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    • 6. 发明专利
    • APPARATUS FOR PRODUCING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL
    • JPH02229790A
    • 1990-09-12
    • JP5156289
    • 1989-03-03
    • FURUKAWA ELECTRIC CO LTD
    • OZAWA SHOICHIKIJIMA TAKASHIKIKUTA TOSHIO
    • C30B27/02H01L21/208
    • PURPOSE:To facilitate the dissociation of a single crystal from a crucible and a liquid sealant with a device for executing a TKM method using the liquid sealant by providing a means for removing the liquid sealant from the crucible after the solidification of a raw material melt. CONSTITUTION:Polycrystalline raw materials of polycrystal GaAs and B2O3 (liquid sealant) are put into the crucible 14 and a seed crystal 1 is attached to a pulling-up shaft 4. The inside of a high-pressure vessel 13 is evacuated to a vacuum. Ar which is an inert gas is introduced and the pressure and temp. thereof are increased to melt the raw materials. The seed crystal 1 is then brought into contact with the raw material melt 2 and the temp of heaters 5, 6 is controlled to execute seeding. While the temp. in a melt zone and a low-temp. zone is controlled to 1250 deg.C to 900 deg.C, the seed crystal 1 and the crucible 14 are moved upward and the melt 2 is fully solidified to the single crystal. The crucible 14 is moved toward a liquid sealant container 9 which is made of quartz and is provided above the heater 5. The container 9 is heated to the temp. higher than the temp. around the crucible 14 by a heater 10. The pressure in the container 9 drops and the sealant 3 is sucked into the container 9 when the nozzle at the front end of the container 9 is brought into contact with the sealant 3 and the temp. of the heater 10 is lowered.
    • 7. 发明专利
    • PRODUCTION OF COMPOUND SEMICONDUCTOR SINGLE CRYSTAL
    • JPH02221193A
    • 1990-09-04
    • JP4038689
    • 1989-02-22
    • FURUKAWA ELECTRIC CO LTD
    • KIJIMA TAKASHIOZAWA SHOICHIKIKUTA TOSHIO
    • C30B27/02H01L21/208
    • PURPOSE:To obtain the high-quality single crystal having a low dislocation density at the time of producing the single crystal with an apparatus for producing the compd. semiconductor crystal consisting of T.K, M by executing temp. control while using >=3 heaters covering the melt zone, solid-liquid boundary and solidifying zone of the above-mentioned apparatus. CONSTITUTION:An inert gaseous atmosphere is maintained in a high-pressure vessel 1 and a seed crystal 8 is brought into contact with a compd. semiconductor melt 6 covered with a liquid sealant 7 in a crucible 2. While the sealed crystal 8 and the crucible 2 are kept rotated in the same direction, the seed crystal is resin together with the crucible 2 to the dotted line position of the solidifying zone and after the melt 6 is fully solidified, the crystal is transferred from the crucible 2' and is cooled. The four independent heaters 10 to 13 around the crucible are used in this production process and the heater 10 is so energized that the solidified single crystal is not rapidly cooled. The heater 11 is energized to improve the temp. gradient near the solid-liquid boundary by the heater 12 and the heater 12 is a main heater to hold the melt 6. The heater 13 is energized only in the initial period of solidification as the temp. gradient in the initial period of solidification and the temp. gradient during the solidification are not uniform when the melt 6 is held.