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    • 2. 发明专利
    • METHOD FOR REMOVING METALLIC FILM IN REAL TIME
    • JPH02200786A
    • 1990-08-09
    • JP2207889
    • 1989-01-31
    • NIPPON SHEET GLASS CO LTD
    • IKEDA MAKOTONISHIHARA HIROSHIHARUNA MASAMITSU
    • G03F7/00C23F1/00H05K3/07
    • PURPOSE:To continuously execute exposing and developing of a photosensitive material and etching of a metallic film in the same treating liquid by depositing the metallic film on a substrate, providing the coated film of the photosensitive material thereon, immersing this substrate into the treating liquid, impressing an electric field thereto and irradiating the surface of the coated film with a light beam. CONSTITUTION:The metallic film 3 (Al, etc.) having a prescribed thickness is deposited by thermal vapor deposition on the surface 2 of the substrate 1 (LiNbO3, etc.) and a photoresist layer 4 is applied atop the film. This substrate 1 is immersed together with a platinum electrode 5 into an aq. soln. of about 1% sodium hydroxide which has the development effect on the photoresist layer 4 and can remove the metallic film 3 by an electrodecomposition effect. A DC voltage is then impressed between the metallic film 3 and the electrode 5 by using a power source 6 and the prescribed region is irradiated with the light beam 7 (He-Cd laser light, etc.) condensed by an objective lens 8, by which the photoresist layer 4 is exposed and the metallic film 3 is successively removed in a very small area unit. The removal of the metallic film 3 in real time is attained in this way with high accuracy.