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    • 3. 发明专利
    • Measuring chamber for emitted gas
    • 用于发射气体的测量室
    • JP2003307472A
    • 2003-10-31
    • JP2002112067
    • 2002-04-15
    • Sumika Chemical Analysis Service Ltd株式会社住化分析センター
    • FUJII HIROSHITAKEDA KIKUOOHASHI KAZUTOSHINONAKA TATSUO
    • G01N1/22G01N33/00
    • PROBLEM TO BE SOLVED: To provide a chamber by which also an emitted gas from a sample as a whole is measured without being restricted by a size or a shape of the sample and which is manufactured simply so as to be matched to the size or the shape of the sample and to provide a measuring method of the emitted gas by using the chamber.
      SOLUTION: A measuring chamber for the emitted gas is formed by using a sheet used to cut off the inside of the chamber from the open air, and it comprises a cleaning-gas supply machine and an exhaust port. Alternatively, the chamber is composed of a frame used to maintain a shape of the chamber and a flexible sheet. The measuring method for the emitted gas uses any one from among the chambers.
      COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种室,其中测量来自样品的发射气体,而不受样品的尺寸或形状的限制,并且其被简单地制造成与 尺寸或样品的形状,并且通过使用室来提供排出的气体的测量方法。 解决方案:用于排出气体的测量室通过使用用于从敞开空气切断室内部的片材形成,并且其包括清洁气体供给机和排气口。 或者,室由用于保持室的形状的框架和柔性片组成。 排放气体的测量方法使用腔室中的任何一种。 版权所有(C)2004,JPO