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    • 1. 发明专利
    • Barrier film, and method of manufacturing the same
    • 遮蔽膜及其制造方法
    • JP2012096432A
    • 2012-05-24
    • JP2010245132
    • 2010-11-01
    • Sony Corpソニー株式会社
    • YO TAKUCHUONO HIROAKIKAWANA TAKAHIRO
    • B32B9/00
    • C23C16/403C23C16/45555Y10T428/24975
    • PROBLEM TO BE SOLVED: To provide a barrier film with a moisture vapor transmission rate that is on the order of 10 to the minus fourth power or less, and to provide a method of manufacturing the same.SOLUTION: The barrier film 10 includes a base material 11, a first barrier layer 141, and a second barrier layer 142. The base material 11, which has first and second surfaces 111 and 112, is formed of a plastic film. The first barrier layer 141, which is formed on the first surface 111 by an atomic layer deposition method, is made of an inorganic material having water vapor barrier properties. The second barrier layer 142, which is formed on the second surface 112 by the atomic layer deposition method, is made of an inorganic material having water vapor barrier properties.
    • 要解决的问题:提供一种阻气膜,其阻水膜的湿度传输速率为10至负第四功率以下,并提供其制造方法。 解决方案:阻挡膜10包括基材11,第一阻挡层141和第二阻挡层142.具有第一表面111和第二表面112的基材11由塑料膜形成。 通过原子层沉积法形成在第一表面111上的第一阻挡层141由具有水蒸气阻隔性的无机材料制成。 通过原子层沉积法形成在第二表面112上的第二阻挡层142由具有水蒸气阻隔性的无机材料制成。 版权所有(C)2012,JPO&INPIT