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1. 发明专利

JP2010252745A Bacterium analyzer 审中-公开
标题翻译：细菌分析仪
公开(公告)号：JP2010252745A
公开(公告)日：2010-11-11
申请号：JP2009109243
申请日：2009-04-28
申请人： Kyushu Univ , Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 国立大学法人九州大学 , 日本電信電話株式会社
发明人： HATANO TAKAHIRO , KODATE JUNICHI , SATO NORIO , SHIGEMATSU TOMOSHI , NAKANISHI MAMORU , ISHII HITOSHI , MACHIDA KATSUYUKI , YOSHIDA SHINICHI
IPC分类号： C12M1/34
摘要： PROBLEM TO BE SOLVED: To provide a bacterium analyzer which can more simply and quickly analyze bacteria. SOLUTION: A bacterium-inducing mechanism A102a, a bacterium-inducing mechanism B102b give a stimulation source having a directionality for expressing taxis in bacteria of measurement target, to a liquid received in a bacterium-inducing route 101. The bacterium-inducing mechanism A102a, the bacterium-inducing mechanism B102b give stimulation sources for expressing taxes in different bacteria, respectively, to the liquid received in the bacterium-inducing route 101 at different points on the bacterium-inducing route 101. The stimulation sources include chemical substances, potentials, magnetic fields, light and gravity. A detecting portion A103a, a detection portion B103b detect fine particles moving along the bacterium-inducing route 101. Results (data) detected with the detecting portion A103a, the detection portion B103b are collected and analyzed with an analysis-displaying portion 106, and the results are displayed. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供可以更简单快速地分析细菌的细菌分析仪。解决方案：细菌诱导机制A102a，细菌诱导机制B102b给予在细菌诱导途径101中接收的液体具有用于在测定对象细菌中表达出租车的方向性的刺激源。诱导细菌机构A102a，细菌诱导机构B102b分别向细菌诱导途径101的不同点的细菌诱导途径101中接收的液体分别赋予不同细菌的税收的刺激源。刺激源包括化学物质，电位，磁场，光线和重力。检测部分A103a，检测部分B103b检测沿着细菌诱导路线101移动的细颗粒。用检测部分A103a检测到的结果（数据），检测部分B103b被分析显示部分106收集和分析，并且显示结果。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010252746A Bacterium analyzer 审中-公开
标题翻译：细菌分析仪
公开(公告)号：JP2010252746A
公开(公告)日：2010-11-11
申请号：JP2009109247
申请日：2009-04-28
申请人： Kyushu Univ , Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 国立大学法人九州大学 , 日本電信電話株式会社
发明人： HATANO TAKAHIRO , KODATE JUNICHI , SATO NORIO , SHIGEMATSU TOMOSHI , NAKANISHI MAMORU , ISHII HITOSHI , MACHIDA KATSUYUKI , YOSHIDA SHINICHI
IPC分类号： C12M1/34 , C12M1/42
摘要： PROBLEM TO BE SOLVED: To provide a bacterium analyzer which can more simply and quickly analyze bacteria.
SOLUTION: A bacterium-inducing mechanism A102a, a bacterium-inducing mechanism B102b give stimulation sources having directionality for expressing taxes in bacteria of measurement target, to a liquid received in a bacterium-inducing route A101a, a bacterium-inducing route B101b. The bacterium-inducing mechanism A102a, the bacterium-inducing mechanism B102b give stimulation sources for expressing taxes in different bacteria, respectively, to the liquids received in the bacterium-inducing route A101a and the bacterium-inducing route B101b. A detecting portion A103a, a detection portion B103b detect fine particles moving along the bacterium-inducing route A101a, the bacterium-inducing route B101b. Results (data) detected with the detecting portion A103a, the detection portion B103b are collected and analyzed with an analysis-displaying portion 106, and the results are displayed.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供可以更简单快速地分析细菌的细菌分析仪。解决方案：细菌诱导机制A102a，细菌诱导机制B102b将具有用于在测定对象细菌中表达税收的方向性的刺激源赋予细菌诱导途径A101a，细菌诱导途径B101b 。细菌诱导机构A102a，细菌诱导机构B102b分别赋予在细菌诱导途径A101a和细菌诱导途径B101b中接收的液体的不同细菌中的税收的刺激源。检测部A103a，检测部B103b检测沿着细菌诱导路径A101a，细菌诱导路径B101b移动的微粒。用检测部分A103a检测到的结果（数据），检测部分B103b被分析显示部分106收集和分析，并且显示结果。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010252747A Detection method for legionella and fluorescent material 有权
标题翻译：紫外线和荧光材料的检测方法
公开(公告)号：JP2010252747A
公开(公告)日：2010-11-11
申请号：JP2009109253
申请日：2009-04-28
申请人： Kyushu Univ , Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 国立大学法人九州大学 , 日本電信電話株式会社
发明人： ISHII HITOSHI , SATO NORIO , HATANO TAKAHIRO , MACHIDA KATSUYUKI , YOSHIDA SHINICHI , MORIMOTO SATOSHI , NAKAZONO MANABU
IPC分类号： C12Q1/04 , C12P7/66
摘要： PROBLEM TO BE SOLVED: To provide a method of simply and quickly measuring Legionella.
SOLUTION: An objective sample for detecting Legionella is soaked in water. The objective Legionella is Legionella pneumophila. Exciting light is radiated on the sample soaked in water. Light of 254 nm wavelength (ultraviolet light) is radiated as the exciting light. Then, light (fluorescence) radiated by irradiating with exciting light the sample soaked in water as above, is detected. If fluorescence of 346 nm wavelength is detected, the presence of the Legionella pneumophila can be determined (identified).
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供简单快速测量军团菌的方法。
解决方案：将用于检测军团菌的客观样品浸泡在水中。目的军团菌是嗜肺军团菌。激发光照射在样品浸泡在水中。作为激发光照射254nm波长的光（紫外光）。然后，检测通过用激发光照射照射如上所述浸渍在水中的样品的光（荧光）。如果检测到346nm波长的荧光，则可以确定（鉴定）嗜肺军团杆菌的存在。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010252744A Bacterium analyzer 审中-公开
标题翻译：细菌分析仪
公开(公告)号：JP2010252744A
公开(公告)日：2010-11-11
申请号：JP2009109239
申请日：2009-04-28
申请人： Kyushu Univ , Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 国立大学法人九州大学 , 日本電信電話株式会社
发明人： HATANO TAKAHIRO , KODATE JUNICHI , SATO NORIO , SHIGEMATSU TOMOSHI , NAKANISHI MAMORU , ISHII HITOSHI , MACHIDA KATSUYUKI , YOSHIDA SHINICHI
IPC分类号： C12M1/34 , C12M1/42
摘要： PROBLEM TO BE SOLVED: To provide a bacterium analyzer which can more simply and quickly analyze bacteria. SOLUTION: A bacterium-inducing mechanism 102 gives a stimulation source having directionality for expressing taxis in bacteria of measurement target, to a liquid received in a bacterium-inducing route 101. A detecting portion 103 detects fine particles moving along the bacterium-inducing route 101. When the stimulation source is given by the bacterium-inducing mechanism 102, the bacteria of the target expresses the taxis and move along the bacterium-inducing route 101. On the other hand, fine foreign matters and the like except the bacteria in the liquid received in the bacterium-inducing route 101 do not move even when the stimulation source is given. Accordingly, when the fine particles moving along the bacterium-inducing route 101 are detected with the detecting portion 103 in a state that the stimulation source is given, it can be determined that the fine particles are bacteria. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供可以更简单快速地分析细菌的细菌分析仪。解决方案：细菌诱导机构102向在细菌诱导途径101中接收的液体给出具有用于在测定对象细菌中表达出租车的方向性的刺激源。检测部103检测沿着细菌诱导途径诱导途径101.当细菌诱导机构102给出刺激源时，靶的细菌表达出租车并沿着细菌诱导途径101移动。另一方面，除了细菌之外的微细异物等在细菌诱导途径101中接收的液体即使在给予刺激源时也不会移动。因此，当以刺激源的状态，用检测部103检测沿细菌诱导路径101移动的微粒时，可以判定为细菌。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2010129952A Method of manufacturing through electrode wiring 审中-公开
标题翻译：通过电极接线制造方法
公开(公告)号：JP2010129952A
公开(公告)日：2010-06-10
申请号：JP2008306180
申请日：2008-12-01
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： ISHII HITOSHI , SAKATA TOMOMI , SATO NORIO , KUWABARA HIROSHI , SATO YASUHIRO , YOSHIIKE TAKEYA , MACHIDA KATSUYUKI
IPC分类号： H01L21/3205 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To form through-electrode wiring by forming a hole part of more uniform depth in a state where an increase in cost, breakage, etc., are suppressed without employing a complicated process. SOLUTION: A silicon substrate 101 is selectively etched by RIE (Reactive Ion Etching) using a silicon oxide layer 104 as a mask to form a through-hole 106 reaching one surface of the silicon substrate 101 (an interface with a buried oxide layer 102). In the etching processing (RIE) for forming the through-hole 106, the etching progresses only up to the interface between the silicon substrate 101 and buried oxide layer 102 along the depth of the silicon substrate 101. Consequently, the through-hole 106 is formed up to a uniform depth as long as the silicon substrate 101 has a uniform plate thickness. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过在不需要复杂的工艺的情况下在成本，断裂等增加的状态下形成更均匀深度的孔部来形成贯通电极布线。解决方案：使用氧化硅层104作为掩模，通过RIE（反应离子蚀刻）选择性地蚀刻硅衬底101，以形成到达硅衬底101的一个表面的通孔106（与埋入氧化物的界面层102）。在用于形成通孔106的蚀刻处理（RIE）中，蚀刻仅沿着硅衬底101的深度进行到硅衬底101和掩埋氧化物层102之间的界面。因此，通孔106是只要硅基板101具有均匀的板厚即可形成均匀的深度。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2009107041A Microstructure and its manufacturing method 有权
标题翻译：微结构及其制造方法
公开(公告)号：JP2009107041A
公开(公告)日：2009-05-21
申请号：JP2007280139
申请日：2007-10-29
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： KUWABARA HIROSHI , SATO NORIO , KODATE JUNICHI , MORIMURA HIROKI , ISHII HITOSHI , MACHIDA KATSUYUKI
IPC分类号： B81B3/00
摘要： PROBLEM TO BE SOLVED: To form a microstructure with a minute movable structure in a state of having higher reliability without causing any increase in size of equipment or a restriction in implementation. SOLUTION: The microstructure is provided with: a substrate 101; a supporting frame 102 placed in a way that it encircles a specific range of the substrate 101; a movable section supporting section 103 formed above the substrate 101 inside the supporting frame 102; a movable structure 104 equipped with a beam 104a that is supported by the movable section supporting section 103 and a movable electrode 104b; a fixed electrode supporting section 105a; and a fixed electrode 105b one part (end part) of which is supported by the fixed electrode supporting section 105a and which is positioned above the movable electrode 104b. It is also provided with a sealing membrane 106 that is supported by a fixed electrode structure 105 composed of the fixed electrode supporting section 105a and the fixed electrode 105b, and by the supporting frame 102, and seals the space (movable section forming space) inside the supporting frame 102. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：在不会导致设备尺寸的任何增加或实施方面的限制的情况下，以更高的可靠性形成具有微小可动结构的微结构。微结构提供有：衬底101; 以围绕衬底101的特定范围的方式设置的支撑框架102; 形成在支撑框架102内部的基板101的上方的可动部支承部103; 配备有由可动部支撑部103支撑的梁104a和可动电极104b的可动结构104; 固定电极支撑部分105a; 固定电极105b的一部分（端部）由固定电极支撑部105a支撑并位于可动电极104b的上方。还设置有由固定电极支撑部105a和固定电极105b构成的固定电极结构105和由支撑框架102支撑的密封膜106，并将其内部的空间（可动部形成空间）密封支持框架102.版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008251816A Method of forming thin film 有权
标题翻译：形成薄膜的方法
公开(公告)号：JP2008251816A
公开(公告)日：2008-10-16
申请号：JP2007090943
申请日：2007-03-30
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： SATO NORIO , ISHII HITOSHI , MACHIDA KATSUYUKI
IPC分类号： H01L21/314
摘要： PROBLEM TO BE SOLVED: To form a thin film without breakage in a recess in forming the thin film on a substrate having the recess by the use of a so-called STP method. SOLUTION: A coated film 104 is formed on the main surface of a substrate 105 by applying a coating liquid by, for instant, a spin coating method. The coating liquid is produced by including a thin film raw material being a thin film material and an organic material composed of an organic compound with its surface energy smaller than that of the thin film material. For instance, the thin film material is a polyimide, the thin film raw material is a polyamic acid as a precursor to a polyimide, and the organic material is a polycaprolactone. Further, the coating liquid is produced by dissolving these poliamic acids and polycaprolactone in 1-methyl-2-pyrrolidone. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过使用所谓的STP法在具有凹陷的基板上形成薄膜的凹部中形成不破裂的薄膜。解决方案：通过以旋涂法即刻施加涂布液，在基板105的主表面上形成涂膜104。通过包括薄膜材料的薄膜原料和由表面能小于薄膜材料的表面能的有机化合物构成的有机材料来制造涂布液。例如，薄膜材料是聚酰亚胺，薄膜原料是聚酰胺酸作为聚酰亚胺的前体，有机材料是聚己内酯。此外，通过将这些聚氨酯酸和聚己内酯溶解在1-甲基-2-吡咯烷酮中来制备涂布液。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2008109004A Manufacturing method of minute structure 有权
标题翻译：分钟结构的制造方法
公开(公告)号：JP2008109004A
公开(公告)日：2008-05-08
申请号：JP2006292213
申请日：2006-10-27
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： SATO NORIO , ISHII HITOSHI , ONO KAZUYOSHI , KAMEI TOSHIKAZU , MACHIDA KATSUYUKI , IKUTSU HIDEO
IPC分类号： H01L21/3065 , B81C1/00 , H01L21/3205 , H01L23/12 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To enable to highly accurately form a minute structure consisting of a plurality of portions each having a dimension of about some hundreds μm such as a plurality of stages each having a dimension of some hundreds μm.
SOLUTION: A method creates a state where an opening pattern 141 is formed on a pasted photosensistive resist film 104 using a known photolithographic technique, and a state where a groove 106 extending in the same direction as that of a groove 103 is formed on the bottom of the groove 103 by selectively etching to remove the bottom of the groove 103 of a semiconductor substrate 101 by dry etching using the photosensitive resist film 104 having the opening pattern 141 as a mask.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了能够高精度地形成由多个尺寸约为几百微米的多个部分组成的微小结构，例如多个阶段，每个阶段各自具有几百微米的尺寸。解决方案：一种方法产生使用已知的光刻技术在粘贴的光敏抗蚀剂膜104上形成开口图案141的状态，并且形成沿与槽103相同的方向延伸的槽106的状态通过使用具有开口图案141的光敏抗蚀剂膜104作为掩模的干蚀刻，通过选择性蚀刻来去除半导体衬底101的沟槽103的底部，从而在槽103的底部。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2009277617A Fine electronic mechanical switch and method of manufacturing the same 审中-公开
标题翻译：精细电子机械开关及其制造方法
公开(公告)号：JP2009277617A
公开(公告)日：2009-11-26
申请号：JP2008130559
申请日：2008-05-19
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： KUWABARA HIROSHI , MORIMURA HIROKI , SATO NORIO , KODATE JUNICHI , ISHII HITOSHI , MACHIDA KATSUYUKI
IPC分类号： H01H59/00 , B81B3/00 , B81C1/00 , H01H49/00
摘要： PROBLEM TO BE SOLVED: To reduce loss in a wiring structure of a fine electronic mechanical switch, and prevent the increase of loss and generation of action failure at a contact electrode. SOLUTION: A wiring support part 107 and a wiring 108 supported by the wiring support part 107 and arranged at an upper part of a movable electrode 104 are provided on a substrate 101. There are two wiring structures each containing the wiring support part 107 and the wiring 108, two wirings 108 insulated and separated from each other, with each end arranged in opposition with a given interval. Further, one end of each two wirings 108 arranged in opposition is arranged above the contact electrode 106 with a given distance. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了减少精细电子机械开关的布线结构的损耗，并且防止在接触电极处的损耗增加和动作故障的产生。解决方案：布线支撑部107和由布线支撑部107支撑并布置在可动电极104的上部的布线108设置在基板101上。两个布线结构分别包含布线支撑部分 107和布线108，两个布线108彼此绝缘和分离，每端以给定的间隔相对布置。此外，布置成相对布置的每个布线108的一端以给定的距离布置在接触电极106的上方。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010256452A Method of manufacturing micro mechanical structure 审中-公开
标题翻译：制造微机械结构的方法
公开(公告)号：JP2010256452A
公开(公告)日：2010-11-11
申请号：JP2009103798
申请日：2009-04-22
申请人： Nippon Telegr & Teleph Corp , Ntt Advanced Technology Corp , エヌ・ティ・ティ・アドバンステクノロジ株式会社 , 日本電信電話株式会社
发明人： ISHII HITOSHI , SAKATA TOMOMI , TAKAKAWARA KAZUHIKO , KUWABARA HIROSHI , SATO YASUHIRO , MACHIDA KATSUYUKI
IPC分类号： G02B26/08 , B81C1/00
摘要： PROBLEM TO BE SOLVED: To more easily form a metallic film having a desired shape on both faces of a mirror structure manufactured by using an SOI ( silicon-on-insulator) substrate.
SOLUTION: An electrodeposition resist layer 107 is formed by electro-depositing an electrodeposition resist on the surface of the metallic film 106, the electrodeposition resist layer 107 is patterned by a photolithography, thus an electrodeposition resist pattern 171 is formed in the region facing the metallic pattern 141 of a mirror part 131. The electrodeposition resist pattern 171 is so formed to cover a metallic pattern region formed while facing the metallic pattern 141 on the back face side of the mirror part 131.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了更容易地在通过使用SOI（绝缘体上硅）基板制造的反射镜结构的两个表面上形成具有期望形状的金属膜。解决方案：通过在金属膜106的表面上电沉积电沉积抗蚀剂形成电沉积抗蚀剂层107，通过光刻将电沉积抗蚀剂层107图案化，从而在该区域中形成电沉积抗蚀剂图案171 面对镜部131的金属图案141.电沉积抗蚀剂图案171被形成为覆盖在镜部131的背面侧面对金属图案141所形成的金属图案区域。版权所有（C））2011，JPO＆INPIT

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