会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明专利
    • CVD APPARATUS
    • JPH0258824A
    • 1990-02-28
    • JP21096988
    • 1988-08-24
    • MITSUBISHI METAL CORP
    • TAKESHITA TAKUOHAGINO SADAAKISAKURAI TAKESHI
    • H01L21/205H01L21/263H01L21/31
    • PURPOSE:To increase a film depositing rate, to Iower the reaction heating temperature and to improve the recovery of raw materials by providing within a reaction vessel a susceptor for holding substrates on which a reaction product of the raw gas is to be deposited, and an ultraviolet radiating means for radiating ultraviolet rays along and orthogonally to the flowing direction of the raw gas. CONSTITUTION:Within a reaction vessel 11, a substrate holding face 26 is provided on each of three side faces of a susceptor 25 inclined at the same angle with respect to the flowing direction of raw gas so that a plurality of substrates on which a reaction product of the raw gas is to be deposited are held on these holding faces 26. An ultraviolet ray source 30 is provided near the reaction vessel and ultraviolet rays therefrom are guided via a mirror 31 to a half mirror 32 by which they are divided into two parts. One part of the ultraviolet rays is guided via a mirror 33 to a window 14 from which it enters the reaction vessel along the flowing direction of the gas. The other part of the ultraviolet rays is guided to a group of half mirrors 34 provided corresponding to windows 19, whereby it is divided equally and introduced into the vessel orthogonally fo the axis of the vessel. In this manner, the reaction can be accelerated while the product can be prevented from being reacted again.
    • 5. 发明专利
    • MANUFACTURE OF SUPERCONDUCTOR THIN FILM
    • JPH0254811A
    • 1990-02-23
    • JP20584388
    • 1988-08-18
    • MITSUBISHI METAL CORP
    • HAGINO SADAAKIUCHIDA HIROTOSAKURAI TAKESHI
    • C01G3/00C01G1/00C01G29/00H01B12/06H01B13/00
    • PURPOSE:To heighten critical current density of a superconductor thin film by making a plurality of raw material gas forming yttrium or bismuth ceramic superconductor to react in a vapor phase for forming an intermediate film followed by oxidizing the intermediate film. CONSTITUTION:Raw material gas of a plurality of raw materials for forming an yttrium ceramic superconductor or a bismuth ceramics superconductor is housed inside the coordinator containers 11, 12 and 13 for being fed to the raw material containers 1, 2 and 3 being carried by Ar as carrier gas. A substrate 9, to which an intermediate film for generating the superconductor is to be stuck, is set up inside a reaction chamber 5. A superconductor raw material inside the raw material containers 1, 2 and 3 is fed inside the reaction chamber 5 decompressed by a vacuum pump 7 under a heating condition by a heater 8 as metal complex gas carried by Ar gas so as to form the intermediate film on the substrate 9. Next, the substrate 9 is set up in an annealing furnace where the intermediate film is oxidized under a prescribed condition. As a result thereof, a dense superconductor thin film is formed thus to enable critical current density to be heightened.