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1. 发明专利

JPH03106024A CLEANING AND DRYING PROCESS AND MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE PROCESS 失效
公开(公告)号：JPH03106024A
公开(公告)日：1991-05-02
申请号：JP24583589
申请日：1989-09-20
申请人： HITACHI LTD , MITSUI PETROCHEMICAL IND
发明人： TAKEHANA YOICHI , SAITO YOSHIO , MIYAKE HIROHIKO , ITO KATSUHIKO
IPC分类号： G03F1/82 , H01L21/304
摘要： PURPOSE:To enable the title cleaning and drying process, eliminating such a risk as a fire or an explosion, to be performed using fluoroalkylalcohol containing non-combustible hexafluoroisopropanol. CONSTITUTION:Hexa fluoroisopropanol easily melting in water can be rapidly substituted for any water content on the surface of an element 10 to be processed similar to the conventional IPA. Besides, the drying up effect and wettability on the surface of the element 10 exceed those of IPA so that the foreign matter cleaning up efficiency may exceed that of the process using IPA. A solvent 4 of non-combustible fluoroalkylalcohol or mainly composed of the same is stored at the bottom part of a vessel 13. The element 10 to be processed such as a semiconductor wafer, photomask, etc., after cleaned up with pure water in the state of being contained in a jig 11 is suspended in the vessel 3 so as to be exposed as it is to the vapor 7 of the boiled solvent 4.

2. 发明专利

JPH0393899A CLEANSER AND METHOD FOR CLEANSING 失效
公开(公告)号：JPH0393899A
公开(公告)日：1991-04-18
申请号：JP23131289
申请日：1989-09-06
申请人： MITSUI PETROCHEMICAL IND , HITACHI LTD
发明人： TSUMOTO TAKAMASA , MIYAKE HIROHIKO , TAKEHANA YOICHI , SAITO YOSHIO , ITO KATSUHIKO
IPC分类号： B08B3/08 , C11D7/28 , C11D7/50 , H01L21/304 , H05K3/26
摘要： PURPOSE:To provide a cleanser comprising a mixture of 5-fluoropropanol and a solvent miscible with the 5-fluoropropanol, effective for cleansing substrates, etc., used in the processes of semiconductor preparation without employing CFC gas and without having the danger of fire and explosion. CONSTITUTION:The objective cleanser comprises 5-fluoropropanol and a solvent (e.g. water, an alcohol, an ether, a ketone or a hydrocarbon excluding halogenated hydrocarbons) miscible with the 5-fluoropropanol.

3. 发明专利

JPS63204259A MASK 失效
公开(公告)号：JPS63204259A
公开(公告)日：1988-08-23
申请号：JP3555087
申请日：1987-02-20
申请人： HITACHI LTD , MITSUI PETROCHEMICAL IND
发明人： TAKEHANA YOICHI , SAITO GOICHI , SATO HISAKO , MIYAKE HIROHIKO
IPC分类号： G03F1/00 , G03F1/46 , G03F1/62 , G03F7/20 , H01L21/027
摘要： PURPOSE:To improve the throughput of a forming line for semiconductor devices by depositing the pattern of a light shielding film on the light exit face side of a substrate body and coating an antireflection film on the incident face side of the substrate body. CONSTITUTION:The pattern of the integrated circuits to be transferred which is the pattern of the light shielding film consisting of a vapor deposited chromium film 2 is formed on the light exist face 1a side of the substrate body 1 consisting of quartz glass. the antireflection film 3 consisting of MgF2 is coated by vapor deposition on the incident face 1b side of the body 1. The film 3 may be constituted of an org. compd. such as olefin polymer of a fluorine system and deriv. of acrylate or methacrylate. Namely, the film 3 is coated on the body 1 and, therefore, the time for exposing to the resist film on a wafer is shortened by the effect of decreasing the reflection loss of light and increasing the transmittance of light. The throughput in the forming lines for the semiconductors is thereby improved.

4. 发明专利

JPH0314898A DETERGENT 失效
公开(公告)号：JPH0314898A
公开(公告)日：1991-01-23
申请号：JP10816890
申请日：1990-04-24
申请人： MITSUI PETROCHEMICAL IND
发明人： TSUMOTO TAKAMASA , MIYAKE HIROHIKO
IPC分类号： C11D7/50
摘要： PURPOSE:To obtain an noncombustible, nontoxic, decomposable detergent excellent in detergency and dryability and useful for cleaning, e.g. a substrate used in the semiconductor manufacturing process by using pentafluoropropanol as constituent. CONSTITUTION:A detergent containing pentafluoropropanol (CF3CF2CH2OH).

5. 发明专利

JPS61122154A Ceramic forming composition 失效
公开(公告)号：JPS61122154A
公开(公告)日：1986-06-10
申请号：JP24399084
申请日：1984-11-19
申请人： Mitsui Petrochemical Ind
发明人： HIRAI NOBUKI , HIROTA KEN , MIYAKE HIROHIKO
IPC分类号： C04B35/622 , C04B35/00

6. 发明专利

JPH02203529A CLEANING AND DRYING PROCESS FOR SUBSTRATE 失效
公开(公告)号：JPH02203529A
公开(公告)日：1990-08-13
申请号：JP2283889
申请日：1989-02-01
申请人： MITSUI PETROCHEMICAL IND
发明人： TSUMOTO TAKAMASA , MIYAKE HIROHIKO
IPC分类号： B08B3/08 , C11D3/43 , H01L21/304
摘要： PURPOSE:To prevent the environmental pollution due to flon usage as well as the danger of a fire or an explosion from occurring by a method wherein, in order to clean and dry up a substrate, the substrate is led in the vapor of propanol pentafluoride to be cleaned and dried up. CONSTITUTION:A cleaning vessel 2 is heated by a heater 3 through the intermediary of a heating medium 6 so that propanol pentafluoride as a cleaning solvent may evaporate to be filled in the vessel 2. When a preprocessed substrate 5 is inserted into the vessel 2, the vapor of the cleaning solvent 4 condenses and liquefies on the surface of the substrate 5 since the temperature of the substrate 5 is lower than the vapor temperature of the propanol pentafluoride. At this time, the surface of the substrate 5 is cleaned up by the liquefied propanol pentafluoride. Thereafter, when the temperature of the substrate 5 is raised up to the same temperature as that of the said vapor, condensation does not take place and the substrate 5 becomes dry. Through these procedures, the environmental problem due to flon usage can be settled and a fire or an explosion can be prevented from occurring because noncombustible gas is used.

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