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    • 1. 发明专利
    • Hologram element, manufacturing method thereof and hologram laser unit
    • HOLOGRAM元件,其制造方法和激光激光单元
    • JP2006201588A
    • 2006-08-03
    • JP2005014290
    • 2005-01-21
    • Sharp Corpシャープ株式会社
    • TAKEMORI HIROTOSHI
    • G02F1/13G02B5/32G11B7/125
    • PROBLEM TO BE SOLVED: To provide a hologram element which can be manufactured relatively easily at a low cost, to provide a manufacturing method of the hologram element and to provide a hologram laser unit provided with the hologram element. SOLUTION: A hologram pattern 33 is formed on one surface part in the thickness direction of a substrate 31. The hologram pattern 33 refracts incident light to a predetermined direction, concretely to the direction of a photoreceptor element. A liquid crystal panel 80 which adjusts transmittance in accordance with a region of the hologram pattern 33 is disposed on a part besides the region of the hologram pattern 33 among the one surface part in the thickness direction of a substrate 31. By controlling a voltage applied to the liquid crystal panel 80 disposed on the one surface part in the thickness direction of a substrate 31, the transmittance in accordance with the region of the hologram pattern 33 can be adjusted. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供可以以低成本相对容易地制造的全息元件,以提供全息元件的制造方法,并提供设置有全息元件的全息图激光单元。 解决方案:在基板31的厚度方向上的一个表面部分上形成全息图形33.全息图形33将入射光折射到预定的方向,具体地说是相对于感光体元件的方向。 在基板31的厚度方向的一个表面部分之外的除了全息图形33的区域之外的部分上,还设置有根据全息图形33的区域来调节透射率的液晶面板80.通过控制施加的电压 对于设置在基板31的厚度方向上的一个表面部分上的液晶面板80,可以调节根据全息图图案33的区域的透射率。 版权所有(C)2006,JPO&NCIPI
    • 2. 发明专利
    • Hologram element, method for manufacturing the same and hologram laser unit
    • HOLOGRAM元件,其制造方法和激光激光单元
    • JP2004347724A
    • 2004-12-09
    • JP2003142589
    • 2003-05-20
    • Sharp Corpシャープ株式会社
    • TAKEMORI HIROTOSHI
    • G02B5/18G02B5/32G03H1/04G03H1/18G11B7/125G11B7/22
    • PROBLEM TO BE SOLVED: To make it possible to easily identify kinds of hologram elements with the naked eye and to manufacture a variety of hologram elements at a low cost. SOLUTION: This hologram element 10 has colored members 4 for element identification at the outside of a hologram pattern 3 which is a diffraction pattern disposed on one surface of a substrate 1. The kind of this hologram element 10 can be identified only by the color of the colored members 4 with the naked eye and it is not necessary to magnify a kind identifying mark through a microscope unlike a conventional hologram element. Since the colored members 4 are disposed in grooves in cutting marks 5 at the outside of the hologram pattern 3, the element can be divided in a good state with no rise of the colored members in a dicing step. The grooves can be formed in a photolithographic step and an etching step of forming the hologram pattern 3. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了能够用肉眼容易地识别各种全息元件,并以低成本制造各种全息元件。 解决方案:该全息元件10具有着色部件4,用于在全息图形3的外侧进行元件识别,该全息图形3是设置在基板1的一个表面上的衍射图案。该全息元件10的种类仅能由 彩色构件4的肉眼的颜色,并不像传统的全息元件那样通过显微镜放大一种识别标记。 由于着色部件4配置在全息图形3的外侧的切痕5的槽内,所以在切割工序中,可以将元件分割成良好的状态而不着色部件的上升。 凹槽可以在光刻步骤和形成全息图模式3的蚀刻步骤中形成。版权所有(C)2005,JPO&NCIPI
    • 3. 发明专利
    • Manufacturing method of hologram element and optical pickup device
    • HOLOGRAM元件和光学拾取器件的制造方法
    • JP2007026589A
    • 2007-02-01
    • JP2005210025
    • 2005-07-20
    • Sharp Corpシャープ株式会社
    • TAKEMORI HIROTOSHI
    • G11B7/22G02B27/28G03H1/04G11B7/135
    • PROBLEM TO BE SOLVED: To provide a manufacturing method of a hologram element capable of obtaining a high primary diffraction efficiency in each area and obtaining an almost fixed value as primary diffraction efficiency in each area even though grating intervals of diffraction grating of hologram patterns formed in a plurality of respective areas are different. SOLUTION: After forming a photosensitive material film 44 on the surface of a transparent substrate 41, the first hologram pattern 42 of the first area and the second hologram pattern 43 of the second area with different grating intervals are respectively developed as mask patterns 44a and 44b by a suitable exposure amount corresponding to the grating interval of each area. Thereafter, etching is applied to form the first hologram pattern 42 and the second hologram pattern 43, thereby being able to form a diffraction grating, as a diffraction grating of a hologram pattern of each area, wherein a duty ratio being a ratio of the width of a protruding part to the grating interval is suitable and the values of duty ratios between the respective areas are almost equal. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种全息元件的制造方法,其能够在每个区域中获得高的一次衍射效率,并获得几乎固定的值作为每个区域的主要衍射效率,即使全息图的衍射光栅的光栅间隔 形成在多个相应区域中的图案是不同的。 解决方案:在透明基板41的表面上形成感光材料薄膜44之后,将具有不同光栅间隔的第一区域的第一全息图图案42和第二区域的第二全息图图形43分别显影为掩模图案 44a和44b通过对应于每个区域的光栅间隔的合适的曝光量。 此后,施加蚀刻以形成第一全息图图案42和第二全息图图案43,从而能够形成衍射光栅,作为每个区域的全息图图案的衍射光栅,其中占空比是宽度 对于光栅间隔的突出部分是合适的,并且各个区域之间的占空比的值几乎相等。 版权所有(C)2007,JPO&INPIT
    • 4. 发明专利
    • Hologram element, manufacturing method therefor, and electro-optical component
    • HOLOGRAM元件,其制造方法和电光元件
    • JP2005195965A
    • 2005-07-21
    • JP2004003164
    • 2004-01-08
    • Sharp Corpシャープ株式会社
    • TAKEMORI HIROTOSHITSUJIMURA MASAHIRO
    • G02B5/32G02B5/18G03H1/02
    • G03H1/02G02B5/32G03H2250/39
    • PROBLEM TO BE SOLVED: To prevent a crack from occurring in a hologram element by reducing the swelling distortion of a substrate.
      SOLUTION: The hologram element includes a substrate on which a hologram diffraction grating is formed, and a low moisture permeable membrane covering the hologram diffraction grating, and has an exposed area which is not covered with the low moisture permeable membrane. Generally, an occurrence percentage of cracks is influenced by the swelling distortion caused by the hygroscopic property of the substrate. Since the hologram element of this invention has an exposed area which is not covered with the low moisture permeable membrane on the substrate, the element can absorb moisture also from the surface with the low moisture permeable membrane formed thereon, therefore, the swelling distortion is relaxed and the cracks are prevented from occurring.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:通过减少基板的膨胀变形来防止全息元件中的裂纹发生。 解决方案:全息元件包括其上形成有全息衍射光栅的基板和覆盖全息衍射光栅的低透湿膜,并且具有未被低透湿膜覆盖的曝光区域。 通常,裂纹的发生百分比受到由基材的吸湿性引起的溶胀变形的影响。 由于本发明的全息元件具有未被基底上的低透湿膜覆盖的曝光区域,所以该元件也可以从形成在其上的低透湿膜的表面吸收水分,因此膨胀变形松弛 并且防止发生裂纹。 版权所有(C)2005,JPO&NCIPI