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1. 发明专利

JP2014047308A Resin composition and resin molded article 审中-公开
标题翻译：树脂组合物和树脂成型品
公开(公告)号：JP2014047308A
公开(公告)日：2014-03-17
申请号：JP2012192672
申请日：2012-08-31
申请人： Sony Corp , ソニー株式会社
发明人： UEDA KENJI , INAGAKI YASUSHI , OE TAKAHIRO , YAMADA ATSUSHI
IPC分类号： C08L69/00 , C08K3/34 , C08K5/42 , C08L27/18
CPC分类号： C08L69/00 , C08K3/34 , C08K5/42 , C08L27/18 , C08L2201/02
摘要： PROBLEM TO BE SOLVED: To provide a non-halogen polycarbonate resin composition and a resin molded article having excellent fire retardancy and physical properties suitable for use as an industrial product.SOLUTION: A resin composition comprises a component A, a component B, a component C, and a component D. The component A is a polycarbonate resin. The component B is talc having an average median diameter of not less than 4.6 μm and not more than 6.0 μm and contained at not less than 5 wt.% and not more than 20 wt%. The component C is organic sulfonic acid or an organic sulfonic acid metal salt and contained at not less than 0.05 wt.% and not more than 2.0 wt.%. The component D is a drip inhibitor and contained at not less than 0.05 wt.% and not more than 1.0 wt.%.
摘要翻译：要解决的问题：提供一种非卤素聚碳酸酯树脂组合物和具有优异的阻燃性和物理性能的树脂模塑制品，其适合用作工业产品。溶液：树脂组合物包含组分A，组分B，组分 C和成分D.成分A为聚碳酸酯树脂。组分B是具有平均中值直径不小于4.6μm且不大于6.0μm并且不低于5重量％且不大于20重量％的滑石。组分C是有机磺酸或有机磺酸金属盐，其含量不小于0.05重量％且不超过2.0重量％。组分D为滴液抑制剂，含量不小于0.05重量％且不大于1.0重量％。

2. 发明专利

JP2009138210A Film depositing apparatus, film depositing method, and manufacturing method of luminescent device 审中-公开
标题翻译：薄膜沉积装置，膜沉积方法及其制造方法
公开(公告)号：JP2009138210A
公开(公告)日：2009-06-25
申请号：JP2007313022
申请日：2007-12-04
申请人： Sony Corp , ソニー株式会社
发明人： MORIKAWA SHINICHIRO , YAMADA ATSUSHI
IPC分类号： C23C16/44 , H01L51/50 , H05B33/10
CPC分类号： C23C16/4412 , C23C16/4408
摘要： PROBLEM TO BE SOLVED: To remove particles generated during the film deposition by the chemical vapor deposition method.
SOLUTION: A film depositing apparatus includes: a chamber 10 in which a substrate S is disposed; a gas introducing portion 40 for introducing a reactive gas into the chamber 10; a gas exhausting portion 50 for exhausting the reactive gas from the chamber 10; and a control portion 60 for controlling particle exhausting processing for exhausting particles within the chamber 10 from the gas exhausting portion 50 either in a middle of depositing a film on the substrate S disposed within the chamber 10 in accordance with a reaction based on the reactive gas, or in a stage of completion of the film deposition.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过化学气相沉积方法去除在膜沉积期间产生的颗粒。解决方案：一种膜沉积设备，包括：其中设置有基底S的腔室10; 用于将反应气体引入室10的气体导入部40; 用于从室10排出反应性气体的排气部分50; 以及控制部分60，用于控制从气体排出部分50排出室10内的颗粒的颗粒排出处理，或者在根据基于反应气体的反应在设置在室10内的基板S上沉积膜的中间，或在膜沉积完成的阶段。版权所有（C）2009，JPO＆INPIT

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