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    • 1. 发明专利
    • Aqueous developing solution for forming resist coating
    • 用于形成耐磨涂层的水性发展解决方案
    • JP2000075500A
    • 2000-03-14
    • JP24822098
    • 1998-09-02
    • Kansai Paint Co Ltd関西ペイント株式会社
    • IMAI GENJIKOJIMA DAISUKEKOGURE HIDEO
    • G03F7/32
    • PROBLEM TO BE SOLVED: To provide an aqueous developing solution for forming the resist coating. SOLUTION: The developing solution is used in the resist pattern forming process which is composed of coating a photosensitive resist composition on a substrate so as to form a photosensitive coating, then exposing the coating directly or through a mask to an active energy rays so that a desired resist coating (image) is formed on the surface of the photosensitive coating formed on the substrate and further treating the exposed resist with an alkaline or acidic developing solution so as to form a resist pattern on the substrate. The objective developing solution is an aqueous colored developing solution which contains at least one basic dye when it is used as an alkaline developing solution or contains at least one acidic dye when it is used as an acidic developing solution.
    • 要解决的问题:提供用于形成抗蚀剂涂层的水性显影液。 解决方案:显影液用于抗蚀剂图案形成工艺,其中包括在基材上涂布光敏抗蚀剂组合物以形成感光涂层,然后将涂层直接或通过掩模曝露于活性能量射线,使得 在形成在基板上的感光涂层的表面上形成期望的抗蚀剂涂层(图像),并用碱性或酸性显影液进一步处理曝光的抗蚀剂,以在基板上形成抗蚀剂图案。 目标显影液是一种含水彩色显影液,当用作碱性显影液时含有至少一种碱性染料,或者当用作酸性显影液时,其含有至少一种酸性染料。
    • 2. 发明专利
    • Connection method of electrode patterns and photoelectric cell module
    • 电极图和光电池模块的连接方法
    • JP2007059322A
    • 2007-03-08
    • JP2005245915
    • 2005-08-26
    • Kansai Paint Co Ltd関西ペイント株式会社
    • KOGURE HIDEO
    • H01M14/00H01L31/04H01M2/22
    • Y02E10/542
    • PROBLEM TO BE SOLVED: To provide a connection method of electrode patterns by which steady conduction between the electrode patterns is obtained and which is superior in mass producibility.
      SOLUTION: This is a method to electrically connect a pair of electrode patterns 22, 83 arranged through an insulating layer, and comprises a process in which a laminating mask 69, in which a wiring portion forming hole 68b penetrating through the front and rear sides is formed on a laminate having a hot melt layer 66 pasted with a substrate film 64, is thermo-compression bonded to a first substrate 82 formed with a first electrode pattern 83 on the surface, so that the wiring portion forming hole 68b and the first electrode pattern 83 may be positioned in place, a process in which a conductive paste 61a is filled in the wiring portion forming hole 68b, a process in which the substrate film 64 is separated from the hot melt layer 66, and a process in which a second substrate 20 formed with the second electrode pattern 22 on the surface is thermo-compression bonded to the exposed hot melt layer 66, so that the second electrode pattern 22 and the wiring portion forming hole 68b may be positioned in place.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供通过其获得电极图案之间的稳定传导并且其批量生产性优异的电极图案的连接方法。 解决方案:这是一种电连接通过绝缘层布置的一对电极图案22,83的方法,并且包括其中层叠掩模69的方法,其中布线部分形成孔68b穿过前部和 后侧形成在具有粘贴有基底膜64的热熔层66的层压体上,被热压接在形成有表面上的第一电极图案83的第一基板82上,使得布线部形成孔68b和 可以将第一电极图案83定位在适当位置,其中在布线部分形成孔68b中填充有导电浆料61a的过程,其中基板膜64与热熔层66分离的工艺,以及 在表面上形成有第二电极图案22的第二基板20被热压粘合到暴露的热熔层66,使得第二电极图案22和布线部形成孔68b可以是 定位到位 版权所有(C)2007,JPO&INPIT
    • 3. 发明专利
    • Electrode pattern forming method, and photoelectric cell module
    • 电极图案形成方法和光电池模块
    • JP2007056345A
    • 2007-03-08
    • JP2005245520
    • 2005-08-26
    • Kansai Paint Co Ltd関西ペイント株式会社
    • KOGURE HIDEO
    • C23C14/04H01L31/04H01M14/00
    • Y02E10/542
    • PROBLEM TO BE SOLVED: To provide an electrode pattern forming method excellent in mass productivity. SOLUTION: In the electrode pattern forming method, a hot-melt layer 8 is covered by a covering layer 4 consisting of a metallic material, and an electrode pattern 22a is formed on a substrate 20 by using a main electrode forming mask 10a having an aperture 12a for forming a main electrode penetrating face and back surfaces. The method comprises a step of heat-bonding the main electrode forming mask 10a on a surface of the substrate via a hot-melt layer 8, a step of forming the main electrode pattern 22a on the substrate 20 by performing the physical vapor deposition of a conductive vapor deposition material via the aperture 12a for forming the main electrode, and a step of peeling the main electrode forming mask. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种质量生产率优异的电极图案形成方法。 解决方案:在电极图案形成方法中,热熔层8被由金属材料构成的覆盖层4覆盖,并且通过使用主电极形成掩模10a在基板20上形成电极图案22a 具有用于形成主电极穿透面和后表面的孔12a。 该方法包括通过热熔层8将主电极形成掩模10a热压在基板的表面上的步骤,通过执行物理气相沉积在基板20上形成主电极图案22a的步骤 通过用于形成主电极的孔12a的导电气相沉积材料和剥离主电极形成掩模的步骤。 版权所有(C)2007,JPO&INPIT
    • 4. 发明专利
    • Method for covering exposed base metal
    • 覆盖暴露的基础金属的方法
    • JP2004190070A
    • 2004-07-08
    • JP2002357117
    • 2002-12-09
    • Kansai Paint Co Ltd関西ペイント株式会社
    • AKUI JUNKUWANO EIJIKOGURE HIDEOISOZAKI OSAMUHIRAKI TADAYOSHI
    • B05D3/10B05D7/14C23C20/08C25D13/00
    • PROBLEM TO BE SOLVED: To provide an exposed base metal covering method capable of easily covering an exposed portion of a covered base metal, and depositing a film of excellent adhesibility to a cover film and corrosion resistance. SOLUTION: In this exposed base metal covering method, the exposed portion of a covered metal is covered with titanium-based metal surface treatment agent containing (A) titanium-containing aqueous solution obtained by mixing hydrogen peroxide with at least one kind of titanium compound selected from the group consisting of hydrolytic titanium compound, low-condensate of hydrolytic titanium compound, and low-condensate of hydrated titanium and hydrolytic titanium, and (B) at least one kind of compound selected from a group consisting of organic acids, organic acid salts, metal salts of hydrofluoric acid, metal salts of hydrofluoric acid salt, ammonium, and organic basic compound. COPYRIGHT: (C)2004,JPO&NCIPI
    • 要解决的问题:提供一种能够容易地覆盖被覆盖的基底金属的暴露部分的暴露的基底金属覆盖方法,并且对覆盖膜沉积具有优异的粘附性的膜和耐腐蚀性。 解决方案:在这种暴露的基底金属覆盖方法中,被覆金属的暴露部分被钛基金属表面处理剂覆盖,所述钛基金属表面处理剂含有(A)含钛水溶液,其通过将过氧化氢与至少一种 选自水解钛化合物,水解钛化合物的低缩合物和水合钛和水解钛的低缩合物的钛化合物,和(B)选自有机酸, 有机酸盐,氢氟酸的金属盐,氢氟酸盐的金属盐,铵和有机碱性化合物。 版权所有(C)2004,JPO&NCIPI
    • 8. 发明专利
    • Photocell and manufacturing method therefor
    • 光电子及其制造方法
    • JP2006012794A
    • 2006-01-12
    • JP2005147691
    • 2005-05-20
    • Kansai Paint Co Ltd関西ペイント株式会社
    • HAYASHI IWAOMURAMATSU TOSHIMITSUMOGI JUNICHIKOGURE HIDEO
    • H01M14/00H01L31/04H01M2/02H01M2/08
    • Y02E10/542
    • PROBLEM TO BE SOLVED: To provide a photocell whose performance is held properly in a long period.
      SOLUTION: The photocell comprises a transparent first substrate 61, having a semiconductor electrode 7 carrying a photosensitizer, a second substrate 62 having a counter electrode 4 disposed facing with the semiconductor electrode 7, and an electrolyte layer 1 provided between the semiconductor electrode 7 and the counter electrode 4, and the layer 1 is sealed by a sealing material 2 interposed between the first substrate 61 and the second substrate 62, wherein the first substrate 61, the second substrate 62 and the sealing material 2 are made of the same material, and the contacting parts of the first substrate 61 and the second substrate 62 with the sealing material 2 are ultrasonically welded.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种长时间保持其性能的光电管。 解决方案:光电池包括透明的第一衬底61,其具有携带光敏剂的半导体电极7,具有与半导体电极7相对设置的对置电极4的第二衬底62和设置在半导体电极之间的电解质层1 7和对电极4,并且层1​​被插入在第一基板61和第二基板62之间的密封材料2密封,其中第一基板61,第二基板62和密封材料2由其形成 材料,第一基板61和第二基板62的与密封材料2的接触部分被超声波焊接。 版权所有(C)2006,JPO&NCIPI
    • 10. 发明专利
    • Forming method of dye-sensitized semiconductor electrode and photoelectric cell module
    • 透明半导体电极和光电池模块的形成方法
    • JP2007059324A
    • 2007-03-08
    • JP2005245974
    • 2005-08-26
    • Kansai Paint Co Ltd関西ペイント株式会社
    • KOGURE HIDEO
    • H01M14/00H01L31/04
    • Y02E10/542
    • PROBLEM TO BE SOLVED: To provide a formation method of a dye-sensitized semiconductor electrode superior in mass-producibility. SOLUTION: This is a method of forming a dye-sensitized semiconductor electrode on an electrode pattern 22 and comprises a process in which a semiconductor electrode forming mask 30a, in which a hot melt layer 8 is covered by a covering layer 4 consisting of a metal material and has an aperture 32a penetrating through the front and rear sides, is thermo-compression bonded to a substrate on which the electrode pattern 22 is formed on the surface, so that the aperture 32a and the electrode pattern 22 may be properly positioned, a process in which the semiconductor electrode material is filled into the aperture 32a, a process in which a photosensitized dye is carried on the semiconductor electrode material 34b filled in the aperture 32a, and a process in which the semiconductor electrode forming mask 30a is separated. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种染色剂敏化半导体电极的制造方法,其具有优异的批量生产能力。 解决方案:这是在电极图案22上形成染料敏化半导体电极的方法,并且包括其中热熔层8被覆盖层4覆盖的半导体电极形成掩模30a的工艺,所述覆盖层4包括 的金属材料并且具有穿过前侧和后侧的孔32a被热压粘合到其上在其上形成有电极图案22的基板,使得孔32a和电极图案22可以适当地 将半导体电极材料填充到孔32a中的过程,将光敏染料载持在填充在孔32a中的半导体电极材料34b上的过程,以及其中半导体电极形成掩模30a为 分离。 版权所有(C)2007,JPO&INPIT