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1. 发明专利

JP2004286645A Multiwavelength light source apparatus 审中-公开
公开(公告)号：JP2004286645A
公开(公告)日：2004-10-14
申请号：JP2003080343
申请日：2003-03-24
申请人： Minolta Co Ltd , ミノルタ株式会社
发明人： YAMADA MASAYUKI , GOTO YASUSHI
IPC分类号： G01J3/10 , G01N21/01 , G01N21/27 , G02B5/18
摘要： PROBLEM TO BE SOLVED: To provide a compact, lightweight, and low-cost multiple wavelength light source apparatus. SOLUTION: The multiwavelength light source apparatus 1 is provided with a diffraction grating 14 for spatially dispersing light; a plurality of light sources 11 arranged in the direction of dispersion of the diffraction grating for emitting lights each containing light of a desired wavelength toward the diffraction grating 14; a lens 13 arranged between the diffraction grating 14 and the light sources 11 for making the lights emitted by the light sources 11 parallel and guiding them to the diffraction grating 14 and condensing lights diffracted and reflected at the diffraction grating 14; and an emergent slit 16 for passing only light having a specific dispersion width among the lights condensed by the lens 13. The emergent slit 16 is arranged within an angle of distribution of the plurality of light sources 11. COPYRIGHT: (C)2005,JPO&NCIPI

2. 发明专利

JP2004340733A Measuring instrument 审中-公开
公开(公告)号：JP2004340733A
公开(公告)日：2004-12-02
申请号：JP2003137274
申请日：2003-05-15
申请人： Minolta Co Ltd , ミノルタ株式会社
发明人： YOSHIDA HIROKO , YAMAMOTO KOJI , GOTO YASUSHI , UEDA HIROAKI , KASAI ICHIRO , NISHIDA NAOKI , NODA TETSUYA
IPC分类号： G01N21/64
摘要： PROBLEM TO BE SOLVED: To provide a measuring instrument capable of realizing the simplification of constitution and miniaturization. SOLUTION: A light source 11 emits at least light with a first wavelength. A diffraction optical element 12 is constituted so as not only to reflect the exciting light with the first wavelength emitted from the light source 11 to guide the same to a sample S but also to permit fluorescence with a second wavelength shifted from the first wavelength by the sample S to transmit to separate the exciting light with the first wavelength and the fluorescence with the second wavelength. A fluorescence detector 14 detects the fluorescence with the second wavelength separated by the diffraction optical element 12. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2004294072A Multiwavelength light source device and optical measuring apparatus 审中-公开
公开(公告)号：JP2004294072A
公开(公告)日：2004-10-21
申请号：JP2003082697
申请日：2003-03-25
申请人： Minolta Co Ltd , ミノルタ株式会社
发明人： YAMADA MASAYUKI , GOTO YASUSHI
IPC分类号： G01J3/10 , G01J3/18 , G01N21/01 , G01N21/27
摘要： PROBLEM TO BE SOLVED: To provide a multiwavelength light source device and an optical measuring apparatus for avoiding the occurrence of measurement errors.
SOLUTION: The optical measuring apparatus comprises a plurality of light sources 11 for emitting light containing light having desired wavelength each; optical systems 13, 14 for diffracting light emitted from the plurality of light sources 11 in a specific direction according to a desired wavelength; and an emission slit 16 for selectively transmitting light from the optical systems 13, 14. In the multiwavelength light source device 10 for the optical measuring apparatus 1, the plurality of light sources 11 are arranged so that the direction of diffraction of light having a desired wavelength in each light source 11 by the optical systems 13, 14 becomes the direction of an emission slit 16. Then, a beam splitter 19 for branching the light path of light emitted from the emission slit 16 is further provided. With an angular aperture for both luminous flux branched by the beam splitter 19, the angular aperture for one luminous flux is limited to the other.
COPYRIGHT: (C)2005,JPO&NCIPI

4. 发明专利

JP2004286647A Multiwavelength light source apparatus 审中-公开
标题翻译：多光源光源装置
公开(公告)号：JP2004286647A
公开(公告)日：2004-10-14
申请号：JP2003080377
申请日：2003-03-24
申请人： Minolta Co Ltd , ミノルタ株式会社
发明人： YAMADA MASAYUKI , GOTO YASUSHI
IPC分类号： G01J3/10 , G01J3/18 , G01N21/01
摘要： PROBLEM TO BE SOLVED: To provide a multiwavelength light source apparatus which sets half value widths at a plurality of light sources for every wavelength of light emission. SOLUTION: The multiwavelength light source apparatus 1 is provided with: a diffraction grating 14 for spatially dispersing light; a plurality of light sources 11 for emitting lights each containing a desired wavelength toward the diffraction grating 14; a plurality of incident slits 12 each arranged in the vicinity of the plurality of light sources 11 for suppressing the dispersion of lights of a specific direction among the lights from the light sources 11; a lens 13 for making the lights suppressed by the incident slits 12 parallel, guiding them to the diffraction grating 14, and condensing lights diffracted and reflected at the diffraction grating 14; and an emergent slit 16 for passing only light having a specific dispersion width among the lights condensed by the lens 13. The slit widths of the plurality of incident slits 12 are set according to the light sources 11, respectively. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种多波长光源装置，其针对每个发光波长在多个光源处设定半值宽度。解决方案：多波长光源装置1设置有用于空间散射光的衍射光栅14; 多个光源11，用于向衍射光栅14发射各自含有所需波长的光; 多个入射狭缝12，其布置在多个光源11附近，用于抑制来自光源11的光中的特定方向的光的分散; 用于使入射狭缝12抑制的光平行的透镜13，将它们引导到衍射光栅14，并且会聚在衍射光栅14处衍射和反射的光; 以及用于仅透过由透镜13聚光的光之间具有特定色散宽度的光的出射狭缝16.多个入射狭缝12的狭缝宽度分别根据光源11设定。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2004286512A Multiple wavelength light source apparatus and optical measuring apparatus 审中-公开
公开(公告)号：JP2004286512A
公开(公告)日：2004-10-14
申请号：JP2003077310
申请日：2003-03-20
申请人： Minolta Co Ltd , ミノルタ株式会社
发明人： YAMADA MASAYUKI , GOTO YASUSHI
IPC分类号： G01J3/10 , G01J3/18 , G01N21/01 , G01N21/27
摘要： PROBLEM TO BE SOLVED: To provide a compact, lightweight, and low-cost multiple wavelength light source apparatus and an optical measuring apparatus in which such a multiple wavelength light source apparatus is incorporated. SOLUTION: The multiple wavelength light source 1 is provided with: a plurality of light source parts 11 and 12 each for emitting light containing light having a desired wavelength; optical systems 13 and 14 for diffracting light projected from the plurality of light source parts 11 and 12 in a specific direction according to the desired wavelength and condensing the light; and an emergent slit 16 for selectively transmitting the light from the optical systems 13 and 14. The plurality of light source parts 11 and 12 are each arranged in such a way that the direction of diffraction by the optical systems 13 and 14 of the light having the desired wavelength of the light source parts 11 and 12 may be matched with the direction of the emergent slit 16. In the multiple wavelength light source apparatus 1, the emergent slit 16 is arranged within an angle of distribution of the plurality of light source parts 11 and 12. The plurality of light source parts 11 and 12 are arranged at such locations that the order of diffraction of light transmitted though the emergent slit 16 may include a plurality of orders of diffraction. COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JPH08327450A SPECTROPHOTOMETER 失效
公开(公告)号：JPH08327450A
公开(公告)日：1996-12-13
申请号：JP13088895
申请日：1995-05-30
申请人： MINOLTA CO LTD
发明人： TSURUYA KATSUTOSHI , ITOU SEISHIRO , GOTO YASUSHI , KAMIO NOBUYUKI , OKUI SHIZUHIRO
IPC分类号： G01J3/02 , G01J1/04 , G01J3/36
摘要： PURPOSE: To provide a spectrophotometer which can make accurate spectrophotometric measurement even when the brightness of an object to be measured in the visual field for measurement of the spectrophotometer is uneven. CONSTITUTION: A spectrophotometer is provided with an objective lens 2 which forms the image I1 of an object 1 to be measured, an entrance slit plate P1 having an entrance slit h1 at the image forming position, first to third lens groups 13-15 which condense the light passing through the slit h1, a diffraction grating 4 which diffracts the light passing through the slit h1, and a sensor S0 which receives the light condensed through the lens groups 13-15 and diffracted through the grating 4. The positions of the lens groups 13 to 15 and the sensor S0 are decided so that a conjugate relation can be established between the entrance pupil (aperture stop) AP of the lens groups 13-15 and the light receiving surface SS of the sensor S0.

7. 发明专利

JP2002090791A EXPOSURE METER 失效
公开(公告)号：JP2002090791A
公开(公告)日：2002-03-27
申请号：JP2000280381
申请日：2000-09-14
申请人： MINOLTA CO LTD
发明人： GOTO YASUSHI , YUASA YOSHIO
IPC分类号： G01J1/02 , G01J1/44 , G03B7/0805 , G03B17/18 , G03B7/08
摘要： PROBLEM TO BE SOLVED: To provide an exposure meter which can expose by both an incident light system and a reflected light system and makes it possible to easily compare a measured value of the incident light system and a measured value of the reflected light system with each other. SOLUTION: The exposure meter which can measure exposure by both the incident light system and reflected light system has a display part 6 where the measured value A1 of the incident light system and the measured value R1 of the reflected light system can be displayed together so that they can be contrasted with each other.

8. 发明专利

JP2000115818A CRT MEASUREMENT INSTRUMENT 失效
公开(公告)号：JP2000115818A
公开(公告)日：2000-04-21
申请号：JP27899698
申请日：1998-09-30
申请人： MINOLTA CO LTD
发明人： GOTO YASUSHI , SHIMIZU SHINJI
IPC分类号： H04N17/04 , G09G1/00 , G09G5/00
摘要： PROBLEM TO BE SOLVED: To enhance the S/N ratio of a photographed image of a measured pattern which is displayed on a CRT. SOLUTION: A signal generator 4 outputs a video signal of a measured pattern displayed on a color CRT 6. A vertical synchronizing signal detection section 26 and a horizontal synchronizing signal detection section 27 detect a vertical synchronizing pulse and a horizontal synchronizing pulse from the video signal. A counter 251 in a control section 25 starts counting the vertical synchronizing pulse from a detection timing of the vertical synchronizing pulse, and when the count of the counter 251 reaches a count corresponding to a light emission start timing of a measured area set on a CRT display screen and a count corresponding to a light emission end timing, an exposure control signal generating section 252 outputs a control signal, consisting of an exposure start signal and an exposure stop signal to a CCD camera 3 respectively. The exposure of the CCD camera 3 is conducted only for the light emission period of the measured area, so as to prevent the deterioration in the S/N ratio of the image signal due to the exposure for the non-light-emission period other than the light emission period.

9. 发明专利

JP2002323372A EXPOSURE METER 失效
公开(公告)号：JP2002323372A
公开(公告)日：2002-11-08
申请号：JP2001130822
申请日：2001-04-27
申请人： MINOLTA CO LTD
发明人： IMAI KIYOSHI , GOTO YASUSHI , ISHIKAWA NORIO
IPC分类号： G01J1/02 , G03B7/02 , G03B13/06 , G03B17/18 , G03B17/20 , G03B17/56
摘要： PROBLEM TO BE SOLVED: To prevent mistake in a measuring system by a user, concerning an exposure meter equipped with both an incident light system light receiving part and a reflection light system light receiving part. SOLUTION: This exposure meter is equipped with a control circuit 55 for displaying a measured value only on an external LCD 3 while measurement by the incident light system in the ON state of an incident light measuring key 27, and displaying the measured value only on a finder LCD 35 while measurement by the reflected light system in the ON state of a reflected light measuring key 26.

10. 发明专利

JP2000115817A PROFILE MEASUREMENT INSTRUMENT 失效
公开(公告)号：JP2000115817A
公开(公告)日：2000-04-21
申请号：JP27751198
申请日：1998-09-30
申请人： MINOLTA CO LTD
发明人： SHIMIZU SHINJI , GOTO YASUSHI
IPC分类号： H01J9/42 , G01B11/24 , G01M11/00 , G09G1/00 , H04N17/04
摘要： PROBLEM TO BE SOLVED: To enhance measurement accuracy for a profile measurement. SOLUTION: A plurality of measurement patterns with different light emitting positions of phosphors in each measurement pattern are displayed on a display screen of a measured CRT, and a light emitting position of the phosphors, and the luminance level in each measurement pattern are calculated from a photographed image (steps #2-#8). In this case, the light emitting position of the phosphors are calculated by calculating a reference position of a coordinate system for each measurement pattern and taking this reference position as an origin (step #6). Then the luminance levels of the phosphors obtained from all the measured patterns are rearranged, based on the light emission position to calculate a profile of each measured pattern (steps #10, #12). Even when an interval of measured patterns is deviated, the deviation does not give any effect on the light emitting position of the phosphors by specifying the light emitting position based on the reference position of the coordinate system calculated for each measurement pattern.

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