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1. 发明专利

JP2013008595A Photoelectric conversion device and method for manufacturing the same 审中-公开
标题翻译：光电转换装置及其制造方法
公开(公告)号：JP2013008595A
公开(公告)日：2013-01-10
申请号：JP2011141149
申请日：2011-06-24
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , KOGO AKIRA
IPC分类号： H01M14/00 , H01L31/04 , H01M2/08
CPC分类号： Y02E10/542
摘要： PROBLEM TO BE SOLVED: To provide a photoelectric conversion device capable of improving utilization efficiency of a dye, and a method for manufacturing the same.SOLUTION: The photoelectric conversion device comprises: a conductive base; a porous semiconductor layer which is disposed on the conductive base and has a dye adsorbed thereon; a counter electrode; an electrolyte layer; a sealing member formed around the conductive base; and at least one projected part formed between the porous semiconductor layer and circumference of the sealing member.
摘要翻译：要解决的问题：提供能够提高染料利用效率的光电转换装置及其制造方法。光电转换装置包括：导电基体; 多孔半导体层，其设置在导电性基体上并具有吸附在其上的染料; 对电极电解质层; 围绕所述导电性基体形成的密封构件; 以及形成在所述多孔半导体层和所述密封构件的周围之间的至少一个突出部。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2008235010A Method of manufacturing display device 审中-公开
标题翻译：制造显示装置的方法
公开(公告)号：JP2008235010A
公开(公告)日：2008-10-02
申请号：JP2007072965
申请日：2007-03-20
申请人： Sony Corp , ソニー株式会社
发明人： KAGAMI KEIICHI , MATSUO KEISUKE , OBINATA KOKICHI , MATSUDA EISUKE
IPC分类号： H05B33/10 , G09F9/00 , G09F9/30 , H01L27/32 , H01L51/50
CPC分类号： H05B33/10 , C23C14/048 , H01L51/0013 , H01L51/0026 , H01L51/56 , Y02E10/549 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device capable of maintaining the light-emitting efficiency and luminance half life at a high level in a light-emitting element, having a transfer layer as a light-emitting layer, even when this transfer layer containing an organic light-emitting material coated and formed on a support substrate is pattern-formed on a device substrate by thermal transfer.
SOLUTION: A process S11 is carried out in which the transfer layer containing the organic light-emitting material is coated and formed on the support substrate, and next, a process S12 is carried out in which the transfer layer is heat-treated. Then, a process S2 is carried out where the heat-treated transfer layer is thermally transferred onto the device substrate. On the device substrate to which the transfer layer is thermally transferred, the lower electrode is formed, and on this lower electrode, the transfer layer is pattern-transferred. Then, the other functional layer and the upper electrode are formed by being laminated on the transfer layer, thereby providing an organic electroluminescent element, which is formed by pinching the transfer layer containing the organic light-emitting material, between the lower electrode and the upper electrode.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种制造显示装置的方法，所述显示装置能够将发光效率和亮度半衰期维持在发光元件的高电平，所述发光元件具有转印层作为发光层即使将包含涂布并形成在支撑基板上的有机发光材料的转印层通过热转印图案化形成在器件基板上。解决方案：进行步骤S11，其中包含有机发光材料的转印层被涂覆并形成在支撑基板上，接下来，执行转印层被热处理的工艺S12 。然后，进行热处理转印层热转印到器件基板上的工序S2。在转印层被热传递到的器件衬底上形成下电极，并且在该下电极上转印层被图案转印。然后，通过层叠在转印层上形成另一功能层和上电极，由此提供通过在下电极和上电极之间夹持含有有机发光材料的转印层而形成的有机电致发光元件电极。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008311103A Manufacturing method of display device, and the display device 审中-公开
标题翻译：显示装置的制造方法和显示装置
公开(公告)号：JP2008311103A
公开(公告)日：2008-12-25
申请号：JP2007158342
申请日：2007-06-15
申请人： Sony Corp , ソニー株式会社
发明人： NAKAMURA HIROSHI , RO SEIKI , MATSUO KEISUKE
IPC分类号： H05B33/10 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a display device, capable of improving characteristics of an organic layer, when the organic layer is formed by a heat transfer method. SOLUTION: A light-emitting layer 15C is formed by carrying out a plurality of times of transfer processes, by sequentially using a plurality of donor substrates, having respectively a transfer layer of a thickness which is made by dividing in the thickness direction the light-emitting layer 15C. Even when the distribution of concentration ratio (doping concentration ratio) of two or more kinds of materials (host material and dopant material) contained in each transfer layer is nonuniform in the thickness direction at the time of transfer, unevenness in the thickness direction of the distribution of dope concentration ratio as a whole for the light-emitting layer 15C is reduced, as compared with a conventional method in which the light-emitting layer 15C is formed by a single transfer process. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供当通过传热方法形成有机层时能够改善有机层的特性的显示装置的制造方法。解决方案：通过依次使用多个施主基板，分别具有通过在厚度方向上分割的厚度的转印层，进行多次转印处理而形成发光层15C 发光层15C。即使当转印层中包含的两种以上的两种以上材料（主体材料和掺杂剂）的材料的浓度比（掺杂浓度比）的分布在厚度方向上不均匀时，与通过单次转印法形成发光层15C的现有方法相比，发光层15C的掺杂浓度比的整体分布减少。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008235011A Method of manufacturing display method 审中-公开
标题翻译：制作显示方法的方法
公开(公告)号：JP2008235011A
公开(公告)日：2008-10-02
申请号：JP2007072969
申请日：2007-03-20
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , ANDO MASATO , MIYAKI YUKIO , OBINATA KOKICHI , UJIIE YASUHARU
IPC分类号： H05B33/10 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide a technique capable of using a material having proper light-emitting characteristics as the material of a light-emitting layer and enabling micronization of the light-emitting layer and enlargement of a substrate, in a method for pattern-forming the light-emitting layer made of a plurality of light-emitting materials on a device substrate.
SOLUTION: On a substrate, a first transfer layer containing a first organic material and a second transfer layer containing a second organic material are pattern-formed by a printing method, at least via a photothermal conversion layer. Meanwhile, the lower electrode or the like are formed on the device substrate, and then the substrate to be transferred is formed. Successively, by irradiating radiation rays on the substrate equipped with the first transfer layer and the second transfer layer, the transfer layer is transferred in a lump on the substrate to be transferred.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种能够使用具有适当的发光特性的材料作为发光层的材料并且能够使发光层微粉化和基板的放大的技术，在方法用于在器件衬底上形成由多个发光材料制成的发光层。解决方案：在衬底上，至少通过光热转换层，通过印刷方法形成包含第一有机材料的第一转印层和含有第二有机材料的第二转印层。同时，在器件基板上形成下电极等，然后形成待转印的基板。接着，通过在配备有第一转印层和第二转印层的基板上照射放射线，将转印层一次性地转印到被转印基板上。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2007141702A Substrate for transcription, transcription method, and manufacturing method of display 有权
标题翻译：基因转录，转录方法和制造方法的显示
公开(公告)号：JP2007141702A
公开(公告)日：2007-06-07
申请号：JP2005335310
申请日：2005-11-21
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE
IPC分类号： H05B33/10 , G09F9/00 , G09F9/30 , H01L27/32 , H01L51/50
CPC分类号： H01L51/0013 , H01L27/3211 , H01L51/0059 , H01L51/5284 , H01L2251/558
摘要： PROBLEM TO BE SOLVED: To provide a substrate for transcription and transcription method capable of forming a transcription pattern by thermal transcription and capable of improving production efficiency, and to provide a manufacturing method of a display device.
SOLUTION: In the substrate 1 for the transcription in which a transcription material layer 5 is installed on a supporting substrate 2 via a light absorbing layer 4, a reflection prevention pattern 3 for preventing reflection of light at the boundary face of the supporting substrate 2 and the light absorbing layer 4, is arranged between the supporting substrate 2 and the light absorbing layer 4, and the reflection prevention pattern 3 has a film thickness t in which absorbance of light of a prescribed wavelength h to transmit through the supporting substrate 2 and to be absorbed in the light absorbing layer 4 becomes to have the maximum value.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：待解决的问题：提供能够通过热转录形成转录模式并能够提高生产效率的转录和转录方法的底物，并提供显示装置的制造方法。解决方案：在用于转印的基板1中，其中转印材料层5经由光吸收层4安装在支撑基板2上，防反射图案3用于防止光在支撑基板2的边界面反射基板2和光吸收层4配置在支撑基板2和光吸收层4之间，防反射图案3具有膜厚t，其中规定波长的光的吸光度h通过支撑基板并且被吸收在光吸收层4中，变得具有最大值。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2009146716A Display device and donor substrate 审中-公开
标题翻译：显示器件和激光器衬底
公开(公告)号：JP2009146716A
公开(公告)日：2009-07-02
申请号：JP2007322502
申请日：2007-12-13
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , ANDO MASATO , MIYAKI YUKIO
IPC分类号： H05B33/12 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a display device and a donor substrate capable of improving film thickness uniformity of light-emitting layers.
SOLUTION: Blue organic light-emitting elements 10B1, 10B2 are arranged on both neighboring sides of a red organic light-emitting element 10R and a green organic light-emitting element 10G. Transfer layers 50R, 50G of only two colors of red color and green color are formed on zones corresponding to organic light-emitting elements 10R, 10B1, 10G and 10B2 of three colors of red color, green color, and blue color on a donor substrate 40, and the width is widened approximately one and a half times per one color. Namely, an arrangement interval Wdt of a partition 42, and a width Wst of the red organic light-emitting element 10R or the green organic light-emitting element 10G satisfy the relationship of Wdt>Wst. When the red color transfer layer 50R and the green color transfer layer 50G are deposited by an inkjetting method, an impact accuracy permissible range of a drop becomes wide, and nonuniformity of the film thickness is lessened. Consequently, film thickness uniformity of the transferred red color light-emitting layer and the transferred green color light-emitting layer is improved.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够提高发光层的膜厚均匀性的显示装置和施主基板。解决方案：蓝色有机发光元件10B1,10B2布置在红色有机发光元件10R和绿色有机发光元件10G的两相邻侧上。在与供体基板上的红色，绿色和蓝色三种颜色的有机发光元件10R，10B1,10G和10B2对应的区域上形成仅有两种颜色的红色和绿色的转印层50R，50G 40，并且每个颜色的宽度加宽大约一倍半。也就是说，隔壁42的布置间隔Wdt和红色有机发光元件10R或绿色有机发光元件10G的宽度Wst满足Wdt> Wst的关系。当通过喷墨方法沉积红色转印层50R和绿色转印层50G时，液滴的冲击精度允许范围变宽，并且膜厚度的不均匀性降低。因此，转印的红色发光层和转移的绿色发光层的膜厚均匀性得到改善。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008288017A Manufacturing method of organic electroluminescent display device 审中-公开
标题翻译：有机电致发光显示装置的制造方法
公开(公告)号：JP2008288017A
公开(公告)日：2008-11-27
申请号：JP2007131453
申请日：2007-05-17
申请人： Sony Corp , ソニー株式会社
发明人： UEDA KENJI , KAGAMI KEIICHI , MATSUO KEISUKE
IPC分类号： H05B33/10 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To solve a problem that, when a transfer layer is formed on a substrate for transfer with existence of contaminants such as moisture, oxygen, and an organic matter, and the transfer layer is transferred to an element-forming substrate by a laser heat transfer method, the contaminants are apt to remain in the transfer layer transferred to the element-forming substrate.
SOLUTION: In the manufacturing method of the organic EL display device having a transfer process S3 of transferring a transfer layer formed on a substrate for transfer at a forming process S1 of the substrate for transfer to the element forming substrate finishing a first film-forming process S2 of an organic EL element by a laser heat transfer method, the transfer layer is to be formed after a pre-treatment at least including laser heating treatment heating the substrate for transfer by irradiation of laser light, before forming the transfer layer on the substrate for transfer at the forming process S1 of the substrate for transfer.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题为了解决当转印层形成在具有诸如水分，氧气和有机物等污染物的转印用基板上的情况下，并且转印层被转印到元件上时，通过激光传热法形成衬底，污染物易于残留在转移到元件形成衬底的转移层中。解决方案：在具有转印步骤S3的有机EL显示装置的制造方法中，转印步骤S3将形成在转印用基板上的转印层转印到元件形成基板的成膜工序S1，通过激光传热法形成有机EL元件的工艺S2，在形成转印层之前，至少在激光加热处理加热用于通过照射激光进行转印的基板的预处理之后，形成转印层在用于转印用基板的成形工序S1的基板上进行转印。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2008227230A Display unit 有权
标题翻译：显示单元
公开(公告)号：JP2008227230A
公开(公告)日：2008-09-25
申请号：JP2007064787
申请日：2007-03-14
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , SATO CHIYOKO , HANAWA KOJI , SHIBAZAKI TAKANOBU , YAMAMOTO TETSUO , MIURA KIWAMU
IPC分类号： H01L51/50 , G09F9/00 , G09F9/30 , H01L27/32 , H05B33/10
CPC分类号： H01L27/3206 , H01L27/3211 , H01L27/3246 , H01L27/3283 , H01L51/0013 , H01L51/56
摘要： PROBLEM TO BE SOLVED: To provide a display unit that controls film thickness distribution of a transcriptional light emitting layer within a luminous region and improves the level of display quality.
SOLUTION: A transcribed substrate 11 and a donor substrate 40 are so arranged that they face each other with an insulating layer 14 in between, and a laser beam is irradiated to sublimate or evaporize a transfer layer 50 and transcribe it at least to a luminous region 13A. Assuming an intersection of a tangent to the insulating layer 14 drawn from the edge of the luminous region 13A and the surface of the donor substrate 40 is A, and an intersection between a perpendicular drawn from A to the transcribed substrate 11 and the surface of the insulating substrate 14 is C, the light emitting layer 15C is formed so as to include C and preferably not to include D. The film thickness distribution of the light emitting layer 15C within the luminous region 13A and color mixture into the adjacent luminous region 13A are controlled, thus improving the display quality. The distance d in a direction to a line between an edge 13B of the luminous region 13A and the contact surface of the insulating layer 14 and the donor substrate 40 should preferably be 4 μm or more.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种显示单元，其控制发光区域内的转录发光层的膜厚分布，并提高显示质量的水平。解决方案：转印的基板11和施主基板40被布置成使得它们之间具有绝缘层14彼此面对，并且激光束被照射以升华或蒸发转印层50并且将其转录至少至发光区域13A。假设从发光区域13A的边缘和施主基板40的表面拉出的绝缘层14的切线的交点为A，从A向转录的基板11绘制的垂直线和绝缘基板14是C，发光层15C被形成为包括C并且优选地不包括D.发光层13A内的发光层15C的膜厚度分布和颜色混合物到相邻的发光区域13A是控制，从而提高显示质量。在与发光区域13A的边缘13B和绝缘层14的接触表面和施主衬底40之间的线的方向上的距离d应优选为4μm以上。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2006309994A Base plate for transfer, transfer method, and manufacturing method of display device 审中-公开
标题翻译：用于传输的基板，传输方法和显示装置的制造方法
公开(公告)号：JP2006309994A
公开(公告)日：2006-11-09
申请号：JP2005128908
申请日：2005-04-27
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , MATSUDA EISUKE
IPC分类号： H05B33/10 , H01L51/50 , H05B33/14 , H05B33/22
摘要： PROBLEM TO BE SOLVED: To utilize a transfer layer formed on a donor element as a base plate for transfer without waste.
SOLUTION: In the base plate for transfer (donor element 20), formed by forming a light emitting layer 23 on a supporting base plate 21, a plurality of alignment marks M1 to M3 performing a position alignment with an element formation base plate to be an object of transfer are formed on the support base plate 21, coping with the matching relations different from each other. In order to carry out transfer by using the donor element 20, the position alignment with the element formation base plate is carried out and transferred, by using one alignment mark out of the plurality of alignment marks M1 to M3; afterwards, the transfer is carried out, by carrying out position alignment using another alignment mark to another element formation base plate. By repeating the above process, the light-emitting layer 23 formed on the donor element 20 can be utilized without waste.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：使用形成在施主元件上的转印层作为基板进行转印而不浪费。解决方案：在通过在支撑基板21上形成发光层23而形成的用于转印的基板（施主元件20）中，多个对准标记M1至M3与元件形成基板作为转移对象形成在支撑基板21上，以应对彼此不同的匹配关系。为了通过使用施主元件20进行转印，通过使用多个对准标记M1〜M3中的一个对准标记来进行与元件形成基板的位置对准，并进行转印。然后，通过使用另一个对准标记对另一元件形成基板进行位置对准来进行转印。通过重复上述处理，可以无需浪费地使用形成在供体元件20上的发光层23。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2006080023A Display device and its manufacturing method 审中-公开
标题翻译：显示设备及其制造方法
公开(公告)号：JP2006080023A
公开(公告)日：2006-03-23
申请号：JP2004265337
申请日：2004-09-13
申请人： Sony Corp , ソニー株式会社
发明人： MATSUO KEISUKE , TOKUNAGA KAZUHIKO , NISHIGUCHI MASAO , YOKOYAMA SEIICHI
IPC分类号： H05B33/22 , H01L51/50 , H05B33/10 , H05B33/24
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device capable of contributing to ensure display characteristics by forming an insulating layer into flat as far as possible. SOLUTION: A lower flatted insulating layer 151 is formed to have openings 151K each storing a driving wire 14, and an upper flatted insulating layer 152 is formed to cover the lower flatted insulating layer 151 while it fills in the openings 151K, and thus the lower flatted insulating layer 151 and the upper flatted insulating layer 152 are layered in the order into a double layer structure to form a flatted insulating layer 15. The irregular surface structure including TFT's 12 and driving wires 14 is not reflected, namely, the flatted insulating layer 1 is formed so that an influence of the irregular surface structure is relieved, thereby sufficiently flatting the surface of the flatted insulating layer 15. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过尽可能地将绝缘层形成为平坦的方式来提供能够有助于确保显示特性的显示装置的制造方法。解决方案：形成下部平坦绝缘层151，其开口151K各自存储驱动线14，并且上部平坦绝缘层152形成为覆盖下部平坦绝缘层151，同时填充开口151K，并且因此下部平坦绝缘层151和上部平坦绝缘层152按顺序层叠成双层结构以形成平坦的绝缘层15.包括TFT 12和驱动线14的不规则表面结构不被反射，即形成平坦绝缘层1，使得不规则表面结构的影响减轻，从而使平坦绝缘层15的表面充分平坦化。版权所有（C）2006，JPO＆NCIPI

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