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1. 发明专利

JPS598334A Electron-beam exposure device 失效
标题翻译：电子束曝光装置
公开(公告)号：JPS598334A
公开(公告)日：1984-01-17
申请号：JP11679982
申请日：1982-07-07
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： YOKOUCHI HISATAKE , MATSUOKA GENYA , YODA HARUO , SAITOU NORIO , YANAGISAWA AKIRA , OOKUBO TSUNEO , MATSUDA KOREHITO , KOMATA FUJIO
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
CPC分类号： H01J37/302
摘要： PURPOSE:To draw a pattern at high speed with high accuracy by displaying beam size by digital-data, obtaining size in the width direction and the depth direction as the composite data of ditital-data, and controlling beam size by the composite data. CONSTITUTION:A memory 7 contains data previously calibrated regarding size in the width direction while using the width be beam size as data. A memory 8 contains data previously calibrated regarding size in the width direction while using the depth of beam size as data. A memory 10 contains data previously calibrated regarding size in the depth direction while using the depth of beam size as data. A memory 9 contains data previously calibrated regarding size in the depth direction while using the width of beam size as data. The composite data of each data of the memories 7, 8 is used regarding size in the width direction and the composite data of each data of the memories 10, 9 regarding size in the depth direction respectively.
摘要翻译：目的：通过数字数据显示光束尺寸，以高精度绘制图案，获取宽度方向和深度方向的尺寸作为复合数据，并通过复合数据控制光束尺寸。构成：存储器7包含预先对宽度方向尺寸进行校正的数据，同时使用宽度为光束大小作为数据。存储器8包含预先对宽度方向的大小进行校正的数据，同时使用光束大小的深度作为数据。存储器10包含先前关于深度方向上的尺寸校正的数据，同时使用光束大小的深度作为数据。存储器9包含先前关于深度方向上的尺寸校正的数据，同时使用波束大小的宽度作为数据。关于存储器7,8的每个数据的复合数据用于关于宽度方向上的大小以及存储器10,9的每个数据的合成数据，分别涉及深度方向的大小。

2. 发明专利

JPS57124433A Patterning data processing for electron beam expossing device 失效
标题翻译：电子束曝光装置的数据处理方法
公开(公告)号：JPS57124433A
公开(公告)日：1982-08-03
申请号：JP880781
申请日：1981-01-23
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： SHIMAZU NOBUO , SHIBAYAMA AKINORI , TAKAMOTO KIICHI , YODA HARUO , ISHIGA TADAKATSU
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
CPC分类号： H01J37/302
摘要： PURPOSE:To reduce the capacitance of the memory storage in which patterning data are memorized by a method wherein the pattern group to be repeatedly patterned is memorized as common patterning data, and a patterning is performed by repeatedly reading out the common patterning data. CONSTITUTION:The patterning data are transferred from the magnetic disc 1, wherein the patterning data of a plurality of chips are memorized, to a memory storage 2, and then transferred to a high-speed small capacitance memory storage 4 through the intermediary of a control section 3. A device control section 5 reads out the data stored in the memory storage 4, and a patterning is performed on the face of the sample on a stage 9 by controlling an electrooptical assembly 10. Among the patterns drawn on the surface of the sample, those which are repeatedly patterned are stored in the common data block of the memory storage 2 as common patterning data, and are used by repeatedly transferring them to the memory storage 4 every time a common pattern is drawn.
摘要翻译：目的：为了减少图案形成数据被存储的存储器存储器的电容，其中要重复构图的图案组被存储为常见的图案化数据，并且通过重复读出公共图案形成数据来执行图案化。构成：图形数据从磁盘1传送，其中多个芯片的图案化数据被存储到存储器存储器2中，然后通过控制的中间传送到高速小容量存储器存储器4 设备控制部分5读出存储在存储器4中的数据，并通过控制电光组件10在台9上的样品的表面上进行图案化。样本，被重复图案化的那些被存储在存储器存储器2的公共数据块中作为公共图案化数据，并且每当绘制公共图案时将它们重复地传送到存储器4来使用。

3. 发明专利

JPS57122528A Drawing system for electron beam exposure apparatus 失效
标题翻译：电子束曝光装置绘图系统
公开(公告)号：JPS57122528A
公开(公告)日：1982-07-30
申请号：JP880581
申请日：1981-01-23
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： SHIMAZU NOBUO , SHIBAYAMA AKINORI , OOKUBO TSUNEO , YODA HARUO
IPC分类号： G06K15/12 , B43L13/00 , G03F7/20 , G03F7/26 , H01J37/302 , H01L21/027
CPC分类号： H01J37/3023
摘要： PURPOSE:To alleviate the steps in designing with an exposure apparatus by drawing a pattern with a data which designates a main deflection amount as a drawing data, a data which designates a drawing pattern in a sub deflection range and further additionally a data which designates a drawing pattern group repeatedly while superposing arbitrary sub deflection ranges. CONSTITUTION:A drawing data 11 is applied to a data translator 12, and selected data is supplied to a drawing controller 13 and main and sub deflection registers 14, 15. Subsequently, the output of the controller 13 is supplied to the registers 14, 15, and is also applied through a blanker 16 to an electro-optical mirror 19. Further, the output from the register 14 is applied through a main deflector DA converter 17 to a main deflector 20, and the output from the register 15 is supplied through a sub deflector DA converter 18 to a sub deflector 21. In this structure, the data 11 is composed of 3 types A, B, C. The A employs a data which sets the main deflection amount, the B employs B-1, B-2, wherein the B-1 designates a pattern in the sub deflection range, and the B-2 designates the indirect drawing. Further, C is similar to the B-1, but is used for the repeated data.
摘要翻译：目的：为了减轻用曝光装置进行设计的步骤，通过绘制具有指定主偏转量的数据作为绘图数据的图案，指定在亚偏转范围内的绘制图案的数据，并且还附加指定在叠加任意子偏转范围的同时反复绘制图案组。构成：将图形数据11应用于数据转换器12，将选择的数据提供给绘图控制器13以及主偏转寄存器14和主偏转寄存器15.随后，控制器13的输出被提供给寄存器14,15 并且还通过阻挡器16施加到电光镜19.另外，寄存器14的输出通过主偏转器DA转换器17施加到主偏转器20，并且寄存器15的输出通过副偏转器DA转换器18到副偏转器21.在该结构中，数据11由A，B，C三种组成.A采用设定主偏转量的数据，B使用B-1，B -2，其中B-1表示亚偏转范围内的图案，B-2表示间接图。此外，C类似于B-1，但用于重复数据。

4. 发明专利

JPS57122526A Dividing method for drawing figure in electron beam exposure apparatus 失效
标题翻译：用于在电子束曝光装置中绘制图的分割方法
公开(公告)号：JPS57122526A
公开(公告)日：1982-07-30
申请号：JP867981
申请日：1981-01-23
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： SHIBAYAMA AKINORI , SHIMAZU NOBUO , MATSUDA KOREHITO , YODA HARUO , OZASA SUSUMU
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
CPC分类号： H01J37/302
摘要： PURPOSE:To eliminate the unsharpness of the periphery of an electron beam of an electron beam size variable exposure apparatus by comparing a figure to be drawn with the maximum allowable size of the beam, comparing the area of the figure with the predetermined value, and dividing the figure with the two values. CONSTITUTION:An exposure apparatus is composed of a height direction division control circuit 1, a width direction division control circuit 2, registers 3-9, a digital multiplier 10, digital comparators 11-15, a comparator 16 with a register, a subtractor 17, a digital comparator 18, selectors 19, 20 with registers, and a controller 21. Thus, the maximum allowable width W0 and the height H0 are respectively applied to the registers 3, 6, and the figure width W1 and height H1 to be divided are respectively set in the registers 5, 8. The value of H1XW1=C is set in the register 9, and the figure width W and height H of the entire figure to be divided are respectively set in the registers 4, 7. In this manner, the dividing mode is determined, and a figure is drawn in accordance with this.
摘要翻译：目的：为了消除电子束尺寸可变曝光装置的电子束周围的不清晰度，通过将要绘制的图形与光束的最大允许尺寸进行比较，将图形的面积与预定值进行比较，数字与两个值。构成：曝光装置由高度方向分割控制电路1，宽度方向分割控制电路2，寄存器3-9，数字乘法器10，数字比较器11-15，具有寄存器的比较器16，减法器17 数字比较器18，具有寄存器的选择器19,20以及控制器21.因此，最大允许宽度W0和高度H0分别施加到寄存器3,6，并且图形宽度W1和高度H1被分割分别设置在寄存器5,8中。在寄存器9中设置H1XW1 = C的值，并且要分割的整个图形的图形宽度W和高度H分别设置在寄存器4,7中。在此方式，确定分割模式，并根据此绘制图形。

5. 发明专利

JPS57122525A Dividing method for drawing figure in electron beam exposure apparatus 失效
标题翻译：用于在电子束曝光装置中绘制图的分割方法
公开(公告)号：JPS57122525A
公开(公告)日：1982-07-30
申请号：JP867881
申请日：1981-01-23
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： SHIBAYAMA AKINORI , SHIMAZU NOBUO , FUJINAMI AKIHIRA , YODA HARUO
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
CPC分类号： H01J37/302
摘要： PURPOSE:To eliminate the unsharpness of the end of an electron beam of an electron beam size variable exposure apparatus by dividing a figure into figure segments of the size capable of being solely emitted when a figure which is larger than the maximum size capable of being drawn by the beam is drawn and dividing the size of the figure into the figure segments larger than the predetermined minimum size. CONSTITUTION:There are provided figure height and width size registers 21, 22, electron beam height and width maximum size registers 23, 24, registers 25, 26 for setting the sum of the electron beam height and width minimum size plus previous maximum size of the beam not affected by the influence of an unsharpness, and registers 27, 28 for dividing the height and the width into desired size, and further registers 29-31 capable of selecting two inputs at the rear stages of the registers 21, 23, 25, 27, a register 32, a subtractor 33, an AND gate 34, digital comparators 35, 36, and a controller 37. A figure 40 to be drawn and to be divided is connected to the rear stages of the registers 22, 24, 26, 28, and a name register is controlled by the controller 37, and the figure 40 is divided into the size larger than the predetermined minimum size.
摘要翻译：目的：为了消除电子束尺寸可变曝光装置的电子束末端的不清晰度，通过将图形划分成当能够被绘制的大于最大尺寸的图形时能够被单独发射的尺寸的图形部分通过光束被绘制并将图的大小划分成大于预定最小尺寸的图形段。规定：提供图形高度和宽度尺寸寄存器21,22，电子束高度和宽度最大尺寸寄存器23,24，寄存器25,26，用于设置电子束高度和宽度最小尺寸之和加上先前最大尺寸的和光束不受不清晰度的影响的影响，并且用于将高度和宽度分成所需尺寸的寄存器27,28以及能够在寄存器21,23,25的后级选择两个输入的另外的寄存器29-31， 27，寄存器32，减法器33，与门34，数字比较器35,36和控制器37.待绘制并被分割的图40连接到寄存器22,24,26的后级，28，并且由控制器37控制名称寄存器，并且将图40划分为大于预定最小尺寸的尺寸。

6. 发明专利

JPS57122529A Drawing data processing system for electron beam exposure apparatus 失效
标题翻译：电子束曝光装置绘图数据处理系统
公开(公告)号：JPS57122529A
公开(公告)日：1982-07-30
申请号：JP880681
申请日：1981-01-23
申请人： Hitachi Ltd , Nippon Telegr & Teleph Corp
发明人： SHIMAZU NOBUO , FUJINAMI AKIHIRA , TAKAMOTO KIICHI , YODA HARUO , YOKOUCHI HISATAKE
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30
CPC分类号： H01J37/3023
摘要： PURPOSE:To enhance the productivity of an exposure apparatus by feeding only minimum data necessary to draw to one group of patterns having the prescribed regularity to drawing pattern data, thereby reducing the quantity of the data to be transferred to a buffer memory. CONSTITUTION:Data 11 from a buffer memory forming an exposure apparatus are fed to a controller shown below. In other words, the data 11 are applied to a judging circuit 12. The output from the judging circuit 12 is in turn applied to the first multiplexer 15. The signal from the multiplexer 15 is in turn applied through a plurality of registers 161-16n to a single pattern data generator 17. An output separately selected from the circuit 12 is connected to the output terminal of a generator 17. The signal from the generator 17 is applied through the second multiplexer 18 to a plurality of registers 191-19n. A drawing operation controller 20 is operated by the outputs from the registers. With the structure thus constructed, the circuit 12 discriminates the pattern group having the prescribed regularity. The necessary data are applied through signal wires 13 to the first multiplexer 15, and the other data are applied through signal wires 14 to the second multiplexer 18 of the rear stage.
摘要翻译：目的：为了提高曝光装置的生产率，只需将仅绘制规定规则的一组图案所需的最小数据馈送到绘制图案数据，从而减少要传送到缓冲存储器的数据量。构成：形成曝光装置的缓冲存储器的数据11被馈送到下面所示的控制器。换句话说，将数据11应用于判断电路12.判断电路12的输出依次施加于第一多路复用器15.另外，来自复用器15的信号通过多个寄存器161-16n 单个图案数据发生器17.从电路12分别选择的输出连接到发生器17的输出端。来自发生器17的信号通过第二多路复用器18被施加到多个寄存器191-19n。绘图操作控制器20由寄存器的输出操作。利用如此构造的结构，电路12区分具有规定规则性的图案组。必要的数据通过信号线13施加到第一多路复用器15，并且其它数据通过信号线14施加到后级的第二多路复用器18。

7. 发明专利

JP2008159061A Pattern matching method and apparatus 有权
标题翻译：图案匹配方法和装置
公开(公告)号：JP2008159061A
公开(公告)日：2008-07-10
申请号：JP2007332968
申请日：2007-12-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKANE ATSUSHI , YODA HARUO , YOSHIDA MASASHI , IKEDA KOJI , OZAWA YASUHIKO
IPC分类号： G06T1/00 , G01N23/225 , G06T7/00 , G06T7/60 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an operator-free and fully-automated pattern matching method, and to provide an apparatus having high throughput.
SOLUTION: The pattern matching method and apparatus for matching patterns between design data and an image acquired by a scanning electronic microscope, perform matching in each direction between an edge of the design data and that of an image acquired by the scanning electronic microscope.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供无操作者和全自动模式匹配方法，并提供具有高吞吐量的装置。解决方案：用于匹配设计数据和由扫描电子显微镜获取的图像之间的图案的图案匹配方法和装置，在设计数据的边缘与由扫描电子显微镜获取的图像的边缘之间的每个方向上进行匹配。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2006113073A System and method for pattern defect inspection 审中-公开
标题翻译：用于图形缺陷检查的系统和方法
公开(公告)号：JP2006113073A
公开(公告)日：2006-04-27
申请号：JP2005307961
申请日：2005-10-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YODA HARUO , NOZOE MARI
IPC分类号： G01N23/225 , G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for pattern defect inspection which can speed up detailed analysis of detected pattern defect in semiconductor circuit pattern formation process, by skipping visual reinspection through a review device.
SOLUTION: In this method, a means of synchronization with detection of defects to calculates amount of image features of the defect, and a means for classifying defects into clusters, depending on the calculated amount of image features are added to the high-speed pattern defect inspection system.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于图案缺陷检查的系统和方法，其可以通过通过审查装置跳过视觉再检查来加快半导体电路图案形成处理中检测到的图案缺陷的详细分析。解决方案：在该方法中，与检测缺陷同步的手段，以计算缺陷的图像特征量，以及根据所计算的图像特征量将缺陷分类为群集的装置，速度模式缺陷检测系统。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2002075833A ELECTRON-BEAM DRAWING DEVICE AND DRAWING METHOD 失效
公开(公告)号：JP2002075833A
公开(公告)日：2002-03-15
申请号：JP2000259478
申请日：2000-08-29
申请人： HITACHI LTD
发明人： ANDO MASAAKI , YODA HARUO , TOMIYOSHI CHIKAO , KAWANO MASAMICHI
IPC分类号： G03F7/20 , H01J37/09 , H01J37/305 , H01J37/317 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a device and a method of drawing electron beams by which even an oblique graphic can also be drawn with high accuracy by solving the problem that edge roughness is generated in an oblique side section, and the accuracy of drawing is deteriorated when the oblique graphic is drawn by using slender rectangular beams in the drawing of an oblique graphic pattern. SOLUTION: A first aperture having a rectangle and a second aperture having a parallelogram are formed, and a desired pattern is drawn on a sample surface by using variable parallelogram-shaped electron beams formed by the two apertures. An oblique-side section contour breaking-down means is provided, the oblique side section is drawn by a variable parallelogram, and the inside section of an oblique side is drawn by using a triangle and a quadrilateral (the rectangle).

10. 发明专利

JP2000306827A CHARGED PARTICLE BEAM DRAWING APPARATUS AND PATTERN FORMATION METHOD 失效
公开(公告)号：JP2000306827A
公开(公告)日：2000-11-02
申请号：JP2000041377
申请日：2000-02-15
申请人： HITACHI LTD
发明人： YODA HARUO , KAWANO HAJIME
IPC分类号： H01J37/305 , G03F7/20 , G21K5/04 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To draw a micropattern with less proximity effect by providing an auxiliary exposure for irradiating a drawing region on a sample with an exposure amount for an auxiliary exposure figure and a main exposure for irradiating a drawing pattern region in the drawing region on the sample. SOLUTION: In the process for carrying out an auxiliary exposure over the whole surface of a drawing region 502, the drawing region 502 is divided into a plurality of small regions 503, 504 having equal area, and the value of the area to be irradiated by a charged particle beam is calculated for each small region 503, 504, and the calculated area value is modified by subjecting it to weighted addition of the area value of the peripheral small region thereof for each small region 503, 504. Then, a plurality of auxiliary exposure figures are formed for the whole surface of this drawing region 502, and an exposure amount for auxiliary exposure figure thus formed is determined with reference to the value of the modified area. Then, the drawing region 502 on the sample is irradiated by the exposure amount of the auxiliary exposure figure, and a drawing pattern region in the drawing region on the sample is exposed to main exposure irradiation.

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