间非常短。解决方案：光致酸产生剂含有特定的二噻吩基硫化锍盐化合物和特定的酰基氧化膦化合物，而光反应性组合物含有光酸产生剂和酸反应性化合物。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011157277A Method for producing dithienyl sulfide compound 审中-公开
标题翻译：生产二硫化锡化合物的方法
公开(公告)号：JP2011157277A
公开(公告)日：2011-08-18
申请号：JP2010017603
申请日：2010-01-29
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： AKEMI HIDEHIKO , YAMAMOTO KATSUMASA , YAMAGUCHI HIROSHI
IPC分类号： C07D333/34
摘要： PROBLEM TO BE SOLVED: To provide a method for simply producing a dithienyl sulfide compound at a low cost.
SOLUTION: The method for producing a dithienyl sulfide compound represented by formula (2) (wherein, R is H, 1C-10C alkyl, 1C-4C alkoxy, 1C-20C alkylthio, 4C-10C arylthio, a monocyclic carbon ring group which may have a substituent, or a monocyclic heterocyclic group which may have a substituent; and X is a halogen atom) comprises reacting a thiophene compound Grignard reagent represented by formula (1) (wherein, R is the same group as the group in formula (2)) with sulfur dichloride.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种简单地以低成本生产二噻吩基硫化物的方法。解决方案：制备式（2）表示的二噻吩基硫化物的方法（其中R为H，1C-10C烷基，1C-4C烷氧基，1C-20C烷硫基，4C-10C芳硫基，单环碳环可以具有取代基的基团，或可以具有取代基的单环杂环基; X是卤素原子）包括使由式（1）表示的噻吩化合物格氏试剂（其中，R是与基团中相同的基团）式（2））。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2011153212A Light reactive composition 审中-公开
标题翻译：光敏组合物
公开(公告)号：JP2011153212A
公开(公告)日：2011-08-11
申请号：JP2010015417
申请日：2010-01-27
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： YAMAGUCHI HIROSHI , YAMAMOTO KATSUMASA
IPC分类号： C08G59/68 , C08F2/50
摘要： PROBLEM TO BE SOLVED: To provide a photoreactive composition which has very high sensitivity to light near 300-400 nm in a near ultraviolet region and achieves a very short reaction time upon near ultraviolet irradiation. SOLUTION: The photoreactive composition includes a phenoxazine compound represented by formula (1) (wherein R 1 to R 4 each independently denote H, nitro, amino, hydroxyl, halogen, 1-10C alkyl, 1-4C alkoxy, 1-4C alkylthio, 1-4C halogenated alkyl, 1-4C alkylamino, 1-8C acyl or 2-8C dialkylamino; and R 5 denotes H, 1-10C alkyl, 1-8C acyl, phenyl, 7-10C 4-alkoxyphenyl, 7-14C 4-alkylphenyl, 4-halogenated phenyl, naphthyl or thienyl), a photoacid generator and an acid-reactive compound. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供对近紫外区域对300-400nm附近的光具有非常高的灵敏度的光反应性组合物，并且在近紫外线照射下实现非常短的反应时间。光反应性组合物包括由式（1）表示的吩恶嗪化合物（其中R 1至S 4各自独立地表示H，硝基，氨基，羟基，卤素，1-10C烷基，1-4C烷氧基，1-4C烷硫基，1-4C卤代烷基，1-4C烷基氨基，1-8C酰基或2-8C二烷基氨基; R 表示H ，1-10C烷基，1-8C酰基，苯基，7-10C 4-烷氧基苯基，7-14C- 4-烷基苯基，4-卤代苯基，萘基或噻吩基），光酸产生剂和酸反应性化合物。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2011157278A Method for producing dithienyl sulfide compound 审中-公开
标题翻译：生产二硫化锡化合物的方法
公开(公告)号：JP2011157278A
公开(公告)日：2011-08-18
申请号：JP2010017670
申请日：2010-01-29
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： AKEMI HIDEHIKO , YAMAMOTO KATSUMASA , YAMAGUCHI HIROSHI
IPC分类号： C07D333/34 , C07B61/00
摘要： PROBLEM TO BE SOLVED: To provide a method for simply producing a dithienyl sulfide compound in a high yield and in high purity.
SOLUTION: The method for producing the dithienyl sulfide compound represented by formula (2) (wherein, R is H, a halogen atom, 1 to 10C alkyl, 1 to 4C alkoxy, 1 to 20C alkylthio, 4 to 10C arylthio, a monocyclic hydrocarbon ring group which may have a substituent, or a monocyclic heterocyclic group which may have a substituent) comprises reducing a dithienyl sulfoxide compound represented by formula (1) (wherein, R is the same group as the group in formula (2)) with a reducing agent in the presence of an acid.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：待解决的问题：提供简单地以高产率和高纯度生产二噻吩基硫化物的方法。解决方案：制备由式（2）表示的二噻吩基硫化物的方法（其中R是H，卤素原子，1至10个烷基，1至4个烷氧基，1至20个碳原子数的烷硫基，4至10个芳硫基，可以具有取代基的单环烃环基或可以具有取代基的单环杂环基）包括还原由式（1）表示的二噻吩基亚砜化合物（其中，R是与式（2）中的基团相同的基团））与还原剂在酸的存在下反应。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2014088348A Thickening composition 审中-公开
标题翻译：增稠组合物
公开(公告)号：JP2014088348A
公开(公告)日：2014-05-15
申请号：JP2012239521
申请日：2012-10-30
申请人： Sumitomo Seika Chem Co Ltd , 住友精化株式会社
发明人： YAMAGUCHI HIROSHI , NISHIGUCHI SATOSHI , MORIMITSU YUICHIRO
IPC分类号： A61K8/44 , A61K8/81 , A61Q5/02 , A61Q19/10 , C09K3/00
摘要： PROBLEM TO BE SOLVED: To provide a thickening composition which can be thickened by combination with an amino acid-type surfactant and has thickening properties even in a weakly alkaline pH region.SOLUTION: The thickening composition contains an amino acid-type surfactant and a (meth)acrylic acid-based copolymer, where the (meth)acrylic acid-based copolymer is obtained by copolymerization of the following (A), (B) and (C) as monomer components, the molar number ratio of the component (C) to the total molar number of the component (A) and the component (B) is 0.95 to 10 mol%. (A) (meth)acrylic acid; (B) (meth)acrylic acid alkyl ester where the alkyl group has a carbon number of 1 to 4; (C) (meth)acrylic acid (polyoxyethylene alkyl ether) ester represented by formula (I): CH=CRC(O)-(OCHCH)-OCH, (in the formula, R represents a hydrogen atom or a methyl group, n represents an integer of 10 to 60, and m represents an integer of 12 to 24.)
摘要翻译：要解决的问题：提供一种可以与氨基酸型表面活性剂组合而增稠的增稠组合物，即使在弱碱性pH区域也具有增稠性。溶液：增稠组合物含有氨基酸型表面活性剂和（（甲基）丙烯酸系共聚物，其中通过以下（A），（B）和（C）作为单体组分的共聚获得（甲基）丙烯酸类共聚物，组分（C）（A）成分和（B）成分的总摩尔数为0.95〜10摩尔％。（A）（甲基）丙烯酸; （B）（甲基）丙烯酸烷基酯，其中烷基的碳数为1至4; （C）由式（I）表示的（甲基）丙烯酸（聚氧乙烯烷基醚）酯：CH = CRC（O） - （OCHCH）-OCH，（式中，R表示氢原子或甲基，n 表示10〜60的整数，m表示12〜24的整数。）

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