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    • 7. 发明专利
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • JPS60133777A
    • 1985-07-16
    • JP24089283
    • 1983-12-22
    • NIPPON TELEGRAPH & TELEPHONE
    • SAITOU HIDEHONAGAI HARUO
    • H01S5/00H01S5/0625H01S5/12
    • PURPOSE:To oscillate the titled device by a single wavelength over a wide range of temperatures by a method wherein the carrier density is controlled by passing forward directional currents to a reflection region having a diffraction grating. CONSTITUTION:A laser is composed of an N type InP substrate 1', an N type InP clad layer 2', an undoped InGaAsP active layer 3', a P type InP clad layer 4', a P type InGaAsP contact layer 5', an InGaAsP undoped photo waveguide layer 6', an insulation region 7', a driving P type electrode 8', a wavelength control P-side electrode 9' and an N-side electrode 10'. Light emission is obtained in a region A by passing forward idrectional current between the electrodes 8' and 10'. Injecting current to the reflection region B varies the refractive index in accordance with the number of injected carriers, thus enabling the wavelength capable of selective reflection to be controlled within a distribution of gain; accordingly, the enlargement of the temperature region of single vertical mode oscillation can be realized.
    • 8. 发明专利
    • PROCESS OF SEMICONDUCTOR LASER DEVICE
    • JPS55105393A
    • 1980-08-12
    • JP1280079
    • 1979-02-08
    • NIPPON TELEGRAPH & TELEPHONE
    • SAITOU HIDEHO
    • H01S5/00
    • PURPOSE:To improve the efficiency of laser and to reduce the threshold current by stabilizing both current constriction and the horizontal mode and by reducing the p side electrode resistance simultaneously without heat damage to active layer below the stripe. CONSTITUTION:The n-InP clad layer 2, active layer 3, p-InP buffer layer 4 and p-InGaAs clad layer 5 are crystal-grown on the n-InP substrate 1, the layer 5 except the stripe is selectively etched to form a mesa. Next the current preventive and absorptive layer 6 is formed without heat damage to the active layer 3 below the stripe, the p area 7 is provided in the layer 6 by diffusing Zn over the whole surface of the layer 6 so that it reaches the clad layer 5 and does not pierce the absorptive layer 6, the p and n electrodes 8, 9 are formed last. In this way, the efficiency of laser can be improved and the threshold current can be reduced by stabilizing both current constriction and the horizontal mode and by reducing the p side electrode resistance without heat damage to the active layer below the stripe.
    • 9. 发明专利
    • SEMICONDUCTOR LASER DEVICE
    • JPS5511338A
    • 1980-01-26
    • JP8374878
    • 1978-07-10
    • NIPPON TELEGRAPH & TELEPHONE
    • KAWAGUCHI HITOSHISAITOU HIDEHOWAKITA KOUICHI
    • H01S5/00
    • PURPOSE:To obtain laser oscillation in single vertical mode, by piling a plurality of semiconductor layers including a semiconductor active layer on a semiconductor base, forming a cavity on the base side, and forming a reflecting film at this cavity and on the surface opposite this cavity. CONSTITUTION:On N-type semiconductor base 1 are piled N-type semiconductor carrier sealed layer 2, N-type or P-type semiconductor active layer 3, P-type semiconductor carrier layer 4, and N-type semiconductor layer 5, for example. Also, cavity 6 of depth reaching layer 2 from the side opposite to layer 2 is formed on base 1. Reflecting film 8, which extends to electrode 7, is formed on the inner surface of cavity 6. Window 9, which partially faces layer 4, is provided at the position where layer 5 faces cavity 6. P-type region 10 is formed in the region of layer 5 facing window 9. A reflecting film and film 2, which functions as electrode, are formed in region 10 above window 9. A power source is connected between electrode 7 and electrode 12, with electrode 12 made positive. Then, it is possible to obtain laser oscillation between films 12 and 8, with their interval made as resonator, and it is taken out via film 8, for example.