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1. 发明专利

JPH01306174A POLISHING DEVICE FOR SUBSTRATE OF MAGNETIC DISK 失效
公开(公告)号：JPH01306174A
公开(公告)日：1989-12-11
申请号：JP13447788
申请日：1988-06-02
申请人： SONY CORP
发明人： NAKAMURA ZENKICHI , WATANABE HIDEKI , SHIMURA HIDEYUKI
IPC分类号： B24B37/00 , B24B37/04 , G11B5/84
摘要： PURPOSE:To use by circulating the polishing liquid fed from the following tank and to reduce the consumption of the polishing liquid necessary for polishing a drain passage for recovering a used polishing liquid and a feeding pump for feeding this recovered polishing liquid to a polishing liquid feeding tank. CONSTITUTION:A polishing liquid 16 is fed to a magnetic disk substrate from a feeding tank 3 and both faces of the substrate between upper and lower surface plates 1, 2 are subjected to polishing by a polishing liquid 16. The polishing liquid 16 of after this work is recovered to a 1st drain passage 6 and recovered further to a 2nd drain passage 8 via a switching valve 7. The polishing liquid 16 recovered by the 2nd drain passage 8 is reutilized by its circulation by being fed to a feeding tank 3 by a feeding pump 10. As a result, the consumption of the polishing liquid 16 can drastically be reduced. On the other hand, the stain of the upper and lower surface plates 1, 2 is cleaned by a pure water 20 and the pure water 20 of after cleaning is discharged out of the device through a 1st drain passage 6, the switching valve 7 and a 3rd drain passage 9.

2. 发明专利

JPH01304174A POLISHING FLUID AND METHOD OF POLISHING HARD DISC BASE PLATE 失效
公开(公告)号：JPH01304174A
公开(公告)日：1989-12-07
申请号：JP13447888
申请日：1988-06-02
申请人： SONY CORP
发明人： NAKAMURA ZENKICHI , MIYAZAWA KUNIO , WATANABE HIDEKI , SHIMURA HIDEYUKI
IPC分类号： B24B37/00 , C09K3/14 , G11B5/84
摘要： PURPOSE:To accomplish a high surface roughness of a polishing fluid comprising a dispersion of a polishing agent consisting mainly of sintered abrasive grains in a solvent by incorporating a small amount of crushed abrasive grains having a diameter larger than that of the sintered grains and preferably PVA as anti- settling agent into the fluid. CONSTITUTION:A polishing fluid is obtained by dispersing a polishing agent consisting of, e.g., 100 pts.wt. sintered abrasive grains having a grain diameter of about 6mum and 1-30 pts.wt. crushed alumina grains having a grain diameter of about 10mum in an aqueous solvent, the ratio of the polishing agent to water being about 1:2, and incorporating 0.3-3wt.%, based on the total polishing fluid, PVA as ante-setting agent into the dispersion. For example, a suede-type nonwoven polishing fabric is used with this polishing fluid to polish a hard disc under conditions of, e.g., a rotational speed of an upper surface plate of 60r.p.m., a processing pressure of 50kg/cm , and a polishing fluid feed rate of 100m1/min.

3. 发明专利

JPH1064527A CUTTING DEVICE FOR BATTERY ELECTRODE WEB AND CUTTING DEVICE FOR MEMBER 失效
公开(公告)号：JPH1064527A
公开(公告)日：1998-03-06
申请号：JP24139896
申请日：1996-08-23
申请人： SONY CORP , TOYO KNIFE
发明人： KATAYAMA KIYOSHI , SHIMIZU TATSUO , KOIKE TAKESHI , IMAIZUMI KAZUHIRO , HASHIMOTO ZENZO , WATANABE HIDEKI , SHIMURA HIDEYUKI , IMAIZUMI KOUKI , TAJIMA AKIRA , OKAMOTO TAKESHI
IPC分类号： B26D1/24 , H01M4/139 , H01M10/05 , H01M4/04 , H01M10/38 , H01M10/40
摘要： PROBLEM TO BE SOLVED: To provide a cutting device for a battery electrode web by which the web can be cut with good precision allowing no quality deterioration such as the occurrence of a flare or the marking of a knife mark in the vicinity of an electrode element cut. SOLUTION: First elastic ring 10 is closely stuck on first round blade 3 along the outer periphery of the first round blade 3 at a portion where the same is lapped on the first round blade 3. A belt-like member cut from an web by the first round blade 3 and second round blade 4 is advanced in sandwiched state between the first round blade 3 and the first elastic ring 10, and is kept being sandwiched between the first round blade 3 and the first elastic ring 10 until passing a range sandwiched between the side faces of next second round blades 4, 4. Accordingly, the cut belt-like member from the web can escape from between both side faces of two second round blades 4 easily without producing any waving phenomenon. Likewise, the belt-like member sandwiched between the second round blade 4 and second elastic ring 13 can do.

4. 发明专利

JPH02123520A SUBSTRATE FOR MAGNETIC DISK AND ITS PRODUCTION 失效
公开(公告)号：JPH02123520A
公开(公告)日：1990-05-11
申请号：JP27608288
申请日：1988-11-02
申请人： SONY CORP
发明人： SHIMIZU TATSUO , OZAWA KAZUNORI , YAZAWA KENJI , SHIMURA HIDEYUKI , WATANABE HIDEKI
IPC分类号： G11B5/82 , G11B5/73 , G11B5/84
摘要： PURPOSE:To improve durability of a magnetic disk and to obtain a long life by specifying the mean inclination angle of worked grooves produced by grinding the surface of a substrate to 1.4 degree or more, at which angle a lubricant hardly scatters. CONSTITUTION:The ground surface of the magnetic disk substrate 1 such as an Al or Al-alloy plate is inspected with a surface roughness meter at several points, each for a several mm to several cm range. Profiles of roughness, namely 10 to several hundreds waveforms of worked grooves, are determined by depth (b) and the distance (a) from bottom to top of a grove, and the inclination angle theta is thereby obtained from formula I. The mean inclination angle DELTAq is then obtained from formula II, wherein (n) is the number of measured waveforms. The mean inclination angle DELTAq is specified to 1.4 or more degree, and more preferably 1.4 - 3.0 deg. to assure the durability and long life of the magnetic disk. In the angle DELTAq is less than 1.4 deg., a lubricant applied on the substrate 1 scatters from the substrate surface, which results in degradation of durability and life of the disk.

5. 发明专利

JPH01307019A REPRODUCTION OF SUBSTRATE FOR HARD DISK 失效
公开(公告)号：JPH01307019A
公开(公告)日：1989-12-12
申请号：JP13447988
申请日：1988-06-02
申请人： SONY CORP
发明人： NAKAMURA ZENKICHI , YAZAWA KENJI , WATANABE HIDEKI , SHIMURA HIDEYUKI
IPC分类号： B29B17/02 , G11B5/84
摘要： PURPOSE:To reduce reproducing and processing time of hard disk substrates and to increase the yield of reproducts by plasma ashing the substrate and then polishing to remove a carbon film and magnetic layer on the substrate. CONSTITUTION:The hard disk consists of the substrate 1, Ni-P plating or anodized aluminum layer 2, the magnetic layer 3, carbon film 4 and lubricating layer 5 formed successively. The film 4 is subjected to plasma ashing. The carbon constituting the film is oxidated into oxide and hydrogen constituting the layer 5 changes into H2O to escape from the surface. By polishing the exposed layer 3, it can by removed easily with small heat because no carbon film is present, while the plating layer 2 remains without changing into ferromagnetic state and is free from wide flaws. Thereby, processing time of reproduction polishing is reduced and the productivity and yield of reproducts is improved.

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