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1. 发明专利

JPH0912325A HIGH-PURITY OPAQUE QUARTZ GLASS AND ITS PRODUCTION AS WELL AS ITS APPLICATION 失效
公开(公告)号：JPH0912325A
公开(公告)日：1997-01-14
申请号：JP16409295
申请日：1995-06-29
申请人： NITTO CHEMICAL INDUSTRY CO LTD , TOSOH CORP , NIPPON SEKIEI GLASS KK
发明人： ORII KOICHI , HARA YUKINOBU , KAMO KENJI , AKIYAMA TOMOYUKI , ONO KOICHI , TSUKUMA KOJI , SUDO HAJIME , KIKUCHI GIICHI
IPC分类号： C03B20/00 , C03B19/06 , C03C3/06 , H01L21/22
摘要： PURPOSE: To obtain high-purity opaque quartz glass having excellent heat ray shieldability by specifying the content of closed cells of a specific small diameter and the occupying ratio of closed cells of a specific large diameter and regulating the impurity contents of Li, Na, K, etc. CONSTITUTION: This quartz glass contains 1×10 to 9×10 pieces/cm of the closed cells having an average grain size of 20 to 40μ. The ratio that the closed cells having the diameter of >=100μ occupy in the total cells is

2. 发明专利

JPH0948623A PRODUCTION OF QUARTZ GLASS 失效
公开(公告)号：JPH0948623A
公开(公告)日：1997-02-18
申请号：JP19745395
申请日：1995-08-02
申请人： NITTO CHEMICAL INDUSTRY CO LTD , TOSOH CORP , NIPPON SEKIEI GLASS KK
发明人： ORII KOICHI , HARA YUKINOBU , OSADA HIRONARI , KUDO MASAYUKI , KAMO KENJI , OKAMURA TOSHIHIKO , TSUKUMA KOJI , SUDO HAJIME , KIKUCHI GIICHI
IPC分类号： C03B20/00 , C03B19/06 , C03C3/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing highly pure transparent quartz glass useful for semiconductor production jigs, liquid crystal substrates, etc., by using amorphous silica powder suitable for press molding treatments. SOLUTION: A method for producing quartz glass by sintering the press molded product of silica powder, wherein powder produced by adding 0.1-10wt.% of a water-soluble acrylic resin having a glass transition point of -50 deg.C to 0 deg.C to amorphous silica powder having an average particle diameter of 0.5-10μm and containing the impurities of Na, K, Fe, Ti, and Al in amounts of

3. 发明专利

JPH08119664A HIGH PURITY TRANSPARENT QUARTZ GLASS AND ITS PRODUCTION 失效
公开(公告)号：JPH08119664A
公开(公告)日：1996-05-14
申请号：JP24941794
申请日：1994-10-14
申请人： NITTO CHEMICAL INDUSTRY CO LTD , TOSOH CORP , NIPPON SEKIEI GLASS KK
发明人： ORII KOICHI , HARA YUKINOBU , AKIYAMA TOMOYUKI , TSUKUMA KOJI , KIKUCHI GIICHI
IPC分类号： C03B8/00 , C03B19/06 , C03B20/00 , C03B32/02 , C03C3/06
摘要： PURPOSE: To obtain high purity transparent quartz glass excellent in viscosity characteristics at high temp. by compacting amorphous silica powder, converting the structure of the silica powder of the resultant compact into a high temp. type cristobalite crystal structure without adding a crystallization accelerator and then melting the compact. CONSTITUTION: Amorphous silica powder is compacted, the structure of the silica powder of the resultant compact is converted into a high temp. type cristobalite crystal structure in vacuum or in an atmosphere of He without adding any crystallization accelerator such as an alkali metallic compd. or alumina, and then the compact is melted to produce the objective high purity transparent quartz glass contg. Li, Na, Mg, Ca, K, Al, Ti, Cr, Ni, Zn, Zr, Mo, Fe and Cl by =10 P viscosity at 1,200 deg.C. This quartz glass is useful in a semiconductor production field, etc.

4. 发明专利

JPH07277723A PRODUCTION OF CRISTOBALITE GRAIN 失效
公开(公告)号：JPH07277723A
公开(公告)日：1995-10-24
申请号：JP9919394
申请日：1994-04-13
申请人： NITTO CHEMICAL INDUSTRY CO LTD , TOSOH CORP , NIPPON SEKIEI GLASS KK
发明人： ORII KOICHI , HARA YUKINOBU , AKIYAMA TOMOYUKI , TSUKUMA KOJI
IPC分类号： C03C10/14 , C01B33/12
摘要： PURPOSE:To efficiently and economically produce high-purity cristobalite grains, excellent in denseness and having ultralow contents of an alkali metal and an alkaline earth metal. CONSTITUTION:This method for producing cristobalite grains is to heat-treat water glass-bated amorphous silica grains obtained from an aqueous solution of an alkali silicate in the presence of amorphous silica prepared from an alkoxysiane at 1200-1700 deg.C.

5. 发明专利

JPH05193926A PRODUCTION OF CRISTOBALITE 失效
公开(公告)号：JPH05193926A
公开(公告)日：1993-08-03
申请号：JP3290192
申请日：1992-01-24
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： ORII KOICHI , ARAI HACHIRO , ARISAKA ICHIRO
IPC分类号： C01B33/12 , C01B33/18 , C03B20/00
摘要： PURPOSE:To obtain a high-purity cristobalite having low contents of alkali (alkaline earth) metal and impurities when an amorphous silica is heated and converted to the cristobalite by heating an amorphous silica grain contg. crystobalite at a specified temp. CONSTITUTION:An amorphous silica grain contg.

6. 发明专利

JPH03223107A PREPARATION OF SPHERICAL SILICA 失效
公开(公告)号：JPH03223107A
公开(公告)日：1991-10-02
申请号：JP1781090
申请日：1990-01-30
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： YAMAGUCHI YASUMASA , ORII KOICHI , ARAI HACHIRO , MATSUURA MASAHIRO
IPC分类号： C01B33/18 , C01B33/187
摘要： PURPOSE:To prepare highly pure spherical silica having a low impurity content in simplified processes by spraying an alkali metal silicate salt aqueous solution in a gaseous phase, capturing the produced fine particles in an acid-containing solution in a water-containing state, treating the prepared spherical silica gel with an acid-containing solution and subsequently washing the silica gel with water. CONSTITUTION:The aqueous solution of an alkali metal silicate salt such as the Na salt or K salt of silicic acid in a concentration of usually 20-60wt.% is sprayed in a gaseous phase comprising air, etc., by a centrifugal method, a two fluid nozzle method, etc. The pressure of the atmosphere to be sprayed therein is usually 0.1-100 atmospheres, especially 0.9-10 atmospheres, and the operation temperature is preferably 10-80 deg.C. The produced fine particles are captured in an acid-containing solution containing an inorganic acid or organic acid in the water-containing state. The prepared gelled silica particles are separated from the suspension solution by a method such as filtration, precipitation or centrifugation and washed with water to provide the objective highly pure spherical silica.

7. 发明专利

JPH03193619A PRODUCTION OF SPHERICAL SILICA 失效
公开(公告)号：JPH03193619A
公开(公告)日：1991-08-23
申请号：JP32835089
申请日：1989-12-20
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： YAMAGUCHI YASUMASA , ORII KOICHI , ARAI HACHIRO , IDE AKIRA
IPC分类号： C01B33/193
摘要： PURPOSE:To produce high purity spherical silica in a simplified production process by spraying each aq. solution of alkali metal silicate and aq. acid solution in a gaseous phase, bringing the produced drops of solution into contact with each other, collecting these drops, treating them with acid-contg. liquid, and then washing them with water. CONSTITUTION:Each of aq. solution of alkali metal silicate and aq. solution of acid or/and acid salt is sprayed into the gaseous phase to produce drops, which are brought into contact with each other and then collected, treated with acid contg. liquid, and washed with water to obtain the objective spherical silica. The above-mentioned spherical shape is specified that the ratio of the maximum diameter to the minimum diameter in one particle is ranged from 1 to 0.5. The concentration of SiO2 in the aq. solution of alkali metal silicate used as a material is 5-60wt.%. When the concn. of SiO2 is low, it takes long time for the drops of the alkali metal silicate sprayed in the gaseous phase to be solidified. On the other hand, in the case of high SiO2 concn., viscosity of the alkali metal silicate solution is increased to make spraying difficult.

8. 发明专利

JPH0218393A PRODUCTION OF ARTIFICIAL QUARTZ CRYSTAL 失效
公开(公告)号：JPH0218393A
公开(公告)日：1990-01-22
申请号：JP16683188
申请日：1988-07-06
申请人： NITTO CHEMICAL INDUSTRY CO LTD , MITSUBISHI RAYON CO
发明人： ORII KOICHI , OSHIMA IWAO , OWAKU MUTSUO , SUNAOKA TADASHI
IPC分类号： C30B7/10 , C30B7/00 , C30B29/18
摘要： PURPOSE:To obtain the title high-purity artificial quartz crystal having a low content of impurities, especially of Al, and having excellent radioactivity resistance by using specified crystalline silica as the raw material at the time of producing an artificial quartz crystal by hydrothermal growth. CONSTITUTION:When an artificial quartz crystal is produced by hydrothermal growth, amorphous silica contg. =5ppm, and then heat-treated preferably at 900-1,600 deg.C to convert the silica to crystalline silica contg. cristobalite. The crystalline silica is used as the raw material.

9. 发明专利

JP2586973B2 失效
公开(公告)号：JP2586973B2
公开(公告)日：1997-03-05
申请号：JP3290192
申请日：1992-01-24
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： ORII KOICHI , ARAI HACHIRO , ARISAKA ICHIRO
IPC分类号： C01B33/12 , C01B33/18 , C03B20/00 , C30B29/18

10. 发明专利

JPH0769617A HIGH PURITY SPHERICAL SILICA AND PRODUCTION THEREOF 失效
公开(公告)号：JPH0769617A
公开(公告)日：1995-03-14
申请号：JP14412494
申请日：1994-06-03
申请人： NITTO CHEMICAL INDUSTRY CO LTD
发明人： UNOHARA YASUHIRO , ORII KOICHI
IPC分类号： C01B33/187 , C01B33/12 , C01B33/16 , C09C1/30 , H01L23/29 , H01L23/31 , H01L23/10
摘要： PURPOSE:To obtain a high purity spherical silica excellent in smoothness and sphericity by mixing two kinds of a water-in-oil (W/O) type emulsion obtained by using respectively an alkali silicate aq. solution and a mineral acid aq. solution as a dispersed phase to make spherical silica gel. CONSTITUTION:The W/O type emulsion is obtained by dispersing the alkali silicate aq. solution in fine grain state as the dispersed phase. And another W/O type emulsion is obtained by dispersing the mineral acid aq. solution as the dispersed phase. Next, both emulsions are mixed to form the spherical silica gel. A spherical hydrated silica gel obtained by treating the silica gel with a mineral acid is dried and burnt. And the high purity spherical silica having =90% content of particles of 0.9-1 sphericity is obtained.

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