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    • 8. 发明专利
    • Electronic apparatus
    • 电子设备
    • JP2013048187A
    • 2013-03-07
    • JP2011186353
    • 2011-08-29
    • Napura:Kk有限会社 ナプラ
    • SEKINE SHIGENOBUSEKINE YURINA
    • H05K1/09G02F1/13357H01L31/04H01L31/042H01L33/48H05K3/28H05K3/34
    • Y02E10/50
    • PROBLEM TO BE SOLVED: To provide an electronic apparatus having metallized wiring which is excellent in conductivity, electrochemical stability, oxidation resistance, filling properties, compactness, and mechanical and physical strength, which achieves high bonding force and adhesive force to a substrate and high quality and high reliability.SOLUTION: A substrate 11 has metallized wiring 12 having a predetermined pattern. The metallized wiring 12 includes a metallized layer 121 and an insulation layer 122. The metallized layer 121 includes a high melting point metal component and a low melting point metal component, and the high melting point metal component and the low melting point metal component are diffusely joined to each other. The insulation layer 122 is formed concurrently with the metallized layer 121 and covers an outer surface of the metallized layer 121. An electronic component 14 electrically connects with the metallized layer 121 of the metallized wiring 12.
    • 解决的问题:提供一种具有导电性,电化学稳定性,抗氧化性,填充性,紧凑性和机械和物理强度优异的金属化布线的电子设备,其实现了对基板的高粘结力和粘合力 质量高,可靠性高。 解决方案:基板11具有预定图案的金属化布线12。 金属化布线12包括金属化层121和绝缘层122.金属化层121包括高熔点金属组分和低熔点金属组分,并且高熔点金属组分和低熔点金属组分是扩散的 相互加入 绝缘层122与金属化层121同时形成并覆盖金属化层121的外表面。电子部件14与金属化布线12的金属化层121电连接。(C)2013, JPO和INPIT
    • 10. 发明专利
    • Metal filling apparatus
    • 金属填充装置
    • JP2010283034A
    • 2010-12-16
    • JP2009133363
    • 2009-06-02
    • Napura:Kk有限会社ナプラ
    • SEKINE SHIGENOBUSEKINE YURINAKIMURA RYUJI
    • H01L21/3205H01L21/768H01L23/52
    • PROBLEM TO BE SOLVED: To provide a metal filling apparatus for filling the fine space of an object with a metallic filler without generating a recessing and an air gap, a void and the like and being capable of achieving the reduction of a cost and an improvement in a treatment efficiency. SOLUTION: The metal filling apparatus includes: a first support 10 supporting the object 2 from the reverse side of the opening surfaces of the fine space under the state opening one of the opening surfaces of the fine space; and a second support 11 being joined with the first support 10 from the opening-surface side and sealing the object 2 in a treatment chamber A. The metal filling apparatus further includes: a molten-metal feeder 12 feeding the treatment chamber A with a molten metal M; and a pressure controller 13 controlling a pressure in the treatment chamber A. The metal filling apparatus includes a pressure means pressurizing the treatment chamber A until the molten metal is cured by a cooling after the inside of the fine space is filled with the molten metal M. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种金属填充设备,用于用金属填料填充物体的细小空间,而不产生凹陷和气隙,空隙等,并且能够实现成本的降低 并提高治疗效率。 解决方案:金属填充设备包括:第一支撑件10,其在打开微细空间的一个开口表面的状态下从微细空间的开口表面的相反侧支撑物体2; 并且第二支撑件11从开口表面侧与第一支撑件10接合并将物体2密封在处理室A中。金属填充设备还包括:熔融金属进料器12,将处理室A与熔融的 金属M 以及控制处理室A中的压力的​​压力控制器13.金属填充装置包括对处理室A进行加压的压力装置,直到在精细空间的内部填充有熔融金属M之后通过冷却固化熔融金属 版权所有(C)2011,JPO&INPIT