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1. 发明专利

JP2006146169A System and method for protecting micro-structure of display array by using spacer in gap within display device 有权
标题翻译：通过在显示设备中使用间隙来保护显示器阵列微结构的系统和方法
公开(公告)号：JP2006146169A
公开(公告)日：2006-06-08
申请号：JP2005276442
申请日：2005-09-22
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： PALMATEER LAUREN , CUMMINGS WILLIAM J , GALLY BRIAN J , CHUI CLARENCE
IPC分类号： G09F9/00 , G02B26/08 , G02F1/21 , G09F9/30 , G09G3/20 , G09G3/34
CPC分类号： B81B7/0058 , B81B2201/045 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for protecting a micro-structure of a display array by using a spacer in a gap within a display device. SOLUTION: A packaging system of an electronic device 700 includes one or more spacers 730 that prevent or reduce damage to the electronic device 700 arising from contact of an array 720 with a back plate 750. In some embodiments, the packaged electronic device comprising spacers is thinner than a comparable electronic device manufactured without spacers. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过在显示装置内的间隙中使用间隔物来保护显示阵列的微结构的系统和方法。解决方案：电子设备700的包装系统包括一个或多个间隔物730，其防止或减少由阵列720与背板750的接触引起的电子设备700的损坏。在一些实施例中，封装的电子设备包括间隔物比不用间隔物制造的可比电子器件更薄。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006098391A Electro-optical measurement of hysteresis in interference modulator 审中-公开
标题翻译：干涉调制器中电磁光度测量
公开(公告)号：JP2006098391A
公开(公告)日：2006-04-13
申请号：JP2005219836
申请日：2005-07-29
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： G01M11/00 , G02B26/08
CPC分类号： G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a correct and convenient method of an interference modulator with respect to a micro electricity mechanical system (MEMS).
SOLUTION: A time-variation voltage waveform is applied to the interference modulator in a block 150, the reflectivity of light from the interference modulator is detected in a block 152, the reflectivity is determined as a function of electric voltage in a block 160, and sufficient quality for use as a display is recognized in a block 162. When there are a plurality of interference modulators, it is determined whether the repetition is required in a block 164, and the block 152 and after are repeated, thereby recognizing the quality of the plurality of interference modulators.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供关于微电机械系统（MEMS）的干扰调制器的正确和方便的方法。解决方案：在块150中对干扰调制器施加时变电压波形，在块152中检测来自干扰调制器的光的反射率，反射率被确定为块中的电压的函数 160，并且在块162中识别出用作显示器的足够的质量。当存在多个干扰调制器时，确定在块164中是否需要重复，并且块152和之后被重复，从而识别多个干扰调制器的质量。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2008046603A Process control monitor for interferometric modulator 审中-公开
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008046603A
公开(公告)日：2008-02-28
申请号：JP2007150880
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/08 , G09F9/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor for interferometric modulators for reasons that errors can occur during the manufacturing of MEMS devices, that detecting the errors and the source of the errors can present a problem in the quality control and optimization of MEMS devices, and that accordingly there is a need for structures and methods for monitoring manufacturing processes and their results. SOLUTION: Process control monitors 100, 102, 104 are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device 108. Analysis of the process control monitors 100, 102, 104 can provide information regarding properties of the MEMS device 108 and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102, 104 may utilize optical measurements. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在MEMS器件制造过程中发生错误的原因提供干涉式调制器的过程控制监视器，检测误差和误差源可能会导致质量控制和优化中的问题的MEMS器件，因此，需要用于监测制造工艺及其结果的结构和方法。公开了使用用于制造MEMS器件108的至少一些相同工艺步骤生产的过程控制监视器100,102,104。过程控制监视器100,102,104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102,104的分析可以利用光学测量。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008026877A Process control monitor for interferometric modulator 有权
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008026877A
公开(公告)日：2008-02-07
申请号：JP2007150868
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/02 , B81C1/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide process control monitors for interferometric modulators. SOLUTION: Process control monitors 100, 102 and 104 are manufactured by using at least some of the same process steps as those used to manufacture an MEMS device 108. Analysis of the process control monitors 100, 102 and 104 can provide information regarding properties of the MEMS device 108 and components or subcomponents in the device. The information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102 and 104 can utilize optical measurement values. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供干涉式调制器的过程控制监视器。解决方案：过程控制监视器100,102和104通过使用至少一些与制造MEMS器件108相同的处理步骤来制造。过程控制监视器100,102和104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102和104的分析可以利用光学测量值。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007301719A Process control monitor regarding interferometric modulator 有权
标题翻译：关于干涉仪调制器的过程控制监视器
公开(公告)号：JP2007301719A
公开(公告)日：2007-11-22
申请号：JP2007150861
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor regarding an interferometric modulator. SOLUTION: Process control monitors 100, 102 and 104 manufactured by using at least a part of the same process step as that used for manufacturing a MEMS device 108 are disclosed. By analyzing the process control monitors 100, 102 and 104, information on properties of the MEMS device 108 and components or sub components in the device 108 can be provided. The information can be used to identify an error in processing or optimize the MEMS device 108. In some embodiments, optical measured values can be used in the analysis of the process control monitors 100, 102 and 104. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供关于干涉式调制器的过程控制监视器。解决方案：公开了通过使用与用于制造MEMS器件108的工艺步骤相同的工艺步骤的至少一部分制造的工艺控制监视器100,102和104。通过分析过程控制监视器100,102和104，可以提供关于MEMS设备108的属性和设备108中的组件或子组件的信息。该信息可用于识别处理或优化MEMS器件108中的错误。在一些实施例中，光学测量值可用于过程控制监视器100,102和104的分析。（C） 2008年，日本特许厅和INPIT

6. 发明专利

JP2006113559A Apparatus and method for reducing perceived color shift 有权
标题翻译：减少感知色差的装置和方法
公开(公告)号：JP2006113559A
公开(公告)日：2006-04-27
申请号：JP2005260607
申请日：2005-09-08
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , KOTHARI MANISH
IPC分类号： G02B26/00 , G09F9/00 , G09F9/30 , G09G3/34
CPC分类号： G02B26/001 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for reducing a perceived color shift. SOLUTION: An apparatus and a method for reducing perceived color shift as a function of a viewing angle is disclosed. One embodiment is a display device that includes a color light modulator and a color filter. The filter is configured to filter wavelengths of light that would be perceived as color shifted light when reflected by the modulator at an off-axis viewing angle. Another embodiment includes a color light modulator and a color light source configured to provide light having a spectral content that lacks the wavelengths that would be perceived as color shifted light by a view of the display at an off-axis viewing angle. Another embodiment is a method of making such display devices. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种减少感知色移的装置和方法。公开了一种用于减少感知色移作为视角的函数的装置和方法。一个实施例是包括彩色调制器和滤色器的显示装置。滤光器被配置为滤除在离轴观察角度被调制器反射时被感知为偏移光的光的波长。另一个实施例包括彩色光调制器和彩色光源，其被配置为提供具有光谱含量的光，所述光谱内容缺乏通过视轴处于离轴视角的显示器的视觉而被感知为偏移光的波长。另一实施例是制造这种显示装置的方法。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006099113A Method and device for manipulating color in display 审中-公开
标题翻译：用于在显示器中操作颜色的方法和装置
公开(公告)号：JP2006099113A
公开(公告)日：2006-04-13
申请号：JP2005276235
申请日：2005-09-22
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , CUMMINGS WILLIAM J
IPC分类号： G02B26/00 , B81B3/00
CPC分类号： G02B26/001 , G09G3/3466 , H04M1/73 , H04W52/027 , Y02D70/00 , Y02D70/1222 , Y02D70/142 , Y02D70/144 , Y02D70/164 , Y02D70/26 , Y10T29/49002
摘要： PROBLEM TO BE SOLVED: To provide a method for manipulating color and a structure of a display device in a display by a microelectromechanical system (MEMS) interferometric modulator. SOLUTION: In one embodiment, a display comprises interferometric display elements formed to have spectral responses that produce white light. In another embodiment, the produced white light is interferingly produced that is characterized by a standardized white point. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过微机电系统（MEMS）干涉式调制器来操纵显示器中的显示装置的颜色和结构的方法。解决方案：在一个实施例中，显示器包括形成为具有产生白光的光谱响应的干涉式显示元件。在另一个实施例中，所产生的白光被干涉地产生，其特征在于标准化的白点。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006099069A System and method for protecting microelectromechanical system array using structurally reinforced back-plate 审中-公开
标题翻译：使用结构强化后板保护微电子系统系统的系统和方法
公开(公告)号：JP2006099069A
公开(公告)日：2006-04-13
申请号：JP2005235798
申请日：2005-08-16
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , PALMATEER LAUREN , CUMMINGS WILLIAM J
IPC分类号： G02B26/08 , B81B3/00 , B81B7/04
CPC分类号： B81B3/007 , B81B7/0058 , B81C2203/0163 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To protect microelectromechanical systems from damage by increasing rigidity of a back-plate. SOLUTION: The packaged device includes a substrate 101, an interferometric modulation display array 111 formed on the substrate 101, and a back-plate. The back-plate is placed over the display array 111 with a gap 124 between the back-plate and the display array. The device further includes reinforcing structures which are integrated with the back-plate. The reinforcing structures add stiffness to the back-plate. The back-plate may have a thickness varying along an edge thereof. A driving space is processed by drying, sealing, gas filling, etc., for the purpose of preventing interference of the operation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过增加背板的刚度来保护微机电系统免受损坏。解决方案：封装器件包括衬底101，形成在衬底101上的干涉式调制显示阵列111和背板。背板被放置在显示器阵列111上，在背板和显示器阵列之间具有间隙124。该装置还包括与后板一体化的加强结构。加强结构增加了背板的刚度。背板可以具有沿其边缘变化的厚度。为了防止操作的干扰，驱动空间通过干燥，密封，充气等进行处理。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006091848A Electrical characterization of interferometric modulator 审中-公开
标题翻译：干涉仪调制器的电气特性
公开(公告)号：JP2006091848A
公开(公告)日：2006-04-06
申请号：JP2005211655
申请日：2005-07-21
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J , KOTHARI MANISH
IPC分类号： G09G3/20 , G01M11/00 , G01R31/00 , G01R31/02 , G02B26/08 , G09G3/34
CPC分类号： G09G3/006 , G02B26/001 , G09G3/3466
摘要： PROBLEM TO BE SOLVED: To perform further development of an accurate and convenient method for testing operations of a MEMS device.
SOLUTION: In one embodiment of methods and systems for testing electric characteristics of a reflective display device including an interferometric modulator display device, a controlled voltage is applied to conductive leads in the display device, and a current resulting from this application is measured. This voltage is so controlled that an interferometric modulator is not operated during resistance measurement. A method is also disclosed which conditions the interferometric modulator display device by applying a voltage waveform for operating the interferometric modulator in the display device.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：进一步开发用于MEMS器件的测试操作的精确和方便的方法。解决方案：在用于测试包括干涉式调制器显示装置的反射显示装置的电特性的方法和系统的一个实施例中，将受控电压施加到显示装置中的导电引线，并且测量由该应用产生的电流。该电压被如此控制，使得干扰调制器在电阻测量期间不工作。还公开了一种通过在显示装置中施加用于操作干涉式调制器的电压波形来调节干涉式调制器显示装置的方法。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2010176140A Method and system for packaging display 审中-公开
标题翻译：用于包装显示的方法和系统
公开(公告)号：JP2010176140A
公开(公告)日：2010-08-12
申请号：JP2010044179
申请日：2010-03-01
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： PALMATEER LAUREN , CUMMINGS WILLIAM J , GALLY BRIAN J , FLOYD PHILIP D , CHUI CLARENCE
IPC分类号： G02B26/02 , B81B3/00
CPC分类号： B81B7/0067 , B81B2201/045 , B81C2203/0109 , B81C2203/0145 , B81C2203/019 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a package structure and a method of packaging for an interferometric modulator. SOLUTION: A transparent substrate 810 having an interferometric modulator 830 formed thereon is provided. A backplane 820 is joined to the transparent substrate 810 with a seal 840 where the interferometric modulator is exposed to the surrounding environment through an opening 850 in either the backplane or the seal. The opening is sealed after the transparent substrate and backplane are joined and after any desired desiccant, release material, and/or self-aligning monolayer film is introduced into the package structure 800. COPYRIGHT: (C)2010,JPO&INPIT

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