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1. 发明专利

JPH037940A PRODUCTION OF PHOTOMASK 失效
公开(公告)号：JPH037940A
公开(公告)日：1991-01-16
申请号：JP14249689
申请日：1989-06-05
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ASO SHINICHI
IPC分类号： G03B27/32 , G03F1/00 , G03F1/68 , G03F1/76 , H01L21/027
摘要： PURPOSE:To form the photomask which is suppressed in noise, such as dust, by irradiating a photomask master plate with the Fourier transformation image of an original picture pattern and simultaneously irradiating the plate with the collimated beams of light branched from the exit laser beam by inclining the beams. CONSTITUTION:The light emitted from a laser 1 is collimated by a collimation lens 2 to the collimated beams of light. An input plate drawn with the original picture pattern 3 is irradiated with a part of the beams. The beams are transmitted through a lens 4 of a focal length f installed apart a distance f behind the pattern 3 and further, the photomask master plate 5 installed apart the distance f behind the lens 4 is irradiated with the Fourier transformation image of the original picture pattern. The collimated beams of light mentioned above are partly and simultaneously superposed on the above-mentioned image and are exposed by inclining the beams at an angle theta by an optical path converter 6. The photosensitive silver salt applied on the master plate 5 is in succession subjected to a development processing, by which the photomask is formed.

2. 发明专利

JPH02103919A ALIGNER 失效
公开(公告)号：JPH02103919A
公开(公告)日：1990-04-17
申请号：JP25756988
申请日：1988-10-13
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： AKUTAGAWA RYUTARO , ASO SHINICHI , INAMI TAKASHI , TAKEGAWA HIROZO , SHIMIZU TOKIHIKO
IPC分类号： G03F7/20 , H01L21/027
摘要： PURPOSE:To enable acryloid photoresist to be patterned stably by introducing inert gas through a gas introduction part into closed space which is formed in the vicinity of a sample by a sample base, a sample base sidewall, and a mask, and exhausting air to the outside. CONSTITUTION:A sidewall 11 is erected around a sample base 10, and sealed space 12 is formed which is surrounded by this side wall 11 and the mask 9 being held to a mask holder 8 by vacuum chuck. When inert gas is introduced into the closed space 12 from a gas introduction port 15, the inert gas fills in the space 12 while expelling air in the space 12 from an exhaust port 16. A sample 13 which is chuck by vacuum onto the sample base 10 and on which photoresist is applied is exposed to the light through the mask 9.

3. 发明专利

JPH0253003A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH0253003A
公开(公告)日：1990-02-22
申请号：JP20515888
申请日：1988-08-18
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ASO SHINICHI , INAMI TAKASHI , TAKEGAWA HIROZO , AKUTAGAWA RYUTARO , SHIMIZU TOKIHIKO
IPC分类号： G02B5/20
摘要： PURPOSE:To easily manufacture the color filter which has a nondefective stable pattern by coating a transparent base material with photosetting photoresist of one of black, red, green, and blue, exposing and developing it by using a photomask, and then exposing the entire surface again in the absence of the photomask. CONSTITUTION:The base material 1 is coated with the photosetting photoresist 2 where pigment of one of black, red, green, and blue is dispersed and the photoresist 2 is irradiated with ultraviolet rays in an exposing process C through the mask where a desired pattern is drawn to print the pattern of the mask on the photoresist 2. Then the resist at the unirradiated part is etched and peeled in a developing process D, and the remaining resist is exposed in a 2nd exposing process F to form 1st picture elements. Those processes are repeated to form 2nd and 3nd picture elements,thus manufacturing the color filter 8 which have black light shield parts 4, red picture elements 5, green picture elements 6, and blue picture elements 7 on the base material 1. Consequently, a stable picture element pattern is formed and the color filter which does not have any defect such as a light leak is obtained.

4. 发明专利

JPH01293306A MANUFACTURE OF COLOR FILTER 失效
公开(公告)号：JPH01293306A
公开(公告)日：1989-11-27
申请号：JP12435688
申请日：1988-05-20
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ASO SHINICHI , AKUTAGAWA RYUTARO , TAKEGAWA HIROZO , INAMI TAKASHI , SHIMIZU TOKIHIKO
IPC分类号： G02B5/20
摘要： PURPOSE:To eliminate a light leak and an overlap of picture elements by forming all picture element parts and then applying and drying photosetting photoresist which contains a black material, and thus forming parts for light shielding between picture elements. CONSTITUTION:The photosetting photoresist 2 which contains one of red, green, and blue is applied on a transparent base material 1 and dried, and the photoresist is baked by irradiating with ultraviolet rays through a photomask 3, developed, and cured to form 1st picture elements. Similarly, red picture elements 4, green picture elements 5, and blue picture elements 6 are formed on the base 1 to manufacture a sample 7. Then the sample 7 is further coated with the photosetting photoresist 8 where black pigment is dispersed and ultraviolet rays irradiates from the uncoated surface of the base material 1 to perform exposure. Similarly, black light shield parts 9 are formed between the picture elements through a developing process and a setting process to form the color filter 10. Consequently, light shielding for exposure light to existent picture elements can be utilized and the light leak and overlap are eliminated.

5. 发明专利

JPH01258759A APPARATUS FOR APPLYING LIQUID 失效
公开(公告)号：JPH01258759A
公开(公告)日：1989-10-16
申请号：JP8472588
申请日：1988-04-06
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： TAKEGAWA HIROZO , ASO SHINICHI , SHIMIZU TOKIHIKO , INAMI TAKASHI , AKUTAGAWA RYUTARO
IPC分类号： B05C1/02 , B05C11/08 , G03F7/16 , H01L21/027 , H01L21/30
摘要： PURPOSE:To increase the efficiency of utilization of a liq. and to form a film of a uniform thickness by applying the liq. to the entire surface of a base material in a thickness close to the prescribed thickness with a roller and rotating the base material to make the ununiform thickness of the resulting film smooth. CONSTITUTION:A base material 2 is put on a holder 1, a liq 4 is applied to the material 2 with a roller 7 and the material 2 is rotated with a motor 5. Since a film of a slightly larger thickness than a prescribed thickness is formed on the entire surface of the material 2 before the material 2 is rotated, the amt. of the liq. scattered uselessly by the rotation is reduced. The efficiency of utilization of the liq. is increased and a film of the prescribed uniform thickness can be formed.

6. 发明专利

JPH01195424A COLOR PROJECTING DEVICE 失效
公开(公告)号：JPH01195424A
公开(公告)日：1989-08-07
申请号：JP2050388
申请日：1988-01-29
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SHIMIZU TOKIHIKO , ASO SHINICHI , INAMI TAKASHI , TAKEGAWA HIROZO , AKUTAGAWA RYUTARO
IPC分类号： G03B21/132 , G02F1/133 , G02F1/1335
摘要： PURPOSE:To improve light-proof and heat-proof by utilizing a transmitted light type liquid crystal panel body equipped with a reliable light-proof and heat-proof color filter as a transparency. CONSTITUTION:The color filter 12 is obtained by providing red, green and blue picture elements 12a containing photosensitive resin and pigment and a black matrix 12b on a transparent substrate 11 and moreover providing a transparent electrode layer 12c on the surface as the transparency. The photosensitive resin is a composition containing a multifunction acrylate monomer, an organic polymer bond agent and a photopolymerization start agent consisting of a halomethyl-s-triazine-based compound. And the transmitted light type liquid crystal panel body 1 equipped with said color filter 12 is composed to be disposed. Thus, the reliability in the light-proof and the heat-proof against ultraviolet-rays and infrared-rays projected from a light source can be improved.

7. 发明专利

JPH0136023B2 失效
公开(公告)号：JPH0136023B2
公开(公告)日：1989-07-28
申请号：JP19781183
申请日：1983-10-21
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： EBISU KOJI , HOZUMI SHIRO , ASO SHINICHI , MITSUMATA TADAYASU , YOSHINO MASAAKI
IPC分类号： F24D17/00 , F24J2/44

8. 发明专利

JPH0136022B2 失效
公开(公告)号：JPH0136022B2
公开(公告)日：1989-07-28
申请号：JP16860683
申请日：1983-09-13
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： HOZUMI SHIRO , ASO SHINICHI , EBISU KOJI , YOSHINO MASAAKI , MITSUMATA TADAYASU
IPC分类号： F24J2/44 , F24D17/00

9. 发明专利

JPH01108043A PRINTING APPARATUS 失效
公开(公告)号：JPH01108043A
公开(公告)日：1989-04-25
申请号：JP26674387
申请日：1987-10-21
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： NISHIWAKI FUMITOSHI , INAMI TAKASHI , ASO SHINICHI
IPC分类号： B41F17/14 , B41F3/81
摘要： PURPOSE:To make it possible to directly print a printing film with favorable uniformity of ink film thickness and high pattern accuracy, by providing a printing plate and a mold member having a smooth surface of an ink repellency, whereby the printing plate is brought into touch with an object to be printed after the mold member is brought into contact with a printing surface adhered with the ink. CONSTITUTION:When a carriage 9 is returned leftwards after it is moved rightwards, a printing plate 8 is pressed against a mold member 14 which has a smooth surface of an ink repellency. At this time, since the pressure is generated between the printing plate 8 and the mold member 14 having the smooth surface, an ink 17 adhered to printing area of the printing plate 8 is made flat. The printing plate 8 is a waterless plate, and therefore, when the printing plate 8 is pressed against the mold member 14, the ink at the printing area of the plate 8 is never pressed out to a non-image area of the mold having the ink repellency. Then, the printing plate 8 the printing area of which is made uniform in the ink film thickness thereof is brought into contact with a glass plate 13, effecting printing on the glass plate 13. Accordingly, since the ink at the printing area of the printing plate 8 is arranged to be divided into two layers, the ink film formed on the glass plate can be rendered uniform in the distribu tion of the film thickness.

10. 发明专利

JPS6473077A PRODUCTION OF THIN METALLIC FILM 失效
公开(公告)号：JPS6473077A
公开(公告)日：1989-03-17
申请号：JP23130387
申请日：1987-09-16
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ASO SHINICHI , AKUTAGAWA RYUTARO , SUZUKI SHIGEO
IPC分类号： C23C14/56
摘要： PURPOSE:To produce a perpendicular magnetic recording medium having specified mechanical characteristics by forming a thin alloy film of Co-Cr, etc., on a high- polymer film, then pulling the film plural times by means of tension rollers, etc., under the elastic load within the elastic limit of the film. CONSTITUTION:Ti and Co-Cr alloy are deposited by vacuum evaporation on the surface of the heat resistant high-polymer film consisting of polyimide, etc., having a high glass transition temp. and thermal decomposition temp. to form the perpendicular magnetic recording medium 2. This medium is pulled out of a feed roller 1 and is passed along side a free roller 3, following which the medium is pulled by a 1st tension roller 1 and is fed to nip rollers 5. The tensile stress of this time is set at the load within the elastic limit of the high-polymer polyimide film. The film is further fed from the nip rollers 5 to 6 and the tensile stress of this time is set at 0. The film is then pulled under the stress similar to the previous time to the 2nd tension roller 7 and nip rollers 8 and is further sent by the tensile stress 0 to nip rollers 9 from which the film is sent to a tension roller 10 and a free roller 11 and is taken up on a take-up roller 9. The modulus of the film is maintained constant, by which the magnetic recording medium having the uniform vapor deposited Co-Cr film is obtd.

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