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1. 发明专利

JPH08120475A PRODUCTION OF HIGH PURITY GASEOUS NITROGEN TRIFLUORIDE 失效
公开(公告)号：JPH08120475A
公开(公告)日：1996-05-14
申请号：JP25651494
申请日：1994-10-21
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI , YOSHINO TADASHI
IPC分类号： C25B1/24 , C01B21/083
摘要： PURPOSE: To industrially and economically obtain a high purity gaseous NF3 by making each of an electrode and a raw material into a prescribed component at the time of producing NF3 by molten salt electrolysis using a nickel electrode and ammonium hydrogen fluoride as an electrolytic solution. CONSTITUTION: Gaseous NF3 is produced by using nickel as the metallic electrode and ammonium hydrogen fluoride as the electrolytic solution, which is obtained by allowing gaseous hydrofluoric acid to react with gaseous ammonia, as a raw material of the electrolytic solution. In the method, the purity of nickel to be used as the electrode is regulated to >=98.5wt.%, the purity of gaseous hydrofluoric acid is regulated to >=99.8wt.% and the purity of gaseous ammonia is regulated to >=99.5wt.%. As a result, gaseous NF3 >=99.99vol.% in purity is easily produced only by changing the electrode and the raw material without changing the conventional equipment.

2. 发明专利

JPH04298219A METHOD FOR REFINING GASEOUS RAW MATERIAL 失效
公开(公告)号：JPH04298219A
公开(公告)日：1992-10-22
申请号：JP6179291
申请日：1991-03-26
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI
IPC分类号： B01D53/86
摘要： PURPOSE:To remove the malodorous components in gases and to obtain a gaseous raw material which does not substantially contain oxygen by using a specific oxide solid catalyst. CONSTITUTION:The gaseous raw material contg. the malodorous components, reducing gas and a low concn. of dissolved oxygen is fed from a gas introducing port 1 and is introduced into a reaction column 3 packed with the oxide solid catalyst 2 of manganese dioxide and cupric oxide as active components, by which the gaseous raw material is catalytically oxidized. The malodorous component are subjected to oxidation decomposition by the dissolved oxygen- component and the remaining dissolved oxygen-component is removed as an oxide by reacting with the malodorous components and/or the reducing gas contained in the gaseous raw materials. This oxide is sent from a treated gas outlet 5 to a post stage. A trace oxygen analyzer 4 is preferably installed to monitor the treated gases in a treated gas outlet 5.

3. 发明专利

JPH046650B2 失效
公开(公告)号：JPH046650B2
公开(公告)日：1992-02-06
申请号：JP15018088
申请日：1988-06-20
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI , INOE TADASHI , OOKOBA AKIRA , YODA YUKIHIRO , KAMEDA SHIGEYUKI
IPC分类号： C01F11/46

4. 发明专利

JPS57149816A MANUFACTURE OF SODIUM SILICOFLUORIDE FROM WASTE GAS CONTAINING FLUORINE 失效
公开(公告)号：JPS57149816A
公开(公告)日：1982-09-16
申请号：JP3249981
申请日：1981-03-09
申请人： MITSUI TOATSU CHEMICALS
发明人： IEDA MINORU , SAKASHITA KUNIO , SHINOZAKI TAKEKI
IPC分类号： C01B33/10
摘要： PURPOSE:To inexpensively manufacture coarse-grained sodium silicofluoride of high purity by allowing waste gas contg. fluorine to be absorbed in water to prepare an aqueous soln. of hydrosilicofluoric acid having a specified concn., adding seawater to the soln. so that sodium chloride is contained in a specified ratio, and reacting them. CONSTITUTION:Waste gas contg. fluorine is allowed to be absorbed in water to prepare an aqueous soln. of hydrosilicofluoric acid, and the concn. is adjusted to 10-30, preferably 20-25wt%. To the soln. is added seawater by an amount supplying 1.5-2.5, preferably 2.0-2.3mol NaCl per 1mol hydrosilicofluoric acid, and they are reacted at ordinary temp. - about 70 deg.C. Thus, high quality sodium silicofluoride having >= about 98.5% purity and about 20-60mum particle size is obtd.

5. 发明专利

JPS5641815A PURIFYING METHOD FOR WET PROCESS PHOSPHORIC ACID SOLUTION 失效
公开(公告)号：JPS5641815A
公开(公告)日：1981-04-18
申请号：JP11610479
申请日：1979-09-12
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI , IEDA MINORU
IPC分类号： C01B25/225 , C01B25/229 , C01B25/231 , C01B25/237
摘要： PURPOSE:To reduce sulfuric acid radicals in a phosphoric acid soln. manufactured by a wet process and to efficiently purify the soln. by adding phosphate ore to the soln. so that the molar ratio of CaO to SO3 in the soln. is adjusted to equivalent or more, forming gypsum. CONSTITUTION:Sulfuric acid radicals dissolved in a wet process phosphoric acid soln. manufactured especially by a dihydration method or a dihydration-hemihydration method are treated with phosphate ore, forming gypsum, which is then separated. In this method phosphate ore is added under the conditions of =1, and the ore-added soln. is allowed to stand after agitation. Thus, gypsum formed is grown to about 20-80mu coarse particles and separated as crystals easy to separate, thereby easily reducing the sulfuric acid radicals.

6. 发明专利

JPS5641813A HANDLING METHOD FOR WET PROCESS PHOSPHORIC ACID SOLUTION 失效
公开(公告)号：JPS5641813A
公开(公告)日：1981-04-18
申请号：JP11524679
申请日：1979-09-10
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI , IEDA MINORU
IPC分类号： B65D85/82 , B01J19/00 , B01J19/02 , C01B25/18
摘要： PURPOSE:To prevent the sticking of scale by using products made of reinforced plastics such as FRP as a storage tank, a reactor, etc. used in the manufacture of highly corrosive wet process phosphoric acid soln. or industrial chemicals from the soln. as starting material. CONSTITUTION:Owing to its acidity and fluorine, sulfuric acid and other many impurities contained, a wet process phosphoric acid soln. is highly corrosive as compared to a pure phosphoric acid soln., and it forms scale of impurities. As a reactor, a storage tank, etc. used in the manufacture of such a wet process phosphoric acid soln. or industrial chemicals by adding alkali or the like to the soln., containers made of phenol resin, polyester resin or composite molding obtd. by adding a reinforcing material such as glass fiber to such resin, i.e. reinforced plastics are used. Containers covered with these materials may be used. No scale is stuck to the inner walls of the containers, so the number of times of cleaning work can be reduced.

7. 发明专利

JPH08225320A MODIFICATION OF ALPHA-HEMIHYDRATE GYPSUM OBTAINED AS BY-PRODUCT OF WET-PROCESS FOR PRODUCING PHOSPHORIC ACID 失效
公开(公告)号：JPH08225320A
公开(公告)日：1996-09-03
申请号：JP33004995
申请日：1995-12-19
申请人： MITSUI TOATSU CHEMICALS
发明人： YOSHINO TADASHI , SHIRAISHI TASUKU , SHINOZAKI TAKEKI
IPC分类号： C04B11/00 , C01B25/226 , C01F11/46 , C04B11/26 , C04B28/14
摘要： PURPOSE: To improve the hydrating property of an α-hemihydrate gypsum, save the energy, simplify the production process and reduce the cost by washing and drying an α-hemihydrate gypsum obtained as a by-product of a wet-process for producing phosphoric acid by decomposing an igneous phosphate rock and adding an inorganic alkali to the washed and dried gypsum. CONSTITUTION: α-Hemihydrate gypsum obtained as a by-product of a wet- process for producing phosphoric acid by decomposing an igneous phosphate rock with sulfuric acid by a dihydrate-hemihydrate process is washed with 0.2-5.0kg (based on 1kg of the hemihydrate gypsum in dry base) of water, dried at 40-90 deg.C filtered to remove the water as far as possible, dried at 50-150 deg.C, pulverized and incorporated with 0.001-0.050kg (based on 1kg of the hemihydrate gypsum in dry base) of an inorganic alkali.

8. 发明专利

JPH08157207A PRODUCTION OF SODIUM SILICOFLUORIDE 失效
公开(公告)号：JPH08157207A
公开(公告)日：1996-06-18
申请号：JP30199494
申请日：1994-12-06
申请人： MITSUI TOATSU CHEMICALS
发明人： SHIMURA KAZUYA , SHINOZAKI TAKEKI , MORIKIYO KOUJI
IPC分类号： C02F1/58 , B09B3/00 , C01B33/10
摘要： PURPOSE: To effectively utilize a waste liq. discharged as industrial waste and consisting essentially of sodium sulfate and to obtain high-purity sodium silicofluoride uniform in grain size, difficult to cake and good in handleability. CONSTITUTION: A waste liq. discharged as industrial waste and consisting essentially of sodium sulfate is allowed to react with aq. hydrofluosilicic acid so that 1mol of hydrofluosilicic acid reacts with 0.8 to 1.3mols of sodium sulfate to produce sodium silicofluoride. In this case, the concn. of the aq. hydrofluosilicic acid is 10-30wt.%, and the sodium sulfate concn. in the waste liq. is 5-30wt.%.

9. 发明专利

JPH04176324A DEODORIZING DEVICE 失效
公开(公告)号：JPH04176324A
公开(公告)日：1992-06-24
申请号：JP30095690
申请日：1990-11-08
申请人： MITSUI TOATSU CHEMICALS
发明人： SHINOZAKI TAKEKI
IPC分类号： G01N27/12 , B01D53/30 , B01D53/86 , B01J23/84 , B01J23/889
摘要： PURPOSE:To continuously, extremely easily and economically treat the air contg. malodorous components by introducing the clean air into the deodorizing device and regulating the concn. to a prescribed value when the concn. detected by a measuring instrument exceeds the prescribed concn., then maintaining the air at a prescribed temp. and feeding the air into a reaction column packed with catalysts. CONSTITUTION:The malodorous components in the air 1 to be treated are measured by the malodorous component measuring instrument 5 and are controlled by a clean air regulating valve 4 through a controller 6 until the prescribed concn. is attained. The controller 6 detects the concn. by the measuring instrument 5 when the concn. exceeds the prescribed set value. The opening degree of the clean air regulating valve 4 is then adjusted to suck the clean air 3 and to dilute the air 1 to be treated to the prescribed concn. or below in such a manner that the malodorous components attain the prescribed concn. or below. The air 1 contg. the malodorous components controlled to the prescribed set value or below is introduced to a heat exchanger 7 and is heated or cooled to the prescribed temp. The temp. at this time in checked by a thermometer 8. The air 1 contg. the malodorous components heated or cooled to the prescribed temp. is introduced into the reaction column 10 packed with the catalysts 9 and is subjected to catalystic oxidation, by which the malodorous components are removed. This air is released as the clean air 11.

10. 发明专利

JPH04926B2 失效
公开(公告)号：JPH04926B2
公开(公告)日：1992-01-09
申请号：JP20054785
申请日：1985-09-12
申请人： MITSUI TOATSU CHEMICALS
发明人： INOE TADASHI , OOKOBA AKIRA , SAKASHITA KUNIO , UTSUNOMYA AKIRA , SHINOZAKI TAKEKI , IEDA MINORU
IPC分类号： C01B25/229 , C01F11/46

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