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1. 发明专利

JP2008169471A Coating system, coating method, and coated goods 有权
标题翻译：涂料体系，涂料方法和涂料
公开(公告)号：JP2008169471A
公开(公告)日：2008-07-24
申请号：JP2007290709
申请日：2007-11-08
申请人： Schott Ag , ショットアクチエンゲゼルシャフトSchott AG
发明人： MOELLE CHRISTOPH , BEWIG LARS , KUEPPER THOMAS
IPC分类号： C23C16/515 , B05D1/36 , C23C16/455
CPC分类号： C23C16/515 , C23C16/45512 , C23C16/45523 , C23C16/45591
摘要： PROBLEM TO BE SOLVED: To provide a coating system for supplying a process gas for a targeted layer containing no impurity accurately in time and quantity as much as possible in CVD method including PECVD method and PICVD method, and a coating method and coated goods. SOLUTION: In the coating system 1 for coating goods by overlapping layers, the process gas is introduced to a mixing point 11 alternately, mixed with another gas, and guided to a reaction chamber 7, in which deposits are formed by producing a plasma. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供一种用于在包括PECVD方法和PICVD方法的CVD方法中尽可能多地在时间和数量上精确地供应不含杂质的目标层的处理气体的涂料体系，以及涂布方法和涂布产品。解决方案：在用于通过重叠层涂覆商品的涂覆系统1中，将处理气体交替地引入混合点11，与另一种气体混合，并被引导到通过产生沉积物形成的反应室7 等离子体。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2006028639A Coated substrate with curved surface, and method for production of such coated substrate 有权
标题翻译：具有弯曲表面的涂覆基板，以及这种涂覆基板的制造方法
公开(公告)号：JP2006028639A
公开(公告)日：2006-02-02
申请号：JP2005068651
申请日：2005-03-11
申请人： Schott Ag , ショットアクチエンゲゼルシャフトSchott AG
发明人： KUEPPER THOMAS , WITTENBERG DIETER , MOELLE CHRISTOPH , ZOGG LUTZ
IPC分类号： C23C14/04 , B05D1/32 , B32B7/02 , C23C14/34 , C23C16/04
CPC分类号： B41J3/4073 , C03C17/005 , C03C2218/34 , C23C14/042 , C23C16/042 , G02B1/10 , G02B5/201 , G02B5/285 , H01J9/20 , H01K3/005 , Y10T428/24628
摘要： PROBLEM TO BE SOLVED: To provide a method for production of a substrate having a patterned optical coating on a curved surface, including steps of: applying a masking to a sub-area of the curved surface; applying an optical coating using a vacuum deposition method; and removing the masking. SOLUTION: The coated substrate includes a curved surface that is provided with at least one patterned optical coating. The at least one patterned optical coating is provided on at least one sub-area of the curved surface and is missing on at least one adjacent sub-area. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在弯曲表面上具有图案化光学涂层的基板的制造方法，包括以下步骤：对弯曲表面的子区域施加掩模; 使用真空沉积法应用光学涂层; 并去除掩蔽。涂覆的基材包括具有至少一个图案化的光学涂层的弯曲表面。至少一个图案化光学涂层设置在曲面的至少一个子区域上，并且在至少一个相邻子区域上缺失。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2012062579A Method and apparatus for plasma enhanced chemical vapor deposition 有权
标题翻译：用于等离子体增强化学蒸气沉积的方法和装置
公开(公告)号：JP2012062579A
公开(公告)日：2012-03-29
申请号：JP2012000402
申请日：2012-01-05
申请人： Schott Ag , ショットアクチエンゲゼルシャフトSchott AG
发明人： KUEPPER THOMAS , BEWIG LARS , MOELLE CHRISTOPH , BRANDT LARS , NIKLOS THOMAS
IPC分类号： C23C16/515
CPC分类号： C23C16/405 , C23C16/402 , C23C16/505 , C23C16/511 , C23C16/52 , H01J37/32266
摘要： PROBLEM TO BE SOLVED: To reduce the heating of substrates during plasma enhanced chemical vapor deposition.SOLUTION: A method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least a part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in the form of a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in the form is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.
摘要翻译：要解决的问题：为了减少等离子体增强化学气相沉积期间的衬底的加热。提供了一种通过等离子体增强气相沉积来涂覆衬底的方法和装置，其中待涂覆的衬底的衬底表面的至少一部分周围环境被抽真空，并且处理气体具有允许用于涂层的起始物质，其中通过在填充有工艺气体的基底表面的周围的电磁能中辐射的等离子体来沉积涂层。电磁能以多种脉冲序列的形式辐射，优选为微波或射频脉冲，其中多个脉冲通过第一次间歇在时间上间隔开，其中以间隔辐射的形式的电磁能被截止，其中脉冲序列之间的间隔比脉冲序列内的脉冲之间的第一次间隔长度至少为3倍，优选至少5倍。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2008121116A Method and apparatus for plasma enhanced chemical vapor deposition 有权
标题翻译：用于等离子体增强化学蒸气沉积的方法和装置
公开(公告)号：JP2008121116A
公开(公告)日：2008-05-29
申请号：JP2007291900
申请日：2007-11-09
申请人： Schott Ag , ショットアクチエンゲゼルシャフトSchott AG
发明人： KUEPPER THOMAS , BEWIG LARS , MOELLE CHRISTOPH , BRANDT LARS , NIKLOS THOMAS
IPC分类号： C23C16/511 , C23C16/515
CPC分类号： C23C16/405 , C23C16/402 , C23C16/505 , C23C16/511 , C23C16/52 , H01J37/32266
摘要： PROBLEM TO BE SOLVED: To reduce the heating of substrates during plasma enhanced chemical vapor deposition.
SOLUTION: For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in the form of a multiplicity of pulse sequences, preferably microwave or radio frequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了减少等离子体增强化学气相沉积期间的衬底的加热。解决方案：为了这个目的，提供了一种通过等离子体增强气相沉积来涂覆衬底的方法和装置，其中待涂覆的衬底表面的至少部分周围环境被抽真空，并且处理气体允许用于涂层的起始物质，其中通过在填充有工艺气体的基底表面的周围的电磁能量中辐射的等离子体来沉积涂层。电磁能以多种脉冲序列的形式被辐射，优选地是微波或射频脉冲，其中多个脉冲通过第一次间歇在时间上间隔开，其中辐射的电磁能在中断期间被关闭，并且其中脉冲序列之间的间隔至少比脉冲序列内脉冲之间的第一次间隔长3倍，优选至少5倍。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2005193986A Container with internal color decoration 有权
标题翻译：集装箱内部装饰
公开(公告)号：JP2005193986A
公开(公告)日：2005-07-21
申请号：JP2005003538
申请日：2005-01-11
申请人： Schott Ag , ショットアーゲーSchott Ag
发明人： GEISLER STEFAN , BAIN DAVID , BEWIG LARS , MOELLE CHRISTOPH , KUEPPER THOMAS
IPC分类号： A45D33/18 , A45D34/00 , B65D23/00 , B65D23/02 , B65D25/14
CPC分类号： A45D33/18 , A45D34/00 , A45D2034/007 , A45D2200/053 , B65D23/02 , B65D2203/00
摘要： PROBLEM TO BE SOLVED: To extend the moldability of a container, especially of a perfume bottle and to practically exclude the reaction of the component of color decoration with the component of a product in the container with the decoration, especially in the perfume bottle. SOLUTION: This relates to a container (1) including a hollow body (2) which is at least partially transparent and color decoration (3). The decoration (3) includes at least the internal lining (35) of the hollow body (2). The container includes, particularly, the hollow body (2), includes the first area (20) in which the body (2) is at least partially transparent, color decoration (3) at least in the second area (30) on the inside (22) of the body (2), and the third area (40) connected with the area (20) and/or the second area (30). COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了延长容器，特别是香水瓶的成型性，并且实际上排除了颜色装饰的组分与容器中的产品的组分与装饰物的反应，特别是在香料中瓶子。解决方案：本发明涉及包括至少部分透明的中空体（2）和颜色装饰（3）的容器（1）。装饰物（3）至少包括中空体（2）的内衬（35）。容器特别地包括中空体（2），包括其中主体（2）至少部分透明的第一区域（20），至少在内部的第二区域（30）中的颜色装饰（3）（22）和与区域（20）和/或第二区域（30）连接的第三区域（40）。版权所有（C）2005，JPO＆NCIPI

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