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1. 发明专利

JP2010098164A Processing apparatus and semiconductor manufacturing device 审中-公开
标题翻译：加工设备和半导体制造设备
公开(公告)号：JP2010098164A
公开(公告)日：2010-04-30
申请号：JP2008268460
申请日：2008-10-17
申请人： Rigaku Corp , 株式会社リガク
发明人： NOGUCHI MANABU , NAKAISHI CHIE
IPC分类号： H01L21/31 , C23C16/44 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To prevent damage to a shaft member, etc., to achieve long life by eliminating deposition of a byproduct in a housing, etc. and to eliminate the need for making a housing and other element apparatuses into structure capable of resisting high temperature by further preventing generation of the byproduct not by temperature control but by pressure control in a processing apparatus by which gas is generated in a processing chamber.
SOLUTION: The processing apparatus, for example, a semiconductor manufacturing device, has: the processing chamber B which is arranged in an external region A, stores gas (ammonium chloride) whose solid-phase temperature varies by pressure and whose pressure inside the chamber is P1; a housing 6 which is attached to the processing chamber B; the shaft member 9 which passes through the inside of the housing 6 to come out in the processing chamber B; a decompression chamber C which is provided in the housing 6 and around the shaft member 9 and is spatially connected to the processing chamber B; and a clearance seal 11 which performs control so that pressure P2 in the decompression chamber C becomes lower than the pressure P1 (P1>P2) in the processing chamber B.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了防止轴构件等的损坏，通过消除在壳体等中的副产物的沉积而达到长寿命，并且消除了使壳体和其他元件装置成为结构的需要能够通过进一步防止不通过温度控制产生副产物，而是通过在处理室中产生气体的处理装置中的压力控制来抵抗高温。解决方案：处理装置例如半导体制造装置具有：处理室B，其布置在外部区域A中，存储固相温度随压力变化的气体（氯化铵），其内部的压力房间是P1; 安装在处理室B上的壳体6; 轴构件9穿过壳体6的内部以在处理室B中出来; 减压室C，其设置在壳体6中并且围绕轴构件9并且在空间上连接到处理室B; 以及间隙密封件11，其执行控制，使得减压室C中的压力P2变得低于处理室B中的压力P1（P1> P2）。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2006038836A X-ray ct device 审中-公开
标题翻译： X射线CT设备
公开(公告)号：JP2006038836A
公开(公告)日：2006-02-09
申请号：JP2005181702
申请日：2005-06-22
申请人： Matsumoto Shika Univ , Morita Mfg Co Ltd , Rigaku Corp , 学校法人松本歯科大学 , 株式会社モリタ製作所 , 株式会社リガク
发明人： KODAMA YUICHI , ARAI YOSHINORI , KOBAYASHI YUJI , NOGUCHI MANABU , AKIYAMA KIYOSHI , SUZUKI MASAKAZU
IPC分类号： G01N23/04
摘要： PROBLEM TO BE SOLVED: To provide an X-ray CT device suitable for industrial purposes, imaging magnification or resolution of which can be easily changed.
SOLUTION: This device comprises an X-ray source 6 generating X-ray, a sample holding base 8 holding a sample S, an X-ray detector 7 detecting X-ray emitted from the X-ray source 6 and penetrated the sample S, and an imaging system support means mounting the X-ray source 6 and the X-ray detector 7. The imaging system support means is rotatable around a rotating axis O. The imaging system support means is adapted to arrange the X-ray source 6 and the X-ray detector 7 oppositely across the sample S. Further, the imaging system support means is adapted so that either or both of the X-ray source 6 and the X-ray detector 7 are moved in a direction approaching to and separating from the sample S.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供适用于工业目的的X射线CT装置，可以容易地改变其成像放大率或分辨率。解决方案：该装置包括产生X射线的X射线源6，保持样本S的样本保持基座8，检测从X射线源6发射的X射线并穿透X射线源的X射线检测器7 样品S和安装X射线源6和X射线检测器7的成像系统支撑装置。成像系统支撑装置可围绕旋转轴线O旋转。成像系统支撑装置适于布置X射线源6和X射线检测器7相对地穿过样品S.此外，成像系统支撑装置适于使得X射线源6和X射线检测器7中的任一个或两者沿接近的方向移动并与样品S分离。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2007170921A X-ray ct device 审中-公开
标题翻译： X射线CT设备
公开(公告)号：JP2007170921A
公开(公告)日：2007-07-05
申请号：JP2005366958
申请日：2005-12-20
申请人： Rigaku Corp , 株式会社リガク
发明人： KODAMA YUICHI , NOGUCHI MANABU , YAMADA AYUTA
IPC分类号： G01N23/04 , A61B6/03
CPC分类号： G01N23/046 , A61B6/035 , A61B6/508 , G01N2223/419 , G01N2223/612
摘要： PROBLEM TO BE SOLVED: To provide an X-ray CT device, easy to change its imaging magnifications and resolution, with its weight balance simply adjustable. SOLUTION: An X-ray source 6 and an X-ray detector 7 mounted on a guide arm 3 are movable in a touching or parting direction with respect to a specimen S. As to this move, the gravity center of a whole comprising respective constituent elements mounted on the side arm 3 is held on a rotational axis by a weight balance adjustment mechanism. The adjustment mechanism comprises a movable weight 12 movably mounted on the guide arm 3. The movement of the movable weight 12 is controlled so that the sum total of the moment of rotations around the rotational axis O is substantially zero. The movement route of the movable weight 12 is set on an arbitrary straight line parallel to the moving direction of the X-ray source 6 or of the X-ray detector 7, and not passing through the rotational axis O. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供X射线CT装置，容易改变其成像放大率和分辨率，其重量平衡简单可调。
解决方案：安装在引导臂3上的X射线源6和X射线检测器7相对于样本S在接触或分离方向上可移动。对于该移动，整个重心包括安装在侧臂3上的各构成元件通过重量平衡调节机构保持在旋转轴上。调节机构包括可移动地安装在引导臂3上的可移动重物12.可动重物12的运动被控制成使得旋转轴线O周围的转动转矩的总和基本为零。移动重物12的移动路线被设定在与X射线源6或X射线检测器7的移动方向平行的任意的直线上，不能通过旋转轴O.版权所有：（C）2007，JPO＆INPIT

4. 发明专利

JP2006179613A Magnetic fluid sealing unit for semiconductor wafer vertical heat processor 审中-公开
标题翻译：用于半导体波形垂直加热器的磁性流体密封单元
公开(公告)号：JP2006179613A
公开(公告)日：2006-07-06
申请号：JP2004370014
申请日：2004-12-21
申请人： Rigaku Corp , 株式会社リガク
发明人： SHIMAZAKI YASUYUKI , NOGUCHI MANABU
IPC分类号： H01L21/205 , C23C16/44 , F27D99/00 , H01L21/22 , H01L21/324 , H01L21/683
CPC分类号： C23C16/4409 , H01L21/67126
摘要： PROBLEM TO BE SOLVED: To provide a magnetic fluid sealing unit used for a vertical type heat processor which has eliminated a reserving unit for reserving contamination, impurity gas and particles from a gap between a unit body and a rotating axis in order to prevent contamination of semiconductor wafer for heat treatment within a reactor. SOLUTION: The magnetic fluid sealing unit comprises: the rotating axis 20 for transferring a rotary driving force to a wafer boat within a reaction vessel; a cylindrical unit body 30 including a supporting hole 31 to which the rotating axis 20 is inserted; an external core member 60 which is fixed at the lower side of the rotating axis 20 to rotate toward the external circumference from the lower side of the unit body 30; a magnetic fluid sealing unit 40 for sealing a gap between the rotating axis 20 and unit body 30 using a magnetic fluid; a bearing unit 70 provided at the lower end of the unit body 30 between the unit body 30 and the external core member 60; and a gas supply path 50 provided in the side of the reaction vessel more than the magnetic fluid sealing unit 40 to supply a purge gas to the gap between the rotating axis 20 and the unit body 30 at the location near the magnetic fluid sealing unit 40. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于垂直型热处理器的磁流体密封单元，其已经消除了用于从单元体和旋转轴之间的间隙中保留污染物，杂质气体和颗粒的储存单元，以便防止半导体晶片在反应器内进行热处理的污染。解决方案：磁流体密封单元包括：用于将旋转驱动力传递到反应容器内的晶片舟的旋转轴20; 圆筒形单元主体30，其包括支承孔31，旋转轴线20插入其中; 固定在旋转轴20的下侧的外部芯构件60，从单元主体30的下侧朝向外周旋转; 磁流体密封单元40，用于使用磁性流体密封旋转轴线20与单元主体30之间的间隙; 轴承单元70，其设置在单元主体30的下端之间，在单元主体30和外部芯构件60之间; 以及设置在反应容器侧的比磁性流体密封单元40更多的气体供应路径50，以在磁性流体密封单元40附近的位置处向旋转轴线20和单元主体30之间的间隙提供净化气体（C）2006年，JPO＆NCIPI

5. 发明专利

JP2005076758A Magnetic fluid sealing device 有权
标题翻译：磁流体密封装置
公开(公告)号：JP2005076758A
公开(公告)日：2005-03-24
申请号：JP2003308175
申请日：2003-09-01
申请人： Rigaku Corp , 株式会社リガク
发明人： NOGUCHI MANABU , HIRASHIMA OSAMU , KATO TOMOYASU
IPC分类号： F16J15/43 , C23C16/44
摘要： PROBLEM TO BE SOLVED: To keep a temperature of a seal part at a desired value by using a cooling water jacket without changing a temperature and a flow rate of the cooling water. SOLUTION: A pole piece 34 and a magnet 36 are mounted between a rotating shaft 30 and a housing 32, and the magnetic fluid is reserved in a gap between the pole piece 34 and the rotating shaft 30. The cooling water jacket 40 is mounted on an outer peripheral face of the housing 32, and a mounting position of the cooling water jacket 40 is changed in the axial direction of the rotating shaft 30. By changing the mounting position, the temperature of the seal part can be kept at the desired value. COPYRIGHT: (C)2005,JPO&NCIPI

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