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1. 发明专利

JP2008145328A Method and apparatus for inspecting slider 审中-公开
标题翻译：检查滑块的方法和装置
公开(公告)号：JP2008145328A
公开(公告)日：2008-06-26
申请号：JP2006334355
申请日：2006-12-12
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI , SATO KEIICHI
IPC分类号： G01N21/88 , G11B5/31 , G11B5/455
CPC分类号： G11B5/102 , G01N21/95 , G11B5/3166 , G11B5/3173 , G11B5/3189
摘要： PROBLEM TO BE SOLVED: To efficiently carry out an appearance inspection of a slider while suppressing influences on the slider.
SOLUTION: A method for inspecting the slider in such a rover state that two or more rectangular sliders are arranged on a line in the longitudinal direction comprises: a supporting step of supporting a rover B such that a first normal vector V1 extending from a first plane M1 and a second normal vector V2 extending from a second plane M2 adjacent to the first plane M1 which are selected from four normal vectors extending to the outside of the slider from four planes of the slider being set as respective start points and excepting both side planes along the longitudinal direction of the rover B, have upward components respectively in the vertical direction; and an inspecting step of optically inspecting the first plane M1 of the slider in the supported rover by using a first inspection means 11 and optically inspecting the second plane M2 by using a second inspection means 12.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在抑制对滑块的影响的同时有效地进行滑块的外观检查。解决方案：一种用于在这样的流动站状态下检查滑块的方法，即在纵向方向上的一条直线上布置两个或更多个矩形滑动件包括：支撑步骤，支撑流动站B，使得从第一法线向量V1延伸从与从第一平面M1相邻的第二平面M2延伸的第一平面M1和第二法线向量V2从从滑块的四个平面延伸到滑块的外部的四个法向矢量中选择，其被设置为相应的起始点，并且除了沿着流动站B的长度方向的两侧平面分别在垂直方向上具有向上的分量; 以及检查步骤，通过使用第一检查装置11光学地检查支撑的流动站中的滑块的第一平面M1，并且通过使用第二检查装置12光学地检查第二平面M2。（C）2008年， JPO＆INPIT

2. 发明专利

JP2007004909A Apparatus and method for manufacturing magnetic head slider 有权
标题翻译：用于制造磁头滑块的装置和方法
公开(公告)号：JP2007004909A
公开(公告)日：2007-01-11
申请号：JP2005184561
申请日：2005-06-24
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI
IPC分类号： G11B21/21 , G11B5/60
CPC分类号： B24B41/06 , B24B27/06 , B24B37/048 , G11B5/3116 , Y10T29/49025 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048
摘要： PROBLEM TO BE SOLVED: To improve quality of a product while simplifying a production process and shortening manufacturing time. SOLUTION: This apparatus is provided with: holding means 1 and 2 for holding both ends of a block member 10; a cutting means 31 for cutting a part from the block member 10 to form a magnetic slider; and cut surface machining means 32 and 33 having cut surface machining parts for machining cut surfaces for forming predetermined two surfaces of the magnetic head slider while being mutually opposed. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提高产品质量，同时简化生产过程并缩短生产时间。解决方案：该装置设置有用于保持块构件10的两端的保持装置1和2; 切割装置31，用于从块构件10切割一部分以形成磁性滑块; 切割表面加工装置32和33具有用于加工切割表面的切割表面加工部件，用于形成相互相对的磁头滑块的预定两个表面。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2008146787A Method of manufacturing slider 审中-公开
标题翻译：制造滑块的方法
公开(公告)号：JP2008146787A
公开(公告)日：2008-06-26
申请号：JP2006335566
申请日：2006-12-13
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI , KYO SHO
IPC分类号： G11B5/31 , G11B5/39 , G11B5/60
摘要： PROBLEM TO BE SOLVED: To polish a medium facing surface of a slider while considering an operation temperature.
SOLUTION: A method of polishing a slider includes a step S4 for raising the temperature of a polishing face of a surface plate to be used in polishing of a slider to an operation temperature of the slider, and a step S5 for polishing a medium facing surface of the slider while pressing it against the polishing face whose temperature is raised to the operation temperature.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：在考虑操作温度的同时抛光滑块的面向中的表面。解决方案：抛光滑块的方法包括步骤S4，用于将滑块的抛光中使用的表面板的抛光面的温度升高到滑块的操作温度;以及步骤S5，用于抛光滑块同时将其压靠在温度升高到操作温度的抛光面上。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008010029A Slider inspection method and inspection device 审中-公开
标题翻译：滑动检测方法和检查装置
公开(公告)号：JP2008010029A
公开(公告)日：2008-01-17
申请号：JP2006176617
申请日：2006-06-27
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI
IPC分类号： G11B5/60 , G01N21/956
CPC分类号： G01N21/9515 , G01N21/13 , G01N21/95692
摘要： PROBLEM TO BE SOLVED: To efficiently perform visual inspection of a slider while suppressing effect on the slider.
SOLUTION: The slider inspection method for the slider having an approximately rectangular parallelepiped shape includes movement steps (S2, S3) moving the slider upward and stop it at an inspection position while supporting the slider in a state where a surface other than a medium facing surface or a first surface to be the medium facing surface is made as a lower surface; and an inspection step (S4) inspecting the first surface by a first camera installed with an optical axis adjusted to the inspection position in advance and simultaneously inspecting a second surface of the slider that is different from the first surface and different from the lower surface by a second camera installed with the optical axis adjusted to the inspection position in advance.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了有效地执行滑块的目视检查，同时抑制对滑块的影响。解决方案：具有大致长方体形状的滑块的滑块检查方法包括向上移动滑块的移动台阶（S2，S3），并将其停止在检查位置，同时在滑块的表面不同于中等面向表面或作为介质面对表面的第一表面被制成下表面; 以及检查步骤（S4），由预先调整到检查位置的光轴安装的第一照相机检查第一表面，同时检查与第一表面不同的不同于下表面的滑块的第二表面，预先将安装有光轴的第二相机调整到检查位置。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2008217921A Probe assembly, device and method for polishing bar 有权
标题翻译：探针组件，抛光棒的装置和方法
公开(公告)号：JP2008217921A
公开(公告)日：2008-09-18
申请号：JP2007055568
申请日：2007-03-06
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI , HONDA TAKASHI , TSUCHIYA HIROYASU , HOSAKA KOJI
IPC分类号： G11B5/31 , B24B49/10 , G11B5/39
CPC分类号： G11B5/102 , B24B37/005 , B24B37/048 , B24B49/16 , G11B5/3166 , G11B5/3169 , G11B5/3173
摘要： PROBLEM TO BE SOLVED: To facilitate alignment of a probe with an electrode pad by suppressing the influence of electrostatic discharge damage, contamination or the like to shorten reading time. SOLUTION: The probe assembly 10 includes an elastically bending deformable probe 11, and a stopper 21 for applying bending deformation to the probe 11 so as to generate a first bending displacement D1 at a tip of the probe and holding the tip at the first bending displacement D1 while preventing a bending displacement smaller than the first bending displacement D1 in the tip. The tip of the probe 11 receives a second bending displacement larger than the first bending displacement D1 in the same direction as that of the first bending displacement D1 to abut on an electrode pad 42 disposed on a surface other than a bar polishing surface 43. Thus, electrical connection is established between the probe 11 and the electrode pad 42. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了便于通过抑制静电放电损伤，污染等的影响来缩短探针与电极焊盘的对准以缩短读取时间。解决方案：探针组件10包括弹性弯曲可变形探针11和用于向探针11施加弯曲变形的止动件21，以在探针的尖端处产生第一弯曲位移D1并将尖端保持在第一弯曲位移D1，同时防止小于尖端中的第一弯曲位移D1的弯曲位移。探头11的尖端在与第一弯曲位移D1相同的方向上接收大于第一弯曲位移D1的第二弯曲位移，以邻接设置在除了抛光表面43以外的表面上的电极焊盘42上。因此在探针11和电极垫42之间建立电连接。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007268658A Polishing sheet and polishing method 审中-公开
标题翻译：抛光片和抛光方法
公开(公告)号：JP2007268658A
公开(公告)日：2007-10-18
申请号：JP2006097354
申请日：2006-03-31
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , Tmp Co Ltd , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited , 株式会社Tmp
发明人： NATSUI HIDEAKI , SAITO MAKOTO , ORII KAZUYA , FUJII TAKASHI , HOSAKA KOJI
IPC分类号： B24D11/00 , B24B37/20 , G11B5/31 , G11B5/39 , G11B5/60
CPC分类号： B24B7/228 , B24B37/048 , B24B37/26
摘要： PROBLEM TO BE SOLVED: To solve the problem that when partial recessed parts such as concentric circles or dot patterns are formed in a polishing layer, the discharge efficiency of a liquid lubricant is low so that polishing chips stay on the polishing surface, and in the radial or swirl state, the linear direction of the recessed part of the polishing layer acts almost in parallel to the material to be polished, so that damage to the material to be polished is large, resulting in the problem such as scratches on the surface to be polished and the lowering of a polishing rate, and further the problem of lowering of the durability of the polishing sheet. SOLUTION: In this polishing sheet, a polishing layer pattern 15 formed of a projecting part is formed on at least one side of a substrate sheet. In the polishing sheet, the polishing layer pattern is formed as a one plane curve pattern rotated twice or more spirally in the direction of constantly separating from the center point around the center point of the substrate sheet. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题为了解决在抛光层中形成诸如同心圆或点图案的部分凹陷部分的问题，液体润滑剂的排放效率低，因此抛光芯片停留在抛光表面上，并且在径向或旋转状态下，抛光层的凹陷部分的线性方向几乎与待抛光材料平行，因此对待抛光材料的损坏较大，导致诸如划痕待抛光表面和抛光速率的降低，进一步降低抛光片的耐久性的问题。解决方案：在该抛光片中，在基片的至少一侧上形成由突出部形成的抛光层图案15。在抛光片中，抛光层图案形成为沿着与基板的中心点相对的中心点恒定分离的方向旋转两次或更多次的单平面曲线图案。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2007149158A Slider and its manufacturing method 审中-公开
标题翻译：滑动器及其制造方法
公开(公告)号：JP2007149158A
公开(公告)日：2007-06-14
申请号：JP2005338485
申请日：2005-11-24
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI , HUANG JIAN HUI
IPC分类号： G11B5/31 , G11B5/187 , G11B5/60
CPC分类号： G11B5/3166 , G11B5/3106 , G11B5/3169 , G11B5/3173 , G11B5/6005
摘要： PROBLEM TO BE SOLVED: To obtain sufficient adhesion properties with a substrate not using an intermediate layer (adhesion layer) but using only a DLC film.
SOLUTION: The slider includes a medium facing surface ABS structured to face a recording medium, and a protective film 42 covering at least a part of the medium facing surface ABS. The protective film 42 includes a first protective film 42a formed in contact with the medium facing surface ABS and consisting of an amorphous material having the main components of carbon and hydrogen, and a second protective film 42b formed so as to cover the first protective film 42a and consisting of an amorphous material having the main components of carbon and hydrogen. The atomic fraction of hydrogen of the second protective film 42b is smaller than that of the first protective film 42a.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了获得与不使用中间层（粘合层）但仅使用DLC膜的基材的充分的粘合性能。解决方案：滑块包括构造成面对记录介质的介质面向表面ABS，以及覆盖介质面向表面ABS的至少一部分的保护膜42。保护膜42包括与介质对向表面ABS接触形成的第一保护膜42a，其由具有碳和氢的主要成分的非晶材料构成，第二保护膜42b形成为覆盖第一保护膜42a 并且由具有碳和氢的主要成分的无定形材料组成。第二保护膜42b的氢原子分数小于第一保护膜42a的原子分数。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006059501A Manufacturing method of slider 审中-公开
标题翻译：滑块制造方法
公开(公告)号：JP2006059501A
公开(公告)日：2006-03-02
申请号：JP2004242683
申请日：2004-08-23
申请人： Sae Technologies (Hk) Ltd , Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd. , 新科技研有限公司SAE Technologies(H.K.)Limited
发明人： FUJII TAKASHI
IPC分类号： G11B5/60 , G11B5/31 , G11B21/21
摘要： PROBLEM TO BE SOLVED: To suppress variations in smoothness of the protruding part (the rail part) of a slider.
SOLUTION: The manufacturing method of the slider has a step (step 54) for forming a temporary protective film on the face opposed to a recording medium of the slider, a rugged part formation step (step 55) for forming a rugged part which controls the flying height with respect to the recording medium of the slider when time a thin film magnetic head element performs read or write from/to the recording medium on the face opposed to the recording medium by removing a part of the surface of the face opposed to the recording medium on which the temporary protective film is formed, and a temporary protective film removal step (step 56) for removing the temporary protective film from the face opposed to the recording medium on which the rugged part is formed.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：抑制滑块的突出部分（轨道部分）的平滑度的变化。解决方案：滑块的制造方法具有在与滑块的记录介质相对的面上形成临时保护膜的步骤（步骤54），用于形成凹凸部的凹凸部形成步骤（步骤55）当薄膜磁头元件在与记录介质相对的面上对记录介质执行读取或写入时，通过去除表面的一部分表面来控制相对于滑块的记录介质的飞行高度与形成有临时保护膜的记录介质相对，以及临时保护膜去除步骤（步骤56），用于从与其上形成有凹凸部分的记录介质相对的表面去除临时保护膜。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2009076122A Magnetic head and manufacturing method thereof 审中-公开
标题翻译：磁头及其制造方法
公开(公告)号：JP2009076122A
公开(公告)日：2009-04-09
申请号：JP2007242263
申请日：2007-09-19
申请人： Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd.
发明人： FUJII TAKASHI
IPC分类号： G11B5/31 , G11B5/39 , G11B5/60
CPC分类号： G11B5/3166 , G11B5/3163 , G11B5/3169 , G11B5/3173 , Y10T428/11
摘要： PROBLEM TO BE SOLVED: To precisely form the magnetic height of a reproduction element and that of a recording element by simple and quick processing in a magnetic head. SOLUTION: The magnetic head 2 has: a reproduction element 7 for reading magnetic information; a recording element 8 for writing magnetic information; a reproduction element marker 11 formed on the same plane as the reproduction element 7; and a recording element marker 12 formed on the same plane as the recording element 8. A plurality of magnetic heads 2 are formed on a substrate 1. The substrate 1 is cut to form a bar 14 including the plurality of magnetic heads 2. The bar 14 is held. The reproduction marker 11 and the recording element marker 12 of the held bar 14 are detected optically and their positions are obtained. Based on them, the posture of the held bar 14 is adjusted. The bar 14 whose posture is adjusted is polished. The polished bar 14 is separated for each magnetic head 2. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过在磁头中的简单且快速的处理来精确地形成再现元件的磁高度和记录元件的磁高度。解决方案：磁头2具有：用于读取磁信息的再现元件7; 用于写入磁信息的记录元件8; 形成在与再现元件7相同的平面上的再现元件标记11; 以及形成在与记录元件8相同的平面上的记录元件标记12.多个磁头2形成在基板1上。基板1被切割以形成包括多个磁头2的条14。 14日举行。被保持的条14的再现标记11和记录元件标记12被光学检测，并且获得它们的位置。基于它们，调节保持杆14的姿势。调整其姿势的杆14被抛光。抛光棒14为每个磁头2分开。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008296307A Apparatus and method for polishing slider 审中-公开
标题翻译：抛光滑块的设备及方法
公开(公告)号：JP2008296307A
公开(公告)日：2008-12-11
申请号：JP2007143192
申请日：2007-05-30
申请人： Shinka Jitsugyo Kk , 新科實業有限公司SAE Magnetics(H.K.)Ltd.
发明人： FUJII TAKASHI , HOSAKA KOJI
IPC分类号： B24B37/04 , B24B37/12 , B24B53/017 , G11B5/31
摘要： PROBLEM TO BE SOLVED: To provide a polishing apparatus which improves the efficiency for burying abrasive grains while keeping the flatness of a polishing surface plate. SOLUTION: The apparatus 1 for polishing a slider comprises: a rotatable polishing plate 2 having a polishing surface 2a for polishing the slider; a slurry supplying means for supplying slurry including abrasive grains on the polishing surface; a condition ring 8 which is arranged so as to be opposed to the polishing surface of the polishing plate, and keeps the flatness of the polishing surface by being pressed to the polishing surface of the rotating polishing plate; a charging unit 9 which has a burying ring 16 arranged so as to be opposed to the polishing surface of the polishing surface plate, and buries the abrasive grains included in the slurry supplied by means of the slurry supplying means by pressing the burying ring 16 against the polishing surface of the rotating polishing plate; and a slider holding means 10 which holds the slider, and presses the surface to be polished of the slider to the polishing surface. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种提高磨粒磨粒效率同时保持研磨面板的平坦度的抛光装置。解决方案：用于抛光滑块的装置1包括：具有用于抛光滑块的抛光表面2a的可旋转抛光板2; 浆料供给装置，用于在抛光表面上提供包括磨粒的浆料; 与抛光板的研磨面相对配置的状态环8，通过压在旋转研磨板的研磨面上来保持研磨面的平坦度; 充电单元9具有布置成与抛光表面板的抛光表面相对的埋置环16，并且通过将埋入环16压靠在浆料供给装置中而供给的浆料中所包含的磨料颗粒抵住旋转抛光板的抛光表面; 以及滑块保持装置10，其保持滑块，并将滑块的待抛光表面按压到抛光表面。版权所有（C）2009，JPO＆INPIT

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