专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS57112705A MANUFACTURE OF HOLOGRAPHIC GRATING 失效
公开(公告)号：JPS57112705A
公开(公告)日：1982-07-13
申请号：JP18554480
申请日：1980-12-29
申请人： SHIMADZU CORP , RIKAGAKU KENKYUSHO
发明人： HAIKATA HIDEKI , SANO KAZUO , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： G02B5/18 , G02B5/32 , G03H5/00
摘要： PURPOSE:To efficiently form a grating in a photoresist layer laid on a substrate by combinedly applying holography and ion etching in an oblique direction. CONSTITUTION:A photoresist layer 2 is laid on a substrate 1, and parallel lattice grooves 6 with a sine wave-shaped section are cut in the layer 2 by holography. The layer 2 is then irradiated with ion beams 4 at the angle of a direction which is obliquely upward to the grooves 6 and does not make a component projected on the lattice parallel to the grooves 6, e.g. at about 30 deg. angle of incidence to the substrate surface. The etching speed is maximized at about 60 deg. angle of incidence. Thus, the layer 2 is etched to form a grating (theta is a blaze angle) having lattice grooves 5 with an almost saw-toothed section.

2. 发明专利

JPS55131730A CONCAVED ECHELETTE GRATING AND ITS PROCESS 失效
公开(公告)号：JPS55131730A
公开(公告)日：1980-10-13
申请号：JP3880279
申请日：1979-03-31
申请人： RIKAGAKU KENKYUSHO , SHIMADZU CORP
发明人： AOYANAGI KATSUNOBU , NANBA SUSUMU , SANO KAZUO
IPC分类号： G01J3/18 , G02B5/18 , G02B27/44
摘要： PURPOSE:To obtain an echelette grating with a single blaze angle by forming a lattice groove in a film provided on a concaved substrate, by making the grate- shaped film a mask for the substrate and by treating the substrate by ion or electron etching. CONSTITUTION:The film 3 is provided on the concaved grating substrate 2 and is coated with the photoresist 4. An interference fringe that is an original form of a diffraction grating is printed on the substrate, which is developed to leave the grate-shaped film 3. The film 3 plays a role of the mask in the ion or electron etching process. The etching rate is minimum when the process is performed in the direction perpendicular or approximately parallel to the incident direction of ions, and it is maximum in a face that makes a certain angle with the incident beam. Accordingly when the ion beam I is applied to the surface of the substrate at a proper angle beta as shown in Figure, the etching is carried out quickly in the direction perpendicular to the surface of substrate, and is carried out slowly in the direction perpendicular to the grate face, then the etching progresses as shown by (A), (B) and (C) in Figure, the asymmetric groove is formed. An alpha is a blaze angle.

3. 发明专利

JPS6321128B2 失效
公开(公告)号：JPS6321128B2
公开(公告)日：1988-05-02
申请号：JP3880279
申请日：1979-03-31
申请人： RIKAGAKU KENKYUSHO , SHIMAZU SEISAKUSHO KK
发明人： AOYANAGI KATSUNOBU , NANBA SUSUMU , SANO KAZUO
IPC分类号： G01J3/18 , G02B5/18 , G02B27/44

4. 发明专利

JPS6123521B2 JPS6123521B2 - 失效
公开(公告)号：JPS6123521B2
公开(公告)日：1986-06-06
申请号：JP9006177
申请日：1977-07-27
申请人： Rikagaku Kenkyusho
发明人： NANBA SUSUMU , AOYANAGI KATSUNOBU , SANO KAZUO
IPC分类号： G02B5/18

5. 发明专利

JPS6025761B2 失效
公开(公告)号：JPS6025761B2
公开(公告)日：1985-06-20
申请号：JP18554480
申请日：1980-12-29
申请人： SHIMAZU SEISAKUSHO KK , RIKAGAKU KENKYUSHO
发明人： HAIKATA HIDEKI , SANO KAZUO , NANBA SUSUMU , AOYANAGI KATSUNOBU
IPC分类号： G02B5/18 , G02B5/32 , G03H5/00

6. 发明专利

JPS5424653A SUBSTRATE FOR ECHELETTE GRATING AND METHOD OF MANUFACTURING SAME 失效
公开(公告)号：JPS5424653A
公开(公告)日：1979-02-24
申请号：JP9006177
申请日：1977-07-27
申请人： RIKAGAKU KENKYUSHO
发明人： NANBA SUSUMU , AOYANAGI KATSUNOBU , SANO KAZUO
IPC分类号： G02B5/18

7. 发明专利

JPS6368802A DIFFRACTION GRATING 失效
公开(公告)号：JPS6368802A
公开(公告)日：1988-03-28
申请号：JP21354286
申请日：1986-09-09
申请人： SHIMADZU CORP
发明人： SANO KAZUO
IPC分类号： G02B5/18
摘要： PURPOSE:To obtain a diffraction grating which is advantageous in workmanship and has high energy efficiency by forming grooves to a combined shape of sloped parts and flat parts. CONSTITUTION:The grooves of the diffraction grating are formed to the shape combined with the faces inclined with respect to the reference plane of the grating and the faces (flat faces) which are flat to the reference plane of the grating and are continuous thereto. The ratio of the width between both is determined at 0.5-1.5 width of the flat faces with the width of the sloped faces as 1. The good energy efficiency is obtainable if the grooves are formed to the above-mentioned shape. Such groove shape has no sharp angled groove bases or steep ridge line parts at the tooth tips as compared to a typical saw tooth; therefore, the manufacture by a manufacturing process such as ion etching is easy.

8. 发明专利

JPS5946362B2 JPS5946362B2 - 失效
公开(公告)号：JPS5946362B2
公开(公告)日：1984-11-12
申请号：JP12086078
申请日：1978-09-29
申请人： Shimadzu Corp
发明人： SANO KAZUO
IPC分类号： G01J3/18 , G01J3/22 , G02B5/18

9. 发明专利

JPH04168412A MULTIPLE DIFFRACTION GRATING PLATE 失效
公开(公告)号：JPH04168412A
公开(公告)日：1992-06-16
申请号：JP29656190
申请日：1990-10-31
申请人： SHIMADZU CORP
发明人： NAGANO TETSUYA , SANO KAZUO
IPC分类号： G02B26/10 , G02B5/18
摘要： PURPOSE:To highly precisely exchange a diffraction grating plate with a simple operation by disposing a plurality of diffraction gratings on a flat base plate so that the surfaces of all the diffraction gratings becomes the same plane. CONSTITUTION:A base plate 1 on which a diffrction grating 2 is fixed by an adhesive 3 is mounted on a spectroscope by a shaft vertical to the surface in such a manner as to be rotatable in the center of the base plate. The exchange of the diffraction grating 2 is conducted by this rotation. When the exchange of the diffraction grating 2 is conducted by this operation, the grating 2 can be moved parallel on the base plate flat surface and set in a determined position, and the mounting precision of the grating 2 on the base plate forms a spectroscopic precision when the grating 2 is exchanged and set in the determined position. Although the directional mounting precision of a grating ruled line generated at the time of mounting the grating 2 on the base plate 1 often reduces the spectroscopic precision, this can be solved by the direct formation of the grating 2 on the base plate 1, and the durability is also improved.

10. 发明专利

JPS58186705A Rotatory polarizer 失效
标题翻译：旋转偏振器
公开(公告)号：JPS58186705A
公开(公告)日：1983-10-31
申请号：JP7103982
申请日：1982-04-26
申请人： Shimadzu Corp
发明人： SANO KAZUO , NAKANE KUNIO , HIRANO KATSUMI , KONDOU YOSHIOMI
IPC分类号： G02B5/30
CPC分类号： G02B5/3083
摘要： PURPOSE:To obtain a rotatory polarizer which is free from deviation between input light and exit light by constituting said polarizer of the junction of two parts. CONSTITUTION:The respective parts of a right triangular prism 4 made of a levo-rotatory crystal and a trapezoidal column 5 made of a dextro-rotatory crystal are so arranged that the horizontal right and left directions are in the optical axis direction of the crystals. The base BE of the prism 4 and the top (with AD as the base of the trapezium) EC of the column 5 are equal in length. The length of the base AD of the trapezium is twice the length of the top EC. The slant of the prism 4 and the slant of the column 5 are joined by an optical contact method without using any adhesive agent, and both are joined to the shape of a rectangular parallelopiped. When light is made incident as shown by an arrow from the AB of the two faces AB, CD sandwiching the joined surface AE, the light advances rectilinearly and emits from the face CD. Since both the levo-rotary and dextro-rotary crystals have an equal refractive index, no refraction arises even if the light passes through the face AE diagonally.
摘要翻译：目的：通过构成两部分的连接的所述偏振器，获得不会在输入光和出射光之间偏离的旋转偏振器。构成：由左旋旋转晶体制成的右三角棱镜4和由右旋晶体制成的梯形柱5的各个部分布置成水平左右方向在晶体的光轴方向上。柱5的基底BE和柱5的顶部（AD的梯形的底部）EC的长度相等。梯形底座AD的长度是顶部EC长度的两倍。棱镜4的倾斜度和柱5的倾斜度通过光学接触方法连接而不使用任何粘合剂，并且两者都被连接成长方体形的形状。当光线如箭头所示从两个面AB的AB（夹着接合表面AE的CD）入射时，光直线前进并从面CD发射。由于左旋旋转晶体和右旋旋转晶体都具有相等的折射率，即使光线对角地穿过面部AE，也不产生折射。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式