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1. 发明专利

JP2014111512A Plant growth promoter 有权
标题翻译：植物生长促进剂
公开(公告)号：JP2014111512A
公开(公告)日：2014-06-19
申请号：JP2012266025
申请日：2012-12-05
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： NISHIDA HIROYASU , KOMATSU MICHIO
IPC分类号： C05B17/00 , A01N25/04 , A01N59/00 , A01P21/00 , C05C11/00 , C05D1/00 , C05D9/00
摘要： PROBLEM TO BE SOLVED: To provide a plant growth promoter having high plant growth effects such as a strengthening of the plant cell walls, a promotion of photosynthesis, an activation of roots, an improvement of resistance to falling, an increase of resistance to disease damage and insect damage.SOLUTION: There is provided a plant growth promoter comprising a silica sol obtained by dispersing silica microparticles into a dispersion medium and satisfying the following conditions of 1), 2) and 3): 1) silica microparticles are contained in the silica sol by 10 to 40 mass% expressed in terms of concentration of SiO; 2) 10 to 80 mass% of the silica microparticles is a soluble silica made of monosilicic acid and polysilicic acid having a polymerization degree of 2 to 8; and 3) 30 to 80 mass% of the soluble silica is monosilicic acid.
摘要翻译：要解决的问题：提供具有植物生长效应高的植物生长促进剂，例如植物细胞壁的增强，光合作用的促进，根的激活，抗堕落的提高，抗病性的增加和昆虫损伤。解决方案：提供一种植物生长促进剂，其包含通过将二氧化硅微粒分散到分散介质中而获得的二氧化硅溶胶，并满足以下条件1），2）和3）：1）二氧化硅微粒包含在二氧化硅溶胶以SiO 2浓度表示的10〜40质量％ 2）10〜80质量％的二氧化硅微粒是聚合度为2〜8的单硅酸和聚硅酸制成的可溶性二氧化硅; 和3）30〜80质量％的可溶性二氧化硅是单硅酸。

2. 发明专利

JP2013177617A Silica sol for polishing, and composition for polishing 审中-公开
标题翻译：用于抛光的二氧化硅溶胶和用于抛光的组合物
公开(公告)号：JP2013177617A
公开(公告)日：2013-09-09
申请号：JP2013099157
申请日：2013-05-09
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： NISHIDA HIROYASU , KOMATSU MICHIO
IPC分类号： C09K3/14 , B24B37/00 , C09G1/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a silica sol for polishing and a composition for polishing, capable of polishing LSI and the like such as semiconductor wafers, glass hard disks, and alumina hard disks at high speed and stable polishing speed and inflicting little generation of flaws such as linear traces during polishing; and to provide a method for efficiently producing the silica sol for polishing.SOLUTION: A silica sol for polishing, which is a silica sol in which silica microparticles are dispersed in a dispersant, is provided, wherein the modal particle size in a particle distribution of the silica microparticles is in the range of 5-100 nm, and furthermore the following conditions (1) and (2) are satisfied: (1) the proportion of silica microparticles over the modal particle size is 5-30 volume% based on the whole amount of silica microparticles, and (2) the particle size variation index in a particle size distribution of particles having equal to or less than the modal particle size is in the range of 30-70%. The silica sol for polishing can continue to express an excellent polishing speed by suppressing the generation of linear traces and scratches, when applied to polishing uses.
摘要翻译：要解决的问题：为了提供用于抛光的二氧化硅溶胶和用于抛光的组合物，能够以高速和稳定的抛光速度高速抛光半导体晶片，玻璃硬盘和氧化铝硬盘等LSI等，并且几乎不产生抛光过程中的痕迹等缺陷; 并提供一种有效地制造用于抛光的二氧化硅溶胶的方法。溶液：提供一种二氧化硅溶胶，其中二氧化硅溶胶是二氧化硅微粒分散在分散剂中的二氧化硅溶胶，其中颗粒分布中的模态粒径二氧化硅微粒在5〜100nm的范围内，此外满足以下条件（1）和（2）：（1）二氧化硅微粒相对于模态粒径的比例为5-30体积％，基于二氧化硅微粒的全部量，和（2）具有等于或小于模态粒径的粒子的粒度分布中的粒径变化指数在30〜70％的范围内。当用于抛光用途时，用于抛光的硅溶胶可以通过抑制线形痕迹和划痕的产生而继续表现出优异的抛光速度。

3. 发明专利

JP2012200832A Abrasive agent 有权
标题翻译：磨料代理
公开(公告)号：JP2012200832A
公开(公告)日：2012-10-22
申请号：JP2011069118
申请日：2011-03-28
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： NISHIDA HIROYASU , TAWARASAKO YUJI
IPC分类号： B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an abrasive agent that can increase a polishing speed and reduce scratches (linear impressions) when an object to be polished is polished using the agent.SOLUTION: This abrasive agent is manufactured by dispersing, in dispersion media, inorganic oxide fine particles having a solid acid amount or a solid base amount of 0.01 mmol/g or higher and an averaged grain size of 2 μm or smaller. The pH of the abrasive agent is 8.0-11.5.
摘要翻译：要解决的问题：提供一种研磨剂，其可以在使用该试剂抛光待抛光物体时提高抛光速度并减少划痕（线性印模）。解决方案：该研磨剂是通过在分散介质中分散固体酸量或固体碱量为0.01mmol / g以上，平均粒径为2μm以下的无机氧化物微粒而制造的。研磨剂的pH值为8.0-11.5。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2011237802A Production method for antireflection laminate 有权
标题翻译：生产反应层压板的方法
公开(公告)号：JP2011237802A
公开(公告)日：2011-11-24
申请号：JP2011109691
申请日：2011-05-16
申请人： Dainippon Printing Co Ltd , Jgc Catalysts & Chemicals Ltd , 大日本印刷株式会社 , 日揮触媒化成株式会社
发明人： MIZUNO UTAKO , NAKAJO MIDORI , SHINOHARA MASASHI , YOSHIHARA TOSHIO , NISHIDA HIROYASU , MURAGUCHI RYO , HIRAI MASAFUMI
IPC分类号： G02B1/11 , B32B27/20 , C09D4/00 , C09D7/12 , G02F1/1335 , G09F9/00
CPC分类号： C09D5/006 , B05D3/06 , C08K3/36 , C08K7/26 , C08K9/06 , C09D4/00 , C09D7/61 , C09D7/67 , C09D7/70 , G02B1/111 , Y10T428/249953
摘要： PROBLEM TO BE SOLVED: To provide a production method for an antireflection laminate having low refractive index and excellent mechanical strength where a coating layer of an ionizing radiation curable resin composition containing hollow silica fine particles is formed.SOLUTION: Silica fine particles are prepared through the following steps: a first step to form colloidal particles comprising a complex oxide; a second step to selectively remove at least some of elements other than silicon and oxygen from the colloidal particles by dissolving and removing using a mineral acid or an organic acid or by contacting with a cation exchange resin to remove by ion exchange; a third step to coat the surface of the colloidal particles with a hydrolyzable organic silicon compound or a polymer of a silicic acid liquid to prepare silica fine particles; and a fourth step to hydrothermally treat the silica fine particles in the range of 50 to 300°C so that the amounts of alkali metal oxide and ammonia contained in the silica fine particles are 10 ppm and 2000 ppm or less, respectively.
摘要翻译：解决问题的方案：提供一种具有折射率低，机械强度优异的防反射层叠体的制造方法，其中形成含有中空二氧化硅微粒的电离辐射固化型树脂组合物的涂层。解决方案：通过以下步骤制备二氧化硅微粒：形成包含复合氧化物的胶体颗粒的第一步骤; 通过使用无机酸或有机酸溶解和除去或通过与阳离子交换树脂接触以通过离子交换除去来选择性地从胶体颗粒中除去硅和氧以外的至少一些元素的第二步骤; 用可水解的有机硅化合物或硅酸液体的聚合物涂覆胶体颗粒的表面以制备二氧化硅细颗粒的第三步骤; 以及将二氧化硅微粒在50〜300℃的范围内进行水热处理，使二氧化硅微粒中所含的碱金属氧化物和氨的含量分别为10ppm〜2000ppm的第四工序。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2011203745A Anti-reflective laminate 审中-公开
标题翻译：抗反射层压板
公开(公告)号：JP2011203745A
公开(公告)日：2011-10-13
申请号：JP2011109692
申请日：2011-05-16
申请人： Dainippon Printing Co Ltd , Jgc Catalysts & Chemicals Ltd , 大日本印刷株式会社 , 日揮触媒化成株式会社
发明人： MIZUNO UTAKO , NAKAJO MIDORI , SHINOHARA SEIJI , YOSHIHARA TOSHIO , NISHIDA HIROYASU , MURAGUCHI MAKOTO , HIRAI MASABUMI
IPC分类号： G02B1/11 , B32B7/02 , B32B27/18 , B32B27/20 , C09D4/00 , C09D7/12 , G02B1/10 , G09F9/00
CPC分类号： C09D5/006 , B05D3/06 , C08K3/36 , C08K7/26 , C08K9/06 , C09D4/00 , C09D7/61 , C09D7/67 , C09D7/70 , G02B1/111 , Y10T428/249953
摘要： PROBLEM TO BE SOLVED: To provide an antireflection laminate which has a low refractive index and superior mechanical strength and which includes a coating layer of an ionizing radiation curing-type resin composition, including ionizing radiation curing group-containing hollow silica particulates.SOLUTION: The antireflection laminate includes a light translucent base material and at least a low refractive index layer having a refractive index of not more than 1.45, provided on the light translucent base material; the low refractive index layer comprises the ionizing radiation curing-type resin composition and the silica particulates which have an outer shell layer with the interior of the silica particulates being porous or void; and a part or all of the silica particulates is treated by the ionizing radiation curing group-containing silane coupling agent, in at least a part of the silica particulate surface.
摘要翻译：要解决的问题：提供一种具有低折射率和优异的机械强度的抗反射层压板，其包括电离辐射固化型树脂组合物的涂层，其包含含电离辐射固化基团的中空二氧化硅颗粒。解决方案：防反射层压板包括光透光性基材和至少具有折射率不大于1.45的低折射率层，设置在光透光性基材上; 低折射率层包括电离辐射固化型树脂组合物和具有外壳层的二氧化硅微粒，二氧化硅微粒的内部是多孔的或空隙的; 并且在二氧化硅颗粒表面的至少一部分中，通过含电离辐射固化基团的硅烷偶联剂处理部分或全部二氧化硅微粒。

6. 发明专利

JP2011093735A Modified alumina hydrate particle and method for producing the same, coating liquid for forming inkjet receiving layer containing modified alumina hydrate particle, and substrate with receiving layer 审中-公开
标题翻译：改性的氢氧化铝颗粒及其制备方法，用于形成含有改性的氢氧化铝颗粒的接收层的涂覆液和具有接收层的基板
公开(公告)号：JP2011093735A
公开(公告)日：2011-05-12
申请号：JP2009248160
申请日：2009-10-28
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： SUEYOSHI RYOTA , WAKAMIYA YOSHINORI , EGAMI YOSHINORI , KUMAZAWA MITSUAKI , NISHIDA HIROYASU
IPC分类号： C01F7/02 , B41M5/00 , B41M5/50 , B41M5/52 , C09C1/40 , C09C3/06 , C09D7/12 , C09D129/06 , C09D133/00 , C09D133/02 , C09D139/06 , C09D151/08 , C09D175/04 , C09D201/00
摘要： PROBLEM TO BE SOLVED: To provide modified alumina hydrate particles having a predetermined average particle diameter, a coating liquid for forming an inkjet receiving layer excellent in stability, an inkjet receiving layer having excellent transparency, a low haze value, excellent scratch resistance and adhesiveness, and excellent bleeding resistance, drying property and water-proofing property when pigment ink or dye ink is used, and to provide a substrate with an inkjet receiving layer. SOLUTION: The modified alumina hydrate particles comprise an alumina hydrate, having an average primary particle diameter (D1) ranging from 5 to 30 nm, an average secondary particle diameter (D2) ranging from 5 to 500 nm, and a ratio (D2)/(D1) of the average secondary particle diameter (D2) to the primary particle diameter (D1) ranging from 1 to 100; and the particles are modified with at least one kind of salt of group 2 metals in the periodical table. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有预定平均粒径的改性氧化铝水合物颗粒，用于形成稳定性优异的喷墨接收层的涂布液，具有优异透明性，低雾度值，优异耐刮擦性的喷墨接收层和粘合性，并且当使用颜料墨水或染料墨水时，具有优异的耐渗透性，干燥性和防水性，并且提供具有喷墨接受层的基材。解决方案：改性氧化铝水合物颗粒包含平均一次粒径（D1）为5-30nm，平均二次粒径（D2）为5-500nm的水合氧化铝和 D2）/（D1）与一次粒径（D1）的比值为1〜100; 并且在周期表中用至少一种第2族金属的盐改性颗粒。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2010058985A Silica sol and method for producing the same 有权
标题翻译：二氧化硅溶胶及其制造方法
公开(公告)号：JP2010058985A
公开(公告)日：2010-03-18
申请号：JP2008223530
申请日：2008-09-01
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： NISHIDA HIROYASU , NAKAYAMA KAZUHIRO
IPC分类号： C01B33/149 , B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide silica sol obtained by dispersing, in a solvent, spherical silica fine particles having verrucose protrusions on surfaces thereof, particularly silica sol obtained by dispersing, in a solvent, spherical silica fine particles having a low content of sodium, etc., and a method for producing such silica sol. SOLUTION: The silica sol is obtained by dispersing, in a solvent, spherical silica fine particles having a plurality of verrucose protrusions on surfaces thereof, wherein when a specific surface area of the spherical silica fine particles measured by the BET method is represented by (SA1) and a specific surface area calculated from an average particle diameter (D2) of the silica fine particles measured by an image analysis method is represented by (SA2), the value of surface roughness (SA1)/(SA2) is in a range of 1.9-5.0, the average particle diameter (D2) is in a range of 10-200 nm, and a sodium content is in a range of ≤100 mass ppm. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供通过在溶剂中分散具有疣状突起的球形二氧化硅细颗粒表面而获得的二氧化硅溶胶，特别是通过在溶剂中分散具有低含量的球形二氧化硅细颗粒而获得的二氧化硅溶胶的钠等，以及这种硅溶胶的制造方法。解决方案：通过在溶剂中分散其表面上具有多个疣状突起的球形二氧化硅微粒而获得二氧化硅溶胶，其中当通过BET法测量的球形二氧化硅细颗粒的比表面积被表示时（SA1）表示，由图像分析法测定的由二氧化硅微粒的平均粒径（D2）计算出的比表面积由（SA2）表示，表面粗糙度（SA1）/（SA2）的值为范围为1.9-5.0，平均粒径（D2）在10-200nm的范围内，钠含量在≤100质量ppm的范围内。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2009091197A Warty-surfaced sphere-form inorganic oxide sol, method for producing same, and abrasive containing the sol 审中-公开
标题翻译： WARTY表面球形无机氧化物溶胶，其生产方法和含有SOL的磨料
公开(公告)号：JP2009091197A
公开(公告)日：2009-04-30
申请号：JP2007263708
申请日：2007-10-09
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： NAKAYAMA KAZUHIRO , TOKUNAGA MASAMI , NAKAJIMA AKIRA , INOUE KAZUAKI , YOSHIDA OSAMU , WAKAMIYA YOSHINORI , NISHIDA HIROYASU
IPC分类号： C01B33/146 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide a warty-surfaced sphere-form inorganic oxide sol composed of a solvent and fine microspherical inorganic oxide particles dispersed therein and being in a peculiar form, i.e., a warty-surfaced sphere-form.
SOLUTION: The warty-surfaced sphere-form inorganic oxide sol is composed of a solvent and warty-surfaced sphere-form fine inorganic oxide particles being fine spherical inorganic oxide particles having warty protrusions on their surfaces and dispersed therein and satisfying (a) a sphericity in the range of 0.8-1, (b) a surface roughness (SA1)/(SA2) of a value in the range of 1.20-1.70 (wherein (SA1) is the specific surface area as measured by a sodium titration method, and (SA2) is the specific surface area calculated from an average particle diameter (D2) as measured by an image analysis method), and (c) the average particle diameter (D2) as measured by the image analysis method in the range of 10-60 nm.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供由溶剂和分散在其中的细微球形无机氧化物颗粒形成的表面形式的球形无机氧化物溶胶，并且是特殊形式，即疣状的球形。解决方案：疣状球形无机氧化物溶胶由溶剂和疣状球状无机氧化物颗粒组成，其表面上具有疣状突起的细小球状无机氧化物颗粒，并分散在其中并满足（a ）在0.8-1的范围内的球形度，（b）在1.20-1.70范围内的值的表面粗糙度（SA1）/（SA2）（其中（SA1）是通过钠滴定测量的比表面积方法和（SA2）是通过图像分析方法测量的由平均粒径（D2）计算的比表面积）和（c）通过图像分析方法测量的平均粒径（D2）为10-60nm。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2009007616A Method for producing silica-coated gold colloidal particle, and silica-coated gold colloidal particle 有权
标题翻译：用于生产二氧化硅包覆的金色胶体颗粒的方法和二氧化硅涂层的金色胶体颗粒
公开(公告)号：JP2009007616A
公开(公告)日：2009-01-15
申请号：JP2007169203
申请日：2007-06-27
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： WAKAMIYA YOSHINORI , NISHIDA HIROYASU , KOYANAGI TSUGUO
IPC分类号： B22F1/02 , B01J13/00 , B22F1/00 , B22F9/00 , C09C1/62 , C09C3/06
摘要： PROBLEM TO BE SOLVED: To provide a silica-coated gold colloidal particle which is not flocculated or discolored even when heating treatment is applied, and capable of maintaining clear red.
SOLUTION: Disclosed is a method for producing a silica-coated gold colloidal particle characterized in that a gold colloidal particle (M)-dispersed liquid in which the average particle diameter lies in the range of 5 to 100 nm, and subjected to surface treatment with a carboxyl group and/or carboxylate group-containing organic compound and a silica colloidal particle (A)-dispersed liquid in which the average particle diameter lies in the range of 4 to 40 nm, and subjected to surface treatment with an amino group-containing silane compound are mixed. Also disclosed is a method for producing a silica-coated gold colloidal particle characterized in that a gold colloidal particle (M)-dispersed liquid in which the average particle diameter lies in the range of 5 to 100 nm and a silica colloidal particle (A)-dispersed liquid in which the average particle diameter lies in the range of 4 to 40 nm, and subjected to surface treatment with a mercapto group-containing silane compound, and into which a thiol group(-SH group) is introduced are mixed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供即使在加热处理时也不会絮凝或变色的二氧化硅涂覆的金胶体颗粒，并且能够保持透明的红色。解决方案：公开了一种二氧化硅被覆金胶体粒子的制造方法，其特征在于，将平均粒径在5〜100nm范围内的金胶体粒子（M） - 分散液体，用含羧基和/或羧酸根基团的有机化合物和二氧化硅胶体颗粒（A）分散液进行表面处理，其中平均粒径在4〜40nm的范围内，并用氨基含硅基硅烷化合物混合。还公开了一种二氧化硅被覆金胶体粒子的制造方法，其特征在于，将平均粒径在5〜100nm范围内的金胶体粒子（M）分散液和二氧化硅胶体粒子（A）平均粒径在4〜40nm范围内的分散液，并用含巯基的硅烷化合物进行表面处理，并将其中引入硫醇基（-SH基）的混合物。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008273780A Modified silica-based sol and method for preparing the same 审中-公开
标题翻译：改性二氧化硅溶胶及其制备方法
公开(公告)号：JP2008273780A
公开(公告)日：2008-11-13
申请号：JP2007119026
申请日：2007-04-27
申请人： Jgc Catalysts & Chemicals Ltd , 日揮触媒化成株式会社
发明人： TOKUNAGA MASAMI , NAKAYAMA KAZUHIRO , NAKAJIMA AKIRA , NISHIDA HIROYASU
IPC分类号： C01B33/14 , C08K3/36 , C08L101/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide modified silica-based fine particles which can be filled into a curable composition, a film forming composition or a ceramic forming precursor composition in a very dense state and exhibit strength or peculiar properties as a filler.
SOLUTION: The modified silica-based fine particles satisfy the following conditions (a) to (e); (a) a sphericity in the range of 0.80-1.00, (b) a surface roughness (SA1)/(SA2) in the range of 1.00 to
摘要翻译：要解决的问题：提供可以填充到可固化组合物中的改性二氧化硅基细颗粒，非常致密状态的成膜组合物或陶瓷形成前体组合物，并表现出作为填料的强度或特性。改性二氧化硅系微粒满足下述（a）〜（e）的条件。（a）在1.00〜1.20的范围内的球面度为0.80〜1.00，（b）表面粗糙度（SA1）/（SA2），其中SA1为通过钠滴定法测定的比表面积，SA2 是通过图像分析法测定的平均粒径（D2）的比表面积，（c）通过图像分析法测定的平均粒径（D2）在10〜300nm的范围内，（d）a 粒径≥300nm的粗粒子数在≤1000/ mL（以固体浓度1质量％表示）的范围内，（e）粒子变化系数（CV值）在≤ 5％。通过将改性二氧化硅基微粒分散在溶剂中来制备改性二氧化硅基溶胶。版权所有（C）2009，JPO＆INPIT

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