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1. 发明专利

JP2012056239A Piezoelectric laminate and method of manufacturing the same 有权
标题翻译：压电层压板及其制造方法
公开(公告)号：JP2012056239A
公开(公告)日：2012-03-22
申请号：JP2010203142
申请日：2010-09-10
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： MURAYAMA SHUNSUKE , YOSHIDA MITSUNOBU , ODAKAWA KENJI , USUI HIDEO , SADAMOTO MITSURU
IPC分类号： B32B27/36
摘要： PROBLEM TO BE SOLVED: To provide a piezoelectric laminate excellent in adhesiveness with another layer while maintaining high piezoelectricity of polylactic acid resin.SOLUTION: The piezoelectric laminate includes an A layer containing the polylactic acid resin, and a B layer containing an unsaturated carboxylic acid polymer whose one surface is in contact with a surface of the A layer. The ratio of the number of C(=O)-O groups to the number of C(=O)-O-C groups ((the number of C(=O)-O groups)/(the number of C(=O)-O-C groups)) obtained by waveform analysis from a carbon 1s spectrum obtained by measuring a surface of the B layer by an X-ray photoelectron spectroscopy is at least 1.4 to 5.0.
摘要翻译：要解决的问题：提供一种在保持聚乳酸树脂的高压缩性的同时与另一层粘合性优异的压电层叠体。解决方案：压电层叠体包含含有聚乳酸树脂的A层和含有一个表面与A层的表面接触的不饱和羧酸聚合物的B层。 C（= O）-O基数与C（= O）-OC基数（（C（= O）-O基数）/（C（= O） -OC基））由通过X射线光电子能谱测定B层的表面而得到的碳1s光谱进行波形分析得到的比例为1.4〜5.0。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2010248454A Plasma treatment apparatus and plasma treatment method 审中-公开
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：JP2010248454A
公开(公告)日：2010-11-04
申请号：JP2009102383
申请日：2009-04-20
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： ODAKAWA KENJI , SADAMOTO MITSURU , TANABE NAOYOSHI
IPC分类号： C08J7/00 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which can control the intermingling of an impurity gas from the atmosphere and can perform a plasma treatment excellent in the surface modification characteristics of a polymer material.
SOLUTION: The plasma treatment apparatus includes: a nozzle 20 equipped with a gas passage r; a pair of discharge electrodes 4 and 5 which are oppositely arranged interposing the nozzle 20, generate discharge under the substantially atmospheric pressure in the gas passage r, and produce an excitation active species of a treated gas; an integrally fabricated electrode holder 6 in which the nozzle 20 and the discharge electrodes 4 and 5 are arranged in the inside, and which has openings at both ends of a sending out direction z of the treated gas; a fixing member which presses at least the nozzle 20 toward the base level in the electrode holder 6 from the side of the discharge electrode 5, and fixes it to the electrode holder 6; a gas introduction member 3 which is prepared in one end of the electrode holder 6, and introduces the treated gas from one end of the gas passage r; and a blocking member 11 which blocks other end of the electrode holder 6, and has an outlet which discharges the treated gas which contains the excitation active species from the gas passage r.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够控制来自大气中的杂质气体的混合的等离子体处理装置，并且可以进行聚合物材料的表面改性特性优异的等离子体处理。解决方案：等离子体处理装置包括：配备有气体通道r的喷嘴20; 一对放置在喷嘴20上的相对配置的放电电极4和5在气体通道r中在大气压下产生放电，产生处理气体的激发活性物质; 整体制造的电极保持器6，其中喷嘴20和放电电极4和5布置在内部，并且在处理气体的排出方向z的两端具有开口; 至少将喷嘴20从放电电极5侧朝向电极保持件6的基准位置按压的固定部件，将其固定在电极保持架6上; 气体导入部件3，其在电极保持件6的一端形成，并从气体通路r的一端导入处理气体; 以及阻挡电极保持器6的另一端的阻挡构件11，并且具有从气体通道r排出含有激发活性物质的处理气体的出口。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2007134056A Plasma surface treatment device and manufacturing method of surface treatment cylinder base material 有权
标题翻译：表面处理缸基材料的等离子体表面处理装置及其制造方法
公开(公告)号：JP2007134056A
公开(公告)日：2007-05-31
申请号：JP2005323139
申请日：2005-11-08
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： ODAKAWA KENJI , SADAMOTO MITSURU
IPC分类号： H05H1/24 , B01J19/08 , C08J7/00 , C23C16/455
摘要： PROBLEM TO BE SOLVED: To provide a device capable of excellent plasma treatment more uniformly in a plasma surface treatment of a cylindrical base material, and a manufacturing method of a surface treatment cylindrical base material. SOLUTION: The coaxial type plasma surface treatment device has an electrode 1 arranged at outside of a coaxially arranged cylindrical base material 3, and an inside electrode 2 arranged so as to be opposed to the outside electrode 1 through the cylindrical base material 3. A groove, in which gas can flow in axial direction, is formed on the plasma surface treatment side electrode. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在圆柱形基材的等离子体表面处理中更均匀地获得优异等离子体处理的装置，以及表面处理圆柱形基材的制造方法。解决方案：同轴型等离子体表面处理装置具有布置在同轴布置的圆筒形基材3的外侧的电极1和通过圆筒形基材3布置成与外部电极1相对的内部电极2 在等离子体表面处理侧电极上形成有能够沿轴向流动的槽。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2011213847A Silicon-containing sealing film, solar battery element and organic el element using the same, and manufacturing method for silicon-containing sealing film 审中-公开
标题翻译：含硅密封膜，太阳能电池元件及使用其的有机EL元件以及含硅密封膜的制造方法
公开(公告)号：JP2011213847A
公开(公告)日：2011-10-27
申请号：JP2010082901
申请日：2010-03-31
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： ODAKAWA KENJI , TAKAGI TOSHIHIKO , FUKUMOTO HARUHIKO , SADAMOTO MITSURU , KIYONO KAZUHIRO
IPC分类号： C08J7/00 , H01L31/042 , H01L51/50 , H05B33/04 , H05B33/10
CPC分类号： Y02E10/545
摘要： PROBLEM TO BE SOLVED: To provide a silicon-containing sealing film having a high steam barrier property as compared with the conventional technology.SOLUTION: The silicon-containing sealing film includes a modified region formed by carrying out plasma irradiation on the principal surface of a polysilazane film. The modified region contains a silicon atom and a nitrogen atom, or a silicon atom, a nitrogen atom and an oxygen atom. The atomic composition is gradually varied in the modified region.
摘要翻译：要解决的问题：提供与传统技术相比具有高蒸汽阻隔性的含硅密封膜。解决方案：含硅密封膜包括通过在主表面上进行等离子体照射而形成的改质区域聚硅氮烷膜改性区域含有硅原子和氮原子，或硅原子，氮原子和氧原子。原子组成在改性区域逐渐变化。

5. 发明专利

JP2006236697A Electrode for forming discharge plasma 审中-公开
标题翻译：用于形成放电等离子体的电极
公开(公告)号：JP2006236697A
公开(公告)日：2006-09-07
申请号：JP2005047580
申请日：2005-02-23
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： ODAKAWA KENJI , SADAMOTO MITSURU
IPC分类号： H05H1/24 , C08J7/00 , C08L101/00
摘要： PROBLEM TO BE SOLVED: To provide an electrode for forming discharge plasma having high uniformity in discharge plasma, and to provide a plasma treating apparatus using the electrode.
SOLUTION: With a rod or a pipe in which at least a turn of spiral groove is formed as a winding core, a metal tube that becomes an electrode is wound around the spiral groove to manufacture the spiral electrode having improved shape precision. And the electrode for forming plasma in a double spiral shape is used, where two spiral electrodes thus obtained are used for fitting to a set of double spiral shapes.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于形成放电等离子体中具有高均匀性的放电等离子体的电极，并提供使用该电极的等离子体处理装置。解决方案：使用其中形成有至少一圈螺旋槽作为卷绕芯的杆或管，将成为电极的金属管卷绕在螺旋槽周围，以制造具有改善的形状精度的螺旋电极。并且使用用于形成双螺旋形状的等离子体的电极，其中由此获得的两个螺旋电极用于装配到一组双螺旋形状。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2012149278A Method for producing silicon-containing film 审中-公开
标题翻译：生产含硅膜的方法
公开(公告)号：JP2012149278A
公开(公告)日：2012-08-09
申请号：JP2011006647
申请日：2011-01-17
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： ODAKAWA KENJI , TAKAGI TOSHIHIKO , FUKUMOTO HARUHIKO , SADAMOTO MITSURU
IPC分类号： C23C14/06 , C23C14/58 , C23C16/42 , C23C16/56 , H01L21/318
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a silicon-containing film which shows high steam barrier property and heat and moisture resistance.SOLUTION: The method for producing a silicon-containing film includes: depositing a dry deposited film including at least silicon atom and nitrogen atom on a substrate by a dry method, and then modifying at least part of the film by irradiating the film surface with light having a wavelength of 150 nm or less. The method is suitably used for a dry deposited film including hydrogen derived from at least Si-H bond or N-H bond, which is formed by a means selected from among vapor deposition, reactive vapor deposition, sputtering, reactive sputtering, and chemical vapor deposition.
摘要翻译：要解决的问题：提供一种显示高蒸汽阻隔性和耐热湿性的含硅膜的制造方法。解决方案：含硅膜的制造方法包括：通过干法将至少包含硅原子和氮原子的干沉积膜沉积在基板上，然后通过照射膜改性至少部分的膜具有波长为150nm以下的光的表面。该方法适合用于通过选自气相沉积，反应蒸气沉积，溅射，反应溅射和化学气相沉积的方式形成的至少Si-H键或N-H键衍生的氢的干沉积膜。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2011174022A Method for producing polyolefin powder 审中-公开
标题翻译：生产聚烯烃粉末的方法
公开(公告)号：JP2011174022A
公开(公告)日：2011-09-08
申请号：JP2010040904
申请日：2010-02-25
申请人： Mitsui Chemicals Inc , Sophia School Corp , 三井化学株式会社 , 学校法人上智学院
发明人： ODAKAWA KENJI , USUI HIDEO , WACHI HIROKO , SADAMOTO MITSURU , YANAGIMOTO YASUSHI , KOKOMA MASUHIRO
IPC分类号： C08J3/28
摘要： PROBLEM TO BE SOLVED: To provide a method for producing polyolefin powder capable of hydrophilizing the polyolefin powder to an extent to get sufficient industrial value.
SOLUTION: The method for producing the polyolefin powder comprises plasma irradiation of polyolefin powder having a characteristic particle diameter of ≥1 μm and ≤100 μm to impart the polyolefin powder with water dispersibility and set absolute value of zeta potential to ≥10 mV within a pH range of 2 to 13.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供一种能够使聚烯烃粉末亲水化得到足够的工业价值的聚烯烃粉末的制造方法。解决方案：聚烯烃粉末的制造方法包括等离子体照射具有特征粒径≥1μm和≤100μm的聚烯烃粉末，赋予聚烯烃粉末水分散性，并将ζ电位的绝对值设定为≥10mV 在2至13的pH范围内。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2010215776A Plasma treatment method of polymer substrate 审中-公开
标题翻译：聚合物基材的等离子体处理方法
公开(公告)号：JP2010215776A
公开(公告)日：2010-09-30
申请号：JP2009063743
申请日：2009-03-17
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： MURAYAMA SHUNSUKE , ODAKAWA KENJI , ABE TAKATOSHI , SADAMOTO MITSURU
IPC分类号： C08J7/00 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a method for treating a polymer substrate, which is capable of selectively forming a functional group on a surface of the polymer substrate without causing any deposition on the polymer substrate and provides a high process adaptability. SOLUTION: The plasma treatment method includes: a first step of generating active species by exciting a gas component under atmospheric pressure or a pressure close thereto to convert the gas component into plasma; and a second step of delivering the active species to the surface of the polymer substrate to treat the surface. The gas component contains a primary alcohol as a treating agent, provided that the primary alcohol is a compound of which the Gibbs free energy calculated by a computational scientific approach is smaller for a structure having an α-carbon radical compared to that for a structure having an oxygen radical. The first and second steps are carried out in an atmosphere substantially free of water component. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种处理聚合物基材的方法，其能够在聚合物基材的表面上选择性地形成官能团而不会在聚合物基材上引起任何沉积，并提供高的工艺适应性。等离子体处理方法包括：通过在大气压或接近其的压力下激发气体成分以将气体成分转化为等离子体来产生活性物质的第一步骤; 以及将活性物质递送到聚合物基材的表面以处理该表面的第二步骤。气体组分含有作为处理剂的伯醇，条件是伯醇是对于具有α-碳自由基的结构，通过计算科学方法计算的吉布斯自由能与具有α-碳自由基的结构相比较的化合物相比，氧自由基。第一和第二步骤在基本上不含水分的气氛中进行。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2012148416A Laminate and method for producing the same 有权
标题翻译：层压板及其制造方法
公开(公告)号：JP2012148416A
公开(公告)日：2012-08-09
申请号：JP2011006645
申请日：2011-01-17
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： FUKUMOTO HARUHIKO , ODAKAWA KENJI , SADAMOTO MITSURU , NAKAYAMA TOKUO , TAKAGI TOSHIHIKO
IPC分类号： B32B27/00 , B05D7/24 , B32B9/00
摘要： PROBLEM TO BE SOLVED: To provide a film which is made of polysilazane, is excellent in scratch resistance, transparency and adhesion to a base material, and further has a high refractive index, and to provide a method for producing the film.SOLUTION: A laminate includes: a base material 12; and a silicon-containing film 16 formed on the base material 12. The silicon-containing film 16 includes a nitrogen high concentration region 18 composed of silicon atoms and nitrogen atoms, or silicon atoms, nitrogen atoms and oxygen atoms. The nitrogen high concentration region is formed by irradiating a film 14, mixed with a transition metal compound and formed on the base material 12, with energy rays in an atmosphere substantially not including oxygen or water vapor and by denaturing at least a part of the film.
摘要翻译：要解决的问题：为了提供一种由聚硅氮烷制成的膜，其耐划伤性，透明性和与基材的粘合性优异，并且还具有高折射率，并且提供了一种制备该膜的方法。解决方案：层压体包括：基材12; 以及形成在基材12上的含硅膜16.含硅膜16包括由硅原子和氮原子构成的氮高浓度区域18或硅原子，氮原子和氧原子。氮高浓度区域通过在基本上不含氧气或水蒸汽的气氛中照射与过渡金属化合物混合并形成在基材12上的能量射线的薄膜14，并且通过使至少一部分薄膜变性。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2012143996A Laminate and method for manufacturing the same 有权
标题翻译：层压板及其制造方法
公开(公告)号：JP2012143996A
公开(公告)日：2012-08-02
申请号：JP2011005420
申请日：2011-01-14
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： FUKUMOTO HARUHIKO , ODAKAWA KENJI , SADAMOTO MITSURU , NAKAYAMA TOKUO , TAKAGI TOSHIHIKO , USUI HIDEO
IPC分类号： B32B27/00 , B05D5/06 , B05D7/24 , B32B9/00
摘要： PROBLEM TO BE SOLVED: To provide a gas-barrier installation film having high refractive index, excellent abrasion resistance, excellent transparency, and excellent adhesiveness to a base material, excellent productivity, and steam barrier property and oxygen barrier property excellent in the stability of the characteristics.SOLUTION: A laminate includes a base material, and a silicon-containing film formed on the base material. The silicon-containing film has a region of high-concentration nitrogen consisting of silicon atoms and nitrogen atoms, or silicon atoms, nitrogen atoms and oxygen atoms. The region of high-concentration nitrogen is formed by modifying at least a part of a polysilazane film by executing irradiation of the light having the wavelength of ≤150 nm under the atmosphere in which any oxygen or steam is substantially not contained in the polysilazane film formed on the base material.
摘要翻译：解决方案：提供一种具有高折射率，优异的耐磨性，优异的透明性和优异的基材粘合性，优异的生产率，以及优异的蒸气阻隔性和氧气阻隔性的阻气性设置膜稳定性的特点。解决方案：层压体包括基材和形成在基材上的含硅膜。含硅膜具有由硅原子和氮原子或硅原子，氮原子和氧原子组成的高浓度氮的区域。通过在形成的聚硅氮烷膜中的基本上不含有氧或蒸汽的气氛下进行波长为≤150nm的光的照射来修饰至少一部分聚硅氮烷膜而形成高浓度氮的区域在基材上。版权所有（C）2012，JPO＆INPIT

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