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1. 发明专利

JP2006351726A METHOD OF EVALUATING ELECTROSTATIC CHUCK 审中-公开
公开(公告)号：JP2006351726A
公开(公告)日：2006-12-28
申请号：JP2005174157
申请日：2005-06-14
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , YAMAMURA KAZUICHI , KANO MASAKI
IPC分类号： H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a method of evaluating an electrostatic chuck which can make an accurate evaluation without changing its behavior according to a wafer which is repeatedly used. SOLUTION: In the method for evaluating characteristics of the electrostatic chuck using the wafer, a degree of purity of the wafer is evaluated and the wafer which was evaluated that the degree of purity is high is used for evaluating the electrostatic chuck. In this case, as for a determination reference of the degree of purity of the wafer, when a contact angle of water with respect to the wafer is equal to or less than 45°, it is determined that the degree of purity of the wafer is high. When it exceeds 45°, it is determined that the degree of purity is low. Concerning ones which are determined that the degree of purity is low, after the degree of purity of the wafer is increased, they are used for evaluating the electrostatic chuck. As a method for increasing the degree of purity of the wafer, an irradiation of ultraviolet rays, a washing with ozone water, a heat treatment in a vacuum at temperatures 300 to 700°C and the like, are listed. COPYRIGHT: (C)2007,JPO&INPIT

2. 发明专利

JP2002137933A METHOD OF MELT-CUTTING BASE MATERIAL OF GLASS AND DEVICE FOR MELT-CUTTING 失效
公开(公告)号：JP2002137933A
公开(公告)日：2002-05-14
申请号：JP2000325162
申请日：2000-10-25
申请人： SHINETSU CHEMICAL CO
发明人： NAGAO TAKAAKI , YAMAMURA KAZUICHI , FUJII HIDENORI
IPC分类号： C03B37/16 , C03B37/012
摘要： PROBLEM TO BE SOLVED: To provide a method of melt-cutting a bas material of glass enabling automation in the drawing process to draw the base material of glass down to the designated diameter or the like. SOLUTION: This method of melt-cutting a base material of glass comprises the steps of holding both ends of the base material of glass 1, moving the hold of at least one end while heating by flame of a burner to draw the base material of glass 1 to melt-cot the base material of grass 1, where the moving velocity of the hold is adjusted so that the tensile stress at the drawing comes below a designated value.

3. 发明专利

JP2000203861A HEAT TREATMENT FOR PARENT MATERIAL FOR OPTICAL FIBER 失效
公开(公告)号：JP2000203861A
公开(公告)日：2000-07-25
申请号：JP1002399
申请日：1999-01-19
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , NAGAO TAKAAKI , HOSHINO SHOJI , SHIMADA TADAKATSU , HIRASAWA HIDEO
IPC分类号： C03B29/02 , C03B37/012
摘要： PROBLEM TO BE SOLVED: To provide a process for the heat treatment of a parent material for optical fibers that can remove ununiformity due to scratches, unevenness and contaminants on the surface of the parent material as well as the residual strain inside the parent material and the cloudiness caused by glass fine particles sticking to the surface on the parent material. SOLUTION: In the heat treatment of the parent material for optical fibers in which the burner 2 heats the side face of the parent material 1 that revolves around its axial center with flame, as the parent material 1 and the burner 2 relatively moves in the axial center direction, the first flame polishing step where the ununiformity on the surface of the parent material is removed is followed by the second flame polishing step where the residual strain inside the parent material 1 and the cloudiness on the surface of the parent material are removed.

4. 发明专利

JPH1095604A PRODUCTION OF HIGH ALPHA TYPE SILICON NITRIDE 失效
公开(公告)号：JPH1095604A
公开(公告)日：1998-04-14
申请号：JP26677796
申请日：1996-09-17
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , KONYA YOSHIHARU , FUKUHIRA MASANORI
IPC分类号： C01B21/068
摘要： PROBLEM TO BE SOLVED: To produce silicon nitride having a high α-phase content at a high nitriding ratio by nitriding metallic silicon, providing an intermediate at a prescribed nitriding ratio, pulverizing the resultant intermediate and renitriding the pulverized intermediate. SOLUTION: Metallic silicon having maximum =90% α-phase content and >=95% nitriding ratio.

5. 发明专利

JPH0725603A PURIFICATION OF SILICON NITRIDE POWDER 失效
公开(公告)号：JPH0725603A
公开(公告)日：1995-01-27
申请号：JP19516893
申请日：1993-07-12
申请人： SHINETSU CHEMICAL CO
发明人： KONYA YOSHIHARU , FUJII HIDENORI , FUKUHIRA MASANORI
IPC分类号： C01B21/068
摘要： PURPOSE:To provide a method for purifying silicon nitride powder in a high purity by treating crude silicon nitride powder with an acid, capable of efficiently subjecting the crude silicon nitride powder to a solid-liquid separation to reduce impurities and the acid left in the silicon nitride powder, the silicon nitride powder being produced by the nitrogenation reaction of silicon. CONSTITUTION:A method for purifying silicon nitride powder with an acid in a high purity is characterized by slurrying crude silicon nitride powder obtained by a nitrogenation reaction with an inorganic acid aqueous solution to convert impurities into water-soluble compounds, adding an ammonium acetate aqueous solution to the slurry, when the pH of the slurry is >=2.5, and subsequently repeatedly subjecting the mixture to decantation and washing treatments.

6. 发明专利

JPH02188546A OLIGOETHER DERIVATIVE OF HEXAFLUOROPROPYLENE OXIDE HAVING VINYL GROUP AT ONE TERMINAL 失效
公开(公告)号：JPH02188546A
公开(公告)日：1990-07-24
申请号：JP559489
申请日：1989-01-12
申请人： SHINETSU CHEMICAL CO
发明人： TAKAOKA AKIO , KOIKE NORIYUKI , FUJII HIDENORI
IPC分类号： C07C43/17 , C08F16/14 , C08F214/26 , C08F216/14 , C08F290/00 , C08F299/00 , C08G77/38 , C08G77/385
摘要： NEW MATERIAL:Oligoether derivatives of formula I (n is 2-5) of a hexafluoropropylene oxide having a vinyl group at one terminal. USE:Useful as an intermediate for synthesis of various compounds. For example, a polymer excellent in heat resistance, chemical stability, non-tackiness, water and oil repellency, etc., and capable of melt molding is synthesized by copolymerization thereof with a fluoroolefin, etc. A hybrid silicone of the above- mentioned oligoether derivative monomer also can be utilized as an elastomer excellent in heat resistance and low-temperature properties and having water and oil repellency, stain resistance and a low surface energy. PREPARATION:For example, an acid fluoride of an oligomer prepared by formula II is esterified using methanol and the methoxycarbonyl group is then converted to methylcarbinol followed by dehydration, thus obtaining the objective compound of formula I.

7. 发明专利

JP2002029770A METHOD FOR WORKING BASE MATERIAL FOR OPTICAL FIBER 失效
公开(公告)号：JP2002029770A
公开(公告)日：2002-01-29
申请号：JP2000220304
申请日：2000-07-21
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI
IPC分类号： G02B6/00 , C03B37/012
摘要： PROBLEM TO BE SOLVED: To provide a method for melt-cutting the both end parts of a base material for an optical fiber so that the base material can be worked like a cone without generating the haze of silica fine grains generated on the surface of the base material for the optical fiber or any residual strain inside. SOLUTION: In a flame grinding method for grinding a rotating base material for an optical fiber with flames, the minimum outer diameter part which is 1/10-1/2 of the mean diameter of the valid part of the base material is formed in at least one edge part in the axial direction of the base material for the optical fiber, and flame grinding is carried out.

8. 发明专利

JP2001039726A METHOD FOR PROCESSING OPTICAL FIBER PREFORM AND PROCESSING DEVICE THEREFOR 失效
公开(公告)号：JP2001039726A
公开(公告)日：2001-02-13
申请号：JP21478699
申请日：1999-07-29
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , SUZUKI SHINJI , SHIMADA TADAKATSU , HIRASAWA HIDEO
IPC分类号： C03B37/012
摘要： PROBLEM TO BE SOLVED: To provide a method for processing an optical fiber preform which enables the simultaneous execution of a surface treatment and reduction of residual stress simultaneously with stretching of the large-diameter optical fiber preform and a processing device therefor. SOLUTION: The optical fiber preform 1 is stretched by respectively holding both ends of the optical fiber preform 1 with rotary chucks, rotating the optical fiber preform and widening a spacing between both rotary chucks 2a and 2b while subjecting the optical fiber preform to flame heating with a burner. At this time, at least three movable burners are arranged along the longitudinal direction of the optical fiber preform 1. The optical fiber preform is preheated, successively from a moving direction, by the first burner 3a, is heated and stretched to a softening temperature by the second burner 3b and the surface treatment and the reduction of the residual stress of the optical fiber preform 1 are executed by the third burner 3c.

9. 发明专利

JP2000264666A OPTICAL FIBER PREFORM 失效
公开(公告)号：JP2000264666A
公开(公告)日：2000-09-26
申请号：JP6592399
申请日：1999-03-12
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , YAMAMURA KAZUICHI , SHIMADA TADAKATSU , HIRASAWA HIDEO
IPC分类号： C03B8/04 , C03B37/014 , C03B37/018
摘要： PROBLEM TO BE SOLVED: To specify from what part of a fed one preform a certain part of a wire drawn optical fiber is obtained by displaying the side of starting the deposition and growth or/and the side of completion in the resultant optical fiber preform obtained by depositing and growing glass microparticles by a vapor phase axial deposition method. SOLUTION: This optical fiber preform is obtained by blowing SiCl4 and GeCl4 together with an oxyhydrogen flame 2 on the tip of a quartz dummy rod 3 pulled up while being rotated, depositing and growing glass microparticles, producing a porous glass body 1 and locating the starting side in the upper part in a step A, passing the resultant porous glass body 1 through a heating furnace 5, dehydrating and melting the porous glass body 1 and providing an ingot of a dense and transparent optical fiber preform in a step B, passing the preform ingot 6 through a heating furnace 7, pulling the ingot 6 at a higher speed than the feeding speed of the preform ingot 6, carrying out heating and drawing, reducing the diameter and affording an optical fiber preform 10 in a step D, cutting the optical fiber preform 10 to a suitable length, placing a mark M in a part near the top and displaying the side of starting the deposition and growth of the glass microparticles.

10. 发明专利

JPH09255311A PRODUCTION OF SILICON NITRIDE POWDER 失效
公开(公告)号：JPH09255311A
公开(公告)日：1997-09-30
申请号：JP6949696
申请日：1996-03-26
申请人： SHINETSU CHEMICAL CO
发明人： FUJII HIDENORI , KONYA YOSHIHARU , FUKUHIRA MASANORI
IPC分类号： C01B21/068 , C04B35/626
摘要： PROBLEM TO BE SOLVED: To efficiently obtain Si3 N4 powder by classifying intermediate powder by the difference in specific gravity correlated with the rate of nitriding and distributing it to processes in accordance with the rate of nitriding at the time of continuous multistage direct nitriding of metallic Si powder. SOLUTION: Metallic Si powder or granulated metallic Si powder is continuously fed into a fluidized bed, a moving bed or a rotary kiln as a nitriding apparatus, it is nitrided with N-contg. gas at about 1,150-1,400 deg.C to form Si3 N4 and this Si3 N4 is continuously discharged. Powder of an intermediate of Si3 N4 obtd. by the 1st stage reaction is classified by difference in specific gravity correlated with the rate of nitriding and it is distributed to processes in accordance with the rate of nitriding. For example, intermediate powder having such a high rate of nitriding as

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