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    • 1. 发明专利
    • Secondary battery
    • 二次电池
    • JP2014191912A
    • 2014-10-06
    • JP2013064399
    • 2013-03-26
    • Sony Corpソニー株式会社
    • IWAMA MASAYUKIABE KAORUKAGAMI KEIICHIKAWASE KENICHITAKADA TOMOO
    • H01M10/058H01M2/16H01M4/13H01M4/38H01M4/62H01M4/66H01M10/052
    • H01M2/08H01M2/1673H01M10/0525H01M10/0587Y02T10/7011
    • PROBLEM TO BE SOLVED: To provide a secondary battery capable of securing high safety.SOLUTION: The secondary battery includes a positive electrode and a negative electrode opposed through a separator, and an electrolyte. The positive electrode includes a positive electrode current collector and a positive electrode active material layer provided between the positive electrode current collector and the separator, and the negative electrode includes a negative electrode current collector and a negative electrode active material layer provided between the negative electrode current collector and the separator. In a region between the positive electrode current collector and the negative electrode current collector, at least one of the positive electrode, the negative electrode, and the separator contains a plurality of thermally conductive particles, in which a thermal conductivity of the thermally conductive particles in a second direction crossing a first direction is larger than that in the first direction where the positive electrode and the negative electrode face each other.
    • 要解决的问题:提供一种能够确保高安全性的二次电池。解决方案:二次电池包括通过隔膜相对的正极和负极以及电解质。 正极包括正极集电体和设置在正极集电体和隔板之间的正极活性物质层,负极包括负极集电体和设置在负极电流之间的负极活性物质层 收集器和分隔器。 在正极集电体和负极集电体之间的区域中,正极,负极和隔板中的至少一个包含多个导热性粒子,导热性粒子的导热性 与第一方向交叉的第二方向大于正极和负极彼此面对的第一方向的方向。
    • 4. 发明专利
    • Optical function film and method of manufacturing the same, and display device and method of manufacturing the same
    • 光学功能膜及其制造方法及其显示装置及其制造方法
    • JP2011204377A
    • 2011-10-13
    • JP2010068123
    • 2010-03-24
    • Sony Corpソニー株式会社
    • ABE KAORU
    • H05B33/02H01L51/50H05B33/04
    • G02B5/0215H01L51/5218H01L51/5253H01L51/5268H01L51/5281H01L2251/5315H01L2251/5369Y10T428/24992
    • PROBLEM TO BE SOLVED: To provide an optical function film preventing separation caused by defective bonding or deterioration caused by diffusion of moisture, and a method of manufacturing the same; and to provide a display device restraining degradation of brightness by a view angle and color change therein, and a method of manufacturing the same.SOLUTION: The optical function film 20 is formed by laminating sequentially a lower layer 22 comprising silicon nitride of high density, an intermediate layer 23 comprising silicon nitride of low density, and a surface layer 24 comprising silicon nitride of high density, by a plasma CVD method, on the surface of an organic light-emitting element of a display panel 10. Silicon-containing particles 25 are formed in an inside or an upper face of the intermediate layer 23, by restarting plasma during or after formation of the intermediate layer 23, and irregularities 21 are formed on an upper face of the surface layer 24, by forming the surface layer 24 using the silicon-containing particles 25 as nuclei.
    • 要解决的问题:提供防止由于水分扩散引起的接合不良或劣化引起的光学功能膜及其制造方法; 并且提供抑制其视角和颜色变化引起的亮度劣化的显示装置及其制造方法。解决方案:光学功能膜20依次层叠包含高密度氮化硅的下层22, 包含低密度氮化硅的中间层23和包含高密度氮化硅的表面层24通过等离子体CVD法在显示面板10的有机发光元件的表面上。含硅颗粒25 形成在中间层23的内表面或上表面上,通过在形成中间层23期间或之后重新开始等离子体,并且通过在表面层24的上表面上形成凹凸21,使用 含硅颗粒25为核。
    • 6. 发明专利
    • Thin film semiconductor device, display unit, and manufacturing method of thin film semiconductor device
    • 薄膜半导体器件,显示单元和薄膜半导体器件的制造方法
    • JP2008085251A
    • 2008-04-10
    • JP2006266301
    • 2006-09-29
    • Sony Corpソニー株式会社
    • MORITA YASUAKISHIOTANI TOMOHIROKUBOTA SHINJIABE KAORU
    • H01L21/20H01L21/318H01L21/336H01L29/786
    • H01L29/66765H01L27/1248
    • PROBLEM TO BE SOLVED: To provide a thin film semiconductor device and a display unit with excellent properties in stability by covering a polycrystalline silicon film with an interlayer insulating film, which has a high-level blocking function against contaminants and can repair defects of the polycrystalline silicon film caused by hydrogen supply. SOLUTION: With reference to the semiconductor thin film 9 composed of the polycrystalline silicon film to which annealing treatment is performed by laser irradiation, and the thin film semiconductor device having the interlayer insulating film 11 covering the semiconductor thin film 9, the interlayer insulating film 11 is composed of a hydrogen content silicon nitride film 11-2 which serves as a hydrogen supply portion from the side of the silicon thin film 9 and a blocking silicon nitride film 11-4 of exact film quality used as a blocking portion against contaminants that are laminated in this sequence. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:通过用层间绝缘膜覆盖多晶硅膜来提供具有优异的稳定性的薄膜半导体器件和显示单元,其具有对污染物的高水平阻塞功能并且可以修复缺陷 的多晶硅膜由氢气供应引起。 解决方案:参考由通过激光照射进行退火处理的多晶硅膜构成的半导体薄膜9和具有覆盖半导体薄膜9的层间绝缘膜11的薄膜半导体器件,中间层 绝缘膜11由用作来自硅薄膜9一侧的氢供应部分的氢含量氮化硅膜11-2和用作阻挡部分的精确膜质量的阻挡氮化硅膜11-4组成 以这种顺序层压的污染物。 版权所有(C)2008,JPO&INPIT
    • 8. 发明专利
    • Display device
    • 显示设备
    • JP2007184251A
    • 2007-07-19
    • JP2006322104
    • 2006-11-29
    • Sony Corpソニー株式会社
    • IMAI TOSHIAKIABE KAORUKUBOTA SHINJIMORIKAWA SHINICHIRONISHIMURA TEIICHIRO
    • H05B33/04H01L51/50
    • H01L51/5256
    • PROBLEM TO BE SOLVED: To provide a display device capable of protecting a light-emitting element with its protective film excellent in sealing characteristics and a property for covering stepped side walls, and thereby, the light-emitting element is prevented from degradation and display characteristics is well maintained. SOLUTION: In the display device 1 made up by covering an organic electroluminescent element 3 provided on a substrate 2 with a protective film 2, the protective film 4 has laminated silicon nitride films 4a, 4b, 4c film-formed by a chemical vapor-phase growth using ammonia gas, and at the same time, a high-density silicon nitride film 4c is provided on a surface layer of the protective film 4, under which a low-density silicon nitride film 4b lower in density than the above 4c is provided. COPYRIGHT: (C)2007,JPO&INPIT
    • 解决的问题:提供一种能够以其密封特性优异的保护膜和用于覆盖台阶侧壁的性质来保护发光元件的显示装置,从而防止发光元件劣化 显示特性良好。 解决方案:在通过用设置在基板2上的有机电致发光元件3覆盖保护膜2构成的显示装置1中,保护膜4具有由化学品膜形成的层叠氮化硅膜4a,4b,4c 使用氨气进行气相生长,同时在保护膜4的表面层上设置高密度氮化硅膜4c,在该表面上形成密度低于上述密度的低密度氮化硅膜4b 4c。 版权所有(C)2007,JPO&INPIT
    • 9. 发明专利
    • Mask for vapor deposition, and method for cleaning the same
    • 用于蒸发沉积的掩模,及其清洁方法
    • JP2005171290A
    • 2005-06-30
    • JP2003409997
    • 2003-12-09
    • Sony Corpソニー株式会社
    • MORIKAWA MASAHIROABE KAORU
    • H05B33/10C23C14/04H01L51/50H05B33/14
    • PROBLEM TO BE SOLVED: To provide a film of high accuracy by suppressing changes in mask flatness, opening accuracy or the like by deposition of foreign matters contained in cleaning solution even when a mask for vapor deposition is cleaned and recycled.
      SOLUTION: In a mask 1 for vapor deposition comprising a thin plate-like mask foil 2 having an opening of the shape corresponding to a forming pattern on a work and a frame body 3 to support an area in a vicinity of an outer peripheral edge, a groove part 6 formed with the size according to the size of foreign matters to be removed when cleaning the mask and a through hole 7 to make the groove part 6 communicate with any face other than a supporting face 3a in the frame body 3 are formed in the supporting face 3a of the mask foil 2 in the frame body 3.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:即使当用于气相沉积的掩模被清洁和再循环时,通过抑制清洁溶液中包含的异物的沉积来抑制掩模平整度,打开精度等的改变来提供高精度的膜。 解决方案:在用于气相沉积的掩模1中,包括具有对应于工件上的成形图案的形状的开口的薄板状掩模箔2和用于支撑外部附近的区域的框架体3 周缘,形成有根据在清洁面罩时要除去的异物尺寸的凹槽部分6和通孔7,以使槽部分6与框架体中的支撑面3a以外的任何表面连通 3形成在框体3中的掩模箔2的支撑面3a上。版权所有(C)2005,JPO&NCIPI