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    • 1. 发明专利
    • AUTOMATICALLY CONTROLLING METHOD FOR VELOCITY IN CONTINUOUS PROCESS LINE OF STRIP
    • JPH0499900A
    • 1992-03-31
    • JP21432990
    • 1990-08-15
    • NIPPON KOKAN KK
    • MAEKAWA YASUNOBUKANETAKA MITSUMASASAKAMOTO NORIHIKO
    • C25D7/06C25D21/12
    • PURPOSE:To control the velocity of a line to the optimum velocity by fetching length of a coil and length of a looper or the like into a process controller while a line is operated and calculating the central velocity of the line which is constrained in the various conditions and presetting the minimum velocity thereof at every event as the central velocity of the line and automatically controlling the central velocity of the line. CONSTITUTION:The inlet and outlet-side loopers 2, 4, a treating equipment 3 and the bridle rolls 6, 7 are provided in the continuous process line of a strip and automatic velocity control is performed. Therein while the line is operated, length of a coil, length of the inlet and outlet-side loopers and velocity of the line are fetched into a process controller. The central velocity of the line is calculated which is constrained in the various conditions. The minimum velocity is preset at every various event as the central velocity of the line. The central velocity of the line is automatically controlled. Thereby the velocity of the line is successively controlled to the optimum velocity in accordance with the length of the coil in the inlet and outlet sides of the line and the capacity of the loopers.
    • 5. 发明专利
    • METHOD FOR CIRCULATING PLATING LIQUID IN ELECTROPLATING
    • JPH01252799A
    • 1989-10-09
    • JP8049288
    • 1988-03-31
    • NIPPON KOKAN KK
    • ANAMI TATSUROTSUJIHARA TOSHIYUKIKANETAKA MITSUMASAMATSUDA HIDEMICHIARAKI YOSHIHARUMIYOKAWA KEIICHI
    • C25D17/00C25D21/14
    • PURPOSE:To perform gas-liquid separation of the air involved in plating liquid and to save the reducing treatment expense by providing a receiver for temporally storing the plating liquid in the return flow path and continuously controlling the liquid level of the plating liquid stored in the receiver. CONSTITUTION:A strip 2 is passed through the dam rolls 3 of the plating tanks 1 and plated and the plating liquid discharged through the gaps of the dam rolls 3 is collected into the receiver 5 and sent to a circulation tank 4 through a return flow path 9 consisting of the pipelines 6, a pipe common return 7 and a pipeline 8 and regulated in composition and thereafter returned to the plating tanks 1. At this time, the flow rate controlling valves 20 are provided to the pipelines 6 respectively and the flow rate of plating liquid discharged from the receiver 5 is controlled and the plating liquid is stayed in the reservoirs 5. Further the flow rate control of plating liquid is performed by detecting the liquid level of the receiver 5 with the liquid level detectors 21 and sending the signals to the flow rate controllers 22 to compare the liquid level of the receiver 5 with the target value herein and actuating the flow rate controlling valves 20 so that the liquid is regulated to the target value. Thereby the air involved in the plating liquid is separated in the receiver 5 and stripped to the atmosphere.