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    • 1. 发明专利
    • Coating liquid for forming intermediate layer of multilayer resist and method for forming pattern using the same
    • 用于形成多层耐磨层的中间层的涂料液和使用其形成图案的方法
    • JP2006251369A
    • 2006-09-21
    • JP2005067843
    • 2005-03-10
    • Rasa Ind Ltdラサ工業株式会社
    • OTAKE MASAONONOMURA TSUTOMU
    • G03F7/11C09K13/08G03F7/26H01L21/027
    • PROBLEM TO BE SOLVED: To provide a coating liquid for forming an intermediate layer of a multilayer resist, the coating liquid having high dry etching durability, causing no mixing or dissolution with other layers, and capable of preventing a stationary wave effect by UV absorption, and to provide a method for forming a pattern using the coating liquid.
      SOLUTION: The coating liquid for forming an intermediate layer of a multilayer resist essentially comprises a metal alkoxide derivative expressed by M(OR
      1 )
      a or R
      2
      b M(OR
      3 )
      c , wherein M represents a metal atom, each of R
      1 , R
      2 and R
      3 represents a 1-8C alkyl group, a is the valence of M, b and c are integers and the sum b+c is the valence of the metal atom M, and is dissolved in an organic solvent. M is preferably Ti. After the coating liquid is applied on a substrate, the liquid is baked in an inert gas atmosphere at 100°C to 250°C to solidify to obtain an intermediate layer of a multilayer resist.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供一种用于形成多层抗蚀剂的中间层的涂布液,该涂布液具有高的干蚀刻耐久性,不会与其它层混合或溶解,并且能够防止静止波效应 UV吸收,并提供使用涂布液形成图案的方法。 解决方案:用于形成多层抗蚀剂的中间层的涂布液基本上包含由M(OR SP)1或/或R SP表示的金属醇盐衍生物, 其中M表示金属原子,R 1,R 2,R 3, SP>,R 2 和R 3 表示1-8C烷基,a是M的化合价,b和c是整数,并且总和b + c是 金属原子M的价数,并溶解在有机溶剂中。 M优选为Ti。 将涂布液涂布在基板上后,在惰性气体气氛中,在100〜250℃下进行烧成,使其固化,得到多层抗蚀剂的中间层。 版权所有(C)2006,JPO&NCIPI
    • 2. 发明专利
    • Coating liquid for forming dielectric layer, and method of manufacturing the same
    • 用于形成介电层的涂料液及其制造方法
    • JP2010135470A
    • 2010-06-17
    • JP2008308344
    • 2008-12-03
    • Rasa Ind Ltdラサ工業株式会社
    • OTAKE MASAONONOMURA TSUTOMUHIROTA KOJI
    • H01L21/312C08G77/04
    • PROBLEM TO BE SOLVED: To provide a coating liquid for forming a dielectric layer, which can form a coated film having a film forming temperature of 120°C-200°C and a leakage current value of 10 -8 A/cm 2 , and also can obtain characteristics in which a low leakage current and a high relative dielectric constant are equivalent or higher than those of a silicon nitride film by lamination with a high dielectric film; and to provide a method of manufacturing the same. SOLUTION: The coating liquid for forming the dielectric layer has one or more kinds of Si alkoxide derivatives selected from Si alkoxides expressed by general formulas Si(OR 1 ) a , and R 2 b Si(OR 3 ) c , and partially hydrolyzed products and condensates of those substances as main components, and is obtained by dissolving them in an organic solvent. In the general formulas, R 1 and R 3 are each independently 1-8C alkyl groups, and R 2 is a substituent of ≥2C, while (a) is the valence of Si, (b) and (c) are each integers of 1 or more, and (b)+(c) is the valence of Si. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种形成电介质层的涂布液,其可以形成成膜温度为120℃-2200℃,泄漏电流值为10 -8的涂膜 A / cm 2 ,并且还可以获得低泄漏电流和高相对介电常数等于或高于氮化硅膜的特性,通过与高电介质 电影; 并提供其制造方法。 解决方案:用于形成电介质层的涂布液具有一种或多种选自由通式Si(OR 1)的Si烷氧化物选择的Si醇盐衍生物, ,以及这些物质的部分水解产物和缩合物作为(S)S(OR 3,S) 主要成分,通过将其溶解在有机溶剂中而得到。 在通式中,R 1和R 3彼此独立地为1-8个C烷基,R 2 SP 2为≥2C的取代基, 而(a)是Si的化合价,(b)和(c)各自为1以上的整数,(b)+(c)为Si的化合价。 版权所有(C)2010,JPO&INPIT