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1. 发明专利

JPH1034760A MANUFACTURE OF COMPOSITE SHEET 失效
公开(公告)号：JPH1034760A
公开(公告)日：1998-02-10
申请号：JP21332796
申请日：1996-07-25
申请人： KURARAY CO , HEISEI POLYMER KK
发明人： HATTA NOBUO , HATA KATSUMASA , KATO SHINYA , YOKOTA SHINICHI , ETO TATSUNORI , TAKAGI KENICHI
IPC分类号： B32B37/00 , B29C47/06 , B29C47/88 , B29C59/04 , B29C65/00 , B29K75/00 , B29L7/00 , B29L9/00 , B32B27/12 , B29D9/00
摘要： PROBLEM TO BE SOLVED: To enable a process in which a precursor sheet is manufactured simply with good operability by a method in which a polymer film layer and a nonwoven fabric layer are laminated in a nonstretching state on a cooling molding part, the laminate is cooled, and in both end parts of the breadth direction, both layers are cemented in the longitudinal direction. SOLUTION: An expandable/shrinkable polymer film (a) discharged from a die 1 is laid for example with a nonwoven fabric (b) which is expandable in the cross direction to overlap a cooling molding part which is formed by a cooling roll 2 and a nip roll 3 to be introduced so that the film (a) layer comes to the side of the roll 2 and the fabric (b) layer comes to the side of the roll 3. In the cooling molding part, both end parts in the breadth direction of the roll 3 are pressed by two protruding belts which are installed in both end parts to surround the whole peripheral surface, the film (a) layer, which is still kept adhesive, is cemented to the fabric (b) layer in both end parts in the breadth direction, and the inside part between the protruding belts is made nonadhesive.

2. 发明专利

JP2012079879A Chemical mechanical polishing method and slurry used for the same 有权
标题翻译：化学机械抛光方法和浆料用于其中
公开(公告)号：JP2012079879A
公开(公告)日：2012-04-19
申请号：JP2010223035
申请日：2010-09-30
申请人： Kuraray Co Ltd , 株式会社クラレ
发明人： TAKEKOSHI YUTAKA , KATO MITSURU , OKAMOTO TOMOHIRO , KATO SHINYA
IPC分类号： H01L21/304 , B24B37/00
摘要： PROBLEM TO BE SOLVED: To provide a slurry for chemical mechanical polishing excellent in planarization performance and capable of making a step between a stopper film and an insulator film extremely small in a process of forming a shallow trench isolation region.SOLUTION: The slurry for chemical mechanical polishing comprises: (a) a chelate agent, having 3 to 8 acidic groups, where an atomic number existing between acidic groups which are most distantly separated is 4 to 12; (b) an oligosaccharide and/or its derivatives; (c) cerium oxide abrasive grains; and (d) water. The content of (a) the chelate agent is 0.02 to 2.0 mass % of the total amount of the slurry. The content of (b) the oligosaccharide and/or its derivatives is 0.02 to 2.0 mass % of the total amount of the slurry.
摘要翻译：要解决的问题：为了提供平坦化性能优异的化学机械抛光浆料，并且能够在形成浅沟槽隔离区域的过程中使阻挡膜和绝缘体膜之间的台阶变得极小。解决方案：用于化学机械抛光的浆料包括：（a）具有3至8个酸性基团的螯合剂，其中存在于最远离分离的酸性基团之间的原子序数为4至12; （b）寡糖和/或其衍生物; （c）氧化铈磨粒; 和（d）水。（a）螯合剂的含量为浆料总量的0.02〜2.0质量％。（b）寡糖和/或其衍生物的含量为浆料总量的0.02〜2.0质量％。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2007326984A Polymer material, foamed product obtained therefrom and polishing pad using them 有权
标题翻译：聚合物材料，使用它们获得的泡沫产品和抛光垫
公开(公告)号：JP2007326984A
公开(公告)日：2007-12-20
申请号：JP2006160537
申请日：2006-06-09
申请人： Kuraray Co Ltd , 株式会社クラレ
发明人： OKAMOTO TOMOHIRO , KATO SHINYA , KANEDA SHUNJI , KIKUCHI HIROBUMI
IPC分类号： C08G18/65 , B24B37/20 , C08G18/66 , C08J9/12 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad improving flatness of a polished face and flattening efficiency, and also less in causing of scratches; and to provide a polymer material and a foamed product, useful as the polishing pad. SOLUTION: The polymer material shows 40-60°C of a temperature (T 1 ) when a needle penetration depth reaches 0.05 mm and 50-65°C of a temperature (T 2 ) when a needle penetration depth reaches 0.25 mm (T 2 ≥T 1 ) by Vicat softening temperature measurement according to JIS K7206: 1999 (method A50). COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高抛光面的平坦度和平坦化效果的抛光垫，并且也减少了划痕; 并提供可用作抛光垫的聚合物材料和发泡产品。解决方案：当针穿透深度达到0.05mm和温度为50-65℃时，聚合物材料显示40-60℃的温度（T 1 ）（T 根据JIS K7206：1999，通过维卡软化温度测量，针穿入深度达到0.25mm（T 2 ≥T 1 ）2（方法A50）。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JPH07196915A THERMOPLASTIC POLYURETHANE COMPOSITION 失效
公开(公告)号：JPH07196915A
公开(公告)日：1995-08-01
申请号：JP33830493
申请日：1993-12-28
申请人： KURARAY CO
发明人： KATO SHINYA , HIRAI KOJI
IPC分类号： C08K5/29 , C08L75/00 , C08L75/06 , C08L79/00
摘要： PURPOSE:To obtain a resin composition containing a thermoplastic polyurethane synthesized by reacting a specified polyester polyol with a chain-extending agent and a specified polycarbodimide and excellent in flexibility, strength, low-temperature properties, hydrolysis resistance, thermal aging resistance and moldability. CONSTITUTION:This resin composition is produced by blending (A) a thermoplastic polyurethane synthesized by reacting a polyester polyol containing structural units represented by formula I, formula II (m is an integer of 4 to 12) and formula III (Ar is an aromatic group) in a molar ratio of formula II/formula III=3/7 to 8/2 in the molecule and having 1300 to 3500 number-average molecular weight with an organic diisocyanate (e.g. 4,4'-diphenylmethane diisocyanate) and a chain-extending agent (e.g. ethylene glycol) and having to R are each H or a lower alkyl; n is 2 to 80) in a weight ratio of the component (A)/the component (B)=1000/1 to 1000/5.

5. 发明专利

JPH07179558A POLYURETHANE AND ITS PRODUCTION 失效
公开(公告)号：JPH07179558A
公开(公告)日：1995-07-18
申请号：JP34560293
申请日：1993-12-22
申请人： KURARAY CO
发明人： KATO SHINYA , YAMASHITA SADAO
IPC分类号： C08G18/48 , C08G18/65 , C08G18/66 , D01F6/70
摘要： PURPOSE:To produce a polyurethane excellent in mechanical properties, utility, etc., and useful for forming a molding excellent in visual appearance by reacting an organic diisocyanate with a high-molecular diol composed mainly of polytetramethylene ether glycol and a chain-lengthening agent. CONSTITUTION:This polyurethane is produced by reacting (A) an organic diisocyanate, (B) a high-molecular diol composed mainly of polytetramethylene ether glycol having 500 to 3000 number-average molecular weight and (C) a chain-lengthening agent composed mainly of (i) 1,4-butanediol and (ii) a diol (preferably, 1,9-nonanediol) of the formula [R is H or methyl; (m) and (n) are each an integer of >=1 and the total of (m) and (n) is 4 to 10] and having >=4.0wt.% N content. In the chain-lengthening agent (C), the molar ratio of the component (i) to the component (ii) is 97:3 to 70:30. In addition, a molding and a fiber can be obtained by melt-molding or melt-spinning this polyurethane.

6. 发明专利

JPH07179557A POLYURETHANE AND ITS MOLDING 失效
公开(公告)号：JPH07179557A
公开(公告)日：1995-07-18
申请号：JP27795694
申请日：1994-11-11
申请人： KURARAY CO
发明人： IWATA SHIZUO , KATO SHINYA , HIRAI KOJI
IPC分类号： C08G18/42 , C08G18/65 , C08G18/66
摘要： PURPOSE:To produce a polyurethane excellent in moldability, heat resistance and cold resistance and low in permanent compression set by reacting a polyester diol, a diisocyanate, butanediol and an aliphatic diol in a ratio within a specified range. CONSTITUTION:This polyester-based polyurethane is produced by reacting (A) a polyester diol composed of diol units containing (i) 1,9-nonanediol units and (ii) 3-methyl-1,5-pentanediol units and (iii) dicarboxylic acid units, satisfying 0.3

7. 发明专利

JPH07138339A POLYURETHANE 失效
公开(公告)号：JPH07138339A
公开(公告)日：1995-05-30
申请号：JP30731393
申请日：1993-11-12
申请人： KURARAY CO
发明人： IWATA SHIZUO , OSHITA TATSUYA , KATO SHINYA , ISHIGURO MICHIHIRO
IPC分类号： C08G18/24 , C08G18/22 , C08G18/65 , C08G18/66
摘要： PURPOSE:To obtain a polyurethane which hardly increases its melt viscosity during stay in a molding machine, gives a molding free from fisheyes, and is excellent in moldability by reacting a specific high-molecular diol, a specific chain extender, and a specific org. diisocyanate using a specific catalyst. CONSTITUTION:This polyurethane is produced by reacting a high-molecular diol having a mol.wt. of 1,000-5,000 (e.g. a polyester diol obtd. from 1,4- butanediol and adipic acid), an org. diisocyanate (e.g. 4,4'-diphenylmethane diisocyanate), and a chain extender comprising 35-90mol% 1,4-butanediol and 65-10mol% bis(beta-hydroxyethoxy)benzene in the presence of a urethane-forming tin catalyst (e.g. dibutyltin diacetate) in an amt. of Sn of 0.5-15ppm.

8. 发明专利

JPH03215586A ADHESIVE COMPOSITION AND LAMINATE PREPARED BY USING IT 失效
公开(公告)号：JPH03215586A
公开(公告)日：1991-09-20
申请号：JP1126190
申请日：1990-01-19
申请人： KURARAY CO
发明人： NAKANO MANABU , KATO SHINYA , OGINO YASUHIRO
IPC分类号： B32B27/12 , C08L75/00 , C08L75/04 , C09J175/00 , C09J175/06
摘要： PURPOSE:To obtain the title compsn. with excellent mildew resistance and adhesiveness by compounding a specified polyester polyurethane diol with a mildew resistant org. compd. CONSTITUTION:The title compsn. comprises a polyester polyurethane diol, obtd. by reacting a polyester diol (e.g. one obtd. from 3-methyl-1,5-pentanediol and adipic acid) with a diisocyanate (e.g. hexamethylene diisocyanate), and a mildew-resistant org. compd. (e.g. 2-methoxycarbonylaminobenzimidazole).

9. 发明专利

JP2014161940A Abrasive pad and polishing method 有权
标题翻译：抛光垫和抛光方法
公开(公告)号：JP2014161940A
公开(公告)日：2014-09-08
申请号：JP2013033786
申请日：2013-02-22
申请人： Kuraray Co Ltd , 株式会社クラレ
发明人： KATO MITSURU , KIKUCHI HIROBUMI , OKAMOTO TOMOHIRO , KATO SHINYA
IPC分类号： B24B37/24 , C08F18/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an abrasive pad that improves flatness and planarization efficiency of a surface to be polished, causes less occurrence of a scratch, and is usable for a long period of time.SOLUTION: The abrasive pad includes a polishing layer containing a saponified ethylene-vinyl ester copolymer in which ethylene copolymerization rate is 35-55 mol% and a crystal fusion heat quantity is 60-110 J/g. The abrasive pad is used for polishing an insulating film or metal film having a Mohs hardness of 7 or less.
摘要翻译：要解决的问题：提供一种提高待抛光表面的平坦度和平坦化效率的研磨垫，导致较少的划痕发生，并且可长时间使用。解决方案：研磨垫包括含有乙烯共聚合率为35-55摩尔％，结晶熔合热量为60-110J /克的皂化乙烯 - 乙烯基酯共聚物。研磨垫用于抛光莫氏硬度为7以下的绝缘膜或金属膜。

10. 发明专利

JP2011103410A Slurry for chemical mechanical polishing 有权
标题翻译：化学机械抛光浆
公开(公告)号：JP2011103410A
公开(公告)日：2011-05-26
申请号：JP2009258441
申请日：2009-11-11
申请人： Kuraray Co Ltd , 株式会社クラレ
发明人： TAKEKOSHI YUTAKA , KATO MITSURU , OKAMOTO TOMOHIRO , KATO SHINYA
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide a slurry for chemical mechanical polishing capable of extremely reducing a step between an insulating film formed by silicon oxide or the like and a stopper film formed by silicon nitride or the like in a shallow-trench isolation process, and to provide a method of polishing and manufacturing a substrate. SOLUTION: The slurry for chemical mechanical polishing includes a water-soluble compound (a) having 200 to 1,000,000 weight-average molecular weight in the range of >0.5 mass% and ≤10 mass%, a polishing sand particle (b), and water (c). COPYRIGHT: (C)2011,JPO&INPIT

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