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    • 4. 发明专利
    • HEAT-FIXING DEVICE
    • JPH11212385A
    • 1999-08-06
    • JP1358898
    • 1998-01-27
    • SUMITOMO ELECTRIC INDUSTRIES
    • TANAKA MOTOYUKINAKADA HIROHIKONATSUHARA MASUHIROYUSHIO YASUHISA
    • G03G15/20H05B3/12H05B3/16H05B3/20
    • PROBLEM TO BE SOLVED: To obtain a device stably fixing a toner image on recording paper in a state where the large-size paper and the small-size paper coexist even at fixing speed near to 12 ppm while preventing a paper non-passing part from being excessively heated without making a ceramic base plate larger by setting the length of a pressure roller longer than that of the heating element of a ceramic heater by a specified range. SOLUTION: As for the ceramic heater; material excellent in heat conductivity is selected as its material so that the heat-fixing device may be ready to work as soon as the power source of a copying machine is turned on. Then, it is more desirable to set two heating elements 11 than one so as to maintain all the area of the nip part of the pressure roller 1 at equal temperature, and the ceramic heater is formed by considering the heat balance of all the area of a base plate 10 made of aluminum nitride. In this device, the length of the roller 1 is set to be longer than the entire length of the heating element 11 of the ceramic heater by 10 to 50 mm. Thus, the radiant heat of the paper non-passing part Y in the case of carrying the small-width transfer material is radiated and the paper non-passing part Y is prevented from being excessively heated, and the wrinkling of paper and high-temperature offset are restrained.
    • 7. 发明专利
    • HIGH-FREQUENCY ION PLATING DEVICE
    • JPH03177566A
    • 1991-08-01
    • JP31575489
    • 1989-12-05
    • SUMITOMO ELECTRIC INDUSTRIES
    • YUSHIO YASUHISA
    • C23C14/32H01J37/317H01L21/203
    • PURPOSE:To form an extremely high purity thin film by forming the inner wall of a vacuum chamber and at least a part of the members in the chamber with a ceramic or covering those with the ceramic in the high-frequency ion plating device CONSTITUTION:A substrate 2, a substrate fixture 3 for holding the substrate, a crucible 4 contg. a vaporization source and a high-frequency wave impressing coil 5 are arranged in the vacuum chamber 1, a gaseous reactant is supplied from a gas inlet pipe 6, the reactant is excited by the high-frequency wave impressed on the coil to ionize the vapor-deposition material with the generated high-frequency plasma, and the ionized material is deposited on the substrate 2. In this case, since the mount 3, coil 5 and inner wall of the chamber 1 are sputtered by the high-frequency plasma and the metal in the material is mixed into the thin film formed on the substrate 2 as impurities, the surfaces are covered with a ceramic such as Al2O3 or made of the ceramic. Consequently, the metal is not mixed into the thin film on the substrate 2, and a high purity thin film is formed on the substrate 2.