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    • 5. 发明专利
    • VAPOR DEPOSITION POLYMERIZATION APPARATUS AND METHOD FOR CLEANING THE SAME
    • JPH10195109A
    • 1998-07-28
    • JP35914096
    • 1996-12-27
    • ULVAC CORP
    • TAKAHASHI YOSHIKAZU
    • C08F2/00C08G73/10C23C14/12C23C14/24
    • PROBLEM TO BE SOLVED: To provide a vapor deposition polymn. apparatus in which a monomer is vaporized in a vacuum and is deposited and polymerized on the surface of a substate to form a polymer film thereon and which enables an easy removal of a polymer deposited on the inner wall, etc., of a vapor deposition polymn. chamber and to provide a method for cleaning the same. SOLUTION: In the vapor deposition polymn. apparatus 1, the inner wall of a vapor deposition polymn. chamber 2 and the inside of an exhaust pipe 8 are coated with a copper plating 18, 19, and copper-made feed nozzles 5a, 5b are installed for feeding a monomer vapor; therefore, a polymer deposited on the inner wall, etc., can be removed easily. A polymer deposited can be easily removed by using a vapor deposition polymn. apparatus wherein the surfaces onto which the polymer deposits are plated with copper or wherein construction members having such surfaces have been made of copper and by introducing air into a vapor deposition polymn. chamber 2 after the completion of the vapor deposition polymn., maintaining the temp. (200 deg.C) at that time for 3hr, allowing the polymer deposited to spontaneously cool, and scratching the deposit with a cutter knife, etc.